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    • 4. 发明专利
    • ELECTROPHOTOGRAPHIC SENSITIVE BODY
    • JPS61264347A
    • 1986-11-22
    • JP10661185
    • 1985-05-17
    • SUMITOMO ELECTRIC INDUSTRIES
    • NAKAGAMA SHOJITANAKA SABUROFUJITA NOBUHIKOICHIYANAGI HAJIME
    • G03G5/08G03G5/082G03G5/14
    • PURPOSE:To prevent the curling of an electrophotographic sensitive body formed with a photoconductive layer consisting essentially of a-Si on one surface of a flexible substrate while maintaining the flexibility thereof by forming a specific curling preventive layer on the other surface of the substrate on the side opposite from the photoconductive layer. CONSTITUTION:The curling preventive layer consisting of a material having 2-22X10 kg/mm modulus of elasticity and 2-13X10 coefft. of thermal expansion and having 0.3-5mum thickness is formed on the other surface of the substrate on the side opposite from the photoconductive layer of the electrophotographic sensitive body formed with the photoconductive layer consisting essentially of amorphous silicon having 1-6mum thickness on one surface of the flexible substrate. The curling preventive layer 14 does not effectively act as the curling preventive layer 14 if the modulus of elasticity is kg/mm and the flexibility of the photosensitive body 10 is lost if the modulus of elasticity exceeds 22X10 kg/mm . The photosensitive body is curled by the thermal expansion if the coefft. of thermal expansion exceeds 13-10 and the adhesiveness to the substrate 11 is poor if said coefft. is . There is no effect of preventing curling if the thickness is
    • 8. 发明专利
    • STRAIN SENSOR
    • JPS60124877A
    • 1985-07-03
    • JP23249883
    • 1983-12-08
    • SUMITOMO ELECTRIC INDUSTRIES
    • KUME MASAHIROTAKADA KOUJIFUJITA NOBUHIKODOI AKIRAOOTSUKA AKIRAICHIYANAGI HAJIME
    • G01B7/16G01L9/04H01L29/84
    • PURPOSE:To use the titled sensor repeatedly even under environment at an extremely high temperature or a cryogenic temperature by bringing the electric resistance of a path passing through a strain-receiving structure member to not less than fixed times as large as resistance between electrodes through a second region between the electrodes. CONSTITUTION:A first silicon resistance thin-film layer 18 constitutes a first region in a strain-receiving resistance thin-film layer 17 while a second silicon resistance thin-film layer 19 constitutes a second region. The electric resistance of a path passing through the layer 19, the layer 18, a member 14 to be detected as a strain-receiving structure member, the layer 18 and the layer 19 in succession is brought to not less than 10 times as large as electric resistance between electrodes 21a, 21b between the electrodes 21a, 21b. Accordingly, the strain- receiving resistance thin-film layer 17 is also strained similarly when strain is generated in the strain-receiving structure member 14 functioning as the object to be detected in combination, but the change of electric resistance based on strain in the layer 19 can be extracted accurately by lead wires 16a, 16b even when the member 14 to be detected has conductivity.