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1. 发明专利

JP2014047339A Liquid repellent film, formation method of liquid repellent film, nozzle plate, droplet discharge head and droplet discharge device 审中-公开
标题翻译：液体填充膜，液体填充膜的形成方法，喷嘴板，喷射头排出头和排液装置
公开(公告)号：JP2014047339A
公开(公告)日：2014-03-17
申请号：JP2012193926
申请日：2012-09-04
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： MIYAGAWA TAKUYA
IPC分类号： C09K3/18 , B41J2/045 , B41J2/055 , B41J2/135
摘要： PROBLEM TO BE SOLVED: To provide a liquid repellent film having excellent liquid repellency to ink, a formation method of the liquid repellent film capable of producing the liquid repellent film, a nozzle plate including the liquid repellent film, a droplet discharge head and a droplet discharge device.SOLUTION: A liquid repellent film 26 which is formed in order to impart liquid repellency to a substrate 25 includes a compound originated in a coupling agent having a metal M. The compound is connected to the substrate 25, and represented by following general formula (1) when the metal M is a trivalent metal, and further represented by following general formula (2) when the metal M is a tetravalent metal.
摘要翻译：要解决的问题：为了提供对油墨具有优异的疏液性的防液膜，能够制造防液膜的防液膜的形成方法，包括防液膜的喷嘴板，液滴喷射头和液滴排出装置。解决方案：为了赋予液体排斥性而形成的防液膜26包括起源于具有金属M的偶联剂的化合物。化合物连接到基板25，并由以下一般表示当金属M是三价金属时，式（1），当金属M是四价金属时，进一步由以下通式（2）表示。

2. 发明专利

JP2013202929A Ink cartridge and ink jet recording device 有权
标题翻译：墨盒和墨水喷射记录装置
公开(公告)号：JP2013202929A
公开(公告)日：2013-10-07
申请号：JP2012074281
申请日：2012-03-28
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： OTSUKA KENJI , MIYAGAWA TAKUYA , NAGATOYA MASARU
IPC分类号： B41J2/175
摘要： PROBLEM TO BE SOLVED: To provide an ink cartridge which is excellent in bonding fixation or the like with an ink storage section and has a high detection characteristic for an amount of remaining ink, and to provide an ink jet recording device.SOLUTION: An ink cartridge has an ink storage section 12 storing the ink, a triangle prism 15 for an amount of remaining ink in the inside of the ink storage section 12 by reflecting a light from the outside of the ink storage section 12 on one of a wall composing the ink storage section 12 and a prism unit 13 including a plane section 17a fixed with one surface of the triangle prism 15. An function film for repelling ink is formed on two reflecting surfaces 16a, 16b in contact with ink in the triangle prism 15 and has no function film on at least a part of the plane section 17a.
摘要翻译：要解决的问题：提供一种具有优良的油墨存储部分的粘结固定等优异且对剩余油墨量具有高检测特性的墨盒，并提供一种喷墨记录装置。解决方案：一种油墨墨盒具有存储墨水的墨水存储部分12，通过将墨水存储部分12的外部的光反射到构成墨水存储部分12的一个壁上的一个壁上，在墨水存储部分12的内部存储一定量的剩余墨水的三角形棱镜15 墨水存储部分12和棱镜单元13，棱镜单元13包括固定在三角棱镜15的一个表面上的平面部分17a。用于排斥墨水的功能膜形成在与三角棱镜15中的油墨接触的两个反射表面16a，16b上，并且具有在平面部分17a的至少一部分上没有功能膜。

3. 发明专利

JP2010135686A Protective film 审中-公开
标题翻译：保护膜
公开(公告)号：JP2010135686A
公开(公告)日：2010-06-17
申请号：JP2008312351
申请日：2008-12-08
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： MIYAGAWA TAKUYA
IPC分类号： H01L21/306
摘要： PROBLEM TO BE SOLVED: To provide a protective film which provides fine protection at wet etching and is easily removed from a protected surface.
SOLUTION: The protective film 2 is applied to protect the surface of a substrate 1 which is a workpiece in a wet etching process. The protective film 2 is made of, for example, a bridgeless polyolefin soluble to an organic solvent, such as decalin, and protects the surface of the substrate 1 from an acidic or alkaline etchant.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种保护膜，其在湿蚀刻时提供良好的保护，并且容易地从受保护的表面去除。
解决方案：施加保护膜2以在湿蚀刻工艺中保护作为工件的基板1的表面。保护膜2由例如可溶于有机溶剂的无桥聚烯烃（例如十氢化萘）制成，并且保护基材1的表面免受酸性或碱性蚀刻剂的影响。版权所有（C）2010，JPO＆INPIT

4. 发明专利

JP2010132837A Adhesion structure and adhesion method 审中-公开
标题翻译：粘合结构和粘合方法
公开(公告)号：JP2010132837A
公开(公告)日：2010-06-17
申请号：JP2008312354
申请日：2008-12-08
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： MIYAGAWA TAKUYA
IPC分类号： C09J5/04 , C09J5/06 , C09J11/06 , C09J123/00
摘要： PROBLEM TO BE SOLVED: To provide an adhesion structure generating a chemical bond at a low temperature, and to provide an adhesion method.
SOLUTION: An adhesion layer 3A for sticking a base plate 1 and a protection member 2 is obtained by sticking: an adhesive layer 3 coated on a surface of the protection member 2 and having a carboxyl group; and a primer layer 4 provided on a surface of the base plate 1 and having an amino group. An amide bond generated by performing a condensation reaction of the carboxyl group and the amino group is formed on an interlayer of the adhesive layer 3 and the primer layer 4, and 4-(4,6-dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholinium chloride for promoting the condensation reaction is involved.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供在低温下产生化学键的粘合结构，并提供粘合方法。解决方案：通过粘贴涂覆在保护构件2的表面上并具有羧基的粘合层3来获得用于粘贴基板1和保护构件2的粘合层3A; 以及设置在基板1的表面上并具有氨基的底漆层4。在粘合剂层3和底漆层4的中间层上形成通过进行羧基和氨基的缩合反应而产生的酰胺键，以及4-（4,6-二甲氧基-1,3,5-三嗪 -2-基）-4-甲基吗啉鎓氯化物用于促进缩合反应。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2010132835A Protection material 审中-公开
标题翻译：保护材料
公开(公告)号：JP2010132835A
公开(公告)日：2010-06-17
申请号：JP2008312352
申请日：2008-12-08
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： MIYAGAWA TAKUYA
IPC分类号： C09J7/02 , C09J123/00 , C09J151/00 , C09J153/00 , H01L21/306
摘要： PROBLEM TO BE SOLVED: To provide a protection material sufficiently achieving protection at wet etching and capable of easily performing removal from a surface to be protected.
SOLUTION: The protection material 2A capable of being applied to protection of a surface of a base plate 1A when the wet etching is performed has: a protection member 2; and an adhesion layer 3 provided on one surface of the protection member 2 and sticking the protection member 2 onto a surface of the base plate 1A. In the adhesion layer 3, an unvulcanized polyolefin dissolvable in an organic solvent such as decalin is used, for example, as a formation material.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种充分实现湿蚀刻保护的保护材料，并且能够容易地从被保护的表面去除。解决方案：当执行湿蚀刻时，能够用于保护基板1A的表面的保护材料2A具有：保护构件2; 以及设置在保护构件2的一个表面上并将保护构件2粘贴到基板1A的表面上的粘附层3。在粘合层3中，可以使用可溶于有机溶剂如萘烷中的未硫化聚烯烃，例如作为形成材料。版权所有（C）2010，JPO＆INPIT

6. 发明专利

JP2009220507A Method for manufacturing liquid ejection head 审中-公开
标题翻译：制造液体喷射头的方法
公开(公告)号：JP2009220507A
公开(公告)日：2009-10-01
申请号：JP2008069567
申请日：2008-03-18
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： MATSUZAWA AKIRA , OTA MUTSUHIKO , TAKAHASHI TETSUJI , MATSUMOTO YASUYUKI , MIYAGAWA TAKUYA
IPC分类号： B41J2/16
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid ejection head can completely perform protection from an etching liquid.
SOLUTION: This method includes the film forming process adapted to form a pressure generating element 300 on a wafer 100 made of a silicon wafer for a fluid channel forming substrate in which the fluid channel forming substrate having a first liquid channel including a pressure generating chamber 12 communicating with a nozzle opening provided thereon is integrally formed, the process adapted to bond a wafer 130 made of a silicon wafer for a bonding substrate in which the bonding substrate having formed thereon a second liquid channel for supplying a liquid to the pressure generating chamber 12 is integrally formed, to the wafer 100 for the fluid channel forming substrate and to bond an organic film 140 to an entire surface of the wafer 130 for the bonding substrate at the opposite side of a bonded side of the wafer 100 for the fluid channel forming substrate, the etching process adapted to form the pressure generating chamber 12 by wet-etching the wafer 100 for the fluid channel forming substrate, the removing process adapted to remove the organic film 140, and the dividing process adapted to divide the wafer 100 and the wafer 130 to be in a predetermined size.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于制造液体喷射头的方法可以完全对蚀刻液进行保护。解决方案：该方法包括适于在用于流体通道形成衬底的硅晶片制成的晶片100上形成压力产生元件300的成膜工艺，其中流体通道形成衬底具有包括压力的第一液体通道一体地形成与设置在其上的喷嘴开口连通的发生室12，该过程适于将由硅晶片制成的晶片130接合到其上形成有第二液体通道的接合基板，用于将液体供应到压力发生室12一体地形成到用于流体通道形成基板的晶片100上，并且将有机膜140粘合到用于晶片100的接合侧的相对侧的接合基板的晶片130的整个表面，用于流体通道形成衬底，所述蚀刻工艺适于通过湿式蚀刻用于流体通道fo的晶片100形成压力产生室12 去除衬底，适于去除有机膜140的去除工艺，以及用于将晶片100和晶片130分割成预定尺寸的划分过程。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2008058691A Liquid crystal, method for manufacturing liquid crystal, substrate for liquid crystal, and projector 有权
标题翻译：液晶，制造液晶的方法，液晶基板和投影仪
公开(公告)号：JP2008058691A
公开(公告)日：2008-03-13
申请号：JP2006236380
申请日：2006-08-31
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： MIYAGAWA TAKUYA
IPC分类号： G02F1/1337 , G02F1/13 , G03B21/00
摘要： PROBLEM TO BE SOLVED: To provide a substrate for a liquid crystal, having an alignment layer comprising an organic film which shows high alignment property, without having to perform a rubbing treatment, the liquid crystal and a manufacturing method thereof, and to provide a projector equipped with such a liquid crystal device.
SOLUTION: The liquid crystal has such a configuration that a liquid crystal layer 50 is held between a pair of substrates 10, 20 facing each other, wherein alignment layers 40, 60 are formed on the pair of the substrates 10, 20 on the sides of the liquid crystal layer 50, respectively; and the alignment layers 40, 60 are constituted of aligning polymer films, comprising polymers which have three-dimensional regularity and are aligned in a predetermined direction.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种液晶的基板，具有包括显示高取向性的有机膜的取向层，而不必进行摩擦处理，液晶及其制造方法，以及提供配备有这种液晶装置的投影仪。解决方案：液晶具有将液晶层50保持在彼此面对的一对基板10,20之间的结构，其中定向层40,60形成在一对基板10,20上，分别为液晶层50的侧面。并且取向层40,60由具有三维规则性且沿预定方向排列的聚合物的聚合物膜对准构成。版权所有（C）2008，JPO＆INPIT

8. 发明专利

JP2007206535A Manufacturing method for liquid crystal device, liquid crystal device, and electronic equipment 审中-公开
标题翻译：液晶装置，液晶装置和电子设备的制造方法
公开(公告)号：JP2007206535A
公开(公告)日：2007-08-16
申请号：JP2006027261
申请日：2006-02-03
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： MIYAGAWA TAKUYA
IPC分类号： G02F1/1337
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method for a liquid crystal device with which an alignment film having high reliability and superior aligning power can be formed with high mass-productivity.
SOLUTION: In the manufacturing method for the liquid crystal device, a stage of forming the alignment film comprises: a stage of discharging an alignment film material made of an inorganic material obliquely onto a substrate W becoming a body to be treated from a target 205 by using a sputtering device 203 and depositing an inorganic alignment layer having a plurality of columnar structures crystal-grown obliquely to the normal direction of the substrate W on the substrate W; and a stage of surface-treating the top surface of the inorganic alignment layer with a silane coupling agent or alcohol and forming an organic alignment layer of a monomolecular film of an organic material chemically bonded to the inorganic alignment layer on the top surface of the inorganic alignment layer.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种液晶装置的制造方法，可以以高的批量生产率形成具有高可靠性和优异的取向功率的取向膜。解决方案：在液晶装置的制造方法中，形成取向膜的阶段包括：将由无机材料制成的取向膜材料倾斜地放置在基板W上的阶段，所述基板W成为待处理的主体通过使用溅射装置203沉积具有在基板W上与基板W的法线方向倾斜地晶体生长的多个柱状结构的无机取向层; 以及通过硅烷偶联剂或醇对无机取向层的上表面进行表面处理的工序，在无机取向层的化学键合无机取向层的单分子膜的有机取向层的无机对准层。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2007137986A Liquid crystal composition, method for producing liquid crystal composition, liquid crystal device and projector 审中-公开
标题翻译：液晶组合物，制造液晶组合物的方法，液晶装置和投影仪
公开(公告)号：JP2007137986A
公开(公告)日：2007-06-07
申请号：JP2005332481
申请日：2005-11-17
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： MIYAGAWA TAKUYA
IPC分类号： C09K19/54 , G02F1/13
摘要： PROBLEM TO BE SOLVED: To provide a liquid crystal composition stabilizing liquid crystal molecules even when the liquid crystal molecules are activated by radical formation, etc., resulting from receiving of irradiation of light and preventing or suppressing an intermolecular reaction or a reaction with other materials and to provide a method for producing the same.
SOLUTION: The liquid crystal composition comprises a liquid crystal material and a radical scavenger. A liquid crystal layer 50 of a liquid crystal device is composed of the liquid crystal composition.
COPYRIGHT: (C)2007,JPO&INPIT

10. 发明专利

JP2007025118A Manufacturing device of alignment layer, liquid crystal device, and electronic appliance 审中-公开
标题翻译：对准层，液晶装置和电子设备的制造装置
公开(公告)号：JP2007025118A
公开(公告)日：2007-02-01
申请号：JP2005205469
申请日：2005-07-14
申请人： Seiko Epson Corp , セイコーエプソン株式会社
发明人： NAKADA HIDEO , MIYAGAWA TAKUYA
IPC分类号： G02F1/1337
CPC分类号： G02F1/133734 , C23C14/042 , C23C14/225 , C23C14/568
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing device of an alignment layer, with which productivity in manufacturing the alignment layer is improved, and lowering of film performance of the alignment layer is prevented, a liquid crystal device, and an electronic appliance. SOLUTION: The manufacturing device 1 of an alignment layer is for the liquid crystal device comprising a liquid crystal interposed between a pair of substrates placed opposite to each other. The manufacturing device 1 has a film deposition chamber 2, a deposition means 7 to vapor-deposit an alignment layer material on a substrate W so as to form the alignment layer in the film deposition chamber 2, and a slit-shaped opening section 12 to selectively vapor-deposit the alignment layer material, and includes a shielding plate 10 arranged between the deposition means 7 and the substrate W so as to cover a non-alignment layer forming region of the substrate W. A feed and take-off chamber 3 communicating with the film deposition chamber 2 via a gate valve 14 and composed of a vacuum chamber, a shielding plate container 4 communicating with the feed and take-off chamber 3 and containing spares of the shielding plate 10, and a replacing unit 18 installed in the feed and take-off chamber 3 and replacing the shielding plate 10 in the film deposition chamber 2 with the spare of the shielding plate 10 in the shielding plate container 4, are provided to the manufacturing device 1. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：解决问题的方案为了提供一种取向层的制造装置，提高了取向层的制造生产率，并且防止了取向层的膜性能的降低，液晶装置和电子设备。解决方案：取向层的制造装置1是用于包括夹在彼此相对放置的一对基板之间的液晶的液晶装置。制造装置1具有：成膜室2，沉积装置7，用于在基板W上气相沉积取向层材料，以在成膜室2中形成取向层;以及狭缝状的开口部分12至选择性地气相沉积取向层材料，并且包括布置在沉积装置7和基板W之间的屏蔽板10，以覆盖基板W的不对准层形成区域。馈送和取出室3连通与沉积室2通过闸阀14并由真空室组成，屏蔽板容器4与进料和取出室3连通并且包含屏蔽板10的备件;以及更换单元18，其安装在供给和取出室3，并且在屏蔽板容器4中备用屏蔽板10而将成膜室2中的屏蔽板10更换到制造装置1。 OPYRIGHT：（C）2007，JPO＆INPIT

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