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    • 2. 发明专利
    • Manganese dioxide heavy metal adsorbent and treatment method using the same
    • 二氧化锰重金属吸附剂及其处理方法
    • JP2008018312A
    • 2008-01-31
    • JP2006190493
    • 2006-07-11
    • Tosoh Corp東ソー株式会社
    • SAKAKI TAKASHIFUJII YOSHIAKIYOSHIDA SETSUO
    • B01J20/06B09B3/00B09C1/02B09C1/08C02F1/28
    • PROBLEM TO BE SOLVED: To provide a heavy metal adsorbent containing, as an active ingredient, a new manganese dioxide excellent in the adsorption character of heavy metals, and a method which detoxifies incinerated ashes, fly ashes, molten fly ashes, waste, waste water, and soil, which contain various heavy metals, by using the heavy metal adsorbent.
      SOLUTION: The heavy metal adsorbent contains the manganese dioxide in which a weight reduction in a temperature rise starting from 120°C up to 400°C is 6 wt.% or more, as an active ingredient. The concerned heavy metal adsorbent is added to any one of the garbage incineration ashes, the fly ashes, or the molten fly ashes containing the heavy metals, or to the soil and the waste water containing the heavy metals. By kneading them, the heavy metals can be detoxified.
      COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供一种重金属吸附剂,其包含作为活性成分的重金属吸附特性优异的新型二氧化锰,以及使焚烧灰,脱灰,熔融灰灰,废物排毒的方法 ,废水和含有各种重金属的土壤,通过使用重金属吸附剂。 解决方案:重金属吸附剂含有二氧化锰,其中从120℃至400℃的温度升高的重量减少为6重量%或更多,作为活性成分。 相关的重金属吸附剂被添加到任何一种垃圾焚烧灰,飞灰或含有重金属的熔融飞灰,或添加到含有重金属的土壤和废水中。 通过捏合它们,重金属可以解毒。 版权所有(C)2008,JPO&INPIT
    • 3. 发明专利
    • Polishing agent and method
    • 抛光剂和方法
    • JP2006128395A
    • 2006-05-18
    • JP2004314367
    • 2004-10-28
    • Tosoh Corp東ソー株式会社
    • YOSHIDA SETSUO
    • H01L21/304B24B37/00C09K3/14
    • PROBLEM TO BE SOLVED: To provide a polishing agent that polishes an SiO 2 layer at a high speed and an SiN layer at a low speed, and has high polish selectivity for the SiO 2 layer. SOLUTION: The polishing agent contains abrasive grains composed of manganese oxide in which the concentration of impurities comprising counterion of a soluble manganese compound is ≤0.5 wt%. Specifically, the abrasive grains comprise manganese oxide which is obtained by firing trimanganese tetroxide, which is obtained by oxidizing manganese hydroxide. The manganese hydroxide is generated by hydrolysis reaction of manganese metal. The obtained manganese oxide is preferably crushed and shredded. The polishing method using these polishing agents has higher polish selectivity for SiO 2 than for SiN, thereby being excellent in polishing an interlayer dielectric on a semiconductor substrate. COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了提供以高速抛光SiO 2 SB层和SiN层的抛光剂,并且对SiO 2 SB具有高抛光选择性, 2 层。 解决方案:抛光剂含有由氧化锰组成的磨粒,其中包含可溶性锰化合物的抗衡离子的杂质浓度≤0.5wt%。 具体地说,磨粒包含通过烧结通过氧化氢氧化锰获得的四氧化三锰而获得的氧化锰。 氢氧化锰是通过锰金属的水解反应产生的。 得到的氧化锰优选粉碎并粉碎。 使用这些抛光剂的抛光方法对于SiO 2 比对于SiN具有更高的抛光选择性,因此在半导体衬底上抛光层间电介质是优异的。 版权所有(C)2006,JPO&NCIPI
    • 4. 发明专利
    • Solution and method for polishing cooper-based metal
    • 用于抛光基于合金的金属的解决方案和方法
    • JP2005056879A
    • 2005-03-03
    • JP2003205441
    • 2003-08-01
    • Tosoh Corp東ソー株式会社
    • YOSHIDA SETSUO
    • B24B37/00C09K3/14H01L21/304H01L21/306
    • PROBLEM TO BE SOLVED: To provide a solution and a method for polishing Cu-based metal by which the working speed of a Ta-based metallic film of a barrier metal layer can be lowered without compromising the working speed and surface roughness of a Cu-based metallic film of a metallic wiring layer. SOLUTION: Since the working speed of the Ta-based metallic film can be lowered without changing significantly the working speed of the Cu-based metallic film at the time of polishing a copper wiring layer containing the Ta-based metallic film as a barrier layer by CMP by using a polishing solution containing TETA, TEPA, and PEHA, the Ta barrier layer can be polished nondefectively without degrading the productivity. COPYRIGHT: (C)2005,JPO&NCIPI
    • 要解决的问题:提供一种用于抛光Cu基金属的溶液和方法,通过该方法和方法可以降低阻挡金属层的Ta基金属膜的加工速度,而不损害工作速度和表面粗糙度 金属布线层的Cu系金属膜。 解决方案:由于可以降低Ta基金属膜的工作速度,而不会显着地改变在将含有Ta基金属膜的铜布线层作为抛光时的Cu基金属膜的加工速度 通过使用包含TETA,TEPA和PEHA的抛光溶液通过CMP的阻挡层,可以无缺陷地抛光Ta阻挡层而不降低生产率。 版权所有(C)2005,JPO&NCIPI
    • 6. 发明专利
    • Noble metal ion desorbent and noble metal recovering method
    • NOBLE金属离子解吸和金属回收方法
    • JP2014122397A
    • 2014-07-03
    • JP2012279645
    • 2012-12-21
    • Tosoh Corp東ソー株式会社
    • SUDO YUKINORIYOSHIDA SETSUOMASUDA TAKAHIRO
    • C22B11/00B01J20/34C07C323/60C22B3/24C22B3/44C22B7/00
    • Y02P10/234
    • PROBLEM TO BE SOLVED: To provide a noble metal ion desorbent and a noble metal recovering method which can efficiently desorb noble metal ions adsorbed by an adsorbent and can simply recover highly pure noble metal by reductive treatment of the desorption liquid.SOLUTION: An adsorbent having noble metal ions adsorbed is contacted with a solution containing a sulfide compound represented by the general formula (1) to desorb the noble metal ions in the solution and, thereafter, the obtained solution containing the noble metal ions is subjected to reduction treatment to recover a noble metal. (In the formula (1), R represents a methyl group, an ethyl group, a vinyl group, a linear, branched, or cyclic hydrocarbon group having 3 to 8 carbon atoms, an aromatic hydrocarbon group having 6 to 14 carbon atoms, a carboxymethyl group, a carbamoylmethyl group, a 4-carboxyl-3-thiabutyl group, or a 4-carbamoyl-3-thiabutyl group; and X represents a hydroxyl group or a primary amino group.)
    • 要解决的问题:提供一种贵金属离子解吸剂和贵金属回收方法,其可以有效地解吸吸附剂吸附的贵金属离子,并且可以通过还原处理解吸液简单地回收高纯度的贵金属。溶解剂:具有 吸附的贵金属离子与含有通式(1)表示的硫化物的溶液接触,使溶液中的贵金属离子解吸,然后对所得到的含有贵金属离子的溶液进行还原处理,回收 贵金属。 (式(1)中,R表示甲基,乙基,乙烯基,碳原子数3〜8的直链状,支链状或环状的烃基,碳原子数为6〜14的芳香族烃基, 羧甲基,氨基甲酰基甲基,4-羧基-3-硫杂丁基或4-氨基甲酰基-3-硫杂丁基; X表示羟基或伯氨基。
    • 8. 发明专利
    • Method for recovering noble metal
    • 回收金属的方法
    • JP2014012874A
    • 2014-01-23
    • JP2012150932
    • 2012-07-04
    • Tosoh Corp東ソー株式会社
    • YOSHIDA SETSUOSUDO YUKINORIMASUDA TAKAHIRO
    • C25C1/20B01J38/00B09B3/00C22B3/24C22B7/00C22B11/00
    • Y02P10/234Y02W30/82
    • PROBLEM TO BE SOLVED: To provide an economical method for efficiently recovering a noble metal with high purity by preventing degradation of a desorption component in a noble metal ion desorbent, capable of repeatedly utilizing the desorbent after recovering the noble metal.SOLUTION: A solution containing a sulfur-containing amino acid derivative represented by general formula (1), where Rrepresents a methyl group, an ethyl group, a vinyl group, a linear, branched or cyclic hydrocarbon group having 3 to 8 carbon atoms, or an aromatic hydrocarbon group having 6 to 14 carbon atoms, Reach independently represents a hydrogen atom, a methyl group, an ethyl group, a vinyl group, a linear, branched or cyclic hydrocarbon group having 3 to 8 carbon atoms, or an aromatic hydrocarbon group having 6 to 14 carbon atoms, and n is 0 or 1, and an extractant or an adsorbent containing a noble metal ion, are contacted to obtain a solution containing the noble metal ion and the sulfur-containing amino acid derivative represented by the general formula (1), and the solution is electrolyzed as a catholyte to deposit the noble metal.
    • 要解决的问题:提供一种经济的方法,通过防止贵金属离子解吸剂中的解吸组分的降解来有效地回收高纯度的贵金属,能够在回收贵金属之后重复利用解吸剂。溶液:含有 通式(1)表示的含硫氨基酸衍生物,其中R表示甲基,乙基,乙烯基,具有3〜8个碳原子的直链,支链或环状烃基,或具有 6〜14个碳原子,Reach独立地表示氢原子,甲基,乙基,乙烯基,具有3〜8个碳原子的直链,支链或环状烃基,或具有6〜14碳的芳香族烃基 原子,n为0或1,并且提取剂或含有贵金属离子的吸附剂接触以获得含有贵金属离子和含硫氨基交换剂的溶液 id衍生物,并且将溶液作为阴极电解液电解以沉积贵金属。