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1. 发明专利

JP2009062597A Vacuum film deposition system, method for vacuum-depositing resin film, and resin film 有权
标题翻译：真空膜沉积系统，真空沉积树脂膜的方法和树脂膜
公开(公告)号：JP2009062597A
公开(公告)日：2009-03-26
申请号：JP2007232946
申请日：2007-09-07
申请人： Tsukishima Kikai Co Ltd , 月島機械株式会社
发明人： IIDA RYUICHI , MARUTA KAZUHIKO , TONAI SHUNPEI
IPC分类号： C23C14/22 , B32B15/08
摘要： PROBLEM TO BE SOLVED: To uniformly deposit a transparent conductive film such as an ITO thin film having lower resistance and higher permeability at a temperature equal to or lower than the softening point of a resin film at a relatively low cost at a high speed.
SOLUTION: Disclosed is a vacuum film deposition system where, at the upper part in a vacuum vessel 1, a resin film F wound round a film deposition roller 10 is arranged with the face S to be film-deposited downward, and, at the lower part in the vacuum vessel 1, an evaporation source 5 evaporating a vapor deposition material by an electron beam gun 4 and a plasma release source 7 emitting plasma B toward the material vapor A of the vapor deposition material evaporated in the evaporation source 5 are arranged so as to be confronted to the face S to be film-deposited, and the plasma release source 7 is arranged at intervals from a vertical plane R elongating to a vertical direction including the axis O of the film deposition roller 10.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：在相对较低成本的树脂膜的软化点以下的温度下，以高的方式均匀地沉积具有较低电阻和较高磁导率的ITO薄膜的透明导电膜速度。解决方案：公开了一种真空膜沉积系统，其中在真空容器1的上部设置有卷绕在成膜辊10上的树脂膜F，其中面S被膜下沉，在真空容器1的下部，蒸发源5通过电子束枪4蒸发蒸镀材料和将等离子体B朝向蒸发源5中蒸发的气相沉积材料的材料蒸气A发射的等离子体释放源7 被布置成面对要被膜沉积的面S，并且等离子体释放源7从包括成膜辊10的轴线O的垂直方向延伸的垂直面R间隔布置。
版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2008144244A Device for controlling film formation and film-forming apparatus 有权
标题翻译：用于控制膜形成和成膜装置的装置
公开(公告)号：JP2008144244A
公开(公告)日：2008-06-26
申请号：JP2006335727
申请日：2006-12-13
申请人： Tsukishima Kikai Co Ltd , 月島機械株式会社
发明人： MARUTA KAZUHIKO , IIDA RYUICHI , KUWASE KAZUTOSHI , SAITO NAOMI
IPC分类号： C23C14/50
摘要： PROBLEM TO BE SOLVED: To provide a device for controlling film formation, which can control a thin film so as to be formed into uniform thickness on articles to be film-formed having a concave surface to be film-formed, even when mixed articles with different shapes and dimensions are mounted on a film-forming apparatus.
SOLUTION: The device 16 for controlling the film to be formed on the concave surface Wa to be film-formed of the article W to be film-formed comprises: a shaft member 17 which is arranged so as to extend along a central line C that connects the bottom part of the concave surface which is the surface Wa to be film-formed with a central part of an open part; and a control member 19 which is arranged so as to project to the outer circumference of the shaft member 17, is attachable to and detachable from the article W to be film-formed, and can adjust its position in a direction of the center line C.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种用于控制成膜的装置，其可以控制薄膜以在待成膜的凹面的成膜物上形成均匀的厚度，即使当具有不同形状和尺寸的混合制品安装在成膜装置上。解决方案：用于控制在待成膜的物品W成膜的凹面Wa上形成的膜的装置16包括：轴构件17，被布置成沿着中心线C，其将作为要成膜的表面Wa的凹面的底部与开口部的中心部连接; 并且布置成突出到轴构件17的外周的控制构件19可附接到待成膜的物品W上并且可从其拆卸，并且可以在其中心线C的方向上调整其位置版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2008138276A Vacuum film deposition system 审中-公开
标题翻译：真空膜沉积系统
公开(公告)号：JP2008138276A
公开(公告)日：2008-06-19
申请号：JP2006328030
申请日：2006-12-05
申请人： Tsukishima Kikai Co Ltd , 月島機械株式会社
发明人： NAKAGOME MASATO , MARUTA KAZUHIKO , IIDA RYUICHI
IPC分类号： C23C14/50 , C23C14/24
摘要： PROBLEM TO BE SOLVED: To provide a vacuum deposition system where an autorotation axis can be set to the optimum inclination angle in accordance with the shape and dimensions of the body to be film-deposited, and further, there is no need of a driving means such as a motor in individual autorotation domes.
SOLUTION: The vacuum film deposition system forms a thin film by a generating mechanism 5 of a film deposition material, while rotating the body W to be film-deposited stored in a vacuum vessel 1 by a rotating mechanism. In the rotating mechanism, a revolving dome 6 revolving around a revolving axis O is fitted with autorotation domes 7 rotating around an autorotation axis P inclined to the revolving axis O, and the body W to be film-deposited is fitted. In each autorotation dome 7, at least either the inclination angle to the revolving axis O of the autorotation axis P or the position thereof to the revolving dome 6 is controllable, and further, it is rotated in such a manner that revolving force by the revolution of the revolving dome 6 is transferred via a transferring member 14 having flexibility.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种真空沉积系统，其中根据要沉积的物体的形状和尺寸将自转轴设置为最佳倾斜角，并且不需要一个驱动手段，如马达在各自的自转圆顶。解决方案：真空膜沉积系统通过薄膜沉积材料的产生机构5形成薄膜，同时通过旋转机构旋转储存在真空容器1中的待沉积的薄膜体W。在旋转机构中，围绕旋转轴线O旋转的旋转圆顶6配合有围绕与旋转轴线O倾斜的自转轴线P旋转的自转圆顶7，并且将被膜沉积的主体W嵌合。在每个自转圆顶7中，自旋轴线P的旋转轴O的倾斜角度或其旋转圆顶6的位置中的至少一个是可控的，并且进一步旋转，使得旋转力由旋转旋转圆顶6通过具有柔性的转印构件14转印。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2012041641A Vacuum film deposition system, method for vacuum-depositing resin film, and resin film 有权
标题翻译：真空膜沉积系统，真空沉积树脂膜的方法和树脂膜
公开(公告)号：JP2012041641A
公开(公告)日：2012-03-01
申请号：JP2011260098
申请日：2011-11-29
申请人： Tsukishima Kikai Co Ltd , 月島機械株式会社
发明人： IIDA RYUICHI , MARUTA KAZUHIKO , TONAI SHUNPEI
IPC分类号： C23C14/22
摘要： PROBLEM TO BE SOLVED: To uniformly deposit a transparent conductive film such as an ITO thin film having low resistance and high transmittance at a temperature equal to or lower than the softening temperature of a resin film at high rate at relatively low cost.SOLUTION: A resin film F wound around a film deposition roller 10 is arranged on an upper part in a vacuum vessel 1 with its film-deposited surface S being downwardly. An evaporation source 5 in which an evaporation material is evaporated by an electron beam gun 4, and a plasma emission source 7 for irradiating material vapor A of the vapor deposition material evaporated in the evaporation source 5 with plasma B are arranged on a lower part in the vacuum vessel 1 so as to be opposite to the film-deposited surface S. The plasma emission source 7 is arranged with a spacing from a virtual plane R including the axis O of the film deposition roller 10 and extending in the vertical direction.
摘要翻译：要解决的问题：以相对较低的成本以高速率在等于或低于树脂膜的软化温度的温度下均匀沉积具有低电阻和高透射率的ITO薄膜的透明导电膜。解决方案：卷绕在成膜辊10周围的树脂膜F布置在真空容器1的上部，其膜沉积表面S向下。其中通过电子束枪4蒸发蒸发材料的蒸发源5和用于用在等离子体B中蒸发在蒸发源5中蒸发的气相沉积材料的材料蒸气A的等离子体发射源7设置在下部真空容器1与膜沉积表面S相对。等离子体发射源7与包括成膜辊10的轴线O并在垂直方向上延伸的虚拟平面R间隔布置。版权所有（C）2012，JPO＆INPIT

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