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1. 发明专利

JPH10326012A POSITIVE RADIATION SENSITIVE COMPOSITION 失效
公开(公告)号：JPH10326012A
公开(公告)日：1998-12-08
申请号：JP7740698
申请日：1998-03-25
申请人： TORAY INDUSTRIES
发明人： TAMURA KAZUTAKA , NIO HIROYUKI , KANATSUKI SHIGEYOSHI
IPC分类号： G03F7/022 , G03F7/023 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To obtain the positive radiation sensitive composition high in sensitivity and contrast by incorporating a specified phenol resin. SOLUTION: This positive radiation sensitive composition is composed essentially of a novolak resin obtained by condensing a substituted phenol with an aldehyde compound, and a quinonediazido compound obtained by reaction of a polyphenol compound with a 1,2-naphthoquinonediazido-4-(or -5) sulfonylchloride, and a phenolnovolak resin comprising a unit having 2 nuclei in an amount of 1-10 weight%, and a unit having 3 nuclei in an amount of >=20 weight% unit, and a unit having 4 nuclei in an amount of 5-20 weight%. It is preferred that the weight ratio of the 3-nuclei compd. to the 4-nuclei compd. is 2-15 and the substituted phenol is cresol, and the polyphenol compound is alkylpyrogallol.

2. 发明专利

JPH0958756A CONSERVATION METHOD OF RESIST COATED FILM 失效
公开(公告)号：JPH0958756A
公开(公告)日：1997-03-04
申请号：JP21069195
申请日：1995-08-18
申请人： TORAY INDUSTRIES
发明人： TAMURA KAZUTAKA , KANATSUKI SHIGEYOSHI , TACHIBANA YASUKO
IPC分类号： G03F7/022 , B65D81/20 , G03F7/16
摘要： PROBLEM TO BE SOLVED: To prevent a change with the passage of time in photomask blank coated with a resist film, by cutting off the preserving atmosphere of a resist film obtained by applying a resist including an alkali-soluble resin and a 1,2-quinone diazide compound on a base body and drying it, from the outside atmosphere. SOLUTION: In a conservation method of a resist coated film obtained by applying a resist including an alkali-soluble resin and a 1,2-quinone diazide compound on a base body and drying it, the preserving atmosphere is substantially cut off from the outside atmosphere or an adsorbent is put in the preserving atmosphere. The outside atmosphere means an atmosphere in the outside space partitioned from the preserving space of the resist coated film. And the preverving atmosphere means the atmosphere of the inside of the preserving case or the inside atmosphere enveloping the preserving case. It is preferable to use a hermetically sealing container or a highly air-tight bag sealed at the opening, in order to cut off the preserving atmosphere from the outside atmosphere. Active carbon, silica gel, etc., are available for the adsorbent.

3. 发明专利

JPH09221601A PRODUCTION OF RADIATION SENSITIVE RESIST COMPOSITION 失效
公开(公告)号：JPH09221601A
公开(公告)日：1997-08-26
申请号：JP3050496
申请日：1996-02-19
申请人： TORAY INDUSTRIES
发明人： KANATSUKI SHIGEYOSHI , TAMURA KAZUTAKA
IPC分类号： G03F7/022 , C08K5/22 , C08K5/28 , C08L101/00 , G03F7/023
摘要： PROBLEM TO BE SOLVED: To obtain a radiation sensitive resist composition extremely suppressing the deposition of a crystalline extraneous material based on the radiation sensitive compound and the generation of fine solid particle generated in storage, by preparing the concentration of the alkali soluble resin lower than the prescribed value. SOLUTION: This composition is obtained by containing (A) an alkali soluble resin (preferably; novolac resin), (B) a radiation sensitive compound (preferably; 1,2-naphthoquinonediazide compound) and (C) a solvent and preparing the composition having the concentration of the component (A) lower than the prescribed concentration in the first stage, and adding component (A) to the prescribed concentration in the second stage. Between the first stage and the second stage the composition is filtered, and the component (A) is, preferably, added by using the solution of component (A) in the second stage.

4. 发明专利

JPH11352676A POSITIVE RADIOSENSITIVE RESIST COMPOSITION AND PRODUCTION OF RESIST PATTERN USING THE SAME 失效
公开(公告)号：JPH11352676A
公开(公告)日：1999-12-24
申请号：JP8417999
申请日：1999-03-26
申请人： TORAY INDUSTRIES
发明人： NIO HIROYUKI , TAMURA KAZUTAKA , KANATSUKI SHIGEYOSHI
IPC分类号： H01L21/027 , G03F7/004 , G03F7/022
摘要： PROBLEM TO BE SOLVED: To provide a high sensitive positive radiosensitive resist composition capable of forming a high precise pattern in the positive radiosensitive resist composition consisting essentially of novolak resin and quinone diazide photosensitive agent. SOLUTION: The positive radiosensitive resist composition containing the novolak resin, the quinone diaxide compound and at least >=1 kinds of compounds expressed by general formula (1) as the essential components and a producing method of the resist pattern using the same are provided. Where in the formula, each of R and R represents one of hydrogen atom, 1-15C linear, branched or cyclic alkyl group, aryl group, aralkyl group and R represents one of hydrogen atom, 1-15C linear or branched alkyl group, aryl group, aralkyl group or amino group. One produced by the cyclization of R and R or R and R is included.

5. 发明专利

JPH086261A DEVELOPER FOR RADIATION SENSITIVE RESIST 失效
公开(公告)号：JPH086261A
公开(公告)日：1996-01-12
申请号：JP9383095
申请日：1995-04-19
申请人： TORAY INDUSTRIES
发明人： TAMURA KAZUTAKA , KANATSUKI SHIGEYOSHI , ASANO MASAYA
IPC分类号： G03F7/32 , H01L21/027
摘要： PURPOSE:To obtain a developer capable of performing uniform development with high sensitivity, high resolution and a satisfactory pattern shape without leaving residue and especially effective in developing a positive type radiation sensitive resist based on a quinonediazido compd. and novolak resin after patternwise exposure with electron beams. CONSTITUTION:This developer contains alkali metal ions, weak acid radical ions and a water-soluble org. compd. The concn. (a) of the alkali metal is 0.05-0.5mol/kg, the relations of 0.075

6. 发明专利

JP2004012659A METHOD FOR PRODUCING HEAT RESISTANT RESIN PRECURSOR COMPOSITION AND METHOD FOR PRODUCING MONOMER FOR HEAT RESISTANT RESIN PRECURSOR COMPOSITION 审中-公开
公开(公告)号：JP2004012659A
公开(公告)日：2004-01-15
申请号：JP2002163999
申请日：2002-06-05
申请人： TORAY INDUSTRIES
发明人： KANATSUKI SHIGEYOSHI , TOMIKAWA MASAO
IPC分类号： G03F7/037 , C07D307/89 , C08G69/26 , G03F7/004 , G03F7/022
摘要： PROBLEM TO BE SOLVED: To provide a method for synthesizing a heat resistant resin precursor composition having a low chlorine ion content and a photosensitive heat resistant resin precursor composition. SOLUTION: In the method for producing a heat resistant resin precursor composition, when an acid anhydride represented by formula (1) is synthesized, an anhydrous tricarboxylic acid monochloride and a hydroxydiamino compound as starting materials for the acid anhydride are dehydrochlorinated using a metal oxide and/or a metal carbonate containing ≤1 wt.%, in total, of Na, K, Zn, Li, Fe, Ni, Cr, Cu, Mn, Cd and Sb, and then the resulting acid anhydride is reacted with a diamine compound represented by formula (2) wherein R7 and R9 are each a 2-30C trivalent organic group; R8 is a 2-30C trivalent organic group; and q is an integer of 1-4; R10 is 2-30 divalent organic group. COPYRIGHT: (C)2004,JPO

7. 发明专利

JP2001066777A POSITIVE TYPE RADIATION SENSITIVE COMPOSITION 失效
公开(公告)号：JP2001066777A
公开(公告)日：2001-03-16
申请号：JP24189999
申请日：1999-08-27
申请人： TORAY INDUSTRIES
发明人： KANATSUKI SHIGEYOSHI , TAMURA KAZUTAKA , OBAYASHI GENTARO
IPC分类号： H01L21/027 , G03F7/004 , G03F7/027 , G03F7/039
摘要： PROBLEM TO BE SOLVED: To obtain a positive type radiation sensitive composition, having high resolution and high sensitivity by using a polymer containing the units of a specified acrylic ester monomer and an acid-generating agent which generates an acid, when irradiated. SOLUTION: This radiation sensitive composition contains a polymer- containing structural units of a formula and an acid generating agent which generates an acid, when it is irradiated. In the formula, X is a halogen or cyano group, Z is O atom or imino group, R1 is a single bond or a 1-10C alkylene in which C combined with Z is primary or secondary, A is a 6-18C arylene, R2 is a single bond or a 1-10C alkylene, in which C combined with A is primary or secondary and R3 is a group which is decomposed by the action of an acid, released and replaced by H. Since an acid-generating agent is added to the polymer containing the monomer units of the ester of acrylic acid, pattern formation by a chemical amplification mechanism is attained, and pattern having high sensitivity and high resolution pattern is obtained.

8. 发明专利

JPH117137A DEVELOPING SOLUTION FOR RADIATION SENSITIVE RESIST 失效
公开(公告)号：JPH117137A
公开(公告)日：1999-01-12
申请号：JP15889497
申请日：1997-06-16
申请人： TORAY INDUSTRIES
发明人： NIO HIROYUKI , TAMURA KAZUTAKA , KANATSUKI SHIGEYOSHI
IPC分类号： G03F7/32 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To obtain the developing solution for developing the radiation sensitive resist with high contrast by incorporating an aldehyde and alkali metal ions. SOLUTION: This developing solution for the radiation sensitive resist containing the aldehyde and the alkali metal ions, generally, such as Na or K ions, or a combination of them, thus permitting contrast to be enhanced. The aldehyde can be embodied by various kinds of aldehydes, and a combination of aldehydes, but preferable ones to be used are represented by the formula in which R is an H atom or an alkyl or hydroxyalkyl or aralkyl group. It is especially preferred to use the aliphatic aldehydes.

9. 发明专利

JPH06348019A RADIATION SENSITIVE RESIST COMPOSITION 失效
公开(公告)号：JPH06348019A
公开(公告)日：1994-12-22
申请号：JP13846293
申请日：1993-06-10
申请人： TORAY INDUSTRIES
发明人： KATAOKA MUTSUO , KANATSUKI SHIGEYOSHI , OOSETO HIROKI
IPC分类号： G03F7/023 , G03F7/031 , G03F7/039 , H01L21/027
摘要： PURPOSE:To provide a positive radiation sensitive resist compsn. excellent in dry etching resistance, having high sensitivity and hardly generating scum to a resist profile. CONSTITUTION:This radiation sensitive resist compsn. contains an alkali-soluble resin, 1,2-naphthoquinonediazido-4-sulfonic ester or 1,2-naphthoquinonediazido-5- sulfonic ester and carboxyindene-3-sulfonic ester or carboxyindene-4-sulfonic ester.

10. 发明专利

JPH06348018A RADIATION SENSITIVE RESIST COMPOSITION 失效
公开(公告)号：JPH06348018A
公开(公告)日：1994-12-22
申请号：JP13846193
申请日：1993-06-10
申请人： TORAY INDUSTRIES
发明人： KATAOKA MUTSUO , KANATSUKI SHIGEYOSHI , OOSETO HIROKI
IPC分类号： G03F7/023 , G03F7/031 , G03F7/039 , H01L21/027
摘要： PURPOSE:To provide a positive radiation sensitive resist compsn. excellent in dry etching resistance and resolution and having high sensitivity. CONSTITUTION:This radiation sensitive resist compsn. contains an alkali-soluble resin and ester consisting of 2,3,4,4'-tetrahydroxybenzophenone and 1,2- naphthoquinonediazido-4-sulfonic acid and having >=99wt.% total content of mono-, di- and triesters.

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