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1. 发明专利

JP2013153210A Semiconductor device and manufacturing method of the same 审中-公开
标题翻译：半导体器件及其制造方法
公开(公告)号：JP2013153210A
公开(公告)日：2013-08-08
申请号：JP2013080201
申请日：2013-04-08
申请人： Toshiba Corp , 株式会社東芝
发明人： WATABE KAZUHIRO , TAKADA SEIKI , IIJIMA TOSHITSUNE , SATO TOMOMI , SAWACHI SHIGENORI , KAWANA TAKUMI , YAMAGATA OSATAKE , NOMURA HIROSHI , OSHIMA YUMIKO
IPC分类号： H01L23/12
CPC分类号： H01L24/97 , H01L24/82 , H01L2224/12105 , H01L2224/19 , H01L2224/24 , H01L2224/24137 , H01L2224/24226 , H01L2224/24246 , H01L2224/32145 , H01L2224/32225 , H01L2224/32245 , H01L2224/73267 , H01L2224/92244 , H01L2224/97 , H01L2924/12041 , H01L2924/15153 , H01L2924/181 , H01L2224/82 , H01L2224/83 , H01L2924/00 , H01L2924/00012
摘要： PROBLEM TO BE SOLVED: To provide a semiconductor device which achieves low costs, high yield, and high connection reliability, has an electrode of a semiconductor chip that deals with fine pitches, and is excellent in electric characteristics, and to provide a manufacturing method of the semiconductor device.SOLUTION: A semiconductor device 20 includes: a plate like member 1; a semiconductor chip 2 disposed on one major surface of the plate-like member 1 and fastened at a surface on the opposite side of an element circuit surface through an adhesive 3; a single layer insulation material layer 4 that is formed connecting with the element circuit surface of the semiconductor chip 2 and the major surface of the plate like member 1; an opening formed on an electrode of the semiconductor chip 2 in the insulation material layer 4; a conductive part 6 formed in the opening so as to connect with the electrode of the semiconductor chip 2; a wiring layer 5 connected with the conductive part 6 and at least partially extending to a peripheral region of the semiconductor chip 2 on the insulation material layer 4; and an external electrode 7 formed on the wiring layer 5. A height from the major surface of the plate like member 1 to the element circuit surface of the semiconductor chip 2 is equal to or lower than 100 μm.
摘要翻译：要解决的问题：为了提供实现低成本，高产出和高连接可靠性的半导体器件，具有处理细间距的半导体芯片的电极，并且具有优异的电特性，并且提供一种制造方法半导体器件。半导体器件20包括：板状构件1; 半导体芯片2，其设置在板状构件1的一个主表面上，并且通过粘合剂3紧固在元件电路表面的相反侧的表面; 形成为与半导体芯片2的元件电路表面和板状构件1的主表面连接的单层绝缘材料层4; 在绝缘材料层4中形成在半导体芯片2的电极上的开口; 形成在开口中以与半导体芯片2的电极连接的导电部分6; 与导电部6连接并且至少部分地延伸到绝缘材料层4上的半导体芯片2的周边区域的布线层5; 以及形成在布线层5上的外部电极7.从板状构件1的主表面到半导体芯片2的元件电路表面的高度等于或低于100μm。

2. 发明专利

JP2012000992A Imprinting mold and pattern forming method 有权
标题翻译：冲压模具和图案形成方法
公开(公告)号：JP2012000992A
公开(公告)日：2012-01-05
申请号：JP2011158229
申请日：2011-07-19
申请人： Toshiba Corp , 株式会社東芝
发明人： FURUDONO YOKO , INENAMI RYOICHI , NOMURA HIROSHI
IPC分类号： B29C59/02 , B29C33/38 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an imprinting mold capable of suppressing the generation of mold defect.SOLUTION: The imprinting mold includes a substrate, an uneven pattern provided on the substrate and corresponding to a pattern to be transcribed, and a gas permeability region having higher permeability to an inert gas than that of fused quartz to which impurities are not added. The permeability to the inert gas is a property to take the inert gas into the substrate from a surface opposite to the uneven pattern when the uneven pattern is brought into contact with an imprint agent applied on a substrate to be processed, and the gas permeability region has two or more regions with different permeability to the inert gas from the surface opposite to a surface on which the uneven pattern is formed toward the surface on which the uneven pattern is formed.
摘要翻译：要解决的问题：提供能够抑制模具缺陷产生的压印模具。解决方案：压印模具包括基板，设置在基板上并对应于待转印的图案的不均匀图案，以及与惰性气体相比具有比不含杂质的熔融石英更高的渗透性的气体渗透性区域添加。惰性气体的渗透性是当不平坦图案与施加在待处理基板上的压印剂接触时，将惰性气体从与不均匀图案相反的表面吸入基板中，气体透过率区域具有与形成有凹凸图案的表面相反的表面朝向形成有凹凸图案的表面的与惰性气体的渗透性不同的两个以上的区域。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2010060524A Fluorescence/phosphorescence detection device 审中-公开
标题翻译：荧光/荧光检测装置
公开(公告)号：JP2010060524A
公开(公告)日：2010-03-18
申请号：JP2008228940
申请日：2008-09-05
申请人： Toshiba Corp , 株式会社東芝
发明人： NOMURA HIROSHI
IPC分类号： G01N21/64 , G01J1/04 , G07D7/12
摘要： PROBLEM TO BE SOLVED: To provide a fluorescence/phosphorescence detection device capable of detecting filamentous fluorescence emission watermarked in leaves, and so on, or phosphorescence emission by a filament.
SOLUTION: In the fluorescence/phosphorescence detection device which forms an image of fluorescence emission or phosphorescence emission in a slit to be opened by an image forming lens and diffusing a quantity of emitted light penetrating through this slit with a diffusion plate to detect it with a sensor, an S/N ratio can be improved by setting the length and width of the slit within a range not exceeding a predetermined multiple of the length and width of a detection object phosphor.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种荧光/磷光检测装置，其能够检测叶片中水印的丝状荧光发射等，或者通过灯丝发出磷光。解决方案：在荧光/磷光检测装置中，其形成由成像透镜打开的狭缝中的荧光发射或磷光发射的图像，并且通过扩散板扩散穿过该狭缝的发射光量，以检测通过将狭缝的长度和宽度设定在不超过检测对象荧光体的长度和宽度的预定倍数的范围内，可以通过传感器S / N比来提高传感器的S / N比。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2007209851A Spectral detector 有权
标题翻译：光谱检测器
公开(公告)号：JP2007209851A
公开(公告)日：2007-08-23
申请号：JP2006029912
申请日：2006-02-07
申请人： Toshiba Corp , 株式会社東芝
发明人： NOMURA HIROSHI
IPC分类号： B07C5/342 , G01N21/89
摘要： PROBLEM TO BE SOLVED: To provide a spectral detector which can selectively detect light of different wavelength band using one detecting part, thereby allowing the cost and size of the detector to be reduced.
SOLUTION: The detector 1 detecting impressions denoting payment of postage on mails P has a casing 1a having a distal end face facing a conveyance path 2. A light source 11 is provided in the casing 1a, mails P conveyed on the path 2 are irradiated with excitation light through an irradiation window 12, and the light emission from the mails is input to a detection sensor 15 via a detection window 13. A spectral filter 14 selectively decreasing light intensity of a specific wavelength band is provided in this side of the detection sensor 15, a discrimination part 20 discriminates the impressions denoting payment of postage by comparing the light intensity with a threshold.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够使用一个检测部件选择性地检测不同波长带的光的光谱检测器，从而允许降低检测器的成本和尺寸。
解决方案：检测器1检测表示在邮件P上支付邮资的印象具有具有面向传送路径2的远端面的外壳1a。在外壳1a中设置有光源11，在路径2上传送的邮件P 通过照射窗12照射激发光，并且来自电子邮件的发光经由检测窗口13被输入到检测传感器15.在这一侧设置选择性地降低特定波长带的光强度的光谱滤波器14 检测传感器15，鉴别部分20通过将光强与阈值进行比较，来区分表示邮费支付的印象。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2006039148A Photomask, focus measuring method using therefor, and manufacturing method of semiconductor device 审中-公开
标题翻译： PHOTOMASK，使用它的聚焦测量方法和半导体器件的制造方法
公开(公告)号：JP2006039148A
公开(公告)日：2006-02-09
申请号：JP2004217874
申请日：2004-07-26
申请人： Toshiba Corp , 株式会社東芝
发明人： NOMURA HIROSHI
IPC分类号： G03F1/28 , G03F1/68 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70641 , G03F1/44 , G03F7/706
摘要： PROBLEM TO BE SOLVED: To provide a photomask enabling high precision focus measurement by decreasing load on mask manufacturing.
SOLUTION: The photomask PM1 includes a shading part shielding light, and first and second transmission parts transmitting light. The photomask comprises an asymmetric diffraction grating pattern 2 substantially satisfying that θ and n are 163°≤360°/(n+2)≤197°, and a reference pattern 3 for obtaining images that is a reference when measuring shift of the image of the asymmetric diffraction grating, when an absolute value of a difference between a light phase of the first transmission part and the light phase of the second transmission part is θ(≠90°) and the ratio of width of the shading part, the width of the first transmission part and the width of the second transmission part is n:1:1 (n: positive real number, other than 2).
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供通过减小掩模制造负载来实现高精度聚焦测量的光掩模。解决方案：光掩模PM1包括遮光部分遮蔽光，第一和第二透射部分透射光。光掩模包括基本上满足θ和n为163°≤360°/（n + 2）≤197°的不对称衍射光栅图案2，以及用于在测量图像的偏移时获得作为参考的图像的参考图案3 不对称衍射光栅，当第一透射部分的光相与第二透射部分的光相之间的差的绝对值为θ（≠90°）和遮光部分的宽度比时，第一发送部分和第二发送部分的宽度为n：1：1（n：正实数，除2之外）。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2003288629A Sheet discriminating method and sheet discriminating device 审中-公开
标题翻译：表格分类方法和表格分类设备
公开(公告)号：JP2003288629A
公开(公告)日：2003-10-10
申请号：JP2002093090
申请日：2002-03-28
申请人： Toshiba Corp , 株式会社東芝
发明人： UNO TERUHIKO , NOMURA HIROSHI , AOKI TAKESHI
IPC分类号： G01N21/88 , G06K7/12 , G07D7/12
摘要： PROBLEM TO BE SOLVED: To provide a sheet discriminating method and a sheet discriminating device capable of reducing the cost for components and the operation cost, and discriminating the authenticity of sheet with high accuracy. SOLUTION: The ultraviolet ray is applied to each sheet, and a plurality of optical detectors 70a, 70b, 70c are arranged separately from each other for detecting the reflected light. The kind of sheet and a detected part of the sheet corresponding to the kind are determined on the basis of the discrimination information of the sheet detected by the detecting part, and the authenticity of the sheet is discriminated on the basis of the detection data of the optical detector which detects the reflected light from the detected part of the sheet, among the plurality of optical detectors. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供能够降低部件成本和操作成本的片材识别方法和片材识别装置，并且以高精度区分片材的真实性。解决方案：将紫外线施加到每个片材上，并且多个光学检测器70a，70b，70c彼此分开布置以检测反射光。基于由检测部检测到的纸张的识别信息来确定纸张的类型和与该种类相对应的纸张的检测部分，并且基于检测部分的检测数据来判别纸张的真实性在所述多个光学检测器中检测来自检测到的片材的部分的反射光的光学检测器。版权所有（C）2004，JPO

7. 发明专利

JP2003077025A Paper sheet discriminating device and method 审中-公开
标题翻译：纸张分辨设备和方法
公开(公告)号：JP2003077025A
公开(公告)日：2003-03-14
申请号：JP2001269295
申请日：2001-09-05
申请人： Toshiba Corp , 株式会社東芝
发明人： MATSUMOTO YUJI , NOMURA HIROSHI
IPC分类号： G01N21/892 , G07D7/00 , G07D7/12
摘要： PROBLEM TO BE SOLVED: To provide a paper sheet discriminating device capable of improving the accuracy in discrimination by inhibiting the interference of light applied from the plural light sources when paper sheets is read out and discriminated by utilizing the light applied by plural light sources.
SOLUTION: This paper sheet discriminating device comprises a first light source 121 for applying the light to one face of the paper sheet 1, a second light source 122 for applying the light to the other face of the paper sheet, a photo-electric converting means 130 for receiving the light transmitted through the paper sheet and the light reflected from the paper sheet, and converting the same into an electric signal, a timing control means 140 for lag controlling the light emitting timings of the first and second light sources, and a discriminating means 150 for separating a signal corresponding to the transmission light and a signal corresponding to the reflection light from the electric signal on the basis of the lag control, and discriminating the paper sheets on the basis of the separated signals.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种纸张识别装置，其能够通过利用由多个光源施加的光来读出和识别纸张，从而通过抑制从多个光源施加的光的干扰来提高判别精度。解决方案：该纸张识别装置包括用于将光施加到纸张1的一个面的第一光源121，用于将光施加到纸张的另一面的第二光源122，光电转换装置 130，用于接收通过纸张传输的光和从纸张反射的光，并将其转换成电信号;定时控制装置140，用于滞后地控制第一和第二光源的发光定时;以及鉴别装置150，用于根据滞后控制分离对应于传输光的信号和对应于来自电信号的反射光的信号，以及基于分离的信号来鉴别纸张。

8. 发明专利

JP2002055435A TEST MARK AS WELL AS FOCUS USING THE SAME AND METHOD OF MEASURING ABERRATION 失效
公开(公告)号：JP2002055435A
公开(公告)日：2002-02-20
申请号：JP2000241480
申请日：2000-08-09
申请人： TOSHIBA CORP
发明人： NOMURA HIROSHI , MOTOI TAKASHI
IPC分类号： G01B11/00 , G01M11/02 , G03F1/44 , G03F7/20 , G03F7/207 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To provide an exposure mask for focus measurement which allow the measurement of periodic patterns approximate to the pattern density used for manufacturing of semiconductor devices in actuality and is effectively for easy measurement of a defocusing quantity with codes with good accuracy. SOLUTION: The exposure mask including a test mark 7 composed of an asymmetric diffraction grating pattern 10 varying in diffraction efficiency with +1st order light and -1st order light and a reference pattern 20 for obtaining an image which is a reference when measuring the deviation of the image of the asymmetric diffraction grating pattern 10 is used as the exposure for focus measurement.

9. 发明专利

JP2002025884A ABERRATION CORRECTION METHOD FOR PROJECTING OPTICAL SYSTEM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 失效
公开(公告)号：JP2002025884A
公开(公告)日：2002-01-25
申请号：JP2000200123
申请日：2000-06-30
申请人： TOSHIBA CORP
发明人： NOMURA HIROSHI , MOTOI TAKASHI , TAKAKUWA MAHO
IPC分类号： G03F1/00 , G03F1/68 , G03F7/20 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To provide an aberration correction method, capable of quickly correcting the residual aberration of a projecting optical system. SOLUTION: This aberration correction method of the projecting optical system for correcting the influence of the aberration, remaining in the projecting optical system for each photomask by using an aligner provided with the projecting optical system for projecting a pattern formed on the photomask onto a photosensitive substrate, is provided with processes (S5 and S6) for calculating an aberration coefficient for minimizing the influence of the residual aberration to a desired pattern, within a desired area at the time of virtually changing the aberration coefficient to an adjustable aberration term based on the measured result of the residual aberration of the projecting optical system measured beforehand and a process (S7) for moving the aberration of the projecting optical system, corresponding to a difference between the aberration coefficient measured beforehand and the aberration coefficient obtained by calculation relating to the adjustable aberration term.

10. 发明专利

JP2001337441A PHOTOMASK, PHOTOMASK BLANK AND METHOD FOR EXPOSING SEMICONDUCTOR WAFER USING THE PHOTOMASK 失效
公开(公告)号：JP2001337441A
公开(公告)日：2001-12-07
申请号：JP2001086229
申请日：2001-03-23
申请人： TOSHIBA CORP
发明人： KAWAMURA DAISUKE , NOMURA HIROSHI
IPC分类号： G03F1/26 , G03F1/36 , G03F1/68 , G03F7/20 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To provide a photomask having a pattern to be transferred and a peripheral pattern formed around that and capable of attaining exposure nearly independently of the peripheral pattern and to provide a photomask blank. SOLUTION: The photomask has a transparent substrate 11, a pattern 12 and a thin film 13 comprising calcium fluoride. The substrate 11 has a first principal surface and a second principal surface opposite to the first principal surface and is transparent to light for exposure. The pattern 12 is formed on the first principal surface of the substrate 11 and has at least one form selected from a light shielding film, a translucent film and a phase control film. The light shielding film does not transmit the light for exposure, the translucent film transmits part of the light and a phase control film controls the phase of the light. The thin film 13 is formed on the second principal surface of the substrate 11 and acts as an antireflection film which reduces light re-reflected by the rear surface of the substrate 11.

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