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    • 5. 发明专利
    • MEASURING DEVICE FOR ELECTRICAL CHARACTERISTIC OF SEMICONDUCTOR
    • JPS6028240A
    • 1985-02-13
    • JP13626283
    • 1983-07-26
    • RIKAGAKU KENKYUSHO
    • SEGAWA YUUZABUROUAOYANAGI KATSUNOBUNANBA SUSUMU
    • H01L21/66
    • PURPOSE:To measure the life of the carrier and the mobility of a semiconductor in a noncontacting and nondestructive manner by driving a plurality of semiconductor pulse lasers by a driving power supply, irradiating laser beams to the semiconductor while also irradiating other semiconductor pulse lasers to the semiconductor, and detecting obtained reflected and diffracted beams and transmitted diffracted beams by a photodetector. CONSTITUTION:Semiconductor lasers 1, 2, 3 are driven by a pulse laser power supply 21, and laser beams from these lasers 1, 2, 3 are projected to 50% mirrors 5, 6, 7. Laser beams reflected by the 50% mirrors are reflected by 100% mirrors 8, 9, 10 and projected to a sample 14, and transmitted beams are also projected to the sample 14 by 100% mirrors 11, 12, 13. Beams from a semiconductor laser 4 separate from these semiconductor lasers are also irradiated to the same focus, and beams 17 reflected from the sample 14 are detected by a photodetector 22, and recorded by an attenuation recording device 24. Beams 18 transmitted at the same time are detected by a photodetector 26 and sent to a device 24, and the life of the carrier and the mobility of the sample are judged by a decay time while the sample 14 is moved by a shifter 23.
    • 6. 发明专利
    • Manufacture of single crystal thin film
    • 单晶薄膜的制造
    • JPS59217692A
    • 1984-12-07
    • JP9201983
    • 1983-05-25
    • Natl Space Dev Agency JapanRikagaku Kenkyusho
    • SEGAWA YUUZABUROUIWAI SOUHACHINANBA SUSUMUSHIBAFUJI YOUJIMASUDA TSUYOSHIAKIMOTO TOSHIO
    • C30B30/08C30B11/00C30B19/00H01L21/208
    • C30B11/00C30B29/60
    • PURPOSE:To enable the growth of a single crystal thin film having arbitrary shape and size on the surface of a molten liquid, by slowly cooling a molten raw material of crystal in an essentially gravity-free state. CONSTITUTION:The raw material of single crystal is melted in a container, etc. under slight gravity in an essentially gravity-free state, e.g. in a space ship, rocket, etc. An end of the cooling substrate 3 having the same shape as that of the thin film to be manufactured is made to contact with the molten liquid 2 forming a sphere by its own surface tension. The contact point of the molten liquid 2 is cooled, and the growth of the thin film single crystal 4 takes place. Since there is little convection in the molten liquid 2 under the slight gravitational force, the single crystal 4 is grown in the form of a thin film according to the progress of the contact of the cooling substrate 3. When the single crystal 4 is grown to a proper thickness, the cooling substrate 3 is taken out of the molten liquid 2 to obtain the single crystal 4 having a desired shape.
    • 目的:为了在熔融液体的表面上生长具有任意形状和尺寸的单晶薄膜,通过在基本无重力的状态下缓慢冷却熔融原料的晶体。 构成:在基本无重力的状态下,轻微的重力将单晶的原料熔化在容器等中,例如, 在空间船,火箭等中。具有与要制造的薄膜相同形状的冷却基板3的端部通过其自身的表面张力与形成球体的熔融液体2接触。 熔融液2的接触点被冷却,发生薄膜单晶4的生长。 由于在轻微的重力下在熔融液体2中几乎没有对流,所以根据冷却基板3的接触的进展,单晶4以薄膜的形式生长。当将单晶4生长至 合适的厚度,将冷却基板3从熔融液2中取出,得到具有所需形状的单晶4。