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1. 发明专利

JP2011158897A Method for producing resist pattern 审中-公开
标题翻译：生产电阻图案的方法
公开(公告)号：JP2011158897A
公开(公告)日：2011-08-18
申请号：JP2010284208
申请日：2010-12-21
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： HATA MITSUHIRO , HAH JUNG-HWAN
IPC分类号： G03F7/40 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a resist pattern for forming a preferable pattern by a double-patterning process.
SOLUTION: The present invention relates to the method for producing the photoresist pattern by a double-patterning process of forming a second resist pattern on a first resist pattern, wherein the second resist composition contains a resin, having an acid-labile group and insoluble or hardly soluble with an alkali aqueous solution, and reacting with an acid to be dissolved in an alkali aqueous solution, and at least one kind of photo-acid generator selected from among the group consisting of a photoacid generator represented by formula (I) and a photoacid generator represented by formula (II).
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：解决的问题：提供通过双重图案化工艺制造用于形成优选图案的抗蚀剂图案的方法。解决方案：本发明涉及通过在第一抗蚀剂图案上形成第二抗蚀剂图案的双重图案化工艺来制造光致抗蚀剂图案的方法，其中第二抗蚀剂组合物含有具有酸不稳定基团的树脂并且与碱性水溶液不溶或难溶，并与要溶解在碱性水溶液中的酸反应，以及选自由式（I）表示的光酸产生剂中的至少一种光酸产生剂）和由式（II）表示的光致酸产生剂。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2012168519A Resist composition 审中-公开
标题翻译：耐腐蚀组合物
公开(公告)号：JP2012168519A
公开(公告)日：2012-09-06
申请号：JP2012013744
申请日：2012-01-26
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： YAMAGUCHI NORIFUMI , HAH JUNG-HWAN
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition which can obtain a resist pattern having excellent focus margin.SOLUTION: The resist composition includes resin that contains a group unstable to an acid, is insoluble or difficult-soluble in an aqueous alkali solution, and acts with an acid to be dissolved in the aqueous alkali solution, an acid generator, a quencher including sulfonium salt or iodonium salt, and a solvent including cyclohexanone.
摘要翻译：要解决的问题：提供可以获得具有优异聚焦余量的抗蚀剂图案的抗蚀剂组合物。解决方案：抗蚀剂组合物包含含有对酸不稳定的基团的树脂，在碱性水溶液中不溶或难溶，并与酸溶解在碱水溶液中，酸产生剂，猝灭剂，包括锍盐或碘鎓盐，以及包括环己酮的溶剂。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2011123480A Resist composition 审中-公开
标题翻译：耐腐蚀组合物
公开(公告)号：JP2011123480A
公开(公告)日：2011-06-23
申请号：JP2010242475
申请日：2010-10-28
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： ICHIKAWA KOJI , HASHIMOTO KAZUHIKO , HAH JUNG-HWAN
IPC分类号： G03F7/039 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： PROBLEM TO BE SOLVED: To obtain a resist pattern having excellent CD uniformity and focus margin. SOLUTION: The resist composition includes: a resin including a structural unit derived from a compound represented by the formula (I) being insoluble or poorly soluble in the aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid; and an acid generator represented by the formula (II). In the formulae, R 1 represents a fluorine-containing alkyl group, R 2 represents a hydrogen atom or a methyl group, and A represents a divalent saturated hydrocarbon group, wherein Q 1 and Q 2 each independently represents a fluorine atom or a perfluoroalkyl group; X 1 represents a divalent saturated hydrocarbon group in which -CH 2 - can be replaced by -O- or -CO-; Y 1 represents an aliphatic hydrocarbon group, a saturated cyclic hydrocarbon group or an aromatic hydrocarbon group, wherein the saturated cyclic hydrocarbon and the aromatic hydrocarbon group can be replaced, and -CH 2 - can be replaced by -O- or -CO-; Z + represents an organic counter cation. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：获得具有优异的CD均匀性和聚焦余量的抗蚀剂图案。抗蚀剂组合物包括：树脂，其包含衍生自由式（I）表示的化合物的结构单元，其在碱性水溶液中不溶或难溶，但是可溶于碱水溶液中酸; 和由式（II）表示的酸发生剂。在式中，R SP 1表示含氟烷基，R SP 2表示氢原子或甲基，A表示二价饱和烃基，其中Q 1 和Q 2 各自独立地表示氟原子或全氟烷基; X 1 表示二价饱和烃基，其中-CH 2可以被-O-或-CO-代替; Y 1表示脂肪族烃基，饱和环状烃基或芳香族烃基，其中饱和环状烃和芳香族烃基可以被取代，-CH 2 - 可以被-O-或-CO-取代; Z + 表示有机抗衡阳离子。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2011085814A Resist composition and pattern forming method 审中-公开
标题翻译：耐蚀组合物和图案形成方法
公开(公告)号：JP2011085814A
公开(公告)日：2011-04-28
申请号：JP2009239650
申请日：2009-10-16
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： ICHIKAWA KOJI , HAH JUNG-HWAN , MUKAI YUICHI
IPC分类号： G03F7/039 , C08F20/10 , C08F20/26 , C08F20/38 , G03F7/004 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition which shows high resolution, good configuration, a depth of focus (DOF), a good mask error factor (MEF) and good CD uniformity (CDU). SOLUTION: The resist composition comprises a resin comprising repeating units derived from compounds represented by formulae (I) and (II), wherein R 1 and R 3 represent H, halogen-substituted alkyl or the like; T represents an alicyclic hydrocarbon group which may be substituted by halogen, hydroxyl, alkyl, alkoxy or the like, provided that -CH 2 - contained in the group is replaced with one -SO 2 - and may further be displaced by -CO-, -O- or the like; Z 1 represents a saturated hydrocarbon group which may have a substituent, provided that -CH 2 - contained in the group may be replaced with -CO-, -O- or the like; R 4 and R 5 represent H, methyl or the like; and R 6 represents 1-6C alkyl or the like. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供显示高分辨率，良好的配置，焦深（DOF），良好的掩模误差因子（MEF）和良好的CD均匀性（CDU）的抗蚀剂组合物。抗蚀剂组合物包含含有衍生自由式（I）和（II）表示的化合物的重复单元的树脂，其中R 1 和R 3 表示H ，卤素取代的烷基等; T表示可以被卤素，羟基，烷基，烷氧基等取代的脂环族烃基，条件是该基团中所含的-CH 2 S 2 -S-被-S- / SB> - 并且可以进一步被-CO-，-O-等置换; Z 1 表示可以具有取代基的饱和烃基，条件是该基团中所含的-CH 2 S 2 - 可以被-CO-，-O-或喜欢; R 4 和R 5 表示H，甲基等; R 6表示1-6C烷基等。版权所有（C）2011，JPO＆INPIT

5. 发明专利

JP2012168518A Resist composition 审中-公开
标题翻译：耐腐蚀组合物
公开(公告)号：JP2012168518A
公开(公告)日：2012-09-06
申请号：JP2012013743
申请日：2012-01-26
申请人： Sumitomo Chemical Co Ltd , 住友化学株式会社
发明人： YAMAGUCHI NORIFUMI , HAH JUNG-HWAN
IPC分类号： G03F7/004 , C08F220/18 , G03F7/039 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a resist composition which can obtain a resist pattern having excellent focus margin.SOLUTION: The resist composition includes resin that contains a group unstable to an acid, is insoluble or difficult-soluble in an aqueous alkali solution, and acts with an acid to be dissolved in the aqueous alkali solution, an acid generator, a quencher, and an organic solvent, in which the organic solvent includes four or more organic solvents different from one another and at least one of the four or more organic solvents different from one another is a cyclic ketone-based organic solvent.

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