基本信息:
- 专利标题: MANUFACTURE OF MICRO FRESNEL LENS
- 申请号:JP23149283 申请日:1983-12-09
- 公开(公告)号:JPS60123803A 公开(公告)日:1985-07-02
- 发明人: SUZUKI SHINICHI , SUEMITSU HISASHI , NIRIKI TAKASHI
- 申请人: PIONEER ELECTRONIC CORP
- 专利权人: PIONEER ELECTRONIC CORP
- 当前专利权人: PIONEER ELECTRONIC CORP
- 优先权: JP23149283 1983-12-09
- 主分类号: G02B5/18
- IPC分类号: G02B5/18 ; G21K1/06
摘要:
PURPOSE:To improve productivity and to reduce cost by forming annular pattern layers with a higher refractive index than a colorless transparent substrate thereupon. CONSTITUTION:An oxidized film 2 is vacuum-deposited on the surface of the colorless glass substrate 1 which is polished into a specular surface, and resist is applied to form a resist layer 3. Then, the surface is irradiated with an electron beam or laser light directly or with X rays or ultraviolet rays indirectly through a mask to form an image of a necessary pattern on the resist layer 3, and development is carried out to form the annular pattern A. Then, the oxidized layer 3 is etched by using a pattern B to remove the resist layer 3. Then, Nb is diffused thermally in the surface of glass 1 by using the pattern B of the oxidized film 2 as a mask to form a diffused layer with a high refractive index in the same pattern as the pattern B and then the oxidized film 2 is removed to obtain a micro Fresnel lens.