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1. 发明专利

JP2002173467A METHOD FOR PRODUCING ACRYLIC MONOMER COMPRISING TERTIARY ESTER 失效
公开(公告)号：JP2002173467A
公开(公告)日：2002-06-21
申请号：JP2000371231
申请日：2000-12-06
申请人： TORAY INDUSTRIES
发明人： NIO HIROYUKI , TAMURA KAZUTAKA
IPC分类号： G03F7/039 , C07C67/14 , C07C69/54 , C07C69/653 , C07C71/00 , C08F20/16 , C08K5/00 , C08L33/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method for easily producing in high yield an acrylic monomer comprising a tertiary ester, and to provide a polymer for a positive- type radiation-sensitive composition by the use of the acrylic monomer, and to provide the positive-type radiation-sensitive composition. SOLUTION: This method for producing an acrylic monomer comprising a tertiary ester comprises reaction between a tertiary alcohol and an α- substituted or nonsubstituted acrylic acid chloride prepared by the reaction between an α-substituted or nonsubstituted acrylic acid and oxalyl chloride, or comprises reaction between a metal alkoxide of the general formula 2 or 3 (R4 to R9 are each independently a 1-20C organic group) and an α-substituted or nonsubstituted acrylic acid chloride prepared by reaction between an α- substituted or nonsubstituted acrylic acid and oxalyl chloride.

2. 发明专利

JP2002156761A POSITIVE RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR MANUFACTURING RESIST PATTERN BY USING THE SAME 失效
公开(公告)号：JP2002156761A
公开(公告)日：2002-05-31
申请号：JP2000352489
申请日：2000-11-20
申请人： TORAY INDUSTRIES
发明人： NIO HIROYUKI , TAMURA KAZUTAKA , SENOO MASAHIDE
IPC分类号： G03F7/039 , C08L25/18 , C08L33/14 , C08L101/06 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To obtain a positive radiation-sensitive composition having high sensitivity and high resolution for making sub-quarter micron pattern processing possible. SOLUTION: The positive radiation sensitive composition contains (a) an alkali-soluble resin with the alkali-soluble groups protected with acid releasing groups and (b) an acid producing agent, which produces acids by irradiation of radiation. The acid leaving groups of (a) have at least one phenolic hydroxyl group or have the phenolic hydroxyl group protected by an acid releasing group.

3. 发明专利

JP2001194790A POSITIVE TYPE RADIATION SENSITIVE COMPOSITION 失效
公开(公告)号：JP2001194790A
公开(公告)日：2001-07-19
申请号：JP2000004306
申请日：2000-01-13
申请人： TORAY INDUSTRIES
发明人： TAMURA KAZUTAKA , NIO HIROYUKI , OBAYASHI GENTARO
IPC分类号： H01L21/027 , G03F7/039
摘要： PROBLEM TO BE SOLVED: To obtain a high sensitivity positive type radiation sensitive composition having such resolution as to attain sub-quarter-micron patterning. SOLUTION: The positive type radiation sensitive composition contains a polymer containing a structural unit of formula 1 (where X is fluorine-containing alkyl; and A is a monovalent organic group having tertiary carbon combined to oxygen and containing an aromatic ring) and an acid generating agent which generates an acid when irradiated.

4. 发明专利

JP2001100403A POSITIVE TYPE RADIATION SENSITIVE COMPOSITION AND PRODUCTION OF RESIST PATTERN USING SAME 失效
公开(公告)号：JP2001100403A
公开(公告)日：2001-04-13
申请号：JP27633099
申请日：1999-09-29
申请人： TORAY INDUSTRIES
发明人： NIO HIROYUKI , TAMURA KAZUTAKA , OBAYASHI GENTARO
IPC分类号： H01L21/027 , G03F7/004 , G03F7/033 , G03F7/039 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To obtain a positive type radiation sensitive composition having high sensitivity and such resolution as to attain sub-quarter-micron patterning. SOLUTION: The positive type radiation sensitive composition contains a polymer containing a structural unit of formula 1 and an acid generating agent which generates an acid when irradiated. In the formula 1, X is halogen or cyano and R is an acid decomposable organic group containing at least one structure of formula 2 (where R1 and R2 are each alkyl, aryl, arylalkyl, alkoxyalkyl, alkoxyaryl, alkoxyarylalkyl, hydroxyalkyl, hydroxyaryl, hydroxyarylalkyl or the like, R1 and R2 may form a ring structure by ring closure, R3 is a 1-12C organic group and (m) is 0 or 1).

5. 发明专利

JP2000227660A POSITIVE RADIATION-SENSITIVE COMPOSITION 失效
公开(公告)号：JP2000227660A
公开(公告)日：2000-08-15
申请号：JP32389499
申请日：1999-11-15
申请人： TORAY INDUSTRIES
发明人： TAMURA KAZUTAKA , OBAYASHI GENTARO
IPC分类号： H01L21/027 , G03F7/039
摘要： PROBLEM TO BE SOLVED: To provide the positive radiation-sensitive composition having a resolution capable of microfabricating a subquarter micron pattern and high sensitivity by incorporating a polymer having specified structural units and a compound to be allowed to generate an acid by irradiation with radiation. SOLUTION: This composition contains the acid generator capable of generating an acid by irradiation with activated rays and the polymer having the structural units each represented by the formula in which X is a halogen atom, such as I, Br, Cl, or F, or a cyano group; Z is an O atom or an imino group; R is a primary or secondary 1-10C alkylene group, embodied by methylene, ethylene, or trimethylene; and A is an aryl group having at least one group to be decomposed and solubilized in alkali by action of an acid, especially preferably, an H atom of a phenolic hydroxyl group substituted by an acid- removing group.

6. 发明专利

JPH10326012A POSITIVE RADIATION SENSITIVE COMPOSITION 失效
公开(公告)号：JPH10326012A
公开(公告)日：1998-12-08
申请号：JP7740698
申请日：1998-03-25
申请人： TORAY INDUSTRIES
发明人： TAMURA KAZUTAKA , NIO HIROYUKI , KANATSUKI SHIGEYOSHI
IPC分类号： G03F7/022 , G03F7/023 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To obtain the positive radiation sensitive composition high in sensitivity and contrast by incorporating a specified phenol resin. SOLUTION: This positive radiation sensitive composition is composed essentially of a novolak resin obtained by condensing a substituted phenol with an aldehyde compound, and a quinonediazido compound obtained by reaction of a polyphenol compound with a 1,2-naphthoquinonediazido-4-(or -5) sulfonylchloride, and a phenolnovolak resin comprising a unit having 2 nuclei in an amount of 1-10 weight%, and a unit having 3 nuclei in an amount of >=20 weight% unit, and a unit having 4 nuclei in an amount of 5-20 weight%. It is preferred that the weight ratio of the 3-nuclei compd. to the 4-nuclei compd. is 2-15 and the substituted phenol is cresol, and the polyphenol compound is alkylpyrogallol.

7. 发明专利

JPH04172456A DAMPEN WATER-FREE ORIGINAL PLATE FOR LITHOGRAPHY 失效
公开(公告)号：JPH04172456A
公开(公告)日：1992-06-19
申请号：JP30139290
申请日：1990-11-06
申请人： TORAY INDUSTRIES
发明人： TAMURA KAZUTAKA , MORI YOICHI
IPC分类号： G03F7/004 , G03F7/00
摘要： PURPOSE:To obtain an original plate for printing which can be easily developed and in which the adhesive strength between a silicon rubber layer and a sensitive layer is strong and whose printing resistance is enhanced by using as components of the sensitive layer a polymer having hydroxyl group in its side chain and an alkanoyl oxyboron compound. CONSTITUTION:In a dampen water-free plate for lithography having a silicon rubber layer and a sensitive layer provided on a base in this sequence, the sensitive layer contains as its components a polymer having hydroxyl group in its side chain, and an alkanoyl oxyboron compound. Any polymer can be used as the one used in the sensitive layer and containing hydroxyl group in its side chain only if it allows transmission of a sufficient amount of light of the same sensitive wave length as a sensitizing group contained in the sensitive layer, and polymers of ethylene unsaturated compounds, polyurethane, polyester, polyamide and the like can be mentioned as examples of the structure of the main chain of the polymer. The side chain of the polymer which has hydroxyl group is normally a hydroxyl group itself or a univalent organic group having at least one hydroxyl group. Additionally, an alkanoyl oxyboron compound is contained as an essential component in the sensitive layer and the amount by which the compound is added is desirably 0.5 to 50 wt% or more desirably 1 to 30 wt% of the total components of the amount of sensitization.

8. 发明专利

JPH04172455A DAMPEN WATER-FREE ORIGINAL PLATE FOR LITHOGRAPHY 失效
公开(公告)号：JPH04172455A
公开(公告)日：1992-06-19
申请号：JP30139190
申请日：1990-11-06
申请人： TORAY INDUSTRIES
发明人： TAMURA KAZUTAKA , MORI YOICHI
IPC分类号： G03F7/004 , G03F7/00 , G03F7/032
摘要： PURPOSE:To obtain an original plate for printing which can be easily developed and in which the adhesive strength between a silicon rubber layer and a sensitive layer is strong and whose printing resistance is enhanced by using as the component of the sensitive layer a polymer having boron atoms in its side chain. CONSTITUTION:In a dampen water-free plate for lithography having a silicon rubber layer and a sensitive layer provided on a base in this sequence, the sensitive layer contains a polymer component having boron atoms in its side chain. Any polymer can be used as the one used in the sensitive layer and containing boron atoms in its side chain only if it allows transmission of a sufficient amount of light of the same sensitive wave length as a sensitizing group contained in the sensitive layer and various structures can be used as that of the main chain of the polymer. As examples of the main chain structure, polymers of ethylene unsaturated compounds, polyurethane, polyester, polyamide and the like can be mentioned. The amount of boron contained in the polymer is desirably 0.5 to 90 mol% or more desirably 1 to 50 mol% as the ratio of a monomer unit containing boron to the total monomer unit contained in the polymer.

9. 发明专利

JPH03176140A PREPARATION OF LAMINATE 失效
公开(公告)号：JPH03176140A
公开(公告)日：1991-07-31
申请号：JP31732289
申请日：1989-12-05
申请人： TORAY INDUSTRIES
发明人： TAMURA KAZUTAKA , MORI YOICHI
IPC分类号： B32B25/08
摘要： PURPOSE:To simply laminate a polymer to a silicone rubber layer by adding a fluorine-containing compound selecting from a fluorine-containing surfactant, a fluorine-containing polymer and a fluorine-containing solvent in a polymer coating solution. CONSTITUTION:When a laminate of silicone rubber and a polymer is obtained by coating a silicone rubber layer with a polymer solution, at least one kind of a fluorine-containing compound selected from a fluorine-containing surfactant, a fluorine-containing polymer and a fluorine-containing solvent is contained in the polymer solution. As the polymer applied to the silicone rubber layer, for example, polyacrylate, polymethacrylate, polyester, polyester or a copolymer thereof are designated. When the laminate is used as a printing plate, a photosensitive resin composition is used as the polymer applied to the silicone rubber layer. In this case, the under surface of the silicone rubber layer is lined with a support to form a printing plate.

10. 发明专利

JP2003255536A POSITIVE RADIATION-SENSITIVE COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN USING THE SAME 审中-公开
公开(公告)号：JP2003255536A
公开(公告)日：2003-09-10
申请号：JP2002051347
申请日：2002-02-27
申请人： TORAY INDUSTRIES
发明人： NIO HIROYUKI , TAMURA KAZUTAKA , OGUSHI MASAMITSU
IPC分类号： G03F7/039 , C08F30/08 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To obtain a positive radiation-sensitive composition having such a resolution as to enable sub-quater micron patterning and having high sensitivity and high dry etching resistance. SOLUTION: The positive radiation-sensitive composition comprises (a1) a polymer containing a structural unit represented by formula (1) (where R 1 is H, a 1-4C alkyl, cyano or halogen; X is arylene; R 2 and R 3 are each alkyl, silylalkyl, substituted alkyl or the like; and R 4 -R 6 are each H, alkyl or aryl) and (b) an acid generator which generates an acid upon irradiation with a radiation or the positive radiation-sensitive composition comprises (a2) a polymer containing a structural unit represented by formula (2) (where R 7 is H, a 1-4C alkyl, cyano or halogen; Y is a single bond or alkylene; R 8 is an aromatic ring; R 9 is alkyl, silylalkyl, substituted alkyl or the like; and R 10 -R 12 are each H, alkyl or aryl) and (b) the acid generator which generates an acid upon irradiation with a radiation. A method for producing a resist pattern using these is provided. COPYRIGHT: (C)2003,JPO

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