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    • 2. 发明专利
    • Liquid feeder
    • 液体饲料
    • JP2011016046A
    • 2011-01-27
    • JP2009161004
    • 2009-07-07
    • Toppan Printing Co Ltd凸版印刷株式会社
    • NAKANO TAKASHIOBUCHI TOMOMICHITOITANI NAOKI
    • B05C11/10B05C5/00
    • PROBLEM TO BE SOLVED: To provide a liquid feeder which can feed a liquid without the use of a feed pump and reduce the wasteful consumption of the liquid.SOLUTION: This liquid feeder 10 comprises storage containers 11 and 12, piping 16 and 17 (first piping) to be connected with the storage containers 11 and 12, piping 18 to 20 (second piping) which connect the storage container 12 with a dispense pump 92 inside a discharge device 90, and pressure piping 25 and 26 to be connected with the storage containers 11 and 12 respectively. In feeding an ordinary liquid to the discharge device 90, the interior of the storage container 12 is pressurized by feeding a pressurizing gas into the storage container 12 from the pressurizing piping 26, and thus the liquid inside the storage container 12 is fed to the dispense pump 92 through the piping 18 to 20. On the other hand, when the liquid amount inside the storage container 12 decreases, the interior of the storage container 11 is pressurized by feeding the pressurizing gas into the storage container 11 from the pressure piping 25, and therefore the liquid inside the storage container 11 is fed into the storage container 12 through the piping 16 and 17.
    • 要解决的问题:提供一种能够在不使用进料泵的情况下供给液体的液体进料器,并减少液体的浪费。溶液:该液体进料器10包括储存容器11和12,管道16和17(第一 管道)与存储容器11和12连接,将存储容器12与分配泵92连接在排出装置90内的管道18至20(第二管道)以及与储存容器连接的压力管道25和26 容器11和12分别。 在向排出装置90供给普通液体的同时,通过从加压配管26向储存容器12内供给加压气体而使储存容器12的内部加压,从而将储存容器12内的液体供给到分配 泵92通过管道18至20.另一方面,当存储容器12内的液体量减少时,通过从加压管道25将加压气体供给到储存容器11中,使储存容器11的内部加压, 因此,储存容器11内的液体通过配管16,17被供给到收纳容器12内。
    • 3. 发明专利
    • Spinless coat device and color filter substrate
    • 无纺布装置和彩色滤光片基板
    • JP2010175919A
    • 2010-08-12
    • JP2009019457
    • 2009-01-30
    • Toppan Printing Co Ltd凸版印刷株式会社
    • OBUCHI TOMOMICHI
    • G02B5/20B05C5/02B05C11/10
    • PROBLEM TO BE SOLVED: To provide a spinless coat device controlling the film thicknesses to target values respectively at a plurality of kinds of films each having a target film thickness in the same substrate, and also to provide a color filter substrate having a plurality of kinds of impositions using the device.
      SOLUTION: The spinless coat for applying a coating liquid with a fixed width and length while sending the coating liquid to at least one or more slit nozzles moving to the substrate with a prescribed distance from the surface of the glass substrate on the surface of the glass substrate placed on a stage, is equipped with a film thickness change control mechanism for changing the coating film thickness corresponding to the plurality of target(finished) film thicknesses in a position in the glass substrate plane where the film thickness is to be changed.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:为了提供一种在相同基板中具有目标膜厚度的多种膜分别控制膜厚度到目标值的无脊膜涂层装置,并且还提供一种滤色器基板,其具有 使用该装置的多种拼版。 解决方案:用于施加具有固定宽度和长度的涂布液的无纺涂层,同时将涂布液体发送至至少一个或多个狭缝喷嘴,该至少一个或多个狭缝喷嘴从表面上的玻璃基板的表面以规定距离移动到基板 放置在台架上的玻璃基板配备有膜厚变更控制机构,该膜厚变更控制机构用于在玻璃基板平面内将薄膜厚度设定为与玻璃基板平面中的多个目标(成品)膜厚对应的涂膜厚度 改变。 版权所有(C)2010,JPO&INPIT
    • 4. 发明专利
    • Method for manufacturing color filter
    • 制造彩色滤光片的方法
    • JP2010282051A
    • 2010-12-16
    • JP2009135940
    • 2009-06-05
    • Toppan Printing Co Ltd凸版印刷株式会社
    • TOITANI NAOKIOBUCHI TOMOMICHIAOKI EIJI
    • G02B5/20G02F1/1335
    • PROBLEM TO BE SOLVED: To provide a method for manufacturing a color filter at a low cost by lowering height of horn level difference of a coloring pixel produced on an end of a resin black matrix and dispensing with polishing processing and an overcoat layer.
      SOLUTION: An exposure device in which an upper surface of an exposure stage 70 is a mirror surface is used to form a coating film 60 of a colored photoresist of a negative type, a transparent substrate 50 is mounted on the exposure stage 70 with its lower surface turning to the upper surface of the exposure stage and the coating film is exposed to irradiation light E
      0 from above via a photomask so as to superpose a periphery of the coloring pixel 52 on an end of the resin black matrix. The coating film on the end is exposed to the irradiation light and the coating film on an opening is exposed to the irradiation light and reflective irradiation light E
      r from below.
      COPYRIGHT: (C)2011,JPO&INPIT
    • 要解决的问题:通过降低在树脂黑矩阵的端部上产生的着色像素的喇叭高度差的高度,并且分配抛光处理和外涂层来提供以低成本制造滤色器的方法 。 解决方案:曝光台70的上表面是镜面的曝光装置用于形成负型彩色光致抗蚀剂的涂膜60,透明基板50安装在曝光台70上 其下表面转到曝光台的上表面,并且通过光掩模将涂膜从上方暴露于照射光E 0 ,以将着色像素52的周边叠加在一端 的树脂黑色矩阵。 将一端的涂膜暴露于照射光,并使开口上的涂膜从下方暴露于照射光和反射照射光E r 。 版权所有(C)2011,JPO&INPIT
    • 5. 发明专利
    • Method of manufacturing color filter
    • 制作彩色滤光片的方法
    • JP2008170773A
    • 2008-07-24
    • JP2007004372
    • 2007-01-12
    • Toppan Printing Co Ltd凸版印刷株式会社
    • OBUCHI TOMOMICHI
    • G02B5/20G02F1/1335
    • PROBLEM TO BE SOLVED: To provide a method of manufacturing a color filter which uses a production line equipped with a forming apparatus and a conveying apparatus and reuses a regenerated substrate by providing a MVA (Multi-domain Vertical Alignment) photo resist peeling-off method carried out by using an existing line in the peeling-off of a resist from a substrate having defective MVA photoresist coat produced in the middle of a line to regenerate the substrate, minimizing the stoppage of the apparatus and automatically operating.
      SOLUTION: The method of manufacturing the color filter includes a step in which a process for successively controlling a process treatment of the MVA photoresist peeling-off method for peeling off the resist from the substrate having defective resist coat treatment and the action of the substrate is registered to a process control part using a process treatment line for forming a MVA pattern and overall-exposure in the MVA photoresist peeling-off method is carried out in a proximity exposing apparatus under the condition of the exposure which is an NG information recipe of 500-1,000 μm exposure gap and 150-200 mJ/cm
      2 exposure amount.
      COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供一种使用配备有成形装置和输送装置的生产线的滤色器的制造方法,并且通过提供MVA(多畴垂直取向)光刻胶剥离来再利用再生基板 通过使用现有的线路在从线中间产生的具有缺陷的MVA光致抗蚀剂涂层的基板剥离抗蚀剂以再生基板,从而使设备的停止和自动操作最小化。 解决方案:制造滤色器的方法包括以下步骤:连续地控制用于从具有抗蚀剂涂层处理不良的基板剥离抗蚀剂的MVA光致抗蚀剂剥离方法的处理处理和 使用用于形成MVA图案的处理处理线将基板登记到处理控制部,并且在曝光的条件下在接近曝光装置中进行MVA光刻胶剥离方法中的全面曝光,该曝光是NG信息 500-1,000μm曝光间隙和150-200mJ / cm 2 SP / 2曝光量的配方。 版权所有(C)2008,JPO&INPIT
    • 6. 发明专利
    • Liquid discharge apparatus
    • 液体排放装置
    • JP2011016047A
    • 2011-01-27
    • JP2009161005
    • 2009-07-07
    • Toppan Printing Co Ltd凸版印刷株式会社
    • OBUCHI TOMOMICHINAKANO TAKASHITOITANI NAOKI
    • B05C5/00B05C11/10
    • PROBLEM TO BE SOLVED: To provide a liquid discharge apparatus which can surely perform switching to a different chemical in a short period of time and in which the quantity of a waste liquid chemical in switching is small.SOLUTION: The liquid discharge apparatus 10 includes liquid supply parts 1-3, a discharge part 5 for discharging the liquid to the outside, a multi-way valve 4 for connecting the liquid supply parts 1-3 and the discharge part 5 and a controller 6 for controlling opening and closing of the multi-directional valve 4. The controller 6 selectively communicate the liquid supply parts 1-3 with the discharge part 5 by controlling the opening and the closing of the valves H-I of the multi-way valve 4. In switching from the supply of the liquid chemical by the liquid supply part 1 to the supply of the liquid chemical by the liquid supply part 2, the liquid in a flow path from the multi-way valve 4 to the discharge port of the discharge part 5 is replaced by a cleaning liquid supplied from the liquid supply part 3 and the liquid chemical supplied from the liquid supply part 2 in order.
    • 要解决的问题:提供一种液体排出装置,其可以在短时间内可靠地切换到不同的化学品,并且其中切换中的废液化学品的量小。解决方案:液体排出装置10包括液体 供给部件1-3,用于将液体排出到外部的排出部分5,用于连接液体供应部分1-3和排放部分5的多通阀4和用于控制多个流体的打开和关闭的控制器6 控制器6通过控制多通阀4的阀门HI的打开和关闭来选择性地将液体供应部件1-3与排出部件5连通。在从液体化学品的供给切换 通过液体供应部分1通过液体供应部分2供应液体化学品,从多通阀4到排出部分5的排放口的流动路径中的液体被清洗液体s 从液体供应部分3和从液体供应部分2供应的液体化学品顺序上升。