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1. 发明专利

JPS60103310A MANUFACTURE OF MICRO FRESNEL LENS 失效
公开(公告)号：JPS60103310A
公开(公告)日：1985-06-07
申请号：JP21076583
申请日：1983-11-11
申请人： PIONEER ELECTRONIC CORP
发明人： SUEMITSU HISASHI , SUZUKI SHINICHI , NIRIKI TAKASHI
IPC分类号： G02B3/08 , G02B5/18 , G02B7/28 , G03B13/30 , G03F7/00
摘要： PURPOSE:To manufacture micro Fresnel lenses which have rings sectioned in a saw tooth shape and also have high convergence efficiently continuously by an electron beam exposing device by making a linear scan at right angles to the direction of the relative movement between a substrate coated with resist and a generation source for an exposure beam. CONSTITUTION:The pattern surface of a micro Fresnel lens is formed by making a linear scan on a substrate A obtained by forming a resist layer 4 on a flat transparent plate of glass, acryl, etc.; and the substrate A moves in a Y direction and an electron beam 11 scans on the resist layer 4 to width 12 in an X direction. The electron beam 11 scans on the same line five times in an overlapping state and the beam turns on and off in the scanning section within the range of the deflection width 12 according to pattern data. Then, an after image corresponding to projections and recesses of the micro Fresnel lens surface is formed within a specific width, and this operation is repeated to form necessary projections and recesses of the micro Fresnel lens by developing the resist.

2. 发明专利

JPS60103308A MANUFACTURE OF MICRO FRESNEL LENS 失效
公开(公告)号：JPS60103308A
公开(公告)日：1985-06-07
申请号：JP21076383
申请日：1983-11-11
申请人： PIONEER ELECTRONIC CORP
发明人： SUZUKI SHINICHI , SUEMITSU HISASHI , NIRIKI TAKASHI
IPC分类号： G02B3/08 , G02B5/18 , G02B6/122 , G03F7/00
摘要： PURPOSE:To offer a micro Fresnel lens at low cost by manufacturing a nickel stamper by an electroforming method from an annular resist pattern formed on a substrate and using this stamper. CONSTITUTION:The smooth surface of glass 11 is coated with resist 12, which is exposed and developed to form an annular image of resist 12. Silver 19 is formed on the image by sputtering, vapor deposition, etc., for form an electrode body. This electrode body is used as an electrode to deposit nickel 20 on the silver 19 on the electrode body by an electroforming method until a plate shape is obtained, and the deposited nickel plate is separated from the electrode body to form a nickel stamper which has annular projections and recesses formed by transferring the annular image of resist 12. This nickel stamper is used for a reproducing method such as a photopolymer method and an injection method to mass-produce micro Fresnel lenses at low cost.

3. 发明专利

JPH0450730B2 失效
公开(公告)号：JPH0450730B2
公开(公告)日：1992-08-17
申请号：JP17935482
申请日：1982-10-13
申请人： PIONEER ELECTRONIC CORP
发明人： SUEMITSU HISASHI , NIRIKI TAKASHI
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , H01L21/30 , H01L23/544

4. 发明专利

JPS60103309A MANUFACTURE OF MICRO FRESNEL LENS 失效
公开(公告)号：JPS60103309A
公开(公告)日：1985-06-07
申请号：JP21076483
申请日：1983-11-11
申请人： PIONEER ELECTRONIC CORP
发明人： SUZUKI SHINICHI , SUEMITSU HISASHI , NIRIKI TAKASHI
IPC分类号： G02B3/08 , G02B5/18
摘要： PURPOSE:To manufacture micro Fresnel lenses accurately in quantities by coating the smooth surface of a colorless transparent plate with resist and forming the resist layer in an annular pattern by exposure and development, and etching the resist layer. CONSTITUTION:The surface of specularly polished glass 11 is coated with resist to form the resist layer 12. This resist layer 12 is exposed to an electron beam, laser light, ultraviolet rays, etc., and developed to form an annular resist layer 12 on the surface of the glass 11. This is etched to form the same annular projections and recesses with the resist layer 12 on the surface of the glass 11, and this resist layer 12 is then removed to form a micro Fresnel lens which utilizes the diffraction phenomenon of light.

5. 发明专利

JPS60103307A MANUFACTURE OF MICRO FRESNEL LENS 失效
公开(公告)号：JPS60103307A
公开(公告)日：1985-06-07
申请号：JP21076283
申请日：1983-11-11
申请人： PIONEER ELECTRONIC CORP
发明人： SUZUKI SHINICHI , SUEMITSU HISASHI , NIRIKI TAKASHI
IPC分类号： G02B3/08 , G02B5/18
摘要： PURPOSE:To mass-produce micro Fresnel lenses by coating the smooth surface of a substrate with resist, exposing and developing the surface and thus forming an annular resist pattern, and etching it into the original plate of a micro Fresnel lens and using this as a stamper. CONSTITUTION:The smooth surface of the substrate, e.g. glass 11 is coated with resist 12, which is exposed with an electron beam, laser light, etc., and developed to form an image of annular resist 12. This glass 11 is etched to remove the resist 12, and thus the glass stamper A having annular projections and recesses on the surface is formed. A photopolymer 13 is dripped over its surface, and a glass plate 14 is pressed from above; and the photopolymer 13 is set by being irradiated with ultraviolet rays and the separated to manufacture a micro Fresnel lens which has projections and recesses (b) reverse to the projections and recesses (a) by reproducing the glass stamper A.

6. 发明专利

JPH0322601B2 失效
公开(公告)号：JPH0322601B2
公开(公告)日：1991-03-27
申请号：JP25848484
申请日：1984-12-07
申请人： PIONEER ELECTRONIC CORP
发明人： NIRIKI TAKASHI
IPC分类号： G02B3/08 , G02B5/18

7. 发明专利

JPH0226851B2 失效
公开(公告)号：JPH0226851B2
公开(公告)日：1990-06-13
申请号：JP16705484
申请日：1984-08-09
申请人： PIONEER ELECTRONIC CORP
发明人： NIRIKI TAKASHI
IPC分类号： C03C15/00 , B29C33/38 , B29D11/00 , G02B3/08

8. 发明专利

JPS61137101A Production of micro fresnel lens 失效
标题翻译：生产微型镜片
公开(公告)号：JPS61137101A
公开(公告)日：1986-06-24
申请号：JP25848484
申请日：1984-12-07
申请人： Pioneer Electronic Corp
发明人： NIRIKI TAKASHI
IPC分类号： G02B3/08 , G02B5/18
CPC分类号： G02B5/1876
摘要： PURPOSE:To improve performance by forming a titled lens of layers each of which except a resist layer has a uniform film thickness thereby making uniform the film thickness from the center to the outside circumference of the lens and maintaining an adequate sectional shape. CONSTITUTION:The film thickness of the multi-layered films 20 formed by growing a silicon oxide film 15 on a silicon wafer 14, forming a nitride film layer 16 thereon and a silicon oxide film layer 17 thereon and forming successively a nitride film layer 18 and a silicon oxide film layer 19 is made equal to the design film thickness. The resist 21 is coated on such films 20 and after an annular pattern 22 of the 1st layer is drawn, the process from development of the resist layer 21 up to the removal of the resist after the etching of the layer 19 is executed. The resist 21 is then coated on the substrate and is positioned with the pattern of the 1st layer. The annular pattern 23 of the 2nd layer is drawn and the etching of the film 18 is executed after the developing process by which the resist is removed. The section approximate to the saw tooth-shaped staircase is obtd. to the films 20 by repeating the above- mentioned similar stage.
摘要翻译：目的：为了通过形成除了抗蚀剂层之外的层的标题透镜具有均匀的膜厚度来提高性能，从而使得从透镜的中心到外周均匀的膜厚度并保持适当的截面形状。构成：通过在硅晶片14上生长氧化硅膜15，在其上形成氮化物膜层16和其上的氧化硅膜层17形成的多层膜20的膜厚度，并依次形成氮化物膜层18和使氧化硅膜层19等于设计膜厚度。抗蚀剂21涂覆在这样的膜20上，并且在第一层的环形图案22被拉伸之后，执行从抗蚀剂层21的显影直到去除蚀刻层19之后的抗蚀剂的过程。然后将抗蚀剂21涂覆在基底上并且以第一层的图案定位。绘制第二层的环状图案23，并且在除去抗蚀剂的显影处理之后执行膜18的蚀刻。接近锯齿形楼梯的部分是可以接受的。通过重复上述类似的阶段到膜20。

9. 发明专利

JPS6242102A MANUFACTURE OF MICRO FRESNEL LENS 失效
公开(公告)号：JPS6242102A
公开(公告)日：1987-02-24
申请号：JP18105385
申请日：1985-08-20
申请人： PIONEER ELECTRONIC CORP
发明人： NIRIKI TAKASHI , SUEMITSU HISASHI
IPC分类号： G02B3/08 , G02B5/18
摘要： PURPOSE:To improve lens characteristics by varying the quantity or range exposure of resist according to gamma characteristics of the resist and approximating the shape of the stepwise saw-tooth waves of the remaining film of the resist to the ideal curve of a micro Fresnel lens. CONSTITUTION:A figure (a) shows variation in the thickness of the remaining film with the quantity of exposure of the resist and a curve in a figure (b) varies the range of exposure, so its gamma characteristics are used as they are. Then, 13-18 of the same exposure are projected on this curve and shifted onto the phase shift function psi(gamma) of an ideal curve in a figure (c) to determine the exposure range of each time in a radius-(gamma) direction. At this time, the thickness of the remaining film remains according to longitudinal axes 25-30, but the exposure range in the radius-(gamma) direction is corrected by the gamma characteristic curve in the figure (b) as to the phase shift function psi(gamma), so the shape of stepwise saw-tooth waves of the remaining resist film which is formed actually conforms to the phase shift function psi(gamma) of the ideal curve in a figure (d). Consequently, lens characteristics such as primary efficiency of convergence and a beam spot diameter are improved.

10. 发明专利

JPS60123803A MANUFACTURE OF MICRO FRESNEL LENS 失效
公开(公告)号：JPS60123803A
公开(公告)日：1985-07-02
申请号：JP23149283
申请日：1983-12-09
申请人： PIONEER ELECTRONIC CORP
发明人： SUZUKI SHINICHI , SUEMITSU HISASHI , NIRIKI TAKASHI
IPC分类号： G02B5/18 , G21K1/06
摘要： PURPOSE:To improve productivity and to reduce cost by forming annular pattern layers with a higher refractive index than a colorless transparent substrate thereupon. CONSTITUTION:An oxidized film 2 is vacuum-deposited on the surface of the colorless glass substrate 1 which is polished into a specular surface, and resist is applied to form a resist layer 3. Then, the surface is irradiated with an electron beam or laser light directly or with X rays or ultraviolet rays indirectly through a mask to form an image of a necessary pattern on the resist layer 3, and development is carried out to form the annular pattern A. Then, the oxidized layer 3 is etched by using a pattern B to remove the resist layer 3. Then, Nb is diffused thermally in the surface of glass 1 by using the pattern B of the oxidized film 2 as a mask to form a diffused layer with a high refractive index in the same pattern as the pattern B and then the oxidized film 2 is removed to obtain a micro Fresnel lens.

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