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1. 发明专利

JP2005347474A Ventilator for chemical countermeasure of exposure process and method of chemical countermeasure for exposure process 有权
标题翻译：化学计量曝光过程通风器及化学计量曝光方法
公开(公告)号：JP2005347474A
公开(公告)日：2005-12-15
申请号：JP2004164529
申请日：2004-06-02
申请人： Sharp Corp , Shimizu Corp , シャープ株式会社 , 清水建設株式会社
发明人： YAMADA SHIGEYUKI , SUZUKI YOSHINOBU , SHIRATANI TAKESHI , KOMATSUBARA MASAYUKI
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a ventilator for chemical countermeasure of an exposure process and the method of chemical countermeasure for the exposure process capable of sufficiently reducing the frequency of washing or replacement of a lamp or a lens, and capable of applying to a large-size exposure device without increasing an air cleaning facility.
SOLUTION: The ventilator 100 for chemical countermeasure is constituted of an exposure device equipped with a lamp house 101a for receiving the lamp and lens for exposure, an exposure chamber 102 for installing the exposure device 101 therein, an air cleaner 103 for cleaning air, and a duct 104 for guiding air (clean air) cleaned by the air cleaner 103 to the vicinity of the lamp house 101a.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于曝光过程的化学对策的通风机以及能够充分降低灯或透镜的洗涤或更换频率并且能够施加的曝光过程的化学对策的方法到大型曝光装置，而不增加空气净化装置。
解决方案：用于化学对策的呼吸机100由装备有用于接收灯的灯室101a和用于曝光的透镜的曝光装置，用于将曝光装置101安装在其中的曝光室102，用于清洁的空气滤清器103 空气，以及用于将由空气滤清器103清洁的空气（清洁空气）引导到灯室101a附近的导管104。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2010071860A Apparatus for inspecting glass substrate 审中-公开
标题翻译：检查玻璃基板的装置
公开(公告)号：JP2010071860A
公开(公告)日：2010-04-02
申请号：JP2008240935
申请日：2008-09-19
申请人： Sharp Corp , シャープ株式会社
发明人： YAMADA SHIGEYUKI
IPC分类号： G01N21/84 , G01B11/30 , G01N21/956
摘要： PROBLEM TO BE SOLVED: To provide an inspecting apparatus which facilities a visual inspection of a large-sized glass substrate.
SOLUTION: The inspecting apparatus 100 includes an inspection stage 102 and a drive mechanism 141 for moving the glass substrate 10 relatively to the inspection stage 102. Moreover, this inspecting apparatus 100 includes a viewing section 108 for reflecting an image of the glass substrate 10 viewed from the outside in the width direction relative to a direction in which the glass substrate 10 is moved by the drive mechanism 141, so as to be able to check the image from the inspection stage 102. Therefore, the visual inspection of the glass substrate 10 can be carried out easily by using the inspecting apparatus 100.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于大尺寸玻璃基板的目视检查的检查装置。检查装置100包括检查台102和用于相对于检查台102移动玻璃基板10的驱动机构141.此外，该检查装置100包括用于反映玻璃的图像的观察部108 基板10相对于玻璃基板10被驱动机构141移动的方向在宽度方向上从外侧观察，从而能够检查来自检查台102的图像。因此，目视检查玻璃基板10可以通过使用检查装置100容易地进行。版权所有：（C）2010，JPO＆INPIT

3. 发明专利

JP2007041175A Substrate for display panel and exposing method for the substrate 审中-公开
标题翻译：用于显示面板的基板和用于基板的曝光方法
公开(公告)号：JP2007041175A
公开(公告)日：2007-02-15
申请号：JP2005223635
申请日：2005-08-02
申请人： Sharp Corp , シャープ株式会社
发明人： FUSE DAISUKE , YAMADA SHIGEYUKI , OGATA SHOICHI , MINAMI YASUO , TANIGUCHI HIDEO
IPC分类号： G02F1/1333 , G02F1/1337
摘要： PROBLEM TO BE SOLVED: To provide a substrate for a display panel, in which occurrence of uneven exposure in the vicinity of an exposure starting position is prevented, and an exposing method for the substrate.
SOLUTION: In the proximity of the outside of an outer periphery edge of a display region 12a having a pixel pattern formed in a grid shape, a dummy pattern 11a having the same structure as that of the pixel pattern formed in the grid shape is formed as alignment marks. When the display region 12a is exposed via a mask 53 with an opening section formed thereon, while transferring the substrate along a surface direction, a position and an angle of the mask 53 relative to the substrate 1a are corrected by using the dummy pattern 11a before the display region 12a reaches the position where it is to be exposed via the mask 53.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于显示面板的基板，其中防止在曝光开始位置附近发生不均匀曝光，以及用于基板的曝光方法。解决方案：在具有形成为网格形状的像素图案的显示区域12a的外周边缘的外侧附近，具有与形成为网格形状的像素图案相同结构的虚设图案11a 形成为对准标记。当显示区域12a通过其上形成有开口部的掩模53露出时，在沿着表面方向传送基板的同时，通过使用伪图案11a来校正掩模53相对于基板1a的位置和角度显示区域12a通过掩模53到达要曝光的位置。版权所有（C）2007，JPO＆INPIT

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