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1. 发明专利

JP2010018470A High-purity molten quartz glass, method of producing the same, member using the same and apparatus 审中-公开
标题翻译：高纯度硬质石英玻璃，其制造方法，使用该玻璃的装置和装置
公开(公告)号：JP2010018470A
公开(公告)日：2010-01-28
申请号：JP2008179536
申请日：2008-07-09
申请人： Tohos Sgm Kk , Tosoh Corp , 東ソ−・エスジ−エム株式会社 , 東ソー株式会社
发明人： ARAI KAZUYOSHI , TAKAHATA TSUTOMU , HASHIMOTO SHINKICHI , YAMADA SHUSUKE , HARADA YOSHINORI , UCHIDA MASAHITO , HORIKOSHI HIDEHARU
IPC分类号： C03B20/00 , C03C3/06
CPC分类号： Y02P40/57
摘要： PROBLEM TO BE SOLVED: To inexpensively provide molten quartz glass suitably usable for various kinds of optical material utilizing ultraviolet light, visible light and infrared light, a member for manufacturing a semiconductor, a member for manufacturing a liquid crystal and a member for manufacturing a micro electro mechanical system (MEMS). SOLUTION: The molten quartz glass contains ≤5 ppm OH group, 12.0 Pa s coefficient of viscosity at 1215°C and expresses 1×10 -10 cm 2 /sec or less diffusion coefficient of Cu ion at 20-100 μm depth from the surface in the thermal diffusion of Cu ion in the atmosphere. The molten quartz glass is obtained by forming raw material silica powder into cristobalite and melting in a non-reducing atmosphere. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了廉价地提供适用于利用紫外光，可见光和红外光的各种光学材料的熔融石英玻璃，用于制造半导体的部件，用于制造液晶的部件和用于制造微机电系统（MEMS）。
解决方案：熔融石英玻璃含有≤5ppm的OH基，Li，Na，K，Mg，Ca和Cu各自为0.1ppm，Li和Na总计为≤0.05ppm，内部透射率为≥95％对于245nm波长的紫外线的厚度为10mm，优选含有≤3ppm的Al，在1215℃下具有≥10SSP的粘度系数，并表示1×10 -10 在大气中Cu离子的热扩散中，距离表面20-100μm处的Cu离子的扩散系数 2 / SP /秒。熔融石英玻璃通过将原料二氧化硅粉末形成方英石并在非还原气氛中熔融而获得。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2014005204A Melted quartz glass and method for manufacturing the same 有权
标题翻译：熔融石英玻璃及其制造方法
公开(公告)号：JP2014005204A
公开(公告)日：2014-01-16
申请号：JP2013215033
申请日：2013-10-15
申请人： Tosoh Corp , 東ソー株式会社 , Tohos Sgm Kk , 東ソ−・エスジ−エム株式会社
发明人： ARAI KAZUYOSHI , TAKAHATA TSUTOMU , HASHIMOTO SHINKICHI , UCHIDA MASATO , YAMADA SHUSUKE , HARADA YOSHINORI , HORIKOSHI HIDEHARU
IPC分类号： C03C3/06 , C03B3/02 , C03B5/235 , C03B20/00
CPC分类号： C03C4/0085 , C03B19/066 , C03B20/00 , C03B2201/03 , C03B2201/04 , C03C3/06 , C03C4/10 , C03C2201/23 , C03C2201/50 , C03C2201/54 , Y02P40/57
摘要： PROBLEM TO BE SOLVED: To inexpensively provide a melted quartz glass which is suitably usable for various optical materials that use ultraviolet rays, visible rays and infrared rays, a member for manufacturing a semiconductor, a member for manufacturing a liquid crystal, a member for manufacturing MEMS, and a glass substrate for a liquid crystal, has a high transmittance to ultraviolet rays, visible rays and infrared rays, has high purity and high heat resistance, and a low diffusion speed of a Cu ion.SOLUTION: In a melted quartz glass, an internal transmittance to ultraviolet light having a wavelength of 245 nm in a thickness of 10 mm is 95% or more, an OH content is 5 ppm or less, and each content of Li, Na, K, Mg, Ca and Cu is less than 0.1 ppm. Preferably, Al is contained therein in weight ratio of 2 ppm or less, the viscosity at 1,215°C is 10Pa s or more, and a diffusion coefficient of a Cu ion in a depth of 20 to 100 μm from the surface in thermal diffusion of the Cu ion at 1,050°C in the atmosphere is 1×10cm/sec or less. Such a melted quartz glass can be obtained by previously converting raw material silica powder into cristobalite, and then melting the cristobalitized silica powder in a non-reducing atmosphere.
摘要翻译：要解决的问题：为了廉价地提供适用于使用紫外线，可见光和红外线的各种光学材料的熔融石英玻璃，用于制造半导体的部件，用于制造液晶的部件，制造用部件 MEMS和用于液晶的玻璃基板对紫外线，可见光线和红外线具有高透射率，具有高纯度和高耐热性以及较低的Cu离子扩散速度。在熔融石英玻璃对于厚度为10mm的波长为245nm的紫外线的内部透射率为95％以上，OH含量为5ppm以下，Li，Na，K，Mg，Ca，Cu的含量为小于0.1ppm。优选地，其中含有2重量％以下的Al，1,215℃下的粘度为10Pa·s以上，Cu离子的热扩散表面的深度为20〜100μm的扩散系数大气中1,050℃的Cu离子为1×10cm /秒以下。这种熔融的石英玻璃可以通过将原料二氧化硅粉末预先转化为方英石，然后在非还原气氛中熔化澄清二氧化硅粉末来获得。

3. 发明专利

JP2010018471A Quartz glass, method of producing the same, member using the same and apparatus 审中-公开
标题翻译： QUARTZ玻璃，其制造方法，使用它们的成员和装置
公开(公告)号：JP2010018471A
公开(公告)日：2010-01-28
申请号：JP2008179537
申请日：2008-07-09
申请人： Tohos Sgm Kk , Tosoh Corp , 東ソ−・エスジ−エム株式会社 , 東ソー株式会社
发明人： ARAI KAZUYOSHI , YAMADA SHUSUKE , HARADA YOSHINORI , HASHIMOTO SHINKICHI , UCHIDA MASAHITO , TAKAHATA TSUTOMU , HORIKOSHI HIDEHARU
IPC分类号： C03B20/00 , C03C3/06 , H01L51/50 , H05B33/02 , H05B33/10
CPC分类号： Y02P40/57
摘要： PROBLEM TO BE SOLVED: To inexpensively provide quartz glass usable for various kinds of optical material, a member for manufacturing a semiconductor and a member for manufacturing a liquid crystal and having high transmittance to ultraviolet light, visible light and infrared light, high purity and high heat resistance and the low diffusion rate of Cu ion. SOLUTION: The quartz glass has Cu concentration of ≤0.01 ppm at the depth of 5 mm from the exposed surface when exposed to Cu oxide vapor at 1,050°C for four hours under the atmosphere, contains ≤0.2 ppm in total of Li and Na and 11.5 Pa s coefficient of viscosity at 1,215°C and the coefficient of viscosity increased to ≥10 12.0 Pa s by containing ≤3 ppm Al by weight. The quartz glass is obtained by forming raw material silica powder into cristobalite and melting in a non-reducing atmosphere. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了廉价地提供可用于各种光学材料的石英玻璃，用于制造半导体的部件和用于制造液晶的部件，对紫外线，可见光和红外光具有高透射率，高纯度高，耐热性高，Cu离子扩散速率低。
解决方案：在大气中，当1050℃暴露于氧化铜蒸汽4小时时，石英玻璃的Cu浓度在暴露表面5mm深度处的浓度≤0.01ppm，总共含有≤0.2ppm的Li 和Li，Na，K，Mg，Ca和Cu中的Na和<0.1ppm。石英玻璃对于245nm波长的紫外光，在10mm厚度下具有≥95％的内部透射率，在1,215℃下粘度系数≥10 11.5 Pa的粘度系数，粘度系数增加到≥10< SP> 12.0 ，通过含有≤3ppm重量的Al。通过将原料二氧化硅粉末成形为方石英并在非还原气氛中熔融而获得石英玻璃。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2004284828A High durability quartz glass, its manufacturing method, and member and device using the same 有权
标题翻译：高耐久性QUARTZ玻璃及其制造方法，以及使用其的部件和装置
公开(公告)号：JP2004284828A
公开(公告)日：2004-10-14
申请号：JP2003065000
申请日：2003-03-11
申请人： Tohos Sgm Kk , Tosoh Corp , Tosoh Quartz Corp , 東ソ−・エスジ−エム株式会社 , 東ソー・クォーツ株式会社 , 東ソー株式会社
发明人： ARAI KAZUYOSHI , TAKAHATA TSUTOMU , HASHIMOTO SHINKICHI , KIRITANI HIDEAKI , HARADA YOSHINORI
IPC分类号： C03B20/00 , C03C3/06 , C03C3/085 , C03C3/087 , C03C3/095 , C03C4/08 , H01L21/3065
CPC分类号： C03C3/06 , C03C2201/32 , C03C2201/3411 , C03C2201/3417 , C03C2201/3423 , C03C2201/36 , C03C2201/54
摘要： PROBLEM TO BE SOLVED: To provide a quartz glass having a high purity and exhibiting enhanced durability while keeping good processability and machinability, and reduced dusting property as a member of a semiconductor production apparatus or a liquid crystal display production apparatus using a halide gas and/or its plasma; and to provide a device equipped with such excellent quartz glass.
SOLUTION: The highly durable quartz glass is characterized by containing aluminum and at least one element (M) selected from the group consisting of group 2A elements, group 3A elements and group 4A elements of the periodic table. A method for manufacturing the quartz glass, and the quartz glass member and the device using the quartz glass are also provided.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种具有高纯度并且在保持良好加工性和机械加工性的同时显示出增强的耐久性的石英玻璃，以及作为半导体制造装置的构件或使用卤化物的液晶显示器制造装置的降低的除尘性气体和/或其等离子体; 并提供配备有这样优良的石英玻璃的装置。解决方案：高耐用的石英玻璃的特征在于含有铝和至少一种选自元素周期表的2A族元素，3A族元素和4A族元素的元素（M）。还提供了一种制造石英玻璃的方法，以及石英玻璃构件和使用石英玻璃的装置。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2005336011A Corrosion resistant glass member, method of manufacturing the same and apparatus using the same 有权
标题翻译：耐腐蚀玻璃构件及其制造方法及使用其的装置
公开(公告)号：JP2005336011A
公开(公告)日：2005-12-08
申请号：JP2004157738
申请日：2004-05-27
申请人： Tohos Sgm Kk , Tosoh Corp , 東ソ−・エスジ−エム株式会社 , 東ソー株式会社
发明人： ARAI KAZUYOSHI , TAKAHATA TSUTOMU , HASHIMOTO SHINKICHI
IPC分类号： C03C23/00 , C03C3/06 , C03C4/20 , C03C21/00 , H01L21/205
CPC分类号： C03C21/008 , C03C4/20 , C03C23/007
摘要： PROBLEM TO BE SOLVED: To provide a corrosion resistant glass member having sufficient corrosion resistance against a halogen gas, excellent workability, small Al contamination and low in selective corrosion causing the occurrence of particles.
SOLUTION: A part of the corrosion resistant glass member where exposed by the halogen gas contains 50-1,000 wt.ppm Al and has a melt-treated surface. The member is manufactured by mixing silica power, transition alumina powder and/or alumina-silica compound oxide power and melting the mixture.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供对卤素气体具有足够的耐腐蚀性的耐腐蚀玻璃构件，优异的可加工性，小的Al污染和低选择性腐蚀导致颗粒的发生。
解决方案：由卤素气体暴露的耐腐蚀玻璃构件的一部分含有50-1,000重量ppm的Al并且具有熔融处理的表面。该构件通过混合二氧化硅粉末，过渡氧化铝粉末和/或氧化铝 - 二氧化硅复合氧化物粉末并将混合物熔化而制成。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2009120436A Fused quartz glass 审中-公开
标题翻译： FUSED QUARTZ玻璃
公开(公告)号：JP2009120436A
公开(公告)日：2009-06-04
申请号：JP2007295261
申请日：2007-11-14
申请人： Tohos Sgm Kk , Tosoh Corp , 東ソ−・エスジ−エム株式会社 , 東ソー株式会社
发明人： HARADA YOSHINORI , YAMADA SHUSUKE , TAKAHATA TSUTOMU
IPC分类号： C03B20/00
CPC分类号： C03B19/01 , C03B2201/03 , Y02P40/57
摘要： PROBLEM TO BE SOLVED: To provide a fused quartz glass having a low dusting property which is suitable for use in a member for manufacturing a semiconductor, a member for manufacturing a liquid crystal and a member for manufacturing a MEMS (micro-electro-mechanical system) by using plasma etching at a low cost. SOLUTION: The fused quartz glass excellent in a low dusting property is made by using a natural silica in which the ratio of elements having corrosion resistance to a gaseous halide as the local concentration of a defective part due to foreign substances is less than 0.4 wt.% and preferably the concentration of both Zr and Al at a defective part due to foreign substances is less than 0.1 wt.%. The fused quartz glass of this kind is manufactured by flowing the melt to generate a shearing stress inside the melt in manufacturing the fused quartz glass and a minute defective part due to foreign substances observed by a schlieren method in the fused quartz glass of this kind has a length of 1.3 mm or more. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供适用于半导体制造部件的粉尘特性低的熔融石英玻璃，制造液晶的部件和用于制造MEMS的部件（微电子机械系统），通过以低成本使用等离子体蚀刻。解决方案：通过使用其中具有耐腐蚀性的元素与卤化物的比例作为由于异物引起的缺陷部分的局部浓度的比例小于 0.4重量％，优选由于异物而在缺陷部分的Zr和Al的浓度小于0.1重量％。这种熔融石英玻璃通过使熔体流动而在熔融石英玻璃的制造中在熔融物内部产生剪切应力，并且由于在这种熔融石英玻璃中由于schlieren法观察到的异物而产生的微小缺陷部分具有长度为1.3mm以上。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2008208017A Fused quartz glass and process for producing the same 有权
标题翻译：熔融石英玻璃及其制造方法
公开(公告)号：JP2008208017A
公开(公告)日：2008-09-11
申请号：JP2007235031
申请日：2007-09-11
申请人： Tohos Sgm Kk , Tosoh Corp , 東ソ−・エスジ−エム株式会社 , 東ソー株式会社
发明人： ARAI KAZUYOSHI , TAKAHATA TSUTOMU , HASHIMOTO SHINKICHI , UCHIDA MASAHITO , YAMADA SHUSUKE , HARADA YOSHINORI , HORIKOSHI HIDEHARU
IPC分类号： C03B20/00
CPC分类号： C03C4/0085 , C03B19/066 , C03B20/00 , C03B2201/03 , C03B2201/04 , C03C3/06 , C03C4/10 , C03C2201/23 , C03C2201/50 , C03C2201/54 , Y02P40/57
摘要： PROBLEM TO BE SOLVED: To inexpensively provide a fused quartz glass capable of being preferably used for preparing various optical materials utilizing ultraviolet ray, visible light and infrared ray, a member for producing a semiconductor, a member for producing a liquid crystal, a member for producing MEMS(micro-electro-mechanical system), and a glass substrate for the liquid crystal, and having high permeability of ultraviolet ray, visible light and infrared ray, high purity, high heat resistance, and a low diffusion velocity of Cu ions.
SOLUTION: The fused quartz glass has an internal transmittance of not less than 95% for ultraviolet ray of 245 nm wavelength at 10 mm depth, a viscosity coefficient at 1,215°C of not less than 10
12.0 Pa s, a Cu ion diffusion coefficient in a depth of 20-100 μm from the surface in Cu ion heat diffusion in the atmosphere at 1,050°C of not greater than 1×10
-10 cm
2 /sec, an OH content of not grater than 5 ppm, a Li, Na, K, Mg, Ca and Cu content of each less than 0.1 ppm, and preferably contains 2 ppm of Al by weight ratio. The fused quartz glass can be obtained by converting a raw material silica powder to cristobalite in advance and thereafter fusing the same in a non-reducing atmosphere.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题为了廉价地提供一种能够优选用于制备利用紫外线，可见光和红外线的各种光学材料的熔融石英玻璃，用于制造半导体的部件，用于制造液晶的部件，用于制造MEMS（微电子机械系统）的构件和用于液晶的玻璃基板，并且具有高的紫外线，可见光和红外线的透过性，高纯度，高耐热性和低扩散速度 Cu离子。解决方案：熔融石英玻璃对于10mm深度的245nm波长的紫外线具有不小于95％的内部透射率，1,215℃下的粘度系数不小于10 SP SP 12.0 SP > Pa时，在1050℃的大气中的Cu离子热扩散中与表面的深度为20-100μm的Cu离子扩散系数不大于1×10 -10 < SP> 2 /秒，不超过5ppm的OH含量，Li，Na，K，Mg，Ca和Cu的含量均小于0.1ppm，优选含有2ppm的Al重量比。熔融石英玻璃可以通过将原料二氧化硅粉末预先转化为方英石，然后在非还原气氛中将其熔融而获得。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2003292337A Plasma corrosion resisting silica glass, manufacturing method therefor and apparatus using the same 审中-公开
标题翻译：等离子体腐蚀电阻二氧化硅玻璃及其制造方法及其设备
公开(公告)号：JP2003292337A
公开(公告)日：2003-10-15
申请号：JP2002098893
申请日：2002-04-01
申请人： Tohos Sgm Kk , Tosoh Corp , Tosoh Quartz Corp , 東ソ−・エスジ−エム株式会社 , 東ソー・クォーツ株式会社 , 東ソー株式会社
发明人： HASHIMOTO SHINKICHI , TAKAHATA TSUTOMU
IPC分类号： C03C3/083 , C03C3/06 , C03C4/00 , C03C4/20 , C03C10/04 , H01L21/3065
CPC分类号： C03C3/06 , C03C4/20 , C03C2201/32
摘要： PROBLEM TO BE SOLVED: To provide a silica glass, used for a semiconductor container, a tool, a bell jar for a plasma etcher, and the like, which has plasma resistance, particularly sufficient durability to fluorine plasma such as CF
4 /Ar/O
2 plasma, is free from metal contamination and has high viscosity at high temperatures, and to provide a method for producing the same and apparatuses for manufacturing a semiconductor or a liquid crystal comprising the plasma corrosion resisting silica glass.
SOLUTION: The plasma corrosion resisting silica glass essentially comprising SiO
2 as a glass forming substance comprises aluminum in an amount from more than 10 atomic % to 20 atomic %. The method for producing the plasma corrosion resisting silica glass and apparatuses using the same are provided.
COPYRIGHT: (C)2004,JPO
摘要翻译：解决方案：提供一种用于半导体容器的石英玻璃，用于等离子体蚀刻器的工具，钟罩，等离子体电阻，特别是足够的氟等离子体的耐久性，例如CF 3， SB> 4 / Ar / O 2 等离子体，没有金属污染，并且在高温下具有高粘度，并且提供其制造方法以及用于制造半导体的装置包含等离子体耐腐蚀石英玻璃的液晶。基本上包含作为玻璃形成物质的SiO 2 SB的等离子体耐蚀性硅玻璃包含大于10原子％至20原子％的量的铝。提供了等离子体耐蚀石英玻璃的制造方法和使用其的装置。版权所有（C）2004，JPO

9. 发明专利

JP2007302556A Method for producing ito sintered compact 审中-公开
标题翻译：用于生产ITO烧结紧密度的方法
公开(公告)号：JP2007302556A
公开(公告)日：2007-11-22
申请号：JP2007194347
申请日：2007-07-26
申请人： Tosoh Corp , 東ソー株式会社
发明人： UCHIUMI KENTARO , TAKAHATA TSUTOMU , YOSHIMURA RYOJI
IPC分类号： C04B35/457 , C04B35/00 , C23C14/34
摘要： PROBLEM TO BE SOLVED: To provide a method for producing an Indium Tin Oxide (ITO) sintered compact inexpensively by utilizing scrapped ITO sintered compact through a simple process. SOLUTION: The method for producing an ITO sintered compact comprises the steps of pulverizing an ITO sintered compact into granules of 0.5 mm or less, mixing the ITO granules with a virgin powder substantially consisting of indium, tin and oxygen, forming and sintering the resultant mixture. Alternatively, the method comprises the steps of pulverizing an ITO sintered compact into granules of 0.5 mm or less, mixing the ITO granules with virgin powder substantially consisting of indium and oxygen, forming and sintering the resultant mixture. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：通过简单的方法利用废弃的ITO烧结体，廉价地提供一种生产氧化铟锡（ITO）烧结体的方法。解决方案：制造ITO烧结体的方法包括将ITO烧结体粉碎成0.5mm以下的颗粒的步骤，将ITO颗粒与基本上由铟，锡和氧组成的原始粉末混合，形成和烧结所得混合物。或者，该方法包括以下步骤：将ITO烧结体粉碎成0.5mm以下的颗粒，将ITO颗粒与基本上由铟和氧组成的原始粉末混合，形成并烧结所得到的混合物。版权所有（C）2008，JPO＆INPIT

10. 发明专利

JP2006027930A Black-colored quartz glass, its producing method, and member using the quartz glass 审中-公开
标题翻译：黑色彩色玻璃，其生产方法和使用QUARTZ玻璃的会员
公开(公告)号：JP2006027930A
公开(公告)日：2006-02-02
申请号：JP2004206457
申请日：2004-07-13
申请人： Tosoh Corp , 東ソー株式会社
发明人： TODOKO SHIGEHISA , UCHIDA MASAHITO , TAKAHATA TSUTOMU
IPC分类号： C03C4/02 , C03B20/00 , C03C3/06
CPC分类号： C03B19/06 , C03B19/066 , C03B20/00
摘要： PROBLEM TO BE SOLVED: To provide highly light-shielding black-colored quartz glass which is substantially free from metal impurities and has mechanical and thermal characteristics equivalent to those of transparent quartz glass, in other words, bending strength, hardness, coefficient of thermal expansion, thermal conductivity and the like, equivalent to those of the transparent quartz glass; and to provide a method for producing the same.
SOLUTION: The black-colored quartz glass is silica glass in which crystalline carbon fine particles having an average diameter of 0.05-1 μm are dispersed in an amount of 0.05-2 wt.% and which has a density of 2.15-2.21 g/cm
3 . The black-colored quartz glass has a transmittance in a wavelength region of 200-10,000 nm of ≤1% when its thickness is 1 mm. The black-colored quartz glass is obtained by mixing an amorphous silica powder having an average diameter of 0.1-1 μm and containing hydroxy group in a content of ≥50 ppm and the crystalline carbon fine particles having an average diameter of 0.05-1 μm so that the addition amount of the carbon fine particles to the weight of the silica powder becomes 0.05-2 wt.%, then forming the resulting mixture, and sintering the formed body at 1,100-1,500°C.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供基本上没有金属杂质的高度遮光的黑色石英玻璃，并且具有与透明石英玻璃相当的机械和热特性，换句话说，弯曲强度，硬度，系数的热膨胀，导热性等，与透明石英玻璃相当; 并提供其制造方法。解决方案：黑色石英玻璃是二氧化硅玻璃，其中平均直径为0.05-1μm的结晶碳细颗粒以0.05-2重量％的量分散，密度为2.15-2.21 克/厘米 3 。黑色石英玻璃的厚度为1mm时，在200〜10000nm的波长范围内具有≤1％的透射率。黑色石英玻璃是通过混合平均直径为0.1-1μm，含有≥50ppm的羟基的无定形二氧化硅粉末和平均直径为0.05-1μm的结晶碳微粒而获得的碳微粒相对于二氧化硅粉末的添加量为0.05〜2重量％，然后形成所得混合物，并在1100-1,500℃烧结成形体。版权所有（C）2006，JPO＆NCIPI

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