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1. 发明专利

JP2006041482A Oxidation method of material to be treated, oxidation apparatus, and storage medium 有权
标题翻译：待处理材料的氧化方法，氧化装置和储存介质
公开(公告)号：JP2006041482A
公开(公告)日：2006-02-09
申请号：JP2005141402
申请日：2005-05-13
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： SUZUKI KEISUKE , AOKI KIMIYA , UMEZAWA KOUTAI , MATTHES THOMAS , WELLHAUSEN UWE , DYROFF NORBERT
IPC分类号： H01L21/316 , H01L21/76
CPC分类号： H01L21/02238 , H01L21/0223 , H01L21/02255 , H01L21/31662 , H01L21/76235
摘要： PROBLEM TO BE SOLVED: To provide an oxidation method of a material to be treated in which generation of a facet is prevented by rounding a corner of a bottom in addition to a corner of a shoulder of a trench so that the corners are formed into a shape of a curved surface.
SOLUTION: In an oxidation method of a material to be treated; in which a material to be treated W, on the surface of which trenches 4 are formed, is stored in a treatment chamber 22 that is allowed to be evacuated, then an oxidizing gas and a reducing gas are supplied into the treatment chamber, and then a surface of the material to be treated is oxidized in an atmosphere having oxygen activated species and hydroxyl activated species generated by reacting both of the gases; temperature within the treatment chamber is set to be 900°C or lower during the oxidation. Thus, a corner of a bottom is rounded in addition to a corner of a shoulder of a trench, thereby generation of a facet is prevented.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供除了沟槽的肩部的角部之外，通过使底部的角部四舍五入来防止产生小面的材料的氧化方法，使得角部为形成为曲面的形状。解决方案：在待处理材料的氧化方法中，其中待处理的材料W在其表面上形成沟槽4被储存在允许抽真空的处理室22中，然后将氧化气体和还原气体供应到处理室中，然后待处理材料的表面在具有氧活化物质的气氛中氧化，并且通过使两种气体反应产生羟基活化物质; 在氧化期间将处理室内的温度设定为900℃以下。因此，除了沟槽的肩部的角部之外，底部的角部是圆形的，从而防止了小面的产生。版权所有（C）2006，JPO＆NCIPI

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