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    • 3. 发明专利
    • MEASURING DEVICE AND METHOD
    • JP2002243607A
    • 2002-08-28
    • JP2001039610
    • 2001-02-16
    • ULVAC CORP
    • ITO ATSUSHIMAEHIRA KENFUWA KOYUYAMA JUNPEI
    • G01N5/02
    • PROBLEM TO BE SOLVED: To provide technology capable of improving measurement accuracy, when measuring the oscillation frequencies of crystal oscillators in a liquid. SOLUTION: In this measuring method, a measuring operation for oscillating the oscillators to be measured 61-64 in the liquid and measuring their oscillation frequencies and an operation for oscillating a reference oscillator 60 with a low oscillation frequency, which oscillates in the air are alternately switched from one to the other. Therefore, even if the oscillators to be measured 61-64 oscillate in the liquid to lower the oscillation stability of an oscillating circuit 4, the oscillation of the oscillating circuit 4 returns to a stable state, when the reference oscillator 60 is oscillated. Therefore, even if a plurality of measuring operations are repeated, it is possible to perform measurements, without reduction in the oscillation stability of the oscillating circuit 4 and to improve measurement accuracy more than by conventional methods.
    • 5. 发明专利
    • MINUTE REGION MEASURING DEVICE
    • JP2001041713A
    • 2001-02-16
    • JP21731699
    • 1999-07-30
    • ULVAC CORP
    • ITO ATSUSHI
    • G01B11/06
    • PROBLEM TO BE SOLVED: To provide a minute region measuring device having excellent repeatability and capable of measuring in a short time. SOLUTION: In this device, light from a light source 2 is irradiated onto a minute region on the surface of a substrate 1 on which a thin film is formed, and reflected light is received by a light receiving part 4, to measure the thickness, a refractive index or the like of the thin film. In this case, a light size of the light source 2 is adjusted to have a larger area than the minute region, and a CCD camera 4a is installed on the light receiving part 4, and reflected light quantities from each part of the region on the surface are measured respectively by each electrode of a charge coupled element of the CCD camera 4a. A spectral ellipsometer is formed by installing a monochromator 3 in front of the light source 2 or by installing an acoustooptic spectral filter in front of the CCD camera 4a, and besides, an interference thicknessmeter is formed by interposing a half mirror for transmitting incident light onto the substrate 1 and reflected light on an optical path from the light source 2 to the CCD camera 4a via the substrate 1.
    • 8. 发明专利
    • FILM THICKNESS MONITORING CONTROLLER FOR VACUUM EVAPORATOR
    • JPH0882516A
    • 1996-03-26
    • JP21746494
    • 1994-09-12
    • ULVAC CORP
    • ITO ATSUSHIYODA HIDENORIOKUNO TORU
    • G01B17/02C23C14/54G01B17/00G01B21/08
    • PURPOSE: To enable feedback controlling of a vacuum evaporation source stably even at a low evaporation rate by dividing a difference between the frequency of a piezo-electric crystal and a beat frequency generated from a beat frequency oscillator in a fixed or variable manner. CONSTITUTION: A quartz oscillator 1 is arranged in a chamber of a vacuum evaporator. An output of a transmitter 2 is connected to an input of a double balance mixer 3. The mixer 3 forms an absolute value of the sum of a transmitted frequency signal F from the transmitter 2 and a frequency signal FC from a beat frequency signal oscillator 4 and the difference therebetween, namely, |F-FC| and |F+FC|. The output of the mixer 3 is connected to a frequency divider 7 through an LPF 5 and an amplifier 6 and the LPF 5 passes the signal |F-FC| alone of the difference among the outputs of the mixer 3. The frequency divider 7 is connected to a CPU 10 through a gate 8 and a counter 9 on one hand and directly to the CPU 10 on the other. This achieves a higher resolving power in frequency measurement while stabilizing a feedback control of an evaporation source.
    • 9. 发明专利
    • FILM-FORMATION MONITORING AND CONTROL APPARATUS
    • JPH074943A
    • 1995-01-10
    • JP14176393
    • 1993-06-14
    • ULVAC CORP
    • ITO ATSUSHI
    • C23C14/54G01B17/00G01B17/02
    • PURPOSE:To control and measure a film thickness with good accuracy during a film-formation process by a method wherein the film-formation state of every film for a multilayer film is monitored by using a specific expression obtained by applying the relation between incident light and reflected light in an optical system to a one-dimensional acoustic resonator. CONSTITUTION:A resonant frequency from an oscillation circuit 4 is measured by a counter circuit 5, and the circuit 4 and the circuit 5 constitute a means to measure the fundamental resonant frequency fc of a piezoelectric crystal for a micro-balance sensor 3. The resonant frequency which has been measured by the circuit 5 is sent to a microprocessor 6. By using the resonant frequency fc, the film thickness and the vapor-depositon speed of a layer are computed on the basis of the relational expression between a film thickness and a frequency when tfi represents the film thickness of an ith film on the piezoelectric crystal, Zi represents the acoustic impedance ratio of the ith film, pfi represents the density of the ith film, pq represents the density of the piezoelectric crystal, vq represents the speed of shear waves of the piezoelectric crystal, tq represents the thickness of the piezoelectric crystal and kai represents a wave-number vector.