专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2006037133A Method for producing high purity hafnium material, high purity hafnium material obtained by the method, and sputtering target 审中-公开
标题翻译：用于生产高纯度铪材料的方法，该方法获得的高纯度材料和溅射目标
公开(公告)号：JP2006037133A
公开(公告)日：2006-02-09
申请号：JP2004215569
申请日：2004-07-23
申请人： Toho Titanium Co Ltd , 東邦チタニウム株式会社
发明人： YAMANAKA OSAMU , KANANO OSAMU , TAKEDA YUTAKA
IPC分类号： C22B34/14 , C22B1/08 , C22B5/04 , C22B9/04 , C22B9/20 , C22B9/22 , C22C27/00 , C23C14/34 , H01L21/316
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a high purity hafnium material particularly suitable for a sputtering target in which an oxygen content and a carbon content are extremely low.
SOLUTION: At the time of producing a hafnium material, a hafnium oxide is chlorinated to obtain a hafnium chloride, next, the hafnium chloride is reduced with an active metal into metal hafnium, and further, the metal hafnium is refined under a reduced pressure.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：待解决的问题：提供一种特别适用于氧含量和碳含量极低的溅射靶的高纯度铪材料的制造方法。解决方案：在生产铪材料时，将氧化铪氯化以获得氯化铪，接下来，将氯化铪用活性金属还原成金属铪，此外，金属铪在减压。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2009287045A Method and apparatus for producing metal calcium 有权
标题翻译：用于生产金属钙的方法和装置
公开(公告)号：JP2009287045A
公开(公告)日：2009-12-10
申请号：JP2008137794
申请日：2008-05-27
申请人： Toho Titanium Co Ltd , 東邦チタニウム株式会社
发明人： YAMAGUCHI MASANORI , ONO YUICHI , YAMANAKA OSAMU
IPC分类号： C25C3/02 , C25C7/04 , C25C7/08
摘要： PROBLEM TO BE SOLVED: To provide a method and apparatus for efficiently producing high purity metal calcium by a molten salt electrolysis. SOLUTION: The method of producing metal calcium by filling molten calcium chloride into an electrolytic cell as an electrolytic bath and imparting voltage to an anode and a cathode which are immersed and arranged in the electrolytic cell to carry out the molten salt electrolysis includes a step of: keeping the electrolytic bath of a part including the cathode in the electrolytic bath to a temperature equal to or above the melting point of the metal calcium to form the molten metal calcium (thereafter called "electrolytic step"); and a step of: cooling the electrolytic bath of the part including the cathode to a temperature equal to or below the melting point of metal calcium to deposit metal calcium (thereafter called "cooling step") and is provided with the electrolytic cell where the electrolytic bath is filled and the anode and the cathode which are immersed and arranged in the electrolytic bath, wherein the cathode and the anode are respectively arranged inside of a cathode partition wall and an anode partition wall respectively surrounding the cathode and the anode. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过熔融盐电解有效生产高纯度金属钙的方法和装置。解决方案：通过将熔融氯化钙填充到电解槽中并将其施加于电解池中并进行熔融盐电解的阳极和阴极赋予电压来产生金属钙的方法包括：将包含阴极的部分的电解浴保持在电解浴中的步骤为等于或高于金属钙的熔点的温度，形成熔融金属钙（此后称为“电解步骤”）; 以及将包含阴极的部分的电解槽冷却至等于或低于金属钙的熔点以沉积金属钙的温度（此后称为“冷却步骤”）的步骤，并且设置有电解槽，其中电解将阴极和阳极分别设置在分别围绕阴极和阳极的阴极分隔壁和阳极分隔壁的内部，阴极和阴极被浸没并排列在电解槽中。版权所有（C）2010，JPO＆INPIT

3. 发明专利

JP2009144176A Method of producing metal calcium and molten salt electrolytic apparatus 有权
标题翻译：生产金属钙和钼酸盐电解质设备的方法
公开(公告)号：JP2009144176A
公开(公告)日：2009-07-02
申请号：JP2007319325
申请日：2007-12-11
申请人： Toho Titanium Co Ltd , 東邦チタニウム株式会社
发明人： YAMAGUCHI MASANORI , ONO YUICHI , YAMANAKA OSAMU
IPC分类号： C25C3/02 , C25C7/00 , C25C7/04
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for efficiently producing metal calcium by a molten salt electrolysis.
SOLUTION: In the method of producing metal calcium by filling calcium chloride molten salt in an electrolytic bath and arranging so as to dip an anode and a cathode to carry out the molten salt electrolysis, metal calcium is deposited on the cathode in a solid state by cooling the cathode to a temperature equal to or below the melting point of the metal calcium in the molten salt electrolysis and after molten salt electrolysis, the deposited solid metal calcium is recovered by heating to be melted. The molten salt electrolytic apparatus is used for the manufacturing method and is composed of an electrolytic bath, the cathode, the anode and a partition wall dipped and arranged between the cathode and the anode and the cathode has a flow passage formed to pass a heating medium or a cooling medium to heat or cool the cathode itself.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过熔盐电解有效地生产金属钙的方法和装置。解决方案：在通过在电解槽中填充氯化钙熔盐并排列以使阳极和阴极浸入以进行熔融盐电解的方法制备金属钙的方法中，金属钙沉积在阴极上通过在熔盐电解中将阴极冷却至等于或低于金属钙的熔点的温度，并且在熔融盐电解之后，通过加热回收沉积的固体金属钙以使其熔融。熔盐电解设备用于制造方法，并且由电解浴，阴极，阳极和浸渍并布置在阴极和阳极之间的分隔壁组成，阴极具有形成为使热介质通过的流路或用于加热或冷却阴极本身的冷却介质。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2008231509A High purity metal and production method therefor 有权
标题翻译：高纯金属及其生产方法
公开(公告)号：JP2008231509A
公开(公告)日：2008-10-02
申请号：JP2007073125
申请日：2007-03-20
申请人： Toho Titanium Co Ltd , 東邦チタニウム株式会社
发明人： YAMANAKA OSAMU , HASEGAWA MASATOSHI
IPC分类号： C22B34/24 , C22B9/05 , C22B34/12 , C22B34/14 , C22B34/22
摘要： PROBLEM TO BE SOLVED: To provide a method for industrially and efficiently producing high purity active metal having extremely little of impurity metal content.
SOLUTION: This method for producing the high purity metal includes the following processes: a first process A, in which raw metallic material containing a metal (a) or a metallic (a) compound and an impurity metal (b) or an impurity metallic (b) compound are brought into contact with a halogen, to change them into a mixed saturated halide of metal of a saturated halide of the metal (a) and a saturated halide of the impurity metal (b); a first process B, in which a metallic material (c) having the same or the weaker affinities as the affinity of the metal (a) with the halogen and larger affinity than the affinity of the impurity metal (b) and the halogen, is brought into contact with the mixed saturated halide to change the saturated halide of the impurity metal (b) into unsaturated halide of the impurity metal (b); a second process, in which the unsaturated halide of the impurity metal (b) is removed from the mixed material of the saturated halide of the metal (a) and the unsaturated halide of the impurity metal (b); and a third process, in which the saturated halide of the metal (a) is reduced to make a refined metal.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种工业上有效地生产具有极少杂质金属含量的高纯度活性金属的方法。解决方案：该高纯度金属的制造方法包括：第一工序A，其中含有金属（a）或金属（a）化合物和杂质金属（b）的原料金属材料或使杂质金属（b）化合物与卤素接触，将其变成金属（a）的饱和卤化物的金属和杂质金属（b）的饱和卤化物的混合饱和卤化物。第一种方法B，其中具有与金属（a）与卤素的亲和力相同或较弱的亲和力（金属（c））比金属（b）和卤素的亲和性更大的亲和力的金属材料（c）是与混合的饱和卤化物接触以将杂质金属（b）的饱和卤化物改变成杂质金属（b）的不饱和卤化物; 从金属（a）的饱和卤化物和杂质金属（b）的不饱和卤化物的混合材料中去除杂质金属（b）的不饱和卤化物的第二工艺; 和第三种方法，其中将金属（a）的饱和卤化物还原成精制金属。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2007224368A Metal refining method, and method for manufacturing active metal using it 有权
标题翻译：金属精炼方法和使用其制造活性金属的方法
公开(公告)号：JP2007224368A
公开(公告)日：2007-09-06
申请号：JP2006047207
申请日：2006-02-23
申请人： Toho Titanium Co Ltd , 東邦チタニウム株式会社
发明人： YAMANAKA OSAMU , KANANO OSAMU
IPC分类号： C22B5/04 , C22B9/10 , C22B19/32 , C22B26/10 , C22B26/20 , C22B26/22 , C22B34/12 , C22B34/14 , C22B34/24 , C22C14/00 , C22C16/00 , C22C23/00 , C22C27/02
摘要： PROBLEM TO BE SOLVED: To provide technologies for highly purifying a reductant metal for use in the manufacture of a highly purity active metal for targets and efficiently manufacturing a high purity active metal using the resultant highly-purified reductant metal. SOLUTION: An active metal in a solid state is brought into contact with a raw-material metal in a molten state and impurities in the raw-material metal are adsorbed or bonded onto the active metal to remove the impurities. Moreover, the raw-material metal refined by the above method is used as a reductant and brought into contact with a chloride of an active metal to carry out reduction. COPYRIGHT: (C)2007,JPO&INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式