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1. 发明专利

JP2011232747A Bow rod of string instrument and method for manufacturing bow and bow rod of string instrument 有权
标题翻译：仪器仪表及其制造方法及仪器仪表
公开(公告)号：JP2011232747A
公开(公告)日：2011-11-17
申请号：JP2011085572
申请日：2011-04-07
申请人： Yamaha Corp , ヤマハ株式会社
发明人： YAMAMOTO AKIO , NAKATANI HIROSHI , HEIKO TATSUYA , FUKUSHIMA TOSHIHARU
IPC分类号： G10D3/16 , B29C70/06 , B29K105/08 , B29L23/00 , G10D1/02
CPC分类号： G10D3/16 , B29C70/347 , B29L2031/758
摘要： PROBLEM TO BE SOLVED: To provide a bow rod of a string instrument using a fiber reinforced plastic with an external appearance of a grain similar to that of a natural wood.SOLUTION: A bow rod 5 of a string instrument includes a base material comprising: a carbon fiber resin layer 1 which is formed in a shape of an arched rod; and a glass fiber resin layer 2 which is made of a glass fiber resin and covers the outer surface of the carbon fiber resin layer 1. The glass fiber resin layer 2 has a non-adhesion portion with an air layer existing inside the glass fiber resin layer 2 and an adhesion portion without an air layer.
摘要翻译：要解决的问题：提供一种使用具有类似于天然木材的外观的纤维增强塑料的弦乐器的弓杆。解决方案：弦乐器的弓形杆5包括基材，其包括：碳纤维树脂层1，其形成为弓形的形状; 以及玻璃纤维树脂层2，其由玻璃纤维树脂制成并覆盖碳纤维树脂层1的外表面。玻璃纤维树脂层2具有在玻璃纤维树脂内部存在空气层的非粘合部分层2和没有空气层的粘附部分。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2004144774A Electric stringed instrument 审中-公开
标题翻译：电子仪器
公开(公告)号：JP2004144774A
公开(公告)日：2004-05-20
申请号：JP2002306105
申请日：2002-10-21
申请人： Yamaha Corp , ヤマハ株式会社
发明人： NAKATANI HIROSHI , TAMURA SHINYA , HASEBE MAMORU
IPC分类号： G10D1/02 , G10D3/04 , G10H1/00 , G10H3/18
摘要： PROBLEM TO BE SOLVED: To provide a violin type electric stringed instrument capable of a proper musical sound signal without performing any filter processing or, if any, minimizing filter processing. SOLUTION: The violin type electric stringed instrument is equipped with a musical instrument main body 1 where a bridge is arranged at an intermediate part and strings are tensed, and a pickup part provided to the musical instrument main body to detect vibrations of the musical instrument main body accompanying string vibration.The instrument is characterized in that a mass body 16 for timbre variation is fitted at either of the base end of the neck 3 of the musical instrument main body or a saddle equivalent part 5. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供能够具有适当音乐声音信号的小提琴式电弦乐器，而不进行任何过滤器处理，或者如果有的话，最小化滤波器处理。解决方案：小提琴式电动弦乐器配备有乐器主体1，其中桥被布置在中间部分并且琴弦被拉紧，拾音部分提供给乐器主体以检测振动伴奏弦乐器的乐器主体。仪器的特征在于，用于音色变化的质量体16安装在乐器主体的脖子3的基端或鞍座等效部5的任一个处。（C）2004，JPO

3. 发明专利

JPH03278529A RADICAL REACTION APPARATUS 失效
公开(公告)号：JPH03278529A
公开(公告)日：1991-12-10
申请号：JP7937390
申请日：1990-03-28
申请人： YAMAHA CORP
发明人： NAKATANI HIROSHI
IPC分类号： C23F4/00 , H01L21/302 , H01L21/3065
摘要： PURPOSE:To obtain a novel apparatus which can control ashing or etching characteristic simply by installing a magnetic-field application means which applies a static magnetic field in the direction perpendicular to the plane of a wafer and whose intensity is variable. CONSTITUTION:At a radical reaction apparatus which houses, inside a treatment chamber 10, a wafer 14 having a part to be treated and which ashes or etches, by means of a radical reaction, the part to be treated, a magnetic-field application means 20 which applies a static magnetic field in the direction perpendicular to the plane of the wafer 14 and whose intensity is variable is installed. For example, an electromagnet 20 provided with magnetic poles 20a and 20b which are arranged so as to sandwich a treatment chamber 10 from the upper part and the lower part is installed; an exciting current is supplied to the electromagnet 20 from a DC power supply E via a variable resistance VR; a line of magnetic force B is generated in the direction perpendicular to the plane 14 between the magnetic poles 20a and 20b. The intensity of a magnetic field exerted on the wafer 14 is made variable within a range of, e.g. 0 to 10000 G on the basis of an ON/OFF operation of the power supply E and an operation of the variable resistance VR.

4. 发明专利

JP2003157079A RUBBED STRING INSTRUMENT AND ACOUSTIC SIGNAL GENERATOR 审中-公开
公开(公告)号：JP2003157079A
公开(公告)日：2003-05-30
申请号：JP2001356547
申请日：2001-11-21
申请人： YAMAHA CORP
发明人： NAKATANI HIROSHI
IPC分类号： G10H3/18
摘要： PROBLEM TO BE SOLVED: To recreate a sound field in which delicate string rubbing operations such as the differences between the rubber strings are more accurately reflected even under special environment in which a sound generating source is located at a very close range. SOLUTION: The generator is provided with a low-frequency sound side sensor 301 which is mounted on the bottom surface of a leg section 7a of a low-frequency sound side of a bridge 7 of an electric violin and a high-frequency sound side sensor 300 is mounted on the bottom surface of a leg section 7b of the high-frequency side. Signals detected by the sensors are respectively outputted to an R channel processing section 250 and an L channel processing section 260. The sections 250 and 260 conduct prescribed signal processes for the supplied signals and output the processed signals as R and L channel acoustic signals.

5. 发明专利

JP2003150164A RUBBED STRING MUSICAL INSTRUMENT AND VIBRATION DETECTOR 审中-公开
公开(公告)号：JP2003150164A
公开(公告)日：2003-05-23
申请号：JP2001352214
申请日：2001-11-16
申请人： YAMAHA CORP
发明人： NAKATANI HIROSHI
IPC分类号： G10H3/18
摘要： PROBLEM TO BE SOLVED: To more accurately detect the vibration of the bridge of a rubbed string musical instrument without increasing the cost. SOLUTION: A first vibration detecting sensor group 50a and a second vibration detecting sensor group 50b are respectively arranged on the bottom surface sides of leg sections 18a and 18b of a bridge 7. The group 50a has a constitution in which two sensors such as a piezoelectric sensor 51a and a piezoelectric sensor 53a are stacked with an insulation layer 52 interposed between them and the two sensors are connected in parallel. Similarly, the group 50b has a constitution in which two piezoelectric sensors 51b and 53b are stacked with the layer 52 interposed between them and the sensors are connected together in parallel. The output impedances of the thus constituted groups 50a and 50b are small and various effects are obtained to accurately detect the vibration of the bridge.

6. 发明专利

JPH08250407A MANUFACTURE OF SEMICONDUCTOR DEVICE 失效
公开(公告)号：JPH08250407A
公开(公告)日：1996-09-27
申请号：JP8082395
申请日：1995-03-13
申请人： YAMAHA CORP
发明人： NAKATANI HIROSHI
IPC分类号： G03F7/20 , H01L21/027
摘要： PURPOSE: To form a resist pattern in accordance with designed values on a substrate surface having a stepped-height-difference by providing a mask part, whose. mask size is deviated from a designed value, on a reticle during an exposure step for a stepped surface which is not focused and by carrying out a plurality of exposures focused in accordance with the stepped surfaces and one development. CONSTITUTION: A first exposure is carried out with a stepped surface A from among at least two stepped surfaces A, B being focused. A reticle 20a used during this first exposure has a mask part 21a with a designed width value X on the part facing the stepped surface A. At that time, the part facing the stepped surface B not focused is provided with a mask part 22a having a width X+dX larger than the designed value X. A second exposure is carried out with the stepped surface B being focused. A second reticle 20b has a mask part 22b with the designed width value X. Further, a mask part 21b has a width X+dX larger than the designed value X.

7. 发明专利

JP2003150165A RUBBED STRING INSTRUMENT, SIGNAL DETECTOR AND ACOUSTIC SIGNAL GENERATOR 审中-公开
公开(公告)号：JP2003150165A
公开(公告)日：2003-05-23
申请号：JP2001352215
申请日：2001-11-16
申请人： YAMAHA CORP
发明人： NAKATANI HIROSHI
IPC分类号： G10H3/18
摘要： PROBLEM TO BE SOLVED: To more accurately detect vibration of a bridge or the like caused by playing operations of a rubbed string instrument. SOLUTION: Lateral vibration detecting piezoelectric sensors 51a and 51b, an insulation layer 52 and longitudinal vibration detecting piezoelectric sensors 53a and 53b are arranged and laminated between the bottom surfaces of leg sections 18a and 18b of a bridge 7 and a body 2A. The sensor 51a and 51b and the sensors 53a and 53b are arranged along a polarizing direction as shown in Figure. Thus, detected signals being outputted from an output line 55 mainly include lateral vibration components of the vibration generated in the bridge 7 and detected signals being outputted from an output line 57 mainly include longitudinal vibration components of the vibration generated in the bridge 7. Lateral and longitudinal vibration components are independently detected by a vibration detecting unit 50 which has the constitution described above.

8. 发明专利

JP2002124518A WIRING FORMING METHOD 审中-公开
公开(公告)号：JP2002124518A
公开(公告)日：2002-04-26
申请号：JP2001311167
申请日：2001-10-09
申请人： YAMAHA CORP
发明人： TAWARA TAKASHI , NAKATANI HIROSHI
IPC分类号： H01L21/302 , H01L21/3065 , H01L21/3213
摘要： PROBLEM TO BE SOLVED: To improve the dimensional accuracy of a wiring pattern. SOLUTION: The wiring forming method comprises a step for forming a wiring layer 14 of WSi2, etc., on an insulation film 12 covering the surface of a semiconductor substrate 10, forming a first TiN antireflective film and a second organic antireflective film 18 of acrylic resin, etc., on the layer 14, forming resist layers 20a-20c on the film 18, dry etching the film 18 with the layers 20a-20c used as a mask, dry etching the film 16 with the rest of the layers 20a-20c and the film 18 used as a mask, dry etching the film 14 with the rest of the layers 20a-20c and the films 16, 18 used as a mask, and removing the rest of the layers 20a-20c and the film 18 with leaving a resulting laminate including the rest of the layer 14 and the film 16 as a wiring layer. After etching the film 16 and then removing the rest of the layers 20a-20c and the film 18, the film 14 may be etched with the rest of the film 16 used as a mask.

9. 发明专利

JPH1092774A DRY ETCHING METHOD 失效
公开(公告)号：JPH1092774A
公开(公告)日：1998-04-10
申请号：JP26248296
申请日：1996-09-11
申请人： YAMAHA CORP
发明人： NAKATANI HIROSHI
IPC分类号： H01L21/302 , H01L29/78
摘要： PROBLEM TO BE SOLVED: To improve the anisotropy of etching in a dry etching method. SOLUTION: A Si layer 14, 1 Wsi layer 16 and a TiN layer 18 are sequentially formed on an insulating film 12a covering the surface of a semiconductor substrate 10. Then, a resist layer 20 is formed on the layer 18 in accordance with a gate electrode pattern. The volatilization of solvent in resist is promoted and the amount of the molecules of resist resin is increased by photo- crosslinking reaction by executing a baking processing while the layer 20 is irradiated with far ultraviolet radiation 22. The layer 18 is dry-etched by chlorine gas with the layer 20 as a mask and the stacking of the layers 14 and 16 is dry-etched by chlorine gas containing oxygen with the layer 20 and the remaining part of the layer 18 as the masks. At that time, an oxide film is efficiently formed on the remaining sidewall of the layer 18 and a carbon system polymer film on the sidewall of a part to be etched. Thus, an etching form with satisfactory anisotropy can be obtained.

10. 发明专利

JPH08250406A EXPOSURE OF SEMICONDUCTOR WAFER 失效
公开(公告)号：JPH08250406A
公开(公告)日：1996-09-27
申请号：JP8082295
申请日：1995-03-13
申请人： YAMAHA CORP
发明人： NAKATANI HIROSHI
IPC分类号： G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027
摘要： PURPOSE: To carry out an optimum exposure by specifying a stepped surface to be automatically focused in accordance with each step for forming a device and by correcting the autofocus-point with an offset value, which offset value being a difference between an average height and the stepped surface height to be focused. CONSTITUTION: A stage 4 is scan-driven by a step-control driving part 9 and surface height information in its chip region is sampled. Then, a stepped surface height B to be focused in a chip region to be exposed to light is extracted from the distribution of the sampled height information. Then, a main CPU 10 calculates B-A as an offset value from an average height A of a plurality of autofocus-points obtained previously and a stepped surface height B to be practically focused. In the exposure of each chip region, the above-mentioned offset value is given to a focus-control driving part 8, thus the autofocus-point is corrected and the exposure is carried out.

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