专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPS6449998A TREATMENT DEVICE FOR IMMOBILIZATION OF RADIOACTIVE GAS 失效
公开(公告)号：JPS6449998A
公开(公告)日：1989-02-27
申请号：JP20690887
申请日：1987-08-20
申请人： TOSHIBA CORP
发明人： IIMURA MASASHI , TERASAWA TOMOTAKA
IPC分类号： G21F9/02 , G21F9/00
摘要： PURPOSE:To increase the gas discharge density of a radioactive gas and to enhance ionization efficiency by adding filament to the outside peripheral face of an electrode in the state of insulating the filament from the electrode and energizing the filament so that the filament generates heat. CONSTITUTION:Desired electric power is supplied between terminals 23 by a power supply to ignite the filament 20 and to generate thermions. Furthermore, max. 5kV negative DC high voltage is impressed continuously to the cylindrical electrode 5 by a 1st DC high-voltage power supply 17 and max. 1kV negative DC high voltage to a cylindrical vessel 1 by a 2nd DC high-voltage power supply 18. Gaseous Kr-85 is then ionized by the glow discharge in an ionization chamber 2 and is converted to plasma. The thermions 21 released from the filament 20 at this time contribute to an increase in the density of the glow discharge plasma 22. The ionization efficiency is thus enhanced.

2. 发明专利

JPS61113764A Structural material for preventing permeation of hydrogen 失效
标题翻译：用于防止氢气渗透的结构材料
公开(公告)号：JPS61113764A
公开(公告)日：1986-05-31
申请号：JP23416784
申请日：1984-11-08
申请人： Toshiba Corp
发明人： NAKAHIGASHI SHIGEO , FUKUSHIMA KIMICHIKA , TERASAWA TOMOTAKA
IPC分类号： C22C38/00 , C23C8/22 , C23C14/48 , G21B1/11 , G21B1/17
CPC分类号： C23C14/48
摘要： PURPOSE:To prevent or inhibit effectively the permeation of isotopes of hydrogen by forming at least one between a high carbon concn. region and a high oxygen concn. region in a base material. CONSTITUTION:At least one between a high carbon concn. region and a high oxygen concn. region is formed in a base material such as stainless steel by implanting carbon or oxygen ions. It is preferable that oxygen in the high oxygen concn. region contains oxygen having 17 mass number in a higher ratio than natural oxygen, so only oxygen-17 or oxygen having an increased concn. of oxygen-17 is used in place of ordinary gaseous oxygen when oxygen ions are implanted into the base material.
摘要翻译：目的：通过在高碳浓度之间形成至少一种来预防或抑制氢同位素的渗透。区域和高氧浓度区域在基材中。构成：至少有一个高碳浓度区域和高氧浓度区域通过注入碳或氧离子而形成在诸如不锈钢的基底材料中。高氧浓度优选为区域含有比天然氧更高的17质量数的氧，因此只有具有增加的浓度的氧-17或氧。的氧气-17用于代替普通的气态氧气，当氧离子注入基材时。

3. 发明专利

JPS63298097A DEVICE FOR IMMOBILIZATION TREATMENT OF RADIOACTIVE GAS 失效
公开(公告)号：JPS63298097A
公开(公告)日：1988-12-05
申请号：JP13314887
申请日：1987-05-28
申请人： TOSHIBA CORP
发明人： IIMURA MASASHI , TERASAWA TOMOTAKA
IPC分类号： G21F9/02 , G21F9/00
摘要： PURPOSE:To increase the ionization efficiency of a radioactive gas and to enhance implantation efficiency by providing at least a piece of electron gun to the upper cap part or lower cap part of a cylindrical vessel into which the radioactive gas is introduced. CONSTITUTION:The inside of the cylindrical vessel 1 is evacuated to, for example, about 5X10 Torr and a valve 10 is closed. A valve 8 is thereafter opened to introduce a Krr 85 gas from a cylinder, etc., connected to a pipe 9 into the vessel 1 and a specified pressure, for example, 0.1Torr is maintained in this vessel 1. The valve 8 is closed to put the vessel into the hermetic state after the specified pressure is attained. A refrigerant is passed to a cooling pipe to cool an electrode 5 and the vessel 1. Desired electric power is supplied from a power supply to a filament 21 of the electron gun 23 to generate thermions. A high voltage of several kV is impressed to an electrode 22 and electron rays 25 are guided into an ionizing chamber 2. A negative DC high voltage is impressed to the electrode 5 by a 1st DC high voltage power supply 17 and a negative DC high voltage is continuously impressed thereto from a 2nd DC high voltage power supply. The above-mentioned electron rays 25 are thereby contributed to an increase in glow discharge, by which the ionization efficiency and ion implantation efficiency are enhanced.

4. 发明专利

JPS6179196A Hydrogen permeation preventive structural material 失效
标题翻译：氢气渗透预防结构材料
公开(公告)号：JPS6179196A
公开(公告)日：1986-04-22
申请号：JP20273884
申请日：1984-09-27
申请人： Toshiba Corp
发明人： FUKUSHIMA KIMICHIKA , NAKAHIGASHI SHIGEO , IIMURA MASASHI , TERASAWA TOMOTAKA , EBISAWA KATSUYUKI
IPC分类号： G21F9/02 , G21B1/11 , G21B1/17 , G21F7/00 , G21F9/00

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式