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1. 发明专利

JP2000214585A PHOTOSENSITIVE RESIN COMPOSITION 失效
公开(公告)号：JP2000214585A
公开(公告)日：2000-08-04
申请号：JP1517699
申请日：1999-01-25
申请人： RIKAGAKU KENKYUSHO , SUMITOMO BAKELITE CO
发明人： TAJIMA YUUSUKE , TAKEUCHI KAZUO , TAKEUCHI ETSU
IPC分类号： H01L21/027 , C08G73/10 , C08K3/04 , C08L79/08 , C09D5/00 , G03F7/028 , G03F7/037
摘要： PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition applicable to manufacture semiconductor elements and circuit boards and the like and high in sensitivity and resolution and superior in heat resistance by incorporating a polyamic acid or polyimide each having cis-diene structures on the side chains and an oxygen sensitizing dye. SOLUTION: This photosensitive resin composition contains a oxygen sensitizer and polyamic acid or polyimide each substituted by the cis-diene structures represented by the formula in which at least one of R1-R4 is a monovalent organic group having the cis-diene structure and each of the others is, independently, an H atom or a hydroxyl or carboxyl or 1-20C alkyl or such alkoxy group. The cis-diene structure is a furan or thiophene or pyrrole, and the oxygene sensitizer is a flarene compound and the structural units of the formula amount to >=30 mol. % of the total diamine structural units, thus the resin layer to be enhanced in sensitivity and resolution and heat resistance is obtained.

2. 发明专利

JP2000338668A PHOTOSENSITIVE RESIN COMPOSITION 失效
公开(公告)号：JP2000338668A
公开(公告)日：2000-12-08
申请号：JP14709799
申请日：1999-05-26
申请人： RIKAGAKU KENKYUSHO , SUMITOMO BAKELITE CO
发明人： SHIGEMITSU YASURO , TAJIMA YUUSUKE , TAKEUCHI KAZUO , TAKEUCHI ETSU
IPC分类号： H01L21/027 , C08G73/10 , G03F7/027 , G03F7/028 , G03F7/038
摘要： PROBLEM TO BE SOLVED: To ensure high sensitivity and resolution and to obtain a resin layer excellent in heat resistance by incorporating a cis-diene substituted polyamic acid having a specified structure unit or a polyimide and an oxygen sensitizer. SOLUTION: The photosensitive resin composition contains a cis-diene substituted polyamic acid having a structural unit of the formula or a polyimide and an oxygen sensitizer. In the formula, at least one of R1-R4 is a monovalent organic group having a cis-diene structure, the remainders are each H, hydroxy, carboxyl, a 1-20C alkyl or a 1-20C alkoxyl, X1 and X2 are each O, S, a 1-4C alkylene or a 1-4C alkyleneoxy, Ar1 and Ar2 are each a divalent aromatic group, l1, l2, m1 and m2 are each 0 or 1, where when l1 is 1, m1 is also 1, and when l2 is 1, m2 is also 1.

3. 发明专利

JP2002075863A ULTRAFINE STRUCTURE AND ITS METHOD OF MANUFACTURE 失效
公开(公告)号：JP2002075863A
公开(公告)日：2002-03-15
申请号：JP2000265572
申请日：2000-09-01
申请人： RIKAGAKU KENKYUSHO
发明人： NAKAYAMA TOMONOBU , ONOE JUN , TAKEUCHI KAZUO , AONO MASAKAZU
IPC分类号： H01L21/20 , H01L21/203
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing an ultrafine structure by which ultra refinement and high density is realized with a high throughput. SOLUTION: This method for manufacturing an ultrafine structure is provided with a step of selectively forming linear active areas ST in which dangling bond remains by supplying Ag which is combined with the dangling bond onto a Si (111) 7×7 substrate having dangling bond, a step of forming a one- dimensional molecular mask in the active areas ST by depositing fullerene C6031 and combining it with the remaining dangling bond, a step of growing an amorphous silicon layer 41 whose force of combining with the fullerene C6031 is far smaller than its force of mutual combination and a step of exposing the fullerene C6031 by activating the amorphous silicon layer 41 and moving it between areas of the one-dimensional molecular mask.

4. 发明专利

JPH11264790A DIFFERENTIAL TYPE MEASURING DEVICE FOR DEGREE OF ELECTRICAL MOVEMENT 失效
公开(公告)号：JPH11264790A
公开(公告)日：1999-09-28
申请号：JP6742198
申请日：1998-03-17
申请人： RIKAGAKU KENKYUSHO
发明人： TAKEUCHI KAZUO , ISOMURA SHOHEI , HIRASAWA SEIICHI , OKUYAMA KIKUO
IPC分类号： G01N27/60 , G01N15/02
摘要： PROBLEM TO BE SOLVED: To provide a differential type measuring device for the degree of electrical movement, whereby it is possible to accurately measure the size of particulate under the low pressure condition. SOLUTION: Charged particles drawn in from one slit 4 move downward along the center axis together with a sheath gas supplied from a discharge hole 7 in an enclosure 2, and each particulate is drawn toward a center rod 3 from the side with the enclosure 2 at a speed complying with the degree of electrical movement upon being influenced by the electric field generated by a voltage V impressed by a variable voltage source 10 between the inside circumferential surface of the enclosure 2 and the peripheral surface of the center rod 3. Only those particulates having specified size are taken out, which have advanced for the distance L in drawing the specified locus and reached the other slit 5 in the center rod 3. The sheath gas supplied from a draw-in hole 7 in the enclosure 2 is exhausted from the discharge hole 9 in the enclosure 2 upon passing through the slit 5, but because an orifice 11 is provided in the downstream of the slit 5, the sheath gas is hindered from flowing, and a pressure difference is generated between in front of and behind the orifice 11.

5. 发明专利

JPH1090893A PHOTOSENSITIVE RESIN COMPOSITION 失效
公开(公告)号：JPH1090893A
公开(公告)日：1998-04-10
申请号：JP24345096
申请日：1996-09-13
申请人： RIKAGAKU KENKYUSHO
发明人： TAJIMA YUUSUKE , ISHII TADAHIRO , TAKEUCHI KAZUO
IPC分类号： G03F7/004 , C08L101/02 , C09D5/00 , C09D133/06 , G03F7/038 , H05K3/28
摘要： PROBLEM TO BE SOLVED: To obtain a photosensitive resin compsn. using a relatively small amt. of Fullerene and curable with visible light. SOLUTION: This photosensitive resin compsn. contains Fullerene and a high molecular compd. having a functional group capable of reacting with the Fullerene under irradiation with visible light. A negative type image element is formed as follows; a layer of this compsn. is formed and irradiated with visible light through a photomask having a visible radiation transmitting pattern, the irradiated part in the layer is cured and the uncured part in the layer is removed to form a patterned resist film. A device is produced by etching an image forming layer through the resist film and then removing the resist film.

6. 发明专利

JPH0760110A METHOD FOR CONTROLLING SUPERFINE PARTICLE SIZE 失效
公开(公告)号：JPH0760110A
公开(公告)日：1995-03-07
申请号：JP22813793
申请日：1993-08-20
申请人： RIKAGAKU KENKYUSHO
发明人： KUGA YOSHIHISA , TAKEUCHI KAZUO , ISOMURA SHOHEI , OKUYAMA KIKUO
IPC分类号： B01D59/34 , B01J19/00 , B01J19/08
摘要： PURPOSE:To produce a large particle obtained by aggregating and chaining primary particles by chaining primary particles formed by condensing a molecule in a substance forming a nucleus when ionized by aggregation to form a secondary particle and increasing a size of a produced superfine particle. CONSTITUTION:The electron of UF5 molecule is separated by the irradiation with a light source 12 provided to a laser isotope separator 10, hence the UF5 molecule is ionized, and a stable nucleus is immediately generated. The nucleus thus ionized polarizes the surrounding UF5 molecule as it is excited by the light source 12, the surrounding UF5 molecule is rapidly condensed by an electric force to form a large-sized primary particle, both poles of the primary particle are charged with the irradiation of the light source 12 even after the primary particle is formed, the aggregation of the primary particles is promoted, and a large-sized chained UF5 particle is obtained.

7. 发明专利

JPH0664910A PRODUCTION OF COMPOSITE CARBON MATERIAL 失效
公开(公告)号：JPH0664910A
公开(公告)日：1994-03-08
申请号：JP24409692
申请日：1992-08-21
申请人： YAZAKI CORP , RIKAGAKU KENKYUSHO
发明人： TAKEUCHI KAZUO , OKADA YOSHIKI , KATSUMATA MAKOTO
IPC分类号： B23K26/00 , C01B31/02 , C01B32/05 , C01B32/205 , C23C16/26
摘要： PURPOSE:To provide a production method of a composite carbon material with improved surface and capable of crowdedly forming micro carbonaceous fibers which can be highly graphitizable on a carbonaceous material though the carbonaceous material, which is compounded in the composite carbon material, has any shape such as fibrous, grabular, scaly, etc. CONSTITUTION:A composite carbon material having micro carbon fibers with

8. 发明专利

JPS63242326A LASER IRRADIATION IN LASER ISOTOPE SEPARATION METHOD 失效
公开(公告)号：JPS63242326A
公开(公告)日：1988-10-07
申请号：JP7817987
申请日：1987-03-31
申请人： RIKAGAKU KENKYUSHO
发明人： TAKEUCHI KAZUO , OYAMA TOSHIYUKI
IPC分类号： B01D59/34
摘要： PURPOSE:To sufficiently utilize the benefit obtained by the use of an ultrasonic nozzle and to prevent the damage of an optical window, by allowing two or more kinds of laser beams different in a wavelength irradiating a working substance to cross each other. CONSTITUTION:Two kinds of infrared laser beams 2, 3 different in a wavelength are allowed to irradiate the working substance in an ultrasonic nozzle 1 in such a state that the optical axes thereof cross each other at a right angle. The overlapped part of the laser beams 2, 3 is limited to the central part of the nozzle 2 and no dissociation reaction is induced in the vicinity of the inside part of optical windows 4, 4' permitting the transmission of the laser beams 2, 3. As a result, since no infrared multiple photo dissociation is induced in the gaseous working substance not supercooled in the vicinity of the inner wall of the ultrasonic nozzle 1 or low pressure reaction container 7, the benefit obtained by the use of the ultrasonic nozzle 1 can be sufficiently obtained. Further, since it is avoided that highly intensity infrared laser beam is applied to the optical windows 4, 4', the damage of the optical windows 4, 4' can be prevented.

9. 发明专利

JPS601207A PRODUCTION OF THIN POLYTETRAFLUOROETHYLENE FILM USING LASER 失效
公开(公告)号：JPS601207A
公开(公告)日：1985-01-07
申请号：JP11072583
申请日：1983-06-20
申请人： RIKAGAKU KENKYUSHO
发明人： TAKEUCHI KAZUO , INOUE ICHIROU
IPC分类号： C08J7/18 , C08F2/34 , C08F2/46 , C08F2/48 , C08F14/26 , C08F114/26 , C09D127/12
摘要： PURPOSE:To facilitate the formation of a thin polytetrafluoroethylene film on a desired area of the surface of a solid, by polymerizing a sample gas near the surface of the solid by selective exposure to laser beams. CONSTITUTION:A base 8 is placed in a glass vessel 4 and a sample gas 5 (e.g., CHF3, CHClF2, or C4F8) is sealed within the vessel (numeral 3 is a window comprising an optical crystal). Laser beams 1 (e.g., CO2 or Ar ion laser) are allowed to strike on a sample gas present near the surface of a desired area of the base 8 through a lens 2 to form a region 6 in which CF2 radicals or excited C2F4 molecules are generated and to coat the base 8 selectively with a thin polytetrafluoroethylene film 7 formed by the polymerization of the excited molecules.

10. 发明专利

JP2003192317A METHOD AND APPARATUS FOR PRODUCING FULLERENE POLYMER 审中-公开
公开(公告)号：JP2003192317A
公开(公告)日：2003-07-09
申请号：JP2001385538
申请日：2001-12-19
申请人： RIKAGAKU KENKYUSHO
发明人： TANAKA HIDEKI , TAKEUCHI KAZUO
IPC分类号： C01B31/02
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for producing a fullerene polymer simply and in large quantities, and to provide the method and apparatus capable of controlling the production of the fullerene polymer of trimer or more. SOLUTION: The fullerene polymer is produced as follows: a fullerene powder is heated under an atmospheric gas of a predetermined pressure and the fullerene grains are produced, and the produced fullerene grains are ionized and polymerized. COPYRIGHT: (C)2003,JPO

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