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    • 4. 发明专利
    • Substrate carrying roll
    • 基层携带滚子
    • JP2014122395A
    • 2014-07-03
    • JP2012279533
    • 2012-12-21
    • Kobe Steel Ltd株式会社神戸製鋼所
    • OBA NAOKITAMAGAKI HIROSHI
    • C23C14/56
    • B05C1/003B05C1/10B05C1/12C23C14/541C23C14/562C23C16/46C23C16/545D21F5/022H05B3/0095
    • PROBLEM TO BE SOLVED: To provide a substrate carrying roll capable of securing a wide temperature control range for a substrate without deterioration of the substrate carrying quality.SOLUTION: A film formation roll 2a having a columnar shape, arranged in a film formation apparatus carrying out a film formation treatment on the surface of a film substrate W and carrying the film substrate W comprises: a central part segment 13a formed in the central part in the longitudinal direction along the shaft center of a cylindrical or columnar shape and not allowing the film substrate W to come in contact with; and end part segments 12a and 12b formed at both ends, in the longitudinal direction, of the central part segment 13a and allowing the film substrate W to come in contact with. The film formation roll 2a also has a central part temperature-increasing/decreasing medium path 15a controlling the temperature of the central part segment 13a and a both end part temperature-increasing/decreasing medium path 14 controlling the temperatures of the end part segments 12a and 12b. The temperatures of the central part temperature-increasing/decreasing medium path 15a and both end part temperature-increasing/decreasing medium path 14 are controlled independently.
    • 要解决的问题:提供一种能够确保基板的宽温度控制范围而不会降低基板承载质量的基板承载辊。解决方案:具有圆柱形状的成膜辊2a布置在成膜装置中 在薄膜基板W的表面上进行薄膜形成处理并承载薄膜基板W包括:中心部分13a,沿圆柱形或柱状轴的中心沿纵向方向形成在中心部分,并且不允许薄膜基板 W接触; 以及形成在中心部分片段13a的纵向两端的端部片段12a和12b,并允许胶片基片W接触。 成膜辊2a还具有控制中央部分片段13a的温度的中心部分增温/减少介质路径15a和控制端部片段12a和22的温度的两端部升温/降低介质路径14 12B。 独立地控制中央部升温/降温介质路径15a和端部升温/降温介质路径14的温度。