专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2004152483A Insulation characteristics measuring instrument for thin film magnetic head assembly 有权
公开(公告)号：JP2004152483A
公开(公告)日：2004-05-27
申请号：JP2003394425
申请日：2003-11-25
申请人： Tdk Corp , Tdk株式会社
发明人： ASATANI TAKASHI , KIMURA FUJIMI , SAWAI KIYOTAKE , HASEGAWA YASUHIRO , KUWAJIMA TETSUYA
IPC分类号： G01R31/12 , G11B5/31 , G11B5/455
摘要： PROBLEM TO BE SOLVED: To provide an instrument which can measure insulation characteristics of an insulation film existing between a shield film and an electrode film without cutting a resistive film connecting the shield film and the electrode film, in a thin film magnetic head assembly. SOLUTION: This device comprises a DC power source 81 and a voltmeter 82, and measures insulation characteristics of thin film magnetic head elements included in a thin film magnetic head assembly. The DC power source 81 is provided with a cable, one end of the cable is connected to an anode and a cathode of the DC power source 81 and the other end is connected to probes 83, 84. The voltmeter 82 is provided with a cable, one end of the cable is connected to an anode and a cathode of the voltmeter 82 and the other end is connected to probes 85, 86. COPYRIGHT: (C)2004,JPO

2. 发明专利

JP2007287304A Method of forming pattern film with narrow width and thin-film magnetic head having magnetic pole layer with narrow width 审中-公开
标题翻译：具有窄宽度的薄膜的薄膜形成方法和具有窄宽度的磁性层的薄膜磁头
公开(公告)号：JP2007287304A
公开(公告)日：2007-11-01
申请号：JP2006345740
申请日：2006-12-22
申请人： Tdk Corp , Tdk株式会社
发明人： GOMI HIROTAKA , ISOBE MITSUHARU , ITO NORIYUKI , FUNADA HIROAKI , YAMANA KENJI , TERASAWA MAKOTO , HASEGAWA YASUHIRO
IPC分类号： G11B5/31
CPC分类号： G11B5/313 , G11B5/1278 , G11B5/315 , G11B5/3163 , Y10T29/49037 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： PROBLEM TO BE SOLVED: To provide a method for forming a pattern film, capable of forming a pattern film with a narrower width than the resolution of an exposure machine and a resist used independently of etching at the end. SOLUTION: The method includes the steps of: forming a base layer in the element forming surface of a substrate; forming a first frame layer having end surfaces facing each other across a space having a width W 1 on the base layer; forming a second frame layer having end surfaces facing each other across a space having a width W 2 larger than the width W 1 in the same direction as that of the width W 1 on the first frame layer, so that the space having the width W 2 is located right above the space having the width W 1 ; forming a trench-forming film provided with a trench having a minimum width W 3 smaller than the width W 1 in the same direction as that of the width W 1 so as to fill at least a part of the spaces having the width W 1 and the width W 2 respectively; and forming a pattern film so as to fill at least a part of the trench. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种形成图案膜的方法，其能够形成具有比曝光机的分辨率更窄的宽度的图案膜和在结束时独立于蚀刻使用的抗蚀剂。解决方案：该方法包括以下步骤：在衬底的元件形成表面中形成基底层; 形成具有在所述基底层上具有宽度W 1 的空间的彼此面对的端表面的第一框架层; 形成第二框架层，所述第二框架层的宽度W 1 的宽度W SB> 1 的宽度W 1 的宽度W < SB> 1 ，使得具有宽度W 2 的空间位于具有宽度W 1 的空间的正上方; 在与宽度W 1相同的方向上形成具有小于宽度W 1 的最小宽度W 3 的沟槽的沟槽形成膜以便分别填充具有宽度W 1 和宽度W 2 的空间的至少一部分; 以及形成图案膜以填充沟槽的至少一部分。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2004241087A Method for measuring guide sensor resistance value, and manufacturing method of thin-film magnetic head 有权
标题翻译：测量传感器电阻值的方法及薄膜磁头的制造方法
公开(公告)号：JP2004241087A
公开(公告)日：2004-08-26
申请号：JP2003031597
申请日：2003-02-07
申请人： Shinka Jitsugyo Kk , Tdk Corp , Tdk株式会社 , 新科實業有限公司
发明人： HASEGAWA YASUHIRO , FUKUROI OSAMU , SUGA TAKESHI , TANAKA YOSHIAKI , HORIUCHI MITSURU
IPC分类号： G11B5/39
摘要： PROBLEM TO BE SOLVED: To provide a method for measuring a guide sensor resistance value, capable of measuring the resistance value of a lapping guide formed with a magnetoresistive effect element on a substrate.
SOLUTION: A pair of probes 61 connected with a resistance measuring instrument 60 are respectively brought into contact with a pair of lead patterns 31 of the lapping guide 3, and measuring current is made to flow through the lapping guide 3. Thus, the resistance measuring instrument 60 measures the resistance value of a sensor film pattern 30, including an MR film. The intensity of a current magnetic field generated, when the current is made to flow through the lapping guide 3 is previously divided into a steep region, in which variations in the counter magnetic field variations of the resistance value of the lapping guide 3 is steeper and a slow region in which the variations are slower. A fixed current value which generates a current magnetic field belonging to the slow region among these regions is adopted as a measured current value. Thus, the variance in the resistance measured value of the lapping guide 3 is reduced, and the resistance value of the MR film 20 on a wafer can be obtained precisely.
COPYRIGHT: (C)2004,JPO&NCIPI
摘要翻译：要解决的问题：提供一种测量引导传感器电阻值的方法，其能够测量在基板上形成有磁阻效应元件的研磨导向器的电阻值。解决方案：与电阻测量仪器60连接的一对探头61分别与研磨引导件3的一对引线图案31接触，并且使测量电流流过研磨导轨3.因此，电阻测量装置60测量包括MR膜的传感器膜图案30的电阻值。当电流流过研磨引导件3时产生的电流磁场的强度预先分成陡峭的区域，其中研磨导向件3的电阻值的反磁场变化的变化更陡峭，其变化较慢的缓慢区域。采用在这些区域中产生属于慢区域的电流磁场的固定电流值作为测定电流值。因此，研磨导向件3的电阻测量值的变化减小，并且可以精确地获得晶片上的MR膜20的电阻值。版权所有（C）2004，JPO＆NCIPI

4. 发明专利

JP2006221740A Measuring method of insulation resistance in thin film magnetic head, and manufacturing method of thin film magnetic head 有权
标题翻译：薄膜磁头绝缘电阻的测量方法及薄膜磁头的制造方法
公开(公告)号：JP2006221740A
公开(公告)日：2006-08-24
申请号：JP2005034336
申请日：2005-02-10
申请人： Tdk Corp , Tdk株式会社
发明人： HASEGAWA YASUHIRO , SHIYOUJI JIYUN , YAMAGUCHI MANABU
IPC分类号： G11B5/31 , G11B5/455
摘要： PROBLEM TO BE SOLVED: To accurately measure insulation resistance of each element even when insulation resistance is measured simultaneously for a plurality of elements when a thin film magnetic head in which a substrate and a shield layer are connected is manufactured.
SOLUTION: A head element assembly has a substrate 11 and a plurality of induction type magnetic transducer elements formed on the substrate 11. The induction type magnetic transducer element has a pair of magnetic layers including an upper part magnetic layer 19 connected electrically to the substrate 11 and a coil 20 insulated and supported between them. For insulation resistance of the induction type magnetic transducer element, insulation resistance between the upper part magnetic layer 19 and the coil 20 is measured by using the upper part magnetic layer 19 side as plus and using the coil 20 side as minus and applying DC voltage simultaneously to the plurality of induction type magnetic transducer elements.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：即使当制造连接有基板和屏蔽层的薄膜磁头时，即使在多个元件同时测量绝缘电阻时，也能精确测量各元件的绝缘电阻。解决方案：头元件组件具有形成在基板11上的基板11和多个感应型磁换能器元件。感应型磁换能器元件具有一对磁性层，包括上部磁性层19，基板11和在它们之间被绝缘和支撑的线圈20。对于感应式磁换能器元件的绝缘电阻，通过使用上部磁性层19侧加上并使用线圈20侧为负并同时施加DC电压来测量上部磁性层19和线圈20之间的绝缘电阻到多个感应型磁换能器元件。版权所有（C）2006，JPO＆NCIPI

5. 发明专利

JP2002358609A THIN FILM MAGNETIC HEAD ASSEMBLY, AND METHOD AND DEVICE FOR MEASURING ITS INSULATION CHARACTERISTICS 失效
公开(公告)号：JP2002358609A
公开(公告)日：2002-12-13
申请号：JP2001165916
申请日：2001-05-31
申请人： TDK CORP
发明人： ASATANI TAKASHI , KIMURA FUJIMI , SAWAI KIYOTAKE , HASEGAWA YASUHIRO , KUWAJIMA TETSUYA
IPC分类号： G01R31/02 , G01R33/09 , G11B5/39 , G11B5/455 , H01F10/32 , H01L43/08 , H01L43/12
摘要： PROBLEM TO BE SOLVED: To provide a thin film magnetic head assembly capable of preventing deterioration or destruction of insulation in process and measuring the insulation characteristics of an insulation film existing between a shield film and an electrode film without cutting a resistance film connecting both films. SOLUTION: A first measuring terminal 51 is electrically connected through a first resistance film 61 to first and second electrode films 11 and 13, and through a second resistance film 62 to a first shield film 3. A second measuring terminal 52 is electrically connected to the first resistance film 61 in the first measuring terminal 51 side. A third measuring terminal 53 is connected to the primary resistance film 61 in the first shield film 3 side. A fourth measuring terminal 54 is electrically connected to the first shield film 3. The first to fourth measuring terminals 51 to 54 are exposed to the outside.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式