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1. 发明专利

JP2008309780A Fast reactor of reflector control system 有权
标题翻译：反射器控制系统的快速反应器
公开(公告)号：JP2008309780A
公开(公告)日：2008-12-25
申请号：JP2008123952
申请日：2008-05-09
申请人： Toshiba Corp , 株式会社東芝
发明人： SAKAI TOSHIRO , INATOMI TAKAYA , NAKAMURA HIROSHI , FUKAMICHI KENJIRO , SUZUKI TOSHIYUKI , HASEGAWA KATSUSHI , TSUBOI YASUSHI , KURAMOCHI SHIN
IPC分类号： G21C7/28
CPC分类号： G21C1/02 , G21C7/10 , G21C7/28 , G21C11/06 , Y02E30/34 , Y02E30/39
摘要： PROBLEM TO BE SOLVED: To provide a fast reactor of a reflector control system which is excellent in the structural integrity and manufacturability of a reflector and has high reliability.
SOLUTION: The fast reactor 20 of a reflector control system in this invention is equipped with a reactor vessel 21 accommodating a coolant 26, a core 25 located in the reactor vessel 21 and submerged in the coolant 26 and a reflector 35 placed outside the core 25 so as to move freely in the vertical directions in order to control the reactivity of the core 25. The reflector 35 has a neutron reflective section 35a in its lower part which has a higher neutron reflective capability than the coolant 26 and a cavity section 35b which is located above the neutron reflective section 35a and has lower neutron reflective capability than the coolant 26, and the cavity section 35b is composed of tubular sealing containers 60.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种反射器控制系统的快速反应器，其具有优异的反射器的结构完整性和可制造性，并且具有高可靠性。解决方案：本发明中的反射器控制系统的快速反应器20装备有容纳冷却剂26的反应器容器21，位于反应器容器21中并浸没在冷却剂26中的芯25和放置在外部的反射器35 芯25，以便在垂直方向上自由移动，以便控制芯25的反应性。反射器35在下部具有中子反射部35a，该中子反射部35a具有比冷却剂26更高的中子反射能力，部分35b位于中子反射部分35a上方并具有比冷却剂26低的中子反射能力，并且空腔部分35b由管状密封容器60组成。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2001093814A METHOD AND APPARATUS FOR ELECTRON BEAM EXPOSURE 失效
公开(公告)号：JP2001093814A
公开(公告)日：2001-04-06
申请号：JP26952399
申请日：1999-09-22
申请人： TOSHIBA MICRO ELECTRONICS , TOSHIBA CORP
发明人： SUZUKI TOSHIYUKI
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To avoid accumulation of charges on the surface of a wafer. SOLUTION: There are provided a 1st exposure step S101, in which a resist layer is exposed by using electron beam scanning technology, a transfer step S102 in which an electron gun is transferred to a position which is not adjacent to the present position, a decision step S103 in which it is decided whether all the surface is scanned, and a 2nd exposure step S104 in which parts to be exposed among blank parts are exposed.

3. 发明专利

JPH11109071A HIGH-SPEED BREEDER REACTOR AND DECOMPOSITION DEVICE OF ITS REACTOR CORE UPPER MECHANISM 失效
公开(公告)号：JPH11109071A
公开(公告)日：1999-04-23
申请号：JP27112397
申请日：1997-10-03
申请人： TOSHIBA CORP
发明人： SUZUKI TOSHIYUKI , SUEZONO CHIYOUICHI
IPC分类号： G21C1/02 , G21C19/02
摘要： PROBLEM TO BE SOLVED: To eliminate the need of a rotary plug and to miniaturize a reactor vessel, by setting a reactor core upper mechanism to a decomposition type or pickup type. SOLUTION: In a high-speed breeder reactor 20, a reactor core 23 and a cooling material 26 are accommodated in a reactor vessel 21. An upper lid 33 for forming a cover gas boundary 34 is provided at the upper portion of the reactor vessel 21, and a reactor core upper mechanism 36 is installed at the upper lid 33 so that it can be pulled freely. A control rod drive mechanism is mounted to the reactor core upper mechanism 36, at the same time a fuel exchange machine that calm be installed at the decomposition region of the reactor core upper mechanism 36 is provided, and a fuel being loaded into the reactor core 23 can be exchanged by the fuel exchange machine. An operation floor 40 is positioned at the upper portion of the upper lid 33, a cylindrical storage container 45 is installed airtightly on the operation floor 40 via a door valve device 41, and the pulled reactor core upper mechanism 36 can be accommodated.

4. 发明专利

JPH04306047A TELEPHONE SET USED FOR DATA COMMUNICATION EQUIPMENT 失效
公开(公告)号：JPH04306047A
公开(公告)日：1992-10-28
申请号：JP7012291
申请日：1991-04-02
申请人： TOSHIBA CORP , TOSHIBA AVE KK
发明人： SUZUKI TOSHIYUKI
IPC分类号： H04M1/00 , H04M11/00
摘要： PURPOSE:To operate a ringer of a called station only to a call signal of a talking object and to avoid useless reply by detecting a call signal of a communication equipment with a signal detection circuit and controlling a pseudo call tone generating circuit and the ringer with a controller. CONSTITUTION:When a CNG detection circuit 1e detects a facsimile call signal CNG in a call signal from a controller NCU 1a, the circuit 1e gives the detection signal to a microcomputer 1g. The microcomputer 1g generates a control signal to interrupt a DC circuit of an exchange 2 and connects a facsimile equipment 3 to a telephone set 1 to set the state that a facsimile signal is receptible. Then a pseudo call signal of a pseudo call tone generating circuit 1b is outputted from a speaker 1d to inform the arrival of a call to a recipient of a called station. When the recipient replies the call, a speed control circuit 1f detects hook-off, generates a control signal to stop the circuit 1b and a ringer 1c thereby giving a signal from a caller of a call station to a handset 1i and establishing the talking between the caller station and the called station.

5. 发明专利

JPH0471220A MASK FOR MANUFACTURING SEMICONDUCTOR DEVICE, EXPOSING METHOD USING SAME, SPINNER FOR MANUFACTURING SAME, AND ACCOMMODATING VESSEL FOR ACCOMMODATING SAME 失效
公开(公告)号：JPH0471220A
公开(公告)日：1992-03-05
申请号：JP18462090
申请日：1990-07-12
申请人： TOSHIBA CORP , TOSHIBA MICRO ELECTRONICS
发明人： SUZUKI TOSHIYUKI
IPC分类号： H01L21/027 , G03F7/20
摘要： PURPOSE:To obtain a mask for manufacturing a semiconductor device which mask is capable of preventing charge and an accommodating vessel for the mask, by a method wherein, on a conducting film, at least one portion exposing said film is formed, a resin film is spread, and the exposed portion is turned into an electrode. CONSTITUTION:On the surface of a light transparent plate 10, a chromium film 12 having light shielding properties and electric conductivity is formed. A portion 16 where a part of the chromium film 12 is exposed is formed, and photoresit 14 sensitive to an electron beam is spread. A mask blank 20 having the portion 16 where the chromium film 12 is exposed is mounted on a specimen stand 22 of an electron beam lithography equipment 21, and irradiated with the electron beam, thereby performing image drawing exposure. At this time, the portion 16 where the chromium film is exposed is brought into contact with an electrode 28 grounded to the specimen stand 22. When the mask blank 20 is accommodated, the portion 16 where the chromium mask is exposed is brought into contact with an electrode 72.

6. 发明专利

JPH03183118A METHOD AND APPARATUS FOR ELECTRON BEAM EXPOSURE 失效
公开(公告)号：JPH03183118A
公开(公告)日：1991-08-09
申请号：JP32222589
申请日：1989-12-12
申请人： TOSHIBA CORP , TOSHIBA MICRO ELECTRONICS
发明人： SUZUKI TOSHIYUKI
IPC分类号： H01L21/30 , H01J37/304 , H01J37/317 , H01L21/027
摘要： PURPOSE:To prevent an irregularity in a pattern size due to a fog exposure by a method wherein, when mask blank is irradiated with an electron beam, a beam current is reduced gradually toward a peripheral part more susceptible to the fog exposure than in the central part on the surface of the mask blank. CONSTITUTION:A data 1a, for exposure pattern use, which is stored in a magnetic tape 1 is input to a disk 3; by using the data, a CPU 4 controls an exposure operation by an electron beam which is output from an electron gun 101. An EOS(electro-optical system) control part 5 adjusts a focusing operation of a beam current or changes a grid bias value inside the electron gun 101 in order to control the magnitude of the beam current. In this case, the EOS control part 5 controls the beam current in such a way that the current is reduced gradually more toward a peripheral part than in the central part of a mask blank 109. Consequently, the dose of the electron beam is reduced more toward the peripheral part susceptible to a fog exposure. As a result, the mask blank is exposed uniformly over its whole region.

7. 发明专利

JPS63281097A FUEL LOADING AND UNLOADING DEVICE 失效
公开(公告)号：JPS63281097A
公开(公告)日：1988-11-17
申请号：JP11451287
申请日：1987-05-13
申请人： TOSHIBA CORP
发明人： SUZUKI TOSHIYUKI
IPC分类号： G21C19/32 , H02H5/00
摘要： PURPOSE:To prevent overheating of spent fuel by providing cooling fins consisting of a shape memory alloy to a slant guide line disposed between a reactor vessel and out-of-reactor junction chamber. CONSTITUTION:The hollow slant guide pipe 22 is disposed through a through- hole 21 of a roof slab 20. The cooling fins 26 consisting of the shape memory alloy are projected into a gas space 22a and are disposed circumferentially at plural points. A two-way Ni-Ti base alloy or the like is used as the shape memory alloy and the transformation temp. thereof is about 150-200 deg.C. The temp. of a bucket 24 is raised by the decay heat of the spent fuel and the gas in the space 22a is heated when the bucket 24 contg. the spent fuel stops in the position of the slab 20. Then fins 26 are deformed and elongated to come into contact with the outside of a rail 23 on rising of the gas temp. up to about 150-200 deg.C. The radiation area of natural convection is expanded by contact of the fins 26 with the outside of the rail 23 in such a manner. The natural convection from the inside and outside surfaces of the fins 26 and the guide pipe 22 are then effected and the overheating of the spent fuel is prevented.

8. 发明专利

JPS62235596A SPENT FUEL PROCESSING SYSTEM OF FAST BREEDER REACTOR 失效
公开(公告)号：JPS62235596A
公开(公告)日：1987-10-15
申请号：JP7979186
申请日：1986-04-07
申请人： TOSHIBA CORP , FUJI ELECTRIC CO LTD
发明人： SUZUKI TOSHIYUKI , ENDO SHIGEKI
IPC分类号： G21C19/02 , G21C19/32

9. 发明专利

JPS58177535A Optical detector 失效
标题翻译：光学检测器
公开(公告)号：JPS58177535A
公开(公告)日：1983-10-18
申请号：JP5956682
申请日：1982-04-12
申请人： Toshiba Corp
发明人： SUZUKI TOSHIYUKI
IPC分类号： G11B11/10 , G11B7/135 , G11B11/105
CPC分类号： G11B7/1381
摘要： PURPOSE:To increase the density of information recorded on an information carrier by specifying the diameter of a slit below the wavelength of light and positioning the slit at distance less than the wavelength of the light from the information carrier from which information is read. CONSTITUTION:The optical detector consisting of a lens 2 for converging a light beam 1 for reading information such as a laser beam and an intermediate plate 5 which has the fine slit 6 and cuts off the light except at the slit is arranged at distance l1 less than the wavelength lambda of the light from the information carrier 3. In this system, the diameter of the slit 6 and distance l1 are specified below the wavelength of the light to obtain the diameter d2 of the light beam on the information carrier which is less than the wavelength of the light, e.g. lambda/2-lambda/10. A right figure shows an enlarged slit part and the light beam passed through the slit 6 diverges gradually because of diffraction, so the diameter d2 of the light beam on the information carrier is greater than the diameter d0 of the slit, but its expansion is about l1.
摘要翻译：目的：通过指定光波长以下的狭缝的直径，将狭缝的距离设定为小于从信息载体读取信息的波长的距离，来增加记录在信息载体上的信息密度。构成：由用于会聚用于读取诸如激光束的信息的光束1的透镜2和具有细缝6的中间板5并且切断除狭缝之外的光的光学检测器被设置在距离l1以下比来自信息载体3的光的波长λ更小。在该系统中，狭缝6的直径和距离l1被指定在光的波长以下，以获得信息载体上的光束的直径d2，其小于比光的波长，例如 λ/ 2-lambda / 10。右图示出了放大的狭缝部分，并且穿过狭缝6的光束由于衍射而逐渐发散，因此信息载体上的光束的直径d2大于狭缝的直径d0，但是其扩展约为 l1。

10. 发明专利

JP2014199216A 反射体駆動装置审中-公开
标题翻译：反射器驱动
公开(公告)号：JP2014199216A
公开(公告)日：2014-10-23
申请号：JP2013074962
申请日：2013-03-29
申请人：株式会社東芝 , Toshiba Corp
发明人： HONDA YUKI , YAMAUCHI HIROYUKI , SUZUKI TOSHIYUKI , INATOMI TAKANARI , MATSUMIYA HISATO , TAKAHASHI HIROSHI , KOMAI MASAFUMI , KASAI SHIGEO
IPC分类号： G21C7/28 , G21C1/02
CPC分类号： Y02E30/34 , Y02E30/39
摘要：【課題】従来よりも小型化可能な反射体駆動装置を提供。【解決手段】反射体駆動装置7は、反射体3と連結した駆動軸8と結合されるアーマチュア13とアーマチュア13を介して反射体3を高速で昇降させる高速反射体駆動部Aと超微速で昇降させる超微速反射体駆動部Bとを筐体9内に収容する。超微速反射体駆動部Bは、アーマチュア13を連結させる連結用電磁石12とベース板11の表面に電磁吸引力によって吸着されて超微速反射体駆動部Bを摩擦力で保持する壁面電磁石10とを備える。筐体9は、側面内壁に沿ってベース板11を有する。そして、筐体9の内部または下方に、超微速反射体駆動部Bが把持する反射体3の正味重量を低減させる低減手段20を具備する。【選択図】図1
摘要翻译：要解决的问题：提供能够比常规方式小型化的反射器驱动。解决方案：反射器驱动器7容纳在壳体9中，电枢13联接到连接到反射器3的驱动轴8，高速反射器用于提升高反射体3的驱动部分A和用于通过电枢13以超低速提升反射体3的超慢反射器驱动部分B.超慢反射器驱动部分B包括：连接电磁体 12，用于连接电枢13; 以及通过电磁吸引力吸收到基板11的表面并通过摩擦力保持超慢反射器驱动部分B的壁面电磁体10。壳体9具有沿着侧壁的基板11。在壳体9的内侧或下侧，设有减速装置20，用于减小由超慢反射器驱动部分B夹持的反射器3的净重。

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