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1. 发明专利

JP2009235456A Solution for use in electrolytically treating trivalent-chromium plated film 有权
标题翻译：用于电镀处理镀铬薄膜的方法
公开(公告)号：JP2009235456A
公开(公告)日：2009-10-15
申请号：JP2008080755
申请日：2008-03-26
申请人： Okuno Chem Ind Co Ltd , 奥野製薬工業株式会社
发明人： KATAYAMA JUNICHI , NAGAMINE SHINGO , NAKAMURA KANAME
IPC分类号： C25D3/06 , C25D5/12
摘要： PROBLEM TO BE SOLVED: To provide a solution for use in treating a trivalent-chromium plated film, which can greatly improve a corrosion resistance of the trivalent-chromium plated film without using a hexavalent chromium compound, and to provide a treatment method therefor.
SOLUTION: The solution for use in electrolytically treating the trivalent-chromium plated film is formed of an aqueous solution containing a water-soluble trivalent chromium compound. The method for electrolytically treating the trivalent-chromium plated film includes cathodically electrolyzing an article which has the trivalent-chromium plated film thereon, in the electrolytic treatment solution.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于处理三价铬电镀膜的方法，其可以在不使用六价铬化合物的情况下大大提高三价铬镀膜的耐腐蚀性，并提供一种处理方法因此。解决方案：用于电解处理三价铬镀膜的溶液由含有水溶性三价铬化合物的水溶液形成。用于电解处理三价铬镀膜的方法包括在电解处理溶液中阴极电解其上具有三价铬镀膜的制品。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2009035806A Trivalent chromium plating bath and method of preparing the same 有权
标题翻译：多色镀铬浴及其制备方法
公开(公告)号：JP2009035806A
公开(公告)日：2009-02-19
申请号：JP2007242472
申请日：2007-09-19
申请人： Okuno Chem Ind Co Ltd , 奥野製薬工業株式会社
发明人： KATAYAMA JUNICHI , NAGAMINE SHINGO
IPC分类号： C25D3/06
摘要： PROBLEM TO BE SOLVED: To provide a trivalent chromium plating bath by which a plated film having a smooth surface, high corrosion resistance and satisfactory wear resistance is obtained with high productivity. SOLUTION: The trivalent chromium plating bath contains following components (1)-(4), that are, (1) a trivalent chromium complex solution obtained by holding at least one kind of component selected from aqueous aliphatic carboxylic acids and the salts and an aqueous solution containing a trivalent chromium compound under heating , (2) a conductive salt, (3) a pH buffer agent and (4) at least one sulfur-containing compound selected from a group comprising compounds having SO 2 group and compounds having SO 3 group. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种三价铬电镀浴，通过该镀浴，可以以高生产率获得具有光滑表面，高耐腐蚀性和令人满意的耐磨性的镀膜。解决方案：三价镀铬浴含有以下组分（1） - （4），即（1）通过保持至少一种选自脂族羧酸水溶液和盐的组分获得的三价铬络合物溶液和加热时含有三价铬化合物的水溶液，（2）导电盐，（3）pH缓冲剂和（4）至少一种选自SO 2 S 2的化合物的含硫化合物， / SB>基团和具有SO 3 基团的化合物。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2005047752A Method for controlling film structure of zinc oxide film 有权
标题翻译：控制氧化锌膜薄膜结构的方法
公开(公告)号：JP2005047752A
公开(公告)日：2005-02-24
申请号：JP2003281583
申请日：2003-07-29
申请人： Okuno Chem Ind Co Ltd , 奥野製薬工業株式会社
发明人： KATAYAMA JUNICHI
IPC分类号： C01G9/02 , C23C18/16
摘要： PROBLEM TO BE SOLVED: To provide a method for controlling the film structure of a zinc oxide film, by which the film structure such as orientation property or deposition state of the zinc oxide film can be easily controlled without using a specified catalyst substance.
SOLUTION: The film structure of the zinc oxide film can be controlled by controlling the orientation property and the deposition state of the zinc oxide film by a method comprising controlling the concentrations of zinc ions and nitric acid ions or a method comprising controlling the liquid temperature, in a composition for forming the zinc oxide film, containing zinc ions, nitric acid ions, and an amine-borane compound.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种控制氧化锌膜的膜结构的方法，通过该方法可以容易地控制氧化锌膜的取向性或沉积状态等膜结构，而不使用规定的催化剂物质。解决方案：通过控制锌离子和硝酸离子的浓度的方法，可以通过控制氧化锌膜的取向性和沉积状态来控制氧化锌膜的膜结构，或者包括控制液体温度，用于形成氧化锌膜的组合物，含有锌离子，硝酸离子和胺 - 硼烷化合物。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2003013244A Method for depositing catalyst for electroless plating onto surface of resin substrate 审中-公开
标题翻译：用于沉积在树脂基材表面上的电沉积催化剂的方法
公开(公告)号：JP2003013244A
公开(公告)日：2003-01-15
申请号：JP2001202362
申请日：2001-07-03
申请人： Okuno Chem Ind Co Ltd , 奥野製薬工業株式会社
发明人： KATAYAMA JUNICHI , NISHIMURA MITSUE , NISHIKAWA KAORI , MAEDA TAKEAKI
IPC分类号： C23C18/24 , C23C18/16 , C23C18/28
摘要： PROBLEM TO BE SOLVED: To provide a method for depositing a catalyst for electroless plating onto the surface of the resin substrate, which can reduce a consumption amount of palladium and shorten the treatment process without decreasing catalytic activity, in the process of depositing the catalyst.
SOLUTION: The method is characterized by etching the surface of the resin substrate with an etching solution including a Pd compound, and then contacting it with an aqueous solution including a reducing agent.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：提供一种在沉积催化剂的过程中，在树脂基材的表面上沉积无电镀催化剂的方法，其可以降低钯的消耗量并缩短处理过程而不降低催化活性。解决方案：该方法的特征在于用包含Pd化合物的蚀刻溶液蚀刻树脂基材的表面，然后使其与包含还原剂的水溶液接触。

5. 发明专利

JP2014234524A ３価クロムめっき用アノードの再生処理方法有权
标题翻译：再生镀铬阳极的方法
公开(公告)号：JP2014234524A
公开(公告)日：2014-12-15
申请号：JP2013115113
申请日：2013-05-31
申请人：奥野製薬工業株式会社 , Okuno Chem Ind Co Ltd
发明人： KATAYAMA JUNICHI , AIDA CHIAKI
IPC分类号： C25D13/22
摘要：【課題】3価クロムめっき浴中での6価クロムの生成を抑制するための有効な手段を提供する。【解決手段】導電性の電極基体上に金属酸化物を含む被覆を施した不溶性電極からなる3価クロムめっき用アノードの再生処理方法であって、無機酸及び/又は有機酸を含有するpHが3以下の酸性水溶液からなる再生処理液中において、3価クロムめっき処理に用いたアノードを陰極として、電解処理を行うことを特徴とする3価クロムめっき用アノードの再生処理方法。【選択図】なし
摘要翻译：要解决的问题：提供抑制三价铬电镀浴中六价铬的形成的有效手段。解决方案：一种再生三价铬电镀阳极的方法，该方法由通过用导电电极基体覆盖形成的不溶性电极组成，包含金属氧化物的涂层包括在由三价铬镀层中用作阳极的阳极作为阴极进行电解处理的再生处理溶液中，所述再生处理溶液由含有无机酸的pH为3以下的酸性水溶液和/ 或有机酸。

6. 发明专利

JP2009215581A Method of removing metallic impurities in trivalent chromium bath 有权
标题翻译：去除铬酸盐浴中金属污染物的方法
公开(公告)号：JP2009215581A
公开(公告)日：2009-09-24
申请号：JP2008058237
申请日：2008-03-07
申请人： Okuno Chem Ind Co Ltd , 奥野製薬工業株式会社
发明人： KATAYAMA JUNICHI , NAGAMINE SHINGO
IPC分类号： C25D21/18
摘要： PROBLEM TO BE SOLVED: To provide a method of efficiently reducing metallic impurities accumulated in the 3-valent chromium plating bath and having adverse effect on plating performance in an inexpensive process with a simple operation without deteriorating the productivity. SOLUTION: The method of removing the metallic impurities from the 3-valent chromium plating bath is carried out by electrolyzing the 3-valent chromium plating bath with a cathode current density lower than that in the chromium plating. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种有效降低在3价铬镀液中积累的金属杂质的方法，并且在不降低生产率的情况下以简单的操作在廉价的方法中对电镀性能具有不利影响。解决方案：从3价镀铬浴中除去金属杂质的方法是通过以比铬镀层低的阴极电流密度电解3价镀铬浴来进行的。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2008231459A Method for forming electroconductive film on polyimide resin 审中-公开
标题翻译：在聚酰胺树脂上形成电极膜的方法
公开(公告)号：JP2008231459A
公开(公告)日：2008-10-02
申请号：JP2007068787
申请日：2007-03-16
申请人： Okuno Chem Ind Co Ltd , 奥野製薬工業株式会社
发明人： MURAKAMI TOMOHISA , KATAYAMA JUNICHI
IPC分类号： C23C18/50 , C23C18/16 , C23C28/02 , H05K3/18
摘要： PROBLEM TO BE SOLVED: To provide a method for forming an electroconductive film having both of excellent adhesiveness and excellent etchability on a polyimide resin, by using an electroless plating solution which is safer than a copper electroless plating solution that is conventionally used.
SOLUTION: The method for forming the electroconductive film on the polyimide resin includes forming a plated film of a copper-nickel alloy containing 20 to 70 wt.% nickel on the polyimide resin, by using an autocatalytic electroless plating solution containing hypophosphorous acid or a salt thereof as a reducing agent.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种形成导电膜的方法，其具有在聚酰亚胺树脂上具有优异的粘附性和优异的蚀刻性，通过使用比常规使用的铜化学镀溶液更安全的化学镀溶液。解决方案：在聚酰亚胺树脂上形成导电膜的方法包括在聚酰亚胺树脂上形成含有20至70重量％镍的铜镍合金的镀膜，使用含有次磷酸的自催化无电镀溶液或其盐作为还原剂。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2003013245A Method for forming electroconductive coating on resin substrate 有权
标题翻译：在树脂基材上形成电接触涂层的方法
公开(公告)号：JP2003013245A
公开(公告)日：2003-01-15
申请号：JP2001192650
申请日：2001-06-26
申请人： Okuno Chem Ind Co Ltd , 奥野製薬工業株式会社
发明人： KATAYAMA JUNICHI , NAKAGISHI YUTAKA , NAWAFUNE HIDEMI , AKAMATSU KENSUKE
IPC分类号： C23C18/28 , H05K3/18 , H05K3/38
摘要： PROBLEM TO BE SOLVED: To provide a method for forming an electroconductive coating capable of substituting for an electroless plating method, which can form an electroconductive film having high adhesiveness even to the flat surface of a resin. SOLUTION: The method for forming the electroconductive coating onto the resin substrate is characterized by treating the resin substrate with the method including the steps of (1) introducing an acidic group into the resin substrate, (2) contacting the resin substrate treated in the above step (1) with a solution including metal ions, (3) converting the metal ions adsorbed or bonded to the resin substrate in the above step (2) into metal compounds, and (4) forming the electroconductive film on the resin substrate by reducing the resin substrate treated in the above step (3).
摘要翻译：要解决的问题：提供一种用于形成能够代替化学镀方法的导电涂层的方法，其可以形成即使对于树脂的平坦表面具有高粘合性的导电膜。解决方案：用于在树脂基板上形成导电涂层的方法的特征在于用包括以下步骤的方法处理树脂基板：（1）将酸性基团引入到树脂基板中，（2）使上述处理的树脂基板接触步骤（1）用包含金属离子的溶液，（3）将上述步骤（2）中吸附或结合到树脂基板上的金属离子转化为金属化合物，和（4）通过还原在树脂基板上形成导电膜在上述步骤（3）中处理的树脂基板。

9. 发明专利

JP2010209456A Immersion treatment liquid for rust prevention of plated chromium film, and rust-preventing treatment method 有权
标题翻译：用于防止镀铬膜的浸渍处理液和防止预处理方法
公开(公告)号：JP2010209456A
公开(公告)日：2010-09-24
申请号：JP2009139490
申请日：2009-06-10
申请人： Okuno Chem Ind Co Ltd , 奥野製薬工業株式会社
发明人： KATAYAMA JUNICHI , NAGAMINE SHINGO
IPC分类号： C23C22/33 , C23C22/30 , C25D11/38
摘要： PROBLEM TO BE SOLVED: To provide a rust-preventing treatment liquid which can greatly improve corrosion resistance not only of a plated chromium film obtained from a trivalent chromium bath but also of a plated chromium film obtained from a hexavalent chromium bath, gives little harmful effect on the environment, and does not contain a hexavalent chromium compound, and to provide a rust-preventing treatment method. SOLUTION: The immersion treatment liquid for the rust prevention of the plated chromium film is formed of an aqueous solution containing chromium phosphate. The method for rust-preventing treatment of the plated chromium film includes immersing an article having the plated chromium film thereon into the treatment liquid and further electrolyzing the article in an aqueous solution containing a water-soluble trivalent chromium compound as necessary. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种可以大大提高耐蚀性的防锈处理液，不仅可以由三价铬浴得到的镀铬膜，而且还可以从六价铬浴获得的镀铬膜，对环境几乎没有有害影响，并且不含有六价铬化合物，并且提供防锈处理方法。解决方案：用于防止镀铬铬膜的浸渍处理液由含有磷酸铬的水溶液形成。镀铬铬膜的防锈处理方法包括将具有镀覆铬膜的制品浸入处理液中，并根据需要在含有水溶性三价铬化合物的水溶液中进一步电解该制品。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2010189673A Trivalent chromium plating bath 有权
标题翻译： TRIVALENT铬镀层浴
公开(公告)号：JP2010189673A
公开(公告)日：2010-09-02
申请号：JP2009032740
申请日：2009-02-16
申请人： Okuno Chem Ind Co Ltd , 奥野製薬工業株式会社
发明人： KATAYAMA JUNICHI , NAGAMINE SHINGO
IPC分类号： C25D3/06
摘要： PROBLEM TO BE SOLVED: To provide a trivalent chromium plating bath capable of forming a trivalent chromium plating film more excellent in corrosion resistance than heretofore. SOLUTION: The trivalent chromium plating bath comprises an aqueous solution which contains a water-soluble trivalent chromium compound, a conductive salt, a pH buffer agent, a sulfur-containing compound and amino carboxylic acids. A method of chromium plating is characterized in that electrolytic treatment is performed by using a subject to be plated as a cathode in the trivalent chromium plating bath. An article having chromium-plated film formed by using the trivalent chromium plating bath is also provided. COPYRIGHT: (C)2010,JPO&INPIT

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