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    • 4. 发明专利
    • PHOTOVOLTAIC ELEMENT
    • JPH0370183A
    • 1991-03-26
    • JP20614389
    • 1989-08-09
    • SANYO ELECTRIC CO
    • IWAMOTO MASAYUKIMINAMI KOJIYAMAOKI TOSHIHIKO
    • H01L31/04H01L31/036H01L31/0368H01L31/072H01L31/0745H01L31/0747H01L31/20
    • PURPOSE:To improve conversion efficiency of a solar cell by providing a fine crystal layer consisting of substantially intrinsic fine crystal silicon semiconductor which is provided between an amorphous layer and a crystal layer. CONSTITUTION:A fine crystal layer 2 and n-type or p-type amorphous layer 3 are formed by the plasma CVD method with a p-type or n-type crystal layer 1 as a substrate and S1H4 gas as a main raw material gas by the plasma CVD method. Concretely speaking, a film with the grain diameter of 100 to 1000Angstrom can be obtained with a gas composition ratio of SiH4/H2=0.05 and at a substrate temperature of 180 to 400 deg.C for the fine crystal layer 2. An amorphous layer 3 is formed under a gas composition ratio of B2H6/SiH4=0.01-0.05 for p-type and under a gas composition ratio of PH3/SiH4=0.001-0.05 and at a substrate temperature of 200 deg.C for n-type. Namely, a fine crystal layer which is provided between the amorphous layer and the crystal layer functions as a buffer layer for relaxing mismatching of lattice, etc., between the amorphous layer and the crystal layer by enabling an optically forbidden bandwidth to have an intermediate value between both layers and by setting it to be substantially intrinsic for showing a film quality at low interface level.