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1. 发明专利

JP2007266392A Method of processing three-dimensionally shaped semiconductor member and transistor formed using the method 有权
标题翻译：加工三维半导体半导体器件的方法和使用该方法形成的晶体管
公开(公告)号：JP2007266392A
公开(公告)日：2007-10-11
申请号：JP2006090610
申请日：2006-03-29
申请人： Toshiba Corp , 株式会社東芝
发明人： GOKOCHI TORU , HIEDA YASUYUKI , MUROOKA KENICHI , HIRAOKA TOSHIRO , AKIYAMA JUNICHI , ITO JUNICHI , KUBO KOICHI , HIRAI TAKATOMO
IPC分类号： H01L29/78 , B05D1/18 , H01L21/336 , H01L29/06
CPC分类号： H01L29/78696 , H01L29/42392
摘要： PROBLEM TO BE SOLVED: To enable a three-dimensionally shaped semiconductor member to be processed at as low costs as possible. SOLUTION: The method comprises the steps of: forming a plateau portion on the semiconductor member that has a projection; selectively coating the plateau portion with a self-organizing material or a solution thereof to form a self-organizing material film; creating a latent image in a self-organizing manner on the self-organizing material film; developing the latent image by etching to form a pattern of the self-organizing material film; and processing the semiconductor member using the pattern as a mask. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了能够以尽可能低的成本来处理三维形状的半导体部件。解决方案：该方法包括以下步骤：在具有突起的半导体部件上形成平台部分; 用自组织材料或其溶液选择性地涂覆平台部分以形成自组织材料膜; 在自组织材料电影上以自组织的方式形成潜像; 通过蚀刻显影潜像以形成自组织材料膜的图案; 以及使用该图案作为掩模来处理半导体部件。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2007257738A Recording and reproducing apparatus 有权
标题翻译：记录和再现设备
公开(公告)号：JP2007257738A
公开(公告)日：2007-10-04
申请号：JP2006080878
申请日：2006-03-23
申请人： Toshiba Corp , 株式会社東芝
发明人： HIRAI TAKATOMO , AKIYAMA JUNICHI , KUBO KOICHI , MUROOKA KENICHI , ITO JUNICHI , HIEDA YASUYUKI , GOKOCHI TORU
IPC分类号： G11B5/02
摘要： PROBLEM TO BE SOLVED: To eliminate the contact resistance of a head and a recording medium, to increase capacity and to reduce power consumption.
SOLUTION: The recording and reproducing apparatus comprises: a recording medium 10 provided with a plurality of magnetic cells 14 including a magnetized recording layer 17 whose magnetization direction is changed and having information recorded; and a first head 20 arranged above the recording medium 10 through a space or an insulation layer and provided with a first magnetization fixed layer 22 whose magnetization direction is fixed.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了消除头部和记录介质的接触电阻，增加容量并降低功耗。解决方案：记录和再现装置包括：记录介质10，其设置有多个磁性单元14，磁性单元14包括其磁化方向改变并具有记录信息的磁化记录层17; 以及通过空间或绝缘层布置在记录介质10上方的第一磁头20，并且设置有磁化方向固定的第一磁化固定层22。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2007223015A Method for manufacturing particle substrate, and particle substrate 有权
标题翻译：制造颗粒基质和颗粒基质的方法
公开(公告)号：JP2007223015A
公开(公告)日：2007-09-06
申请号：JP2006050403
申请日：2006-02-27
申请人： Toshiba Corp , 株式会社東芝
发明人： TODORI KENJI , FUJIMOTO AKIRA , GOKOCHI TORU , NAKANISHI TSUTOMU , NAKAMURA YOSHIAKI
IPC分类号： B82B3/00 , C23C28/00
摘要： PROBLEM TO BE SOLVED: To provide a particle substrate having nanoparticles or sub-nano particles of ≤1 nm regularly formed in a wide area, and to provide a method for manufacturing the particle substrate.
SOLUTION: The method includes steps of: preparing a substrate 1 the surface of which has a deposit layer 2 containing a metal; forming a particle layer 4 comprising uniformly arranged metal particles at a certain distance from the surface of the substrate 1 via an insulating layer 3; and irradiating the particle layer 4 with light from the opposite side to the insulating layer 3 so as to generate plasmon in the metal particle end of the particle layer 4 of the insulating layer 3 side and to almost uniformly deposit particle groups comprising the metal of the deposit layer 2 or oxides of the metal corresponding to the plasmon.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有规模形成在大面积上的≤1nm的纳米颗粒或亚纳米颗粒的颗粒基板，并提供一种制造该颗粒基板的方法。解决方案：该方法包括以下步骤：制备其表面具有含有金属的沉积层2的基底1; 通过绝缘层3形成包含与基板1的表面一定距离的均匀排列的金属颗粒的颗粒层4; 并且将来自与绝缘层3相反的一侧的光照射在粒子层4上，以便在绝缘层3侧的粒子层4的金属粒子端部产生等离子体激元，并且几乎均匀地沉积包含绝缘层3的金属的粒子群沉积层2或对应于等离子体的金属的氧化物。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2004331981A Monomer for resist resin 有权
公开(公告)号：JP2004331981A
公开(公告)日：2004-11-25
申请号：JP2004163504
申请日：2004-06-01
申请人： Toshiba Corp , 株式会社東芝
发明人： GOKOCHI TORU , SHINODA NAOMI , ASAKAWA KOUJI , OKINO TAKASHI
IPC分类号： G03F7/039 , C07C49/513 , C07C62/24 , C08F20/10 , C08G63/199 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a monomer for producing a resin for a resist, the resin being used in a photosensitive composition which can form a resist pattern having high dry etching resistance and excellent transparency to short wavelength light, good resolving properties with an alkaline development, and high adhesiveness.
SOLUTION: A monomer compound comprises including a skeleton, in a structure, in which at least one cyclic carbon of an adamantane ring is converted to -(C=O)-, and having at least two of at least one kinds of a groups selected from the group consisting of a hydroxyl group and a carboxyl group which act as a bonding portion upon a polymerization reaction.
COPYRIGHT: (C)2005,JPO&NCIPI

5. 发明专利

JP2004285077A Monomer for resist resin and resin for resist which contains it as a polymerization unit 审中-公开
公开(公告)号：JP2004285077A
公开(公告)日：2004-10-14
申请号：JP2004163529
申请日：2004-06-01
申请人： Toshiba Corp , 株式会社東芝
发明人： GOKOCHI TORU , SHINODA NAOMI , ASAKAWA KOUJI , OKINO TAKASHI
IPC分类号： G03F7/039 , C07D311/00 , C07D313/06 , C08F20/28 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resin for resist which has excellent transparency for short-wavelength light and high resistance to dry etching and can be used for a photosensitive composition in which resist pattern with good resolution and high adherence can be formed in an alkali developing process, and a monomer for manufacturing it.
SOLUTION: The monomer compound characteristically includes a skeletal structure in which at least one cyclic carbon in an adamantane ring are converted into -(C=O)-O-, and has at least one kind of and two or more groups selected from the group consisting of hydroxy groups and carboxy groups which are each a group acting as a binding site in polymerization reaction. The resin are manufactured using it.
COPYRIGHT: (C)2005,JPO&NCIPI

6. 发明专利

JP2004002668A Liquid ink and printer 有权
公开(公告)号：JP2004002668A
公开(公告)日：2004-01-08
申请号：JP2003004862
申请日：2003-01-10
申请人： Toshiba Corp , Toshiba Tec Corp , 東芝テック株式会社 , 株式会社東芝
发明人： GOKOCHI TORU , TANUMA CHIAKI , OTSU KAZUHIKO , AKIYAMA RYOZO , HIROKI MASASHI , ENDO YOSHITAKA
IPC分类号： B41J2/01 , B41J2/005 , B41J11/00 , B41M5/00 , C08G65/14 , C08G65/18 , C09D11/00 , C09D11/322 , C09D11/324 , C09D11/328 , C09D11/36 , C09D11/38
CPC分类号： C09D11/30 , B41J2/0057 , B41J11/002 , B41M7/0081 , C08G65/14 , C08G65/18 , C09D11/101 , C09D11/322 , C09D11/38
摘要： PROBLEM TO BE SOLVED: To provide a liquid ink needing neither use of any organic solvent nor any large-scale exposure system in obtaining high-quality prints. SOLUTION: The liquid ink comprises a photo-acid generator which generates an acid on light irradiation, a color component and at least one solvent subject to polymerization in the presence of the acid. In this liquid ink, it is preferable that the content of the photo-acid generator is 1-10 pt(s). wt. based on 100 pts. wt. of the solvent, the color component is a pigment, and the solvent contain ≥50 pts. wt. of an acid-polymerizable compound having alicyclic and/or aliphatic skeleton(s) with a viscosity of ≤50 mPa.s at ordinary temperatures and pressures and a boiling point of ≥150°C. COPYRIGHT: (C)2004,JPO

7. 发明专利

JP2008034549A Lithography element and lithography device 审中-公开
标题翻译： LITHOGRAPHY元素和LITHOGRAPHY设备
公开(公告)号：JP2008034549A
公开(公告)日：2008-02-14
申请号：JP2006205089
申请日：2006-07-27
申请人： Toshiba Corp , 株式会社東芝
发明人： ITO JUNICHI , AKIYAMA JUNICHI , MUROOKA KENICHI , KUBO KOICHI , GOKOCHI TORU , HIRAI TAKATOMO , HIEDA YASUYUKI
IPC分类号： H01L21/027 , B82B1/00
摘要： PROBLEM TO BE SOLVED: To provide an electric field discharging type lithography element and a lithography device, which are capable of effecting lithography under non-contact state with the object of lithography.
SOLUTION: The lithography element 100 is equipped with a supporting body 10, a first electrode 20 provided on the supporting body 10 and discharging electronic beam EB through electric field discharge by being impressed by a first negative voltage -V1, and a second electrode 30 arranged around the first electrode 20 so as to be insulated from the first electrode 20 while a second negative voltage -V2 different from the first negative voltage -V1 is impressed to control the direction of the electronic beam EB.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种电磁放电型光刻元件和光刻设备，其能够在非接触状态下进行光刻的光刻。光刻元件100配备有支撑体10，设置在支撑体10上的第一电极20，并且通过施加第一负电压-V1的电场放电来放电电子束EB，并且第二电极电极30布置在第一电极20周围，以便与第一电极20绝缘，同时施加不同于第一负电压-V1的第二负电压-V2以控制电子束EB的方向。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2007265503A Information recording and reproducing system 审中-公开
标题翻译：信息记录和再现系统
公开(公告)号：JP2007265503A
公开(公告)日：2007-10-11
申请号：JP2006087973
申请日：2006-03-28
申请人： Toshiba Corp , 株式会社東芝
发明人： AKIYAMA JUNICHI , KUBO KOICHI , ITO JUNICHI , MUROOKA KENICHI , HIRAI TAKATOMO , GOKOCHI TORU , HIEDA YASUYUKI
IPC分类号： G11B5/02
CPC分类号： G11B9/149 , B82Y10/00 , G11B5/02 , G11B9/04 , G11B9/10 , G11B9/1409 , G11B2005/0021
摘要： PROBLEM TO BE SOLVED: To provide an information recording and reproducing system which can significantly improve recording density. SOLUTION: The information recording and reproducing system imposes a second voltage to a first electrode in a state that a first voltage is imposed to a second electrode 12 which is arranged around an electron emission edge of the first electrode 11 to feed current by emitting electrons to a recording area of the recording medium 20 from the electron emission edge when recording and erasing information, and imposes a voltage smaller than the case of recording and erasing to the first electrode in a state that the first voltage is imposed to the second electrode to flow a reproducing current to the recording area of the recording medium from the electron emission edge and detects the change in electric resistance caused by the change in the recording state of the recording area. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供可以显着提高记录密度的信息记录和再现系统。解决方案：信息记录和再现系统在第一电压被施加到第二电极12的状态下施加第二电压，该第二电极被布置在第一电极11的电子发射边缘附近以通过在记录和擦除信息时从电子发射边缘向记录介质20的记录区域发射电子，并且在第一电压被施加到第二电压的状态下施加小于记录和擦除情况的电压到第一电极电极，用于从电子发射边缘向记录介质的记录区域流动再现电流，并检测由记录区域的记录状态改变引起的电阻变化。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2007211099A Photosensitive ink jet ink 有权
标题翻译：感光油墨
公开(公告)号：JP2007211099A
公开(公告)日：2007-08-23
申请号：JP2006031454
申请日：2006-02-08
申请人： Toshiba Corp , Toshiba Tec Corp , 東芝テック株式会社 , 株式会社東芝
发明人： AKIYAMA RYOZO , KIYOMOTO HIROSHI , KAWAKAMI YUKIKO , OTSU KAZUHIKO , GOKOCHI TORU , ISHIBASHI MITSURU
IPC分类号： B41J2/01 , B41M5/00 , C09D11/00 , C09D11/322 , C09D11/328 , C09D11/38
CPC分类号： C09D11/101
摘要： PROBLEM TO BE SOLVED: To provide photosensitive inkjet ink that has excellent adhesion with a variety of recording media and can form printed matter including cured product having high hardness. SOLUTION: The photosensitive inkjet ink includes organic dispersant, photoacid-generating agent and pigment. The organic dispersant includes an oxetane compound and more than 30 wt.% of the total dispersant of at least two kind of polymerizable compounds selected from vinyl ether compounds represented by general formula (1) (wherein, R 11 is selected from the group consisting of vinyl ether group, group bearing vinyl ether skeleton, alkoxy, hydroxy group-substituted substance and hydroxy group wherein at least one has a vinyl ether group or vinyl ether skeleton; R 12 is a group of p+1 valence, bearing substituted or unsubstituted ring skeleton or aliphatic skeleton, p is a positive integer including 0). At least one of the polymerizable compounds is monofunctional, and the monofunctional compound stated above is included in an amount of 20 to 70 wt.% of the total dispersant. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供与各种记录介质具有优异粘合性并可形成包括硬度高的固化产品的印刷品的感光性喷墨油墨。光敏喷墨油墨包括有机分散剂，光致酸产生剂和颜料。有机分散剂包括氧杂环丁烷化合物和超过30重量％的选自通式（1）表示的乙烯基醚化合物中的至少两种可聚合化合物的总分散剂（其中，R SP 11，选自乙烯基醚基，带有乙烯基醚骨架的基团，烷氧基，羟基取代的物质和羟基，其中至少一个具有乙烯基醚基或乙烯基醚骨架; R“SP”12 是一组p + 1价，带有取代或未取代的环骨架或脂族骨架，p是包括0）的正整数。至少一种可聚合化合物是单官能的，上述单官能化合物的含量为总分散剂的20-70％（重量）。版权所有（C）2007，JPO＆INPIT

10. 发明专利

JP2007283627A Primer 有权
标题翻译：底漆
公开(公告)号：JP2007283627A
公开(公告)日：2007-11-01
申请号：JP2006113286
申请日：2006-04-17
申请人： Toshiba Corp , Toshiba Tec Corp , 東芝テック株式会社 , 株式会社東芝
发明人： KAWAKAMI YUKIKO , AKIYAMA RYOZO , KIYOMOTO HIROSHI , OTSU KAZUHIKO , GOKOCHI TORU , ISHIBASHI MITSURU
IPC分类号： B41M5/00 , B41J2/01 , C09D4/00 , C09D5/00 , C09D163/00
摘要： PROBLEM TO BE SOLVED: To provide a primer capable of improving adhesive properties between an ink layer formed on a medium by using a photo-curable inkjet ink and the medium, and forming an image with a high quality.
SOLUTION: The primer comprising an acid generating agent and an acid-polymerizable compound, is characterized in that the amine value is ≤5.0 mg KOH/g.
COPYRIGHT: (C)2008,JPO&INPIT

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