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1. 发明专利

JP2011014628A Wet etching method 有权
标题翻译：湿蚀刻方法
公开(公告)号：JP2011014628A
公开(公告)日：2011-01-20
申请号：JP2009155706
申请日：2009-06-30
申请人： Ulvac Seimaku Kk , アルバック成膜株式会社
发明人： ISHIZUKA MASAHIKO , HIRANO NAONORI
IPC分类号： H01L21/306 , C23F1/00 , C23F1/16 , H01L21/3205
摘要： PROBLEM TO BE SOLVED: To provide a wet etching method having excelling operational efficiency and having a large selective range of materials for an etched board.SOLUTION: A glass board 1, including a patterned chromium layer 2 and a resist layer 3 on a surface, is immersed in an etchant 4 and wet-etched. Here, a metal bar 6 consisting of aluminum or iron is immersed in the etchant 4 in a tank 5, and the exposed surface 2a of the chromium layer 2 and the end of the metal bar 6 are brought into contact at a desired timing. The chromium layer 2, brought into contact with the metal bar 6, is etched gradually by an electrochemical reaction, or the like, and is miniaturized, while a part exposed to the etchant 4 of the glass board 1 is increased gradually and the part is wet-etched. Accordingly, the undercut shape of the glass board 1 is adjusted, and a tapered surface 7 is formed on the glass board 1. Quartz, white-board glass, blue-board glass, borosilicate glass, alkali-free glass or lead glass can applicable to the glass board 1.
摘要翻译：要解决的问题：提供具有优异的操作效率并且具有用于蚀刻板的材料选择范围大的湿式蚀刻方法。解决方案：包括图案化的铬层2和表面上的抗蚀剂层3的玻璃板1，浸在蚀刻剂4中并湿法蚀刻。这里，将由铝或铁组成的金属棒6浸在罐5中的蚀刻剂4中，铬层2的暴露表面2a和金属棒6的端部在期望的时刻接触。与金属棒6接触的铬层2通过电化学反应等逐渐蚀刻并小型化，而暴露于玻璃板1的蚀刻剂4的部分逐渐增加，部分为湿蚀刻。因此，玻璃板1的底切形状被调整，并且在玻璃板1上形成锥形表面7.石英，白板玻璃，蓝板玻璃，硼硅酸盐玻璃，无碱玻璃或铅玻璃可以适用到玻璃板1。

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