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    • 4. 发明专利
    • Vacuum exhauster
    • 真空排气
    • JPS5749082A
    • 1982-03-20
    • JP12424680
    • 1980-09-08
    • Toshiba Corp
    • KATOU SATOSHIMATSUO TOSHIYUKIMIYOSHI MOTOSUKEODAKAWA KAICHIROU
    • F04B37/16
    • PURPOSE: To improve efficiency of workability and quality in analysis and manufacture of parts requiring a high-vacuum system, by using a turbo molecular pump as a preliminary vacuum pump for a vacuum exhauster connected to a load chamber and a cryopump as a main vacuum pump.
      CONSTITUTION: When a turbo molecular pump 11 is set into operation in the state that a gate valve 6 and a valve 2 are closed but an exhaust valve 8 is opened, contaminants in a load chamber 7 is exhausted and purified sufficiently although the exhaust speed in the chamber 7 is not so high, so that preliminary evacuation of the chamber 7 is accomplished. Subsequently, when a cryopump 9 is set into operation with the valves 8, 2 being closed but the gate valve 6 being opened, the chamber 7 can be evacuated in a short while without causing contamination of liquid helium in the pump 9 since gas in the chamber 7 is purified by the preliminary evacuation and therefore the high evacuating performance of the cryopump 9 can be exerted in a stable manner. Thus, it is enabled to improve the efficiency of operation for analyzing and manufacturing semiconductors or the like in the vacuum chamber 7.
      COPYRIGHT: (C)1982,JPO&Japio
    • 目的:通过使用涡轮分子泵作为连接到负载室和低温泵作为主真空泵的真空排气器的初步真空泵,提高分析和制造需要高真空系统的部件的可加工性和质量的效率 。 构成:当涡轮分子泵11在闸阀6和阀2关闭但排气门8打开的状态下运转时,负载室7内的污染物排出并净化,尽管排气速度 室7不是很高,从而完成了室7的预抽真空。 随后,当阀门8,2关闭但闸阀6打开时,低温泵9被运行,腔室7可以在短时间内抽真空而不会引起泵9中的液氦污染,因为气体 通过预抽真空来净化室7,能够以稳定的方式发挥低温泵9的高排气性能。 因此,能够提高在真空室7中分析和制造半导体等的操作效率。
    • 5. 发明专利
    • Divided target
    • 分明的目标
    • JPS58199864A
    • 1983-11-21
    • JP8383882
    • 1982-05-18
    • Toshiba Corp
    • MATSUO TOSHIYUKIOKUMURA KATSUYA
    • C23C14/34H01L21/285
    • C23C14/3407
    • PURPOSE:To make compact an equipment for manufacturing a target used in vapor deposition or other stage and to easily cool the target, by dividing the target into two or more parts. CONSTITUTION:In the manufacture of a target used in a sputtering system vapor deposition or other stage, a fan-shaped rod is divided into two or more parts, each of the parts is conically cut to form surfaces 11 to be sputtered, and the four cut parts are combined and used as a target. Thus, the target can be manufactured simply at a low cost, and since a method for cooling the target can be simplified, defects such as the formation of blow holes can be prevented.
    • 目的:为了制造用于制造用于气相沉积或其他阶段的目标的设备,并且通过将目标分成两个或更多个部分来容易地冷却目标。 构成:在用于溅射系统气相沉积或其他阶段的靶材的制造中,将扇形棒分成两部分或更多部分,每个部分被锥形切割以形成要喷溅的表面11,并且四个 切割部件组合并用作目标。 因此,能够以低成本简单地制造目标,并且由于可以简化用于冷却目标的方法,可以防止诸如形成吹孔的缺陷。
    • 7. 发明专利
    • Wafer transfer mechanism
    • 转移机构
    • JPS5961943A
    • 1984-04-09
    • JP17276882
    • 1982-10-01
    • Toshiba Corp
    • MATSUO TOSHIYUKI
    • H01L21/677H01L21/68
    • H01L21/67706H01L21/67715
    • PURPOSE:To quickly transfer wafers under the high quality condition by providing a plurality of transfer promotion wheels on the transfer path. CONSTITUTION:The guide rails 33 provided in parallel along the transfer direction of the transfer path are curved in the form of character as in the sectional view on the opposing internal wall suface, forming a wafer accommodating groove 33a. A plurality of transfer promoting wheels 34 which are provided in such a manner that the circumferential part is exposed to the transfer surface 27 in the transfer path has the rotating function like a ball bearing and thereby smoothly transfers the wafer 24. Therefore, the wafer 24 is very smoothly supplied to the wafer accommodating part 26a utilizing the inclined condition of the heating chamber 21, feed effect by the transfer promoting wheels 34 provided on the transfer path and a weight of wafer itself 24. Thereby, the wafer can be quickly transferred under the high quality condition, ensuring improvement in productivity.
    • 目的:通过在传送路径上设置多个转印促进轮,在高质量条件下快速转印晶片。 构成:沿着传送路径的传送方向平行设置的导轨33以与相对的内壁面上的截面图相同的字符形式弯曲,形成晶片容纳槽33a。 多个转印促进轮34以这样的方式设置,使得周向部分在转印路径中暴露于转印表面27具有类似于滚珠轴承的旋转功能,从而平滑地传递晶片24.因此,晶片24 利用加热室21的倾斜状态,设置在传送路径上的传送促进轮34的进给效果和晶片本身24的重量,非常顺利地供给到晶片容纳部26a。由此,可以将晶片快速地传送到 高质量的条件,确保生产力的提高。