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1. 发明专利

JP2013140950A Plasma processing device and plasma processing method 有权
标题翻译：等离子体处理装置和等离子体处理方法
公开(公告)号：JP2013140950A
公开(公告)日：2013-07-18
申请号：JP2012259114
申请日：2012-11-27
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社 , Tocalo Co Ltd , トーカロ株式会社
发明人： NISHINO MASA , MAKABE MASATSUGU , NAGAYAMA MASAYUKI , HANDA TATSUYA , MIDORIKAWA RYOTARO , KOBAYASHI KEIGO , NIYA TETSUYA
IPC分类号： H01L21/3065 , C23C16/509 , H05H1/46
CPC分类号： H05H1/46 , H01J37/32477 , H01J37/32495
摘要： PROBLEM TO BE SOLVED: To suppress microparticle occurrence in a plasma process which introduces a gas including a halogen-containing gas and an oxygen gas.SOLUTION: There is provided a plasma processing device 10 comprising: a processing container 12 which can be decompressed; a lower electrode provided in the processing container and functioning as a mounting table 20 on which a wafer W is mounted; an upper electrode or an antenna electrode arranged so as to face the lower electrode; a gas supply source 32 which introduces a gas including a halogen-containing gas and an oxygen gas into the processing container; a high-frequency power source 18 which applies high-frequency power for plasma generation to any of the upper electrode, antenna electrode, and lower electrode; and means for turning the gas into plasma by the high-frequency power for plasma generation and plasma-treating the wafer on the mounting table by the action of plasma. In this plasma processing device, out of surfaces exposed to plasma in the processing container, a part or the whole of a surface which is of equal height of at least the upper electrode side, antenna electrode side, or lower electrode side from the wafer mounting position is covered by a fluoride compound.
摘要翻译：要解决的问题：为了抑制引入包含含卤素气体和氧气的气体的等离子体处理中的微粒发生。解决方案：提供一种等离子体处理装置10，其包括：可以减压的处理容器12; 设置在处理容器中并用作安装有晶片W的安装台20的下电极; 以与所述下电极相对的方式配置的上电极或天线电极; 将含有含卤素气体和氧气的气体引入处理容器内的气体供给源32; 高电源18，其向上电极，天线电极和下电极中的任一个施加用于等离子体产生的高频电力; 以及用于通过等离子体产生的高频电力将气体转化为等离子体的装置，并且通过等离子体的作用对安装台上的晶片进行等离子体处理。在该等离子体处理装置中，在处理容器内暴露于等离子体的表面之外，至少与晶片安装的上电极侧，天线电极侧或下电极侧的高度相同的一部分或全部表面位置被氟化物覆盖。

2. 发明专利

JP2010229492A Method for modifying surface of white yttrium oxide thermal-sprayed film, and member coated with yttrium oxide thermal-sprayed film 有权
标题翻译：用于改性白氧化铅热喷涂膜表面的方法，以及用氧化钛热喷涂膜包覆的部件
公开(公告)号：JP2010229492A
公开(公告)日：2010-10-14
申请号：JP2009078348
申请日：2009-03-27
申请人： Tocalo Co Ltd , トーカロ株式会社
发明人： HARADA YOSHIO , TAKEUCHI JUNICHI , YAMAZAKI MAKOTO , INABA MITSUHARU , KOBAYASHI KEIGO
IPC分类号： C23C4/10 , C23C4/08
摘要： PROBLEM TO BE SOLVED: To provide techniques for producing a white secondary recrystallized layer, which has a white appearance color and is dense, smooth and excellent in plasma-erosion resistance, on the surface of an yttrium oxide thermal-sprayed film. SOLUTION: In the method for forming a secondary recrystallized layer having a white appearance color, the surface of the white yttrium oxide thermal-sprayed film formed by an atmospheric plasma thermal spray method is treated with a laser beam in a highly oxidative gas atmosphere. The member coated with an Y 2 O 3 thermal-sprayed film is provided has the white secondary recrystallized layer on the surface. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供在氧化钇热喷涂膜的表面上生产具有白色外观颜色并且致密，光滑和优异的耐等离子体侵蚀性的白色二次再结晶层的技术。解决方案：在形成具有白色外观颜色的二次再结晶层的方法中，通过大气等离子体热喷涂法形成的白色氧化钇热喷涂膜的表面用高度氧化气体中的激光束大气层。涂覆有Y 2＆lt; 3＆gt; 3＆lt; 3＆gt; 3＆lt; 3＆gt;热喷涂膜的部件具有表面上的白色二次再结晶层。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2010229491A Method for whitening black surface of yttrium oxide thermal-sprayed film, and member coated with white yttrium oxide thermal-sprayed film 有权
标题翻译：白色氧化铝热喷涂膜黑色表面的白色氧化膜热喷涂膜的方法
公开(公告)号：JP2010229491A
公开(公告)日：2010-10-14
申请号：JP2009078325
申请日：2009-03-27
申请人： Tocalo Co Ltd , トーカロ株式会社
发明人： HARADA YOSHIO , TAKEUCHI JUNICHI , YAMAZAKI MAKOTO , INABA MITSUHARU , KOBAYASHI KEIGO
IPC分类号： C23C4/18 , C23C28/00
摘要： PROBLEM TO BE SOLVED: To provide techniques for whitening a surface of a black yttrium thermal-sprayed film and/or a surface of a black secondary recrystallized layer thereof. SOLUTION: A black yttrium oxide thermal-sprayed film is changed into white by irradiating the surface of the film with a laser beam in a sealed state with a highly oxidative gas such as oxygen gas, ozone gas and nitrous oxide gas, as well as yttrium oxide particles constituting the surface of the film are fused to integrate to produce a secondary recrystallized layer. Thus, white characters, numbers, line patterns or the like can be drawn on the surface of the black film. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供使黑色钇热喷涂膜的表面和/或其黑色二次再结晶层的表面变白的技术。解决方案：通过用密封状态的激光束用氧气，臭氧气体和一氧化二氮气体等高度氧化气体照射膜的表面，将黑色氧化钇热喷涂膜变成白色，如并且构成膜的表面的氧化钇粒子被熔合以一体化以产生二次再结晶层。因此，可以在黑色膜的表面上绘制白色字符，数字，线条图案等。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2006131966A Method for producing ceramic-sprayed member, program for carrying out the method, storage medium and ceramic-sprayed member 有权
标题翻译：生产陶瓷喷涂成员的方法，实施方法的程序，储存介质和陶瓷喷涂成员
公开(公告)号：JP2006131966A
公开(公告)日：2006-05-25
申请号：JP2004323545
申请日：2004-11-08
申请人： Tocalo Co Ltd , Tokyo Electron Ltd , トーカロ株式会社 , 東京エレクトロン株式会社
发明人： MORIYA TAKESHI , NAKAYAMA HIROYUKI , NAGAIKE HIROSHI , KOBAYASHI KEIGO , YASUDA KANAME
IPC分类号： C23C4/18 , C23C4/10
CPC分类号： C23C16/4404
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a ceramic-sprayed member, which reliably controls absorption and desorption of moisture; a program for carrying out the method; a storage medium; and a ceramic-sprayed member. SOLUTION: This production method comprises the steps of: immersing a ceramic-sprayed member 200 having a substrate 210 and a thermal-sprayed film 220 formed on the surface of the substrate 210 by thermal spraying, in an organic solvent containing at least one of acetone, ethyl alcohol and isopropyl alcohol, for a predetermined period of time, to remove an organic matter bonded to the thermal-sprayed film 220; and further hydrating the outer surface of the thermal-sprayed film 220, by heating the film in a furnace with an environment having a pressure of 202.65 kPa or higher, a relative humidity of 90% or higher, and a temperature between about 100°C and 300°C, for 1 to 24 hours. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决的问题：提供可靠地控制水分的吸收和解吸的陶瓷喷涂构件的制造方法; 执行该方法的程序; 存储介质; 和陶瓷喷涂部件。解决方案：该制造方法包括以下步骤：通过热喷涂将具有基板210和形成在基板210的表面上的热喷涂膜220的陶瓷喷涂部件200浸渍在至少含有丙酮，乙醇和异丙醇中的一种，预定的时间以除去与热喷涂膜220结合的有机物质; 并且通过在压力为202.65kPa或更高，相对湿度为90％或更高的环境和约100℃的温度下在炉中加热膜，进一步水合热喷涂膜220的外表面和300℃，1〜24小时。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2012067364A Thermally sprayed coating-coated member excellent in corrosion resistance and plasma erosion resistance, and method for preventing crack occurrence in thermally sprayed coating having subjected to high-energy irradiation treatment 有权
标题翻译：热喷涂涂层成员耐腐蚀性和耐等离子体腐蚀性，以及防止发生在高能辐照处理的热喷涂中的裂纹发生的方法
公开(公告)号：JP2012067364A
公开(公告)日：2012-04-05
申请号：JP2010214169
申请日：2010-09-24
申请人： Tocalo Co Ltd , トーカロ株式会社
发明人： HARADA YOSHIO , TOGOSHI KENICHIRO , YAMAZAKI MAKOTO , KOBAYASHI KEIGO , YAMAMOTO HIROSHI
IPC分类号： C23C4/18 , C23C4/10
摘要： PROBLEM TO BE SOLVED: To provide a thermally sprayed coating-coated member that is excellent in resistance against corrosion due to halogen compounds and plasma erosion and in resistance against corrosion due to a cleaning solution frequently and repeatedly used for cleaning apparatus members and is useful as a semiconductor processing apparatus member.SOLUTION: The member has an airtight remelted layer formed by a high-energy irradiation treatment conducted on a surface of a thermally sprayed coating formed using a cermet material composed of a metal and an oxide. Here, through holes present on the surface of the coated film at an initial stage of film forming are eliminated and cracks are prevented, thereby converting the surface of a top coat (thermally sprayed coating) into a cermet sprayed coating film that is substantially free of holes and is excellent in corrosion resistance and plasma erosion resistance.
摘要翻译：要解决的问题：提供一种喷涂涂层部件，其耐卤化合物的耐腐蚀性和等离子体侵蚀性以及由于清洗溶液而产生的耐腐蚀性，并且重复使用于清洗装置部件，作为半导体处理装置构件是有用的。解决方案：该构件具有通过在使用由金属和氧化物构成的金属陶瓷材料形成的热喷涂层的表面上进行高能量照射处理形成的气密重熔层。这里，消除了在成膜初期存在于涂膜表面上的通孔，并防止了裂纹，从而将表面涂层（喷镀涂层）的表面转变成基本上不含孔，耐腐蚀性和耐等离子体侵蚀性优异。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2011214150A Method and device for forming carbon film 有权
标题翻译：形成碳膜的方法和装置
公开(公告)号：JP2011214150A
公开(公告)日：2011-10-27
申请号：JP2011060666
申请日：2011-03-18
申请人： Nanotec Corp , Tocalo Co Ltd , トーカロ株式会社 , ナノテック株式会社
发明人： NAKAMORI HIDEKI , HIRATSUKA MASANORI , KOBAYASHI KEIGO
IPC分类号： C23C14/06 , C23C14/34
摘要： PROBLEM TO BE SOLVED: To provide a method and device for forming carbon film capable of forming a preferable and high-quality carbon film on the surface of material to be processed under a low-temperature environment.SOLUTION: The device for forming carbon film includes: a substrate 2 retaining the material 4 to be processed thereon in a vacuum chamber 1 which can be evacuated to a prescribed degree of vacuum and having a prescribed voltage applied by a substrate voltage-applying means 3; and a plasma generation source which turns a medium gas for discharge generation introduced into the vacuum chamber 1 into plasma based on adjusting power outputted from a pulse electric source 7 to a carbon raw material substrate 5 and discharges the plasma together with carbon raw material toward the material 4 to be processed retained by the substrate 2 from the carbon raw material substrate 5 on the carbon raw material substrate 5 oppositely arranged to the substrate 2. Thereby, the carbon film is processed and formed by the plasma discharged on the surface of the material 4 to be processed.
摘要翻译：要解决的问题：提供一种形成碳膜的方法和装置，该方法和装置能够在低温环境下在待处理材料的表面上形成优选和优质的碳膜。解决方案：用于形成碳膜的装置包括：将真空室1内的被处理材料4保持在规定的真空度并由基板电压施加单元3施加的规定电压的基板2; 以及等离子体产生源，其基于从脉冲电源7向碳原料基板5输出的调节功率，将引入真空室1的放电产生介质气体转换为等离子体，并将等离子体与碳原料一起朝向由碳素原料基板5上的碳原料基板5与基板2相对配置的被基板2保持的被处理材料4，由此，将碳膜通过在该材料的表面上排出的等离子体进行处理 4待处理。

7. 发明专利

JP2007247042A Ceramic covered member for semi-conductor machining apparatus 有权
标题翻译：半导体加工设备的陶瓷覆盖件
公开(公告)号：JP2007247042A
公开(公告)日：2007-09-27
申请号：JP2006076196
申请日：2006-03-20
申请人： Tocalo Co Ltd , Tokyo Electron Ltd , トーカロ株式会社 , 東京エレクトロン株式会社
发明人： KOBAYASHI YOSHIYUKI , MURAKAMI TAKAHIRO , HARADA YOSHIO , TAKEUCHI JUNICHI , YAMAZAKI MAKOTO , KOBAYASHI KEIGO
IPC分类号： C23C28/00 , B08B7/00 , C23C4/04 , C23C4/10 , C23C26/00 , H01L21/304 , H01L21/3065
CPC分类号： C23C28/042 , C23C4/02 , C23C4/11 , C23C4/18 , C23C26/00
摘要： PROBLEM TO BE SOLVED: To enhance durability of a member arranged in a container such as a semi-conductor machining apparatus in which plasma etching is performed under a severe corrosive environment. SOLUTION: A ceramic-covered member has a porous layer composed of a spray deposit film of IIIa group oxide in the periodic table on the surface of a metallic or non-metallic base material directly or via an undercoat layer. A secondary recrystallization layer formed through irradiation of the high energy of electron beams, laser beams or the like is deposited on the porous layer. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提高布置在诸如半导体加工装置的容器中的构件的耐久性，其中在恶劣环境下进行等离子体蚀刻。解决方案：陶瓷覆盖部件具有在金属或非金属基材的表面上直接或经由底涂层在周期表中由IIIa族氧化物的喷镀膜形成的多孔层。通过照射高能量的电子束，激光束等形成的二次再结晶层沉积在多孔层上。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2012136782A Method for modifying surface of white yttrium oxide thermal-sprayed coating, and coated member with yttrium oxide thermal-sprayed coating 有权
标题翻译：用于改性氧化铝热喷涂涂层表面的方法以及氧化锆热喷涂涂层的涂层部件
公开(公告)号：JP2012136782A
公开(公告)日：2012-07-19
申请号：JP2012093050
申请日：2012-04-16
申请人： Tocalo Co Ltd , トーカロ株式会社
发明人： HARADA YOSHIO , TAKEUCHI JUNICHI , YAMAZAKI MAKOTO , INABA MITSUHARU , KOBAYASHI KEIGO
IPC分类号： C23C4/18 , C23C4/06 , C23C4/10
摘要： PROBLEM TO BE SOLVED: To provide a technology to form a white secondarily re-crystallized layer, which gives a white, dense and smooth appearance and is excellent in plasma-erosion resistance, on the surface of yttrium oxide thermal-sprayed coating.SOLUTION: In the method, white yttrium oxide thermal-sprayed coating formed by an atmospheric plasma thermal spray method is subjected to a laser beam treatment in one kind or more of strong oxidizing gas atmosphere selected from active oxygen, ozone, and nitrous oxide so as to form white secondarily re-crystallized layer. A coated member with YOthermal-sprayed coating, having the white secondarily re-crystallized layer on the surface thereof, is also provided.
摘要翻译：要解决的问题：提供在氧化钇热喷涂层的表面上形成白色，致密和光滑的外观并具有优异的耐等离子体侵蚀性的白色二次重结晶层的技术。解决方案：在该方法中，通过大气等离子体热喷涂法形成的白色氧化钇热喷涂在一种或多种选自活性氧，臭氧和亚硝酸的强氧化气体气氛中进行激光束处理以形成白色的二次再结晶层。具有在其表面上具有白色二次再结晶层的热喷涂层的涂层部件具有Y 2 也提供。版权所有（C）2012，JPO＆INPIT

9. 发明专利

JP2012067365A Thermal spray coating member excellent in plasma erosion resistance, and method for manufacturing the same 有权
标题翻译：耐热喷涂层的热喷涂层及其制造方法
公开(公告)号：JP2012067365A
公开(公告)日：2012-04-05
申请号：JP2010214183
申请日：2010-09-24
申请人： Tocalo Co Ltd , トーカロ株式会社
发明人： HARADA YOSHIO , TOGOSHI KENICHIRO , KOBAYASHI KEIGO
IPC分类号： C23C4/04 , C23C4/08 , H01L21/205 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a cermet thermal spray coating member that is excellent in erosion resistance and is useful as a semiconductor processing apparatus member, and to provide a method for manufacturing the same.SOLUTION: A coating having a porosity of 0.4-10% and a thickness of 50-500 μm is formed by various plasma thermal spray methods using cermet thermal spray materials composed of: 10-90 mass% of a metal mainly consisting of Ni and a Ni and Cr containing Ni-based alloy; and 90-10 mass% of an oxide consisting of AlO, YOand YAG, or the likes.
摘要翻译：要解决的问题：提供一种耐蚀性优异并可用作半导体处理装置构件的金属陶瓷热喷涂构件，并提供其制造方法。解决方案：使用金属陶瓷热喷涂材料，通过各种等离子体热喷涂方法形成孔隙率为0.4-10％，厚度为50-500μm的涂层，其由以下组成的金属陶瓷热喷涂材料组成：10-90质量％的主要由 Ni和含Ni和Cr的Ni基合金; 和90〜10质量％的由Al 3 组成的氧化物，Y 2 O 3 和YAG，或类似的。版权所有（C）2012，JPO＆INPIT

10. 发明专利

JP2009185318A Thermal spray coating member having excellent appearance, and its manufacturing method 有权
标题翻译：具有优异外观的热喷涂层及其制造方法
公开(公告)号：JP2009185318A
公开(公告)日：2009-08-20
申请号：JP2008024863
申请日：2008-02-05
申请人： Tocalo Co Ltd , トーカロ株式会社
发明人： KOBAYASHI KEIGO , KUROKI NOBUYUKI , KIMURA SHIGEHARU
IPC分类号： C23C4/10 , C23C4/18
摘要： PROBLEM TO BE SOLVED: To provide a thermal spray coating member having excellent appearance which is suitable for the reaction vessel of a semiconductor machining apparatus or the like, and its manufacturing method. SOLUTION: In the thermal spray coating member having excellent appearance, the surface of a base material is covered with a thermal spray deposit film of REM oxide, and porosity of a dense structure formed in an area of ≤50 μm in depth from the outer surface of the spray deposit film is ≤1%, the dense structure is transparent or white, and roughness of the outer surface of the thermal spray deposit film is in a range of Ra 1-3 μm. COPYRIGHT: (C)2009,JPO&INPIT

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