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    • 1. 发明专利
    • DEVICE FOR IMMOBILIZATION TREATMENT OF RADIOACTIVE GAS
    • JPS63298097A
    • 1988-12-05
    • JP13314887
    • 1987-05-28
    • TOSHIBA CORP
    • IIMURA MASASHITERASAWA TOMOTAKA
    • G21F9/02G21F9/00
    • PURPOSE:To increase the ionization efficiency of a radioactive gas and to enhance implantation efficiency by providing at least a piece of electron gun to the upper cap part or lower cap part of a cylindrical vessel into which the radioactive gas is introduced. CONSTITUTION:The inside of the cylindrical vessel 1 is evacuated to, for example, about 5X10 Torr and a valve 10 is closed. A valve 8 is thereafter opened to introduce a Krr 85 gas from a cylinder, etc., connected to a pipe 9 into the vessel 1 and a specified pressure, for example, 0.1Torr is maintained in this vessel 1. The valve 8 is closed to put the vessel into the hermetic state after the specified pressure is attained. A refrigerant is passed to a cooling pipe to cool an electrode 5 and the vessel 1. Desired electric power is supplied from a power supply to a filament 21 of the electron gun 23 to generate thermions. A high voltage of several kV is impressed to an electrode 22 and electron rays 25 are guided into an ionizing chamber 2. A negative DC high voltage is impressed to the electrode 5 by a 1st DC high voltage power supply 17 and a negative DC high voltage is continuously impressed thereto from a 2nd DC high voltage power supply. The above-mentioned electron rays 25 are thereby contributed to an increase in glow discharge, by which the ionization efficiency and ion implantation efficiency are enhanced.
    • 4. 发明专利
    • HEATNG DEVICE FOR THIN FILM SAMPLE
    • JPS62124439A
    • 1987-06-05
    • JP26371485
    • 1985-11-26
    • TOSHIBA CORP
    • IIMURA MASASHI
    • G01N15/08
    • PURPOSE:To improve the efficiency of the temperature rising of a thin film sample by providing a heat conduction plate and improving heat conduction from a heating mechanism. CONSTITUTION:For example, there is a gap 16 formed owing to heat expansion between a female nut 5 and a heat conduction block 13 in the middle of the temperature rising of the thin film sample 3 by a band heater 14. The heat conduction plate 17 is fixed to the female nut 5 and one surface of the heating body 13 with screws 18 in contact, so heat is conducted from the band heater 14 efficiently to heat the thin film sample 3 to desired temperature. Thus, the thin film sample 3 is heated to the desired temperature and then irradiated with ions of a hydrogen isotope, e.g. deuterium ions from the front (as shown by arrow) and some of the ions 15 enter ultra high vacuum areas in ducts 1 and 8 through the thin film sample 3, so that they are detected by hydrogen isotope detection parts arranged in the areas.
    • 5. 发明专利
    • Sample heating and irradiating device
    • 样品加热和辐射装置
    • JPS5726731A
    • 1982-02-12
    • JP10134780
    • 1980-07-25
    • Toshiba Corp
    • IIMURA MASASHI
    • G01N23/225G01L1/00G01N17/00
    • G01N17/00
    • PURPOSE:To prevent giving thermal influence upon other samples at the time of heating a sample to be irradiated with ions by enclosing the circumference of a filament with a parabolic mirror and successively disposing the samples to the front face of said mirror. CONSTITUTION:Samples 23 are installed to the sample holders in a vacuum vessel 20, and when a filament 22 is heated after the inside of the vessel 20 is evacuated, the filament 22 is condensed by a parabolic mirror 21, and radiates and heats the samples 23 with good efficiency. The elevation of the temp. of the sample 23 to a desired temp. is confirmed with an infrared ray thermometer 7, and the ion current is measured for a fixed time with a Faraday cup 10, after which the cup 10 is moved to the position of 11, and ion beams are irradiated to the sample 23. Upon ending of the ion irradiation, a sample moving device is operated to dispose the next sample to the front face of the mirror 21, thus the ion beam irradiation to the samples is accomplished successively. Thereby, the samples of a number of times more than those in the prior art are installed simultaneously in the vacuum vessel and the efficiency of testing is improved.
    • 目的:为了防止在用抛物面镜包围细丝周围加热待照射的样品时对其他样品产生热影响,并将样品依次设置在所述反射镜的正面。 构成:将样品23安装在真空容器20中的样品保持器上,并且当在容器20的内部被抽真空之后加热细丝22时,灯丝22被抛物面镜21冷凝,并辐射并加热样品 23效率高。 升高的温度 的样品23到期望的温度。 用红外线温度计7确认,并用法拉第杯10测量离子电流一定时间,之后将杯10移动到11的位置,离子束照射到样品23.一旦结束 操作离子照射的样品移动装置以将下一个样品配置到反射镜21的前表面,从而连续地完成对样品的离子束照射。 因此,比现有技术中多次的样品同时安装在真空容器中,并且提高了测试效率。
    • 6. 发明专利
    • COOLING DEVICE FOR SAMPLING FURNACE WATER
    • JPH049695A
    • 1992-01-14
    • JP11020290
    • 1990-04-27
    • TOSHIBA CORP
    • IIMURA MASASHITANIGUCHI TADASHI
    • G21C17/02
    • PURPOSE:To always supply furnace water sampled water held at a constant temperature to a DO meter and a conductometer through a year and to accurately measure the concentration of dissolved oxygen and conductivity by automatically controlling a cooling water level in accordance with the indication temperature of a thermometer. CONSTITUTION:When a thermometer 20 fixed to a sampled furnace water outflow pipe 8 indicates a temperature higher than 25 deg. at the time of setting up the set temperature of a controller 21 to 25 deg., a vertical driving mechanism 16 is driven by the controller 21, liquid level adjusting tank 14 is driven upward, the level of the liquid face 10 of the cooling water is raised, a heat transmission area is increased, a cooling effect is increased, and sampling furnace water is controlled so as to be stabilized at 25 deg.. When the indicator of the thermometer 20 is dropped from 25 deg., the mechanism 16 is driven by the controller 21, the tank 14 is driven downward, the cooling water level is dropped, the heat transmission area is reduced, the cooling effect is reduced, and the sampling furnace water is controlled so as to be stabilized at 25 deg.. Thus, the sampling furnace water can be maintained at the prescribed temperature.
    • 8. 发明专利
    • Exhaust device for auger electron spectral analyser
    • 用于AUGER电子光谱分析仪的排气装置
    • JPS5960953A
    • 1984-04-07
    • JP16977482
    • 1982-09-30
    • Toshiba Corp
    • IIMURA MASASHI
    • G01N23/227H01J37/18H01J37/252
    • H01J37/18
    • PURPOSE:To carry out vacuum exhaustion automatically while maintaining the pressure of an ion pump itself at a constant level by subjecting the exhaust part to rough exhaustion, being followed by minutely switching the valve of the ion pump by means of a signal sent from a signal producing circuit. CONSTITUTION:The exhaust part 1 of an Auger electron spectral analyser containing an electron gun, an ion source and a sample, is repeatedly subjected to rough exhaustion by means of sorption pumps 2 and 3. Next, after a vacuum degree of below 10 Torr is achieved, exhaustion is carried out by driving an ion pump 7 whule minutely controlling a control valve 23 by means of a control device 22 during the time when the indication of the vacuum gage of a signal generating circuit 21 is below a preset value. When the indication of the vacuum gage exceeds the preset value, the signal is stopped and the control valve 23 is closed so as to maintain the vacuum degree at below 10 Torr. Such operation as above is carried out repeatedly. As a result, main exhaustion can be automatically carried out with the ion pump 7 without causing any breakdowns, and the operational performance can be enhanced.
    • 目的:通过使排气部件粗耗化,将离子泵本身的压力保持在一定水平,自动进行真空排气,然后借助于从信号发送的信号精细地切换离子泵的阀门 生产电路。 构成:含有电子枪,离子源和样品的俄歇电子频谱分析仪的排气部分1通过吸附泵2和3反复进行粗耗。接下来,在真空度低于10 < 3>实现了Torr,在信号发生电路21的真空规的指示低于预设的时间期间,通过控制装置22驱动离心泵7,微动控制控制阀23进行排气 值。 当真空规的指示超过预设值时,停止信号并关闭控制阀23,以将真空度保持在低于10 -5乇。 上述操作重复进行。 结果,可以利用离子泵7自动进行主耗尽而不会造成任何故障,并且可以提高操作性能。
    • 9. 发明专利
    • PLATING DEVICE FOR MINUTE TEST PIECE
    • JPH02270985A
    • 1990-11-06
    • JP17278988
    • 1988-07-13
    • TOSHIBA CORP
    • IIMURA MASASHI
    • G01N1/28C25D5/08C25D17/00
    • PURPOSE:To form a plating layer which is uniform and has a large thickness on a test piece with less labor by turning the minute test piece mounted to a perpendicular shaft at the center between the counter electrodes in a plating liquid and further, injecting the plating liquid perpendicularly to the above- mentioned shaft from a nozzle. CONSTITUTION:A pair of electrodes 2, 2 are disposed to face each other in the plating cell 1 housing the plating liquid. A test piece stock 3a supported by the revolving shaft 4 is disposed to the center between these electrodes 2, 2. The shaft 4 is turned around the perpendicular shaft in the direction where the electrodes 2 face each other by means of an output shaft 6 of a motor 5. A pump 20 is disposed on the outside surface of the side wall of the plating cell 1 of the above-mentioned plating device for the minute test piece and the plating liquid is sucked from the plating cell 1 by this pump and is injected from the nozzle 21 in the direction perpendicular to the above-mentioned revolving shaft 4. The adhesion of the hydrogen ion foam to the surface of the test piece stock 3a is prevented in this way, by which the uniform plating layer having a large thickness is formed.