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    • 5. 发明专利
    • GALLIUM NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND SEMICONDUCTOR LASER BEAM SOURCE DEVICE
    • JPH10261838A
    • 1998-09-29
    • JP6572597
    • 1997-03-19
    • SHARP KK
    • OKUMURA TOSHIYUKI
    • H01L33/06H01L33/14H01L33/32H01S5/00H01S3/18H01L33/00
    • PROBLEM TO BE SOLVED: To make it possible for a semiconductor laser element to have good laser oscillation characteristics and to make it possible for a light-emitting diode element to obtain a high light output by a method wherein a quantum well structure active layer, which comprises a nitrogen compound semiconductor containing indium and gallium, is formed of the specified number of layers of quantum well layers and a specified layer thickness of barrier layers, which are alternately laminated. SOLUTION: The compositions of four layers of In0.2 Ga0.8 N quantum well layers (the thickness: 10 μm or thinner) 14 and three layers of In0.05 Ga0.95 ND barrier layers 15, which constitute a multiple quantum well structure active layer 6, have only to be set according to the necessary oscillation wavelength of a laser and in the case where the oscillation wavelength wants to be lengthened, the composition of the In in the layers 14 is increased and in the case where the oscillation wavelength is wanted to shorten, the composition of the In in the layers 14 is reduced. The number of layers of the layers 14 is set in two or more to 1000 or less. Provided that, the layer thickness of the layers 15 is set in 4 μm or thinner and is held limiting so that an overlapping of the wave function of electrodes with the wave function of holes is generated between the layers 14. Thereby, the luminous efficiency of a semiconductor laser element is enhanced and the oscillation threshold current value of the laser element can be reduced.
    • 10. 发明专利
    • JPH05291689A
    • 1993-11-05
    • JP9557992
    • 1992-04-15
    • SHARP KKFURUKAWA ELECTRIC CO LTD
    • OKUMURA TOSHIYUKIATSUNUSHI FUMIHIROMORIOKA TATSUYAMATSUMOTO SHIGETO
    • H01S5/00H01S3/18
    • PURPOSE:To obtain a sufficient optical output and excellent temperature characteristics by making the number of the quantum well layers constituting a quantum well structure fall within a specific range and making the resonator length fall within a specific range for reducing the carrier overflow at high temperatures. CONSTITUTION:Sequentially formed on an n-type InP substrate 8 are an n-type clad layer 1, a first guide layer 2, a multiple quantum well structured active layer 7 made up of a plurality of sequentially deposited quantum well layers 3 and barrier layers 4, a second guide layer 5, a p-type clad layer 6, and a p -type cap layer 11. The gain increases, because the light confinement coefficient increases as the number of the quantum well layers increases. However, if the number of the quantum well layers exceeds an appropriate number, the spreading angle of a far-field image in the direction perpendicular to the quantum well layers increases. Accordingly, the number of the quantum wells is set between 6 and 10. In addition, since the heating value of the semiconductor laser device needs to be suppressed, and to reduce the threshold current density, the resonator length is set between 250mum and 700mum.