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1. 发明专利

JP2009097057A Sputtering apparatus 有权
标题翻译：溅射装置
公开(公告)号：JP2009097057A
公开(公告)日：2009-05-07
申请号：JP2007272054
申请日：2007-10-19
申请人： Ulvac Japan Ltd , 株式会社アルバック
发明人： USHIYAMA FUMIZO , ODAGI HIDEYUKI , KUBO MASASHI , YAMAMOTO KAZUTO , KATAGIRI HIROAKI
IPC分类号： C23C14/35 , H01L21/285
摘要： PROBLEM TO BE SOLVED: To improve target use efficiency by operating magnetron-magnet apparatuses having different sizes in such a manner that their erosion regions do not overlap.
SOLUTION: First and second magnetron-magnet apparatuses having different sizes 20
1 and 20
2 are circulated and moved at the back surface of first and second rectangular targets 21a and 21b so as to form four erosion regions. When the first and second magnetron-magnet apparatuses 20
1 and 20
2 comes in and out of the back surface position by crossing the shorter side of the first and second targets 21a and 21b, the erosion regions have a linear shape along the long side, thereby sputtering a large area.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：通过以不侵蚀区域不重叠的方式操作具有不同尺寸的磁控管 - 磁体装置来提高目标的使用效率。解决方案：具有不同尺寸20 1 和20 2 的第一和第二磁控管磁铁装置在第一和第二矩形对象21a的背面被循环移动， 21b以形成四个侵蚀区域。当第一和第二磁控管磁铁装置20 20 2 通过穿过第一和第二靶21a的短边而进入和离开背面位置时如图21b所示，侵蚀区域沿着长边具有线性形状，从而溅射大面积。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2009114507A Sputtering apparatus 有权
标题翻译：溅射装置
公开(公告)号：JP2009114507A
公开(公告)日：2009-05-28
申请号：JP2007289440
申请日：2007-11-07
申请人： Ulvac Japan Ltd , 株式会社アルバック
发明人： USHIYAMA FUMIZO , ODAGI HIDEYUKI , KUBO MASASHI , YAMAMOTO KAZUTO , KATAGIRI HIROAKI
IPC分类号： C23C14/35
摘要： PROBLEM TO BE SOLVED: To provide a sputtering apparatus of a passage deposition type which improves the efficiency in the use of a target. SOLUTION: Portions of a plurality of magnet traveling trajectories 21, 22 are arranged in the positions just at the rear of first and second targets 11, 12 of a rectangular shape, and magnetron magnet devices 31, 32 of the same diameter as that of the respective magnet traveling trajectories 21, 22 are mounted to the magnetron magnet devices 31, 32. The magnetron magnet devices 31, 32 are made to travel on the magnet traveling trajectories 21, 22. If the erosion regions formed by the magnetron magnet devices 31, 32 are so adapted as not to overlap on each other, the efficiency in the use of the target is improved. The magnets traveling trajectories 21, 22 may be formed to an annular shape such that the magnetron magnet devices 31, 32 may cyclically move. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种提高靶的使用效率的通道沉积型溅射装置。解决方案：多个磁体移动轨迹21,22的部分布置在刚好在矩形形状的第一和第二靶11,12的后部的位置，并且具有相同直径的磁控管磁体装置31,32 各个磁铁行走轨迹21,22的磁铁磁铁装置31,32被安装在磁控管磁铁装置31,32上。使磁控管磁铁装置31,32在磁铁行进轨迹21,22上移动。如果由磁控管磁铁装置31,32被适配为不彼此重叠，改善了使用目标的效率。磁铁移动轨迹21,22可以形成为环形形状，使得磁控管磁体装置31,32可循环移动。版权所有（C）2009，JPO＆INPIT

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