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1. 发明专利

JPH0927458A VACUUM PROCESSING EQUIPMENT 失效
公开(公告)号：JPH0927458A
公开(公告)日：1997-01-28
申请号：JP19612295
申请日：1995-07-07
申请人： TOKYO ELECTRON LTD , TEL YAMANISHI KK
发明人： HAYASHI KAZUICHI , IWATA TERUO
IPC分类号： H01L21/302 , F04B37/06 , F04C29/00 , F04D19/04 , F04D29/58 , H01L21/205 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To prevent the adhesion of reaction products in a vacuum pump containing a rotor for use in vacuum processing for semiconductor wafers. SOLUTION: An exhaust pipe 31, a drag pump 4, an exhaust pipe 32, a trap 71 and a dry pump 72 are connected to a processing chamber 2. Tape heaters 66 are wound around the circumference of the exhaust pipes 31, 32. The drag pump 4 is provided with a resistance heating element on the inside surface of a rectifying plate opposed to the side of a rotor and a resistance heating element on the top of a mesh plate opposed to the top of the rotor. During processing, the inside surfaces of the exhaust pipes 31, 32 and the outside surface of the rotor are heated by means of the tape heaters 66 and the resistance heating elements, and their temperature is thereby increased to a value higher than the deposition temperature of reaction products. As a result, the reaction products are passed in the form of gas through the exhaust pipes 31, 32 and the drag pump 4, and captured and collected in the trap 71.

2. 发明专利

JP2005228889A Film forming device 有权
标题翻译：电影制作装置
公开(公告)号：JP2005228889A
公开(公告)日：2005-08-25
申请号：JP2004035527
申请日：2004-02-12
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： IWATA TERUO , AMIKURA MANABU , FUTAMURA MUNEHISA , TAKAHASHI TAKESHI
IPC分类号： C23C16/00 , C23C16/34 , C23C16/40 , C23C16/448 , H01L21/205 , H01L21/31
CPC分类号： C23C16/4486 , C23C16/34 , C23C16/401 , C23C16/405
摘要： PROBLEM TO BE SOLVED: To provide a film forming device, capable of suppressing an occurrence of particles by stabilizing a vaporized state or a supply state of liquified raw materials. SOLUTION: The film forming device 100 has a raw material supply system 110 for supplying a liquified raw material LM, a carburetor 120 for vaporizing the liquified raw material to generate a raw material gas, and a film-forming chamber 132 for forming a film, by introducing the raw material gas supplied from the carburetor. The carburetor has a spray means, equipped with a spray nozzle 121 spraying the liquified raw material, a vaporization chamber 122 for vaporizing the liquified raw material sprayed by the spray means to generate the raw material gas, a heat means for heating the vaporization chamber, and an outlet 123 leading out the raw material gas from the vaporization chamber. The vaporization chamber has a shape with extending in the spray direction by the spray means. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决的问题：提供一种能够通过使液化原料的蒸发状态或供给状态稳定来抑制颗粒发生的成膜装置。解决方案：成膜装置100具有用于供给液化原料LM的原料供给系统110，用于蒸发液化原料以生成原料气体的化油器120，以及成膜室通过引入从化油器供应的原料气体的薄膜。化油器具有喷雾装置，其具有喷射液化原料的喷嘴121，用于蒸发由喷雾装置喷射的液化原料以产生原料气体的蒸发室122，用于加热蒸发室的加热装置，以及从蒸发室引出原料气体的出口123。蒸发室具有通过喷雾装置在喷雾方向上延伸的形状。版权所有（C）2005，JPO＆NCIPI

3. 发明专利

JP2000346238A VALVE 失效
公开(公告)号：JP2000346238A
公开(公告)日：2000-12-15
申请号：JP15554099
申请日：1999-06-02
申请人： TOKYO ELECTRON LTD
发明人： IWATA TERUO
IPC分类号： F16K3/02 , F16K31/122 , F16K41/10
摘要： PROBLEM TO BE SOLVED: To certainly prevent corrosion of a sealing system, cutting off a valve main body from a driving system, and the driving system, to certainly prevent defective operation caused by particles when fine grains are included in gas, and to prevent vacuum break of a piping line and gas leakage. SOLUTION: This valve 10 is provided with a valve body 12 vertically moving in a valve main body 11 to open/close a gas port 11A; a rod 14 penetrating a through-hole 11B of the valve main body 11 and connecting the valve body 12 and a cylinder 13 outside of the valve main body 11 so as to drive the valve body 12 to open/close; and bellows 15 closing a clearance between the rod 14 and the through-hole 11B. A second valve body 17 is attached to the rod 14, which closes the through-hole 11 from the inside of the valve main body 11 when a flow passage 11A is opened by the valve body 12.

4. 发明专利

JP2000290777A GAS TREATING DEVICE, BUFFLE MEMBER, AND GAS TREATING METHOD 失效
公开(公告)号：JP2000290777A
公开(公告)日：2000-10-17
申请号：JP10034199
申请日：1999-04-07
申请人： TOKYO ELECTRON LTD
发明人： KOMIYA TARO , YONENAGA TOMIHIRO , IWATA TERUO , KASAI SHIGERU
IPC分类号： H01L21/302 , C23C14/24 , C23C16/44 , C23C16/455 , H01J37/32 , H01L21/205 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To provide a gas treating device capable of uniformly feeding gas to the whole face of the surface of a body to be treated, to provide a gas treating method, and to provide a buffle board used for the device and method. SOLUTION: This gas treating device is provided with an air-tightly composed treating chamber, a gas introducing tube 3 connected to the treating chamber, a gas feeding source feeding gas to the inside of the treating chamber via the gas introducing tube 3, a placing stand arranged in the treating chamber 2 and placed with a wafer, a shower head 8 provided at the gas outlet 3a of the gas introducing tube 3, and in which the injecting side is faced to the side of the placing stand, discharging boards 9 in which many discharging holes 10 composing bulkheads on the side of the placing stand in the shower head 10 are pierced and buffle boards 11 arranged on the space between the discharging boards 9 and the gas outlet 3a of the gas introducing tube 3, and in which many through holes 12 are pierced. The through hole 12 is composed of the one with different sizes consisting of an upper hole part 13 formed on the side of the gas introducing tube 3 and a lower hole part 14 expansively opened from the upper hole part 13 toward the side of the discharging board 9.

5. 发明专利

JPH111773A DISCHARGE DEVICE AND DISCHARGE METHOD 失效
公开(公告)号：JPH111773A
公开(公告)日：1999-01-06
申请号：JP16487997
申请日：1997-06-09
申请人： TOKYO ELECTRON LTD
发明人： IWATA TERUO , FUJIKAWA YUICHIRO , HORIUCHI TAKASHI , HAYASHI KAZUICHI
IPC分类号： C23C16/44 , C23C16/455 , H01L21/285 , H01L21/31
摘要： PROBLEM TO BE SOLVED: To provide a discharge device which eliminates the need for stopping the device at the time of maintenance of a trap used at the time of cleaning and eliminates the possibility of the occurrence of the chemical reaction of a reaction product in the trap when the trap is removed and a discharge method therefor. SOLUTION: This device includes a chamber 1 for housing a substrate, a deposition gas introducing system for introducing the deposition gas into this chamber 1, a cleaning gas introducing system for introducing the cleaning gas into the chamber 1 and a discharge system 9 for discharging the inside of the chamber 1. The discharge system 9 has a main discharge line 31, a discharge pump 33 disposed at this main discharge line 31, a bypass line 32 for bypassing the main discharge line 31, the trap 34 disposed at this bypass line 32, valves 37, 38 for vacuum sealing of the inside of the trap 34, gas supplying systems 40, 41 for sealing the gas to the front stage part and rear stage part of the trap 34 of the bypass line 32, a valve 35 for opening and closing the main discharge line and a valve 36 for opening and closing the bypass line.

6. 发明专利

JPH06300436A GAS PURIFYING METHOD 失效
公开(公告)号：JPH06300436A
公开(公告)日：1994-10-28
申请号：JP8212693
申请日：1993-04-08
申请人： TOKYO ELECTRON LTD
发明人： IKEDA TORU , SASAKI YOSHIAKI , IWATA TERUO
IPC分类号： F25J3/08 , H01L21/302 , H01L21/3065
摘要： PURPOSE:To provide a gas purifying method capable of simply obtaining high purity gas. CONSTITUTION:A gas container 20 filled with CO2 is disposed in a refrigerant tank 21, and a valve 24 is opened to supply a refrigerant in the refrigerant tank 21 and hereby cool the CO2 in the gas container 20. When the CO2 in the gas container 20 is converted to dry ice, the valve 29 is opened. Hereby, a turbo molecular pump 27 and a rotary pump 28 forms a vacuum in the refrigerant tank 21. Therefore, impurity gas such as oxygen, nitrogen, and argon in the gas container 20 is exhausted.

7. 发明专利

JPH05288666A 失效
公开(公告)号：JPH05288666A
公开(公告)日：1993-11-02
申请号：JP11538892
申请日：1992-04-08
申请人： TOKYO ELECTRON LTD
发明人： IWATA TERUO , IKEDA TORU
IPC分类号： G01N13/00 , G01N15/08
摘要： PURPOSE:To obtain an effective method for estimating the effective surface area of an arbitrary body. CONSTITUTION:A sample 10 is inputted into a main chamber 20, which is evacuated to the specified vacuum degree, e.g. 1X10 Torr, and mounted on a stage 22. A thermocouple 32 is brought into contact with the sample 10. Electric power is supplied into heaters 30. The heating temperature of the sample 10 is increased in proportion to, e.g. time, with a temperature control means 40. The quantities of gases (mainly H20), which are discharged from the sample 10 at each heating temperature, are measured with ion gages 44 and a spectrum analyzing system 46, espectively. The effective surface area of the sample 10 is compared and estimated based on the discharged quantity of H20, which is obtained during the specified time period.

8. 发明专利

JPH05190497A PURGING GAS INTRODUCING DEVICE FOR INCREASING PRESSURE OF PRESSURE REDUCING APPARATUS 失效
公开(公告)号：JPH05190497A
公开(公告)日：1993-07-30
申请号：JP2478192
申请日：1992-01-13
申请人： TOKYO ELECTRON LTD
发明人： IKEDA TORU , IWATA TERUO
IPC分类号： H01L21/302 , H01L21/205 , H01L21/3065
摘要： PURPOSE:To eliminate dew-condensation on an outer wall of a supply tube for introducing purging gas into a pressure reducing apparatus, to prevent contamination of a facility environment and to increase an exhausting efficiency in the apparatus. CONSTITUTION:After a supply tube 30 for communicating a purging gas supply source with a pressure reducing apparatus is passed to cooling means 32, it is disposed in temperature raising means 34 to heat the gas in the tube 30 cooled by the means 32 at least to the vicinity of the ambient temperature by the means 34, thereby preventing dew-condensation on an outer wall of the tube due to a temperature difference between the interior and the exterior of the tube. The introduced gas is dried to facilitate exhausting of impurities adhered to the inner wall of the apparatus.

9. 发明专利

JPH02251739A APPARATUS FOR MEASURING GAS DISCHARGING QUANTITY 失效
公开(公告)号：JPH02251739A
公开(公告)日：1990-10-09
申请号：JP7264389
申请日：1989-03-25
申请人： TOKYO ELECTRON LTD
发明人： SHINDO NAOKI , IWATA TERUO , SHIMURA KAZUE
IPC分类号： G01N7/00
摘要： PURPOSE:To make it possible to measure accurately the discharge quantity of a gas which is discharged from a body to be measured even if the discharge quantity of the gas discharged from the body to be measured is minute by providing a gate valve between second and first airtight containers. CONSTITUTION:A vacuum chamber 2 (second airtight container) and a differential pressure detecting vacuum chamber 5 (first airtight container) wherein an orifice 9 is provided in a flow path are connected through a gate valve 12. In the gate valve 12, a vacuum sealing part is formed by bringing a member, on which a silver film is deposited into contact. The gate valve 12 is connected to a turbo-molecular pump 3 and a rotary pump 4 through a valve 13. The surrounding part of a valve body 22 in a case 21 of the gate valve 12 is constituted so that evacuation can be performed. In this way, the quantity of gas molecules which are discharged from the apparatus itself can be reduced. Even if the discharge quantity of the gas discharged from the body to be measured is minute, the discharge quantity of the gas discharged from the body to be measured can be accurately measured.

10. 发明专利

JP2010219292A Film forming method 审中-公开
标题翻译：电影制作方法
公开(公告)号：JP2010219292A
公开(公告)日：2010-09-30
申请号：JP2009064300
申请日：2009-03-17
申请人： Tokyo Electron Ltd , 東京エレクトロン株式会社
发明人： IWATA TERUO
IPC分类号： H01L21/316
摘要： PROBLEM TO BE SOLVED: To provide a film forming method capable of reducing variations in a film thickness between substrates when forming a prescribed film by vaporizing and supplying a liquid film forming raw material containing an organic metal compound.
SOLUTION: In the film forming method of forming a metal-containing film on a substrate by vaporizing a film forming raw material composed by diluting a hydrolytic organic metal compound with a solvent in a vaporizer and supplying the vaporized film forming raw material onto the substrate, a moisture content in the film forming raw material to be supplied to the vaporizer is turned to such an amount that the amount of hydrolysate generated by reaction with the organic metal compound does not practically clog a film forming raw material supply system including the vaporizer.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种成膜方法，其能够通过蒸发并供给含有有机金属化合物的液体成膜原料来形成规定的膜时能够降低基板之间的膜厚度的变化。解决方案：在通过在蒸发器中蒸发由溶剂稀释水解有机金属化合物构成的成膜原料并将蒸发的成膜原料供给到气相成膜原料上的基板上形成含金属膜的成膜方法中基板将要供给到蒸发器的成膜原料中的水分含量变成使得与有机金属化合物反应产生的水解产物的量实际上不会堵塞包含该有机金属化合物的成膜原料供给系统蒸发器。版权所有（C）2010，JPO＆INPIT

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