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1. 发明专利

JP2006049363A Stencil mask and stencil mask blank 有权
标题翻译： STENCIL MASK和STENCIL MASK BLANK
公开(公告)号：JP2006049363A
公开(公告)日：2006-02-16
申请号：JP2004224220
申请日：2004-07-30
申请人： Sony Corp , Toppan Printing Co Ltd , ソニー株式会社 , 凸版印刷株式会社
发明人： YOTSUI KENTA , SUMITA TOMOYA , SUZUKI MANABU , EGUCHI HIDEYUKI , TAMURA AKIRA , IWASE KAZUYA , NOHAMA SHIYOUJI , MORIYA SHIGERU , KITAGAWA TETSUYA , NAKANO HIROYUKI
IPC分类号： H01L21/027 , G03F1/50 , G03F1/68
摘要： PROBLEM TO BE SOLVED: To provide a stencil mask, along with stencil mask blanks, capable of easily determining an etching condition. SOLUTION: A difference between a maximum value and a minimum value of two-dimensional aspect ratio 2DAR, where 2DAR=ä(ARx 2 +ARy 2 )/2} 1/2 , in a plurality of membrane divisions, is 1.5 or less. Here, ARx is aspect ratio (=Tz/Lx) of thickness Tz of a substrate which is dug by etching in Z-axis direction against length Lx in X-axis direction of the opening to be a membrane division: ARy is aspect ratio (=Tz/Ly) of thickness Tz of substrate dug by etching in Z-axis direction against length Ly in Y-direction of the opening to be a membrane division: and thickness of substrate Tz corresponds to the height of a support frame or beam. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供能够容易地确定蚀刻条件的模板掩模以及模板掩模坯料。解决方案：2DAR =ä（ARx 2 + ARy 2 ）/ 2的二维宽高比2DAR的最大值和最小值之间的差异在多个膜分割中， 1/2 为1.5以下。这里，ARx是通过在Z轴方向上通过蚀刻在开口的X轴方向上的长度Lx在Z轴方向上蚀刻的基板的厚度Tz的纵横比（= Tz / Lx）成为膜分割：ARy是纵横比在Z轴方向上通过蚀刻Z轴方向的长度L y作为膜分割的开口的Y方向，衬底Tz的厚度Tz = Tz / Ly），衬底Tz的厚度对应于支撑框架或梁的高度。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2006049339A Mask pattern allocating method, mask manufacturing method and program, and mask 有权
标题翻译：掩模图案分配方法，掩模制造方法与程序和掩模
公开(公告)号：JP2006049339A
公开(公告)日：2006-02-16
申请号：JP2004223635
申请日：2004-07-30
申请人： Sony Corp , Toppan Printing Co Ltd , ソニー株式会社 , 凸版印刷株式会社
发明人： IWASE KAZUYA , YOTSUI KENTA , SUMITA TOMOYA , ITOU KOUJIROU , TAMURA AKIRA
IPC分类号： H01L21/027 , G03F1/20
摘要： PROBLEM TO BE SOLVED: To provide a pattern allocating method and a program thereof for obtaining a pattern allocation without influence on formation of a mask pattern even when a partially defective thin film is formed, also to provide a mask manufacturing method to form a mask pattern including the pattern allocation explained above, and to provide a mask which has been manufactured with the relevant mask manufacturing method. SOLUTION: A region including a failure in formation of a membrane is identified previously as the region inhibiting pattern allocation. A pattern allocation enabling formation of a mask pattern can be obtained by extracting a re-allocation object pattern 44 allocated within the pattern allocation inhibiting region (step ST3), and then reallocating the same pattern to the other mask region (step ST4) after complementary division and allocation to each mask region of the pattern are completed (step ST1, ST2), even if a region difficult for pattern formation exists in a mask blanks. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供一种图案分配方法及其程序，用于获得图案分配，而不影响掩模图案的形成，即使形成部分缺陷的薄膜，也提供掩模制造方法来形成包括上述图案分配的掩模图案，并提供已经用相关的掩模制造方法制造的掩模。解决方案：先前将包括膜形成失败的区域识别为区域抑制图案分配。可以通过提取在图案分配禁止区域内分配的重新分配对象图案44，获得能够形成掩模图案的模式分配（步骤ST3），然后在互补之后将相同图案重新分配给另一掩模区域（步骤ST4）完成图案的每个掩模区域的划分和分配（步骤ST1，ST2），即使在掩模坯料中存在难以进行图案形成的区域。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2006049362A Stencil mask and stencil mask blank 有权
标题翻译： STENCIL MASK和STENCIL MASK BLANK
公开(公告)号：JP2006049362A
公开(公告)日：2006-02-16
申请号：JP2004224219
申请日：2004-07-30
申请人： Sony Corp , Toppan Printing Co Ltd , ソニー株式会社 , 凸版印刷株式会社
发明人： YOTSUI KENTA , SUMITA TOMOYA , SUZUKI MANABU , EGUCHI HIDEYUKI , TAMURA AKIRA , IWASE KAZUYA , NOHAMA SHIYOUJI , MORIYA SHIGERU , KITAGAWA TETSUYA , NAKANO HIROYUKI
IPC分类号： H01L21/027 , G03F1/50 , G03F1/68 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To provide a rigid stencil mask, as well as stencil mask blanks, of which etching condition is easily determined and the central portion of a membrane is hard to break, being easy to be manufactured. SOLUTION: Central intersection parts 6M and 6N at which the ends of beam band segments 6a-6d belonging to a complementary pattern zone of one quadrant meet each other, are omitted, to provide central membrane divisions 5A1, 5B1, 5B2 and 5C whose areas in plan view are larger than the surrounding membrane divisions. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种刚性模板掩模以及模板掩模坯料，其易于确定蚀刻条件并且膜的中心部分难以破裂，易于制造。解决方案：省略属于一个象限的互补图案区的束带段6a-6d的端部彼此相遇的中心交叉部分6M和6N，以提供中央膜分隔5A1,5B1,5B2和5C 其平面图中的区域大于周围的膜分隔。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2003050328A Optic/electric wiring board, method for manufacturing the board and package board 审中-公开
标题翻译：光/电接线板，制造板和包装板的方法
公开(公告)号：JP2003050328A
公开(公告)日：2003-02-21
申请号：JP2001237426
申请日：2001-08-06
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： KUMAI KOICHI , YOTSUI KENTA , TSUKAMOTO TAKETO , ISHIZAKI MAMORU , SASAKI ATSUSHI
IPC分类号： G02B6/122 , G02B6/13
摘要： PROBLEM TO BE SOLVED: To provide an optic/electric wiring board on which such optical element as a mirror for optical path conversion is arranged at an arbitral position in the optical wiring, to form the optic/electric wiring board on which an accurate mirror is mounted without using a dicing saw and to simplify the manufacturing process. SOLUTION: The optic/electric wiring board is provided with a board 4 on which an electric wiring 3 is furnished, an optical wiring layer 5 located on at least one face of the board, a hole part 6 furnished in the optical wiring for mounting an optical element and an optical element 7 composed of, for example, a mirror and mounted on the hole part. The hole part is formed by a laser machining or a dry etching and the shape of the cross section of the hole does not have rotational symmetries of five times.
摘要翻译：要解决的问题：为了提供光学/电气布线板，光学路线转换用反射镜等光学元件配置在光学配线的仲裁位置，形成准确的镜面为光学/电气布线基板在不使用切割锯的情况下安装并简化制造过程。解决方案：光/电布线板设置有布置有电线3的板4，位于板的至少一个面上的光布线层5，设置在光布线中的孔部6，用于安装光学元件和由例如镜子组成并安装在孔部上的光学元件7。孔部通过激光加工或干蚀刻形成，孔的截面形状不具有5次的旋转对称性。

5. 发明专利

JP2003007588A Stencil mask, its manufacturing method and exposing method 有权
标题翻译： STENCIL MASK，其制造方法和暴露方法
公开(公告)号：JP2003007588A
公开(公告)日：2003-01-10
申请号：JP2001186839
申请日：2001-06-20
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： GAMO SHUSUKE , YOTSUI KENTA , TAMURA AKIRA
IPC分类号： C23C14/14 , C23C16/24 , G03F1/20 , G03F7/20 , H01L21/027 , G03F1/16
摘要： PROBLEM TO BE SOLVED: To provide a stencil mask exhibiting excellent electron beam irradiation characterstics in which a thin film can be deposited easily while controlling stress.
SOLUTION: The stencil mask comprises a basic body and a parent material of mask supported by the basic body wherein the parent material of mask comprises a non-single crystal silicon based thin film having a through hole pattern passing a charged particle beam.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种显示优异的电子束照射特性的模板掩模，其中可以容易地沉积薄膜同时控制应力。解决方案：模板掩模包括基体和由基体支撑的掩模的母材，其中掩模的母材包括具有通过带电粒子束的通孔图案的非单晶硅基薄膜。

6. 发明专利

JP2006073869A Stencil mask, and stencil mask blanks 审中-公开
标题翻译： STENCIL MASK和STENCIL MASK BLANKS
公开(公告)号：JP2006073869A
公开(公告)日：2006-03-16
申请号：JP2004256965
申请日：2004-09-03
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： YOTSUI KENTA , SUMITA TOMOYA , NEGISHI YOSHIYUKI , EGUCHI HIDEYUKI , TAMURA AKIRA
IPC分类号： H01L21/027 , G03F1/20
摘要： PROBLEM TO BE SOLVED: To provide a stencil mask wherein the exposure throughput of the stencil mask can be improved, which has high rigidity and strong structure, and wherein, its IP control for positional alignment is easy, and moreover, heat radiating quality is excellent, and stencil mask blanks. SOLUTION: In the stencil mask, there are provided a first complementary pattern partition I including a plurality of membrane dividing regions divided by a plurality of beam bands provided substantially in parallel with each other, a second complementary pattern partition II provided adjacently to the first complementary pattern partition and including a plurality of membrane dividing regions divided by the plurality of beam bands provided substantially in parallel with each other, and a third complementary pattern partition III provided adjacently to the second complementary pattern partition and including a plurality of membrane dividing regions divided by the plurality of beam bands provided substantially in parallel with each other. Further in the stencil mask, there are arranged in series with each other and adjacently to each other in one direction the plurality of membrane dividing regions 5A2, 5A3 belonging to the first, second, and third complementary pattern partitions I, II and III. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种模板掩模，其中可以提高模板掩模的曝光生产量，其具有高刚性和强结构，并且其中用于位置对准的IP控制容易，此外，散热质量很好，和模板面具毛坯。解决方案：在模板掩模中，提供了第一互补图案分隔件I，其包括由基本上彼此平行设置的多个光束带分隔开的多个膜分隔区域，第二互补图案分隔件II邻近设置所述第一互补图案分隔部并且包括由基本上彼此平行设置的所述多个光束带分割的多个膜分割区域，以及与所述第二互补图案分隔件相邻设置的第三互补图案分隔件，并且包括多个膜分割由基本上彼此平行设置的多个光束带分割的区域。此外，在模板掩模中，在一个方向上彼此串联并且彼此相邻地排列属于第一，第二和第三互补图案的多个膜分隔区域5A2,5A3分隔I，II和III。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2006049364A Stencil mask and stencil mask blank 有权
标题翻译： STENCIL MASK和STENCIL MASK BLANK
公开(公告)号：JP2006049364A
公开(公告)日：2006-02-16
申请号：JP2004224221
申请日：2004-07-30
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： YOTSUI KENTA , SUMITA TOMOYA , EGUCHI HIDEYUKI , NEGISHI YOSHIYUKI , TAMURA AKIRA
IPC分类号： H01L21/027 , G03F1/50 , G03F1/68
摘要： PROBLEM TO BE SOLVED: To provide a stencil mask of high rigidity along with stencil mask blanks. SOLUTION: The ends of four beam band segments meet each other at the central part of membrane, and each of the end parts abuts with the side of other beam band segments. A plurality of membrane divisions include the membrane division which is surrounded by four sides with vertical and lateral beam bands, being parallel to either X-axis or Y-axis while orthogonal to each other to reinforce each other. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供具有高刚性的模板掩模以及模板掩模坯料。
解决方案：四个光束带段的端部在膜的中心部分彼此相遇，并且每个端部部分与其他束带段的侧面相邻。多个分隔膜包括由垂直和横向束带四个边包围的膜分隔件，它们彼此正交地彼此平行，X轴或Y轴平行。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2003021742A Method for manufacturing polymer optical film and polymer optical film 有权
标题翻译：制造聚合物光学膜和聚合物光学膜的方法
公开(公告)号：JP2003021742A
公开(公告)日：2003-01-24
申请号：JP2001206119
申请日：2001-07-06
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： ISHIZAKI MAMORU , YOTSUI KENTA , TSUKAMOTO TAKETO , SASAKI ATSUSHI , HARA HATSUNE
IPC分类号： G02B6/13 , B29C41/12 , B29K77/00 , B29L7/00 , G02B6/12
摘要： PROBLEM TO BE SOLVED: To relax residual stress without making a polymer optical film undergo abnormal deformation as the first subject and to secondly provide the polymer optical film having no abnormal deformation and little residual stress as the second subject. SOLUTION: The method for manufacturing the polymer optical film includes at least a step to apply a raw material of the polymer optical film on a substrate, a step to obtain the polymer optical film by heat treatment, a step to release the polymer optical film from the substrate and a step to subject the polymer optical film to heat treatment at a temperature not higher than the glass transition temperature of the polymer optical film and not lower than the tilt increasing temperature detected with thermomechanical measurement. In addition, the requisites for the polymer optical film include a fluorinated polyimide. These kinds of heat treatment steps enable the polymer optical film to relax stress and to uniformly shrink.
摘要翻译：要解决的问题：为了在不使聚合物光学膜作为第一被摄体发生异常变形的情况下使残余应力弛豫，其次提供作为第二被摄体的没有异常变形和很小残留应力的聚合物光学膜。解决方案：聚合物光学薄膜的制造方法至少包括在基板上涂布聚合物光学薄膜的原料的步骤，通过热处理获得聚合物光学薄膜的步骤，将聚合物光学薄膜从基板和使聚合物光学膜在不高于聚合物光学膜的玻璃化转变温度的温度下进行热处理的步骤，并且不低于用热机械测量检测到的倾斜增加温度。此外，聚合物光学膜的必要条件包括氟化聚酰亚胺。这些热处理步骤使得聚合物光学膜能够缓和应力并均匀收缩。

9. 发明专利

JP2004179411A Membrane mask and method for exposure 审中-公开
公开(公告)号：JP2004179411A
公开(公告)日：2004-06-24
申请号：JP2002344068
申请日：2002-11-27
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： GAMO SHUSUKE , YOTSUI KENTA , TAMURA AKIRA
IPC分类号： G03F1/20 , H01L21/027 , G03F1/16
摘要： PROBLEM TO BE SOLVED: To provide a membrane mask which has the high strength of a membrane, high workability and excellent electron beam emitting characteristics and which can control a stress. SOLUTION: The membrane mask includes a base material, the membrane supported by this base material, and a mask base material formed on this membrane and having a through hole pattern for transmitting a charged particle beam. The membrane is made of a nanodiamond film containing a nanocrystal diamond having a crystal grain size of 1 to less than 1,000 nm as a main component. COPYRIGHT: (C)2004,JPO

10. 发明专利

JP2004179410A Stencil mask and method for exposure 审中-公开
标题翻译：横断面和接触方法
公开(公告)号：JP2004179410A
公开(公告)日：2004-06-24
申请号：JP2002344067
申请日：2002-11-27
申请人： Toppan Printing Co Ltd , 凸版印刷株式会社
发明人： GAMO SHUSUKE , YOTSUI KENTA , TAMURA AKIRA
IPC分类号： G03F1/20 , H01L21/027 , G03F1/16
摘要： PROBLEM TO BE SOLVED: To provide a stencil mask which has the high strength of a mask base material, high workability and excellent electron beam emitting characteristics and which can control a stress. SOLUTION: The stencil mask includes a base material, and the mask base material supported by the base material. The mask base material has a through hole pattern for transmitting a charged particle beam and is made of a nanodiamond film containing a nanocrystal diamond having a crystal grain size of 1 to less than 1,000 nm as a main component. COPYRIGHT: (C)2004,JPO

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