专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPH09184689A MORTAR APPLYING DEVICE FOR UPPER NOZZLE FOR CASTING 失效
公开(公告)号：JPH09184689A
公开(公告)日：1997-07-15
申请号：JP35251395
申请日：1995-12-28
申请人： TOSHIBA CERAMICS CO , SUMITOMO METAL IND
发明人： KANAI YUICHI , SAITO MASAYUKI , IGARASHI HIDEKI , ASAI MASAMICHI , MIURA HIROYUKI , KUBO YOSHIKAZU , MINAMINOSONO NOBUTAKE
IPC分类号： F27D1/16
摘要： PROBLEM TO BE SOLVED: To change the thickness of a mortal layer applied on the surface of outer circumference of an upper nozzle adequately by providing a nozzle moving means that is movable in the direction of up and down of the upper nozzle that is arranged to a turntable or approaching or separating from the upper nozzle. SOLUTION: The edge part of the applying nozzle 10 of an applying nozzle main body that is set at point P1 is moved at low speed to a point P2 injecting mortar and applies a predetermined quantity of mortar. When the applying nozzle 10 reaches the point P2 , the rising or moving of the applying nozzle 10 and the injection of mortar are stopped and the applying nozzle 10 retreats to a point P3 horizontally. After the retreat, the applying nozzle 10 descends to a point P keeping the state of stopping the injection of mortar. Then, the applying nozzle 10 moves from the point P4 to a point P5 at low speed injecting mortar, applies the predetermined quantity of mortar, moves from the point P5 to a point P6 at high speed and applies the predetermined quantity of mortar. As the result of this, the outer circumference on an introducing side is coated with mortar thickly and the discharging side is coated with mortar thinly.

2. 发明专利

JPH08335559A WAFER-BOARD CARRYING JIG MADE OF QUARTZ GLASS 失效
公开(公告)号：JPH08335559A
公开(公告)日：1996-12-17
申请号：JP18700796
申请日：1996-06-28
申请人： TOSHIBA CERAMICS CO
发明人： SAITO MASAYUKI , ABE SHIGERU , KUMAKURA MAKOTO
IPC分类号： B65G49/07 , H01L21/22 , H01L21/677 , H01L21/68
摘要： PURPOSE: To increase a mechanical strength by making a wall thickness larger at the portion where the bending moment of a wafer board holding portion becomes the largest and its neighboring portion over a particular portion of the overall length of the wafer board holding portion, and also giving essentially the same thickness in the potion other than said particular portion. CONSTITUTION: A thick wall portion 3 is formed at A (a boundary between a straight line and a circular arc of a notched portion having a longitudinal cross section with a circular arc shape and a straight line shape) where the bending moment becomes the largest in a wafer board holding portion 2 and its vicinity. Also, the length of the thick wall portion is set to about 1/4 to 1/2 of the overall length of the wafer board holding portion and located toward the tip portion from the vicinity of the portion A where the maximum bending moment occurs. As stated above, the portion where the bending moment of the wafer board holding portion 2 becomes the largest and its vicinity have a larger wall thickness compared to other portions, so that any breakage and bending of the wafer board holding portion 2 can be prevented and moreover deflection at the tip of the wafer board holding portion 2 can be decreased.

3. 发明专利

JPH0468771B2 失效
公开(公告)号：JPH0468771B2
公开(公告)日：1992-11-04
申请号：JP22546683
申请日：1983-12-01
申请人： TOSHIBA CERAMICS CO
发明人： SAITO MASAYUKI , ABE SHIGERU
IPC分类号： H01L21/31 , H01L21/22 , H01L21/673

4. 发明专利

JPH04304147A ELECTRIC BRUSH 失效
公开(公告)号：JPH04304147A
公开(公告)日：1992-10-27
申请号：JP13373591
申请日：1991-03-29
申请人： TOSHIBA CERAMICS CO
发明人： KATO TOSHIMASA , SAITO MASAYUKI , WATANABE SHIGETOSHI , ITO HIROSHI
IPC分类号： H01R39/26 , H02K13/00
摘要： PURPOSE:To reduce rough loss of a commutator of a motor to reduce wear of an electric brush due to a spark by alleviating a vibration to be applied to the brush due to an eccentricity or an uneven part of the commutator. CONSTITUTION:A groove 9 is formed on a wear plate 8 to be provided on electric split brushes 1, 2 through a vibration insulating element 6. The groove 9 is directed in the split direction of the brushes 1, 2. The groove 9 is formed to allow the brushes 1, 2 to move in a direction of an arrow Y without restriction by the wear plate 8.

5. 发明专利

JPH0450734B2 失效
公开(公告)号：JPH0450734B2
公开(公告)日：1992-08-17
申请号：JP337083
申请日：1983-01-14
申请人： TOSHIBA CERAMICS CO
发明人： UESHIMA NOBUYUKI , SAITO MASAYUKI , KIMURA HARUKI , ABE SHIGERU
IPC分类号： C03B20/00 , C03B32/00 , C03C1/02 , C03C3/06 , C30B25/08 , H01L21/00 , H01L21/22

6. 发明专利

JPS6447245A METAL GRAPHITE BRUSH MATERIAL 失效
公开(公告)号：JPS6447245A
公开(公告)日：1989-02-21
申请号：JP20125087
申请日：1987-08-12
申请人： TOSHIBA CERAMICS CO
发明人： ITO HIROSHI , SAITO MASAYUKI , KATO TOSHIMASA , MIYASHITA MASANORI
IPC分类号： H02K13/00 , H01R39/26
摘要： PURPOSE:To reduce wear and to decrease a specific resistance and contact resistance by setting the occupying ratio of graphite particle powder having 200-2000mum of grain size at the time of pressure molding to 900% or more. CONSTITUTION:Graphite particle powder 12 is dispersively disposed on a metal base material 11 made of metal, such as copper or silver on a metal graphite brush material 10. The powder 12 is formed by kneading natural or artificial graphite together with suitable binder (thermoplastic resin, thermosetting resin or tar pitch, etc.), drying the mixture and granulating it by a suitable granulating machine. The powder 12 has grain size distribution of 200-2000mum at this time. Thus, graphite particles can be rigidly bonded by a binding agent to suppress the removal of the particles and the wear. When the same amount of graphite is employed, its specific resistance and contact resistance can be reduced.

7. 发明专利

JPS6333078B2 失效
公开(公告)号：JPS6333078B2
公开(公告)日：1988-07-04
申请号：JP13126485
申请日：1985-06-17
申请人： TOSHIBA CERAMICS CO
发明人： SAITO MASAYUKI , KUMAKURA MAKOTO , ABE SHIGERU
IPC分类号： F27D3/12 , C03B20/00 , C03C3/06 , H01L21/22 , H01L21/67 , H01L21/68

8. 发明专利

JP2577585B2 失效
公开(公告)号：JP2577585B2
公开(公告)日：1997-02-05
申请号：JP29741887
申请日：1987-11-27
申请人： TOSHIBA CERAMICS CO
发明人： MATSUO HIDEYASU , SAITO MASAYUKI
IPC分类号： C03B20/00 , C03B19/09

9. 发明专利

JPH07169708A MANUFACTURE OF QUARTZ GLASS WAFER BOAT CARRYING JIG 失效
公开(公告)号：JPH07169708A
公开(公告)日：1995-07-04
申请号：JP31428694
申请日：1994-11-25
申请人： TOSHIBA CERAMICS CO
发明人： SAITO MASAYUKI , ABE SHIGERU , KUMAKURA MAKOTO
IPC分类号： B65G49/07 , H01L21/22 , H01L21/677 , H01L21/68
摘要： PURPOSE:To increase the mechanical strength of the part of a wafer boat carrying section where the bending moment becomes the maximum by controlling the length of the part and its vicinity to a specific ratio to the total length of the holding section and making the thickness of the part ticker than that of the other part by a thickening method. CONSTITUTION:The thickness of each part of a wafer boat carrying jig is set in such a way that the thickness of its main body 1 is set at about 4.5mm and that of the front end portion of its wafer boat holding section 2 is set at about 4.5mm, and then, that of its thick section 3 is set at about 7.5mm. The thick section 3 is formed by a thickening method. In addition, the length of the thick section 3 is controlled to about 1/4 to 1/2 of the total length of the holding section 2 and the section 3 is provided toward the front end from a point near the part A where the bending moment becomes the maximum.

10. 发明专利

JPH05301731A 失效
公开(公告)号：JPH05301731A
公开(公告)日：1993-11-16
申请号：JP12533692
申请日：1992-04-20
申请人： TOSHIBA CERAMICS CO
发明人： UESHIMA NOBUYUKI , SAITO MASAYUKI , KIMURA HARUKI , ABE SHIGERU
IPC分类号： C03B20/00 , C03B32/00 , C03C1/02 , C03C3/06 , C30B25/08 , H01L21/00 , H01L21/22
摘要： PURPOSE:To obtain a quartz glass resistant to devitrification and deformation even after the use over a long period. CONSTITUTION:A solid quartz glass is produced by melting and solidifying a natural quartz crystal. A DC voltage of 10-50kV is applied to the solid quartz glass under heating to effect the migration of alkali metals and copper in the solid quartz glass and obtain a quartz glass having alkali metal (Na, K and Li) contents of =10 poise at 1200 deg.C.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式