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1. 发明专利

JP2013108097A Modifier for resin and resin composition including the modifier 有权
标题翻译：用于树脂和树脂组合物的改性剂，包括改性剂
公开(公告)号：JP2013108097A
公开(公告)日：2013-06-06
申请号：JP2013048043
申请日：2013-03-11
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： SAKAMOTO KANA , FUJIKI TAKESHI , YAMADA MASAHIRO , SAKAMOTO HIRONORI , TANAKA AKIRA , TOKUMITSU KATSUHISA
IPC分类号： C08L23/06 , C08K5/54 , C08L83/16
摘要： PROBLEM TO BE SOLVED: To enhance or improve flowability in melt molding of resins, such as engineering plastics.SOLUTION: A modifier composed of a polysilane compound is added to a resin (for example, a thermoplastic resin, such as a polyamide-based resin, a polyester-based resin, a polyacetal resin, a polycarbonate resin, a poly(thio)ether-based resin, a polysulfone-based resin, a polyketone-based resin, a polyimide-based resin, an ultrahigh molecular weight polyolefin-based resin, and a fluorine-based resin). The polysilane compound may be, for example, polyalkylarylsilane (such as polymethylphenylsilane), polydiarylsilane (such as polydiphenylsilane), etc. The modifier can be added to the resin, for example, in such an amount of 0.1-50 pts.wt. based on 100 pts.wt. of the resin.
摘要翻译：要解决的问题：提高或提高树脂（如工程塑料）的熔融成型流动性。解决方案：将由聚硅烷化合物组成的改性剂加入到树脂中（例如，聚酰胺类树脂，聚酯类树脂，聚缩醛树脂，聚碳酸酯树脂，聚（硫醚）醚系树脂，聚砜系树脂，聚酮系树脂，聚酰亚胺系树脂，超高分子量聚烯烃系树脂，氟系树脂等）。聚硅烷化合物可以是例如聚烷基芳基硅烷（例如聚甲基苯基硅烷），聚二芳基硅烷（例如聚二苯基硅烷）等。可以将改性剂加入树脂中，例如以0.1-50重量份的量加入到树脂中。基于100重量的树脂。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2011180269A Photosensitive resin composition, thin film thereof and pattern forming method 有权
标题翻译：光敏树脂组合物，薄膜及其形成方法
公开(公告)号：JP2011180269A
公开(公告)日：2011-09-15
申请号：JP2010042667
申请日：2010-02-26
申请人： Japan Science & Technology Agency , Osaka Gas Co Ltd , Osaka Municipal Technical Research Institute , 地方独立行政法人大阪市立工業研究所 , 大阪瓦斯株式会社 , 独立行政法人科学技術振興機構
发明人： KAWASAKI SHINICHI , FUJIKI TAKESHI , MATSUKAWA KOYO , HAMADA TAKASHI
IPC分类号： G03F7/038 , G03F7/004 , G03F7/075 , G03F7/40 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide: a photosensitive resin composition which has high photoreactivity, can be patterned and can form a film with high hydrophobicity and excellent dielectric properties; a thin film of the composition; and a pattern forming method.
SOLUTION: The photosensitive resin composition comprising a block copolymer and a photoacid generator, the block copolymer having a block containing a cationic polymerizable group (a polymer block of an epoxy group-containing vinyl monomer) and a polysilane block, is applied to a substrate, and a formed coating film is selectively exposed to actinic rays and developed to thereby form a film pattern (a protective film or an insulating film) with high hydrophobicity and excellent dielectric properties through photocationic polymerization of the cationic polymerizable group and photocleavage of the polysilane block. The film is useful to form a thin film transistor using an organic semiconductor layer.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供：具有高的光反应性的感光性树脂组合物，可以被图案化并且可以形成具有高疏水性和优异的介电性能的膜; 该组合物的薄膜; 和图案形成方法。解决方案：将包含嵌段共聚物和光致酸产生剂的嵌段共聚物（含有阳离子可聚合基团的嵌段（含环氧基的乙烯基单体的聚合物嵌段）和聚硅烷嵌段）的光敏树脂组合物施加到基板和成膜的涂膜选择性地暴露于光化学射线并显影，从而通过阳离子可聚合基团的光阳离子聚合形成具有高疏水性和优异的介电性能的膜图案（保护膜或绝缘膜）聚硅烷嵌段。该薄膜可用于形成使用有机半导体层的薄膜晶体管。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2010111876A Fluorene-based composition and molded product of the same 有权
标题翻译：基于氟的组合物及其成型产品
公开(公告)号：JP2010111876A
公开(公告)日：2010-05-20
申请号：JP2009298393
申请日：2009-12-28
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： YAMADA MASAHIRO , KAWASAKI SHINICHI , MURASE HIROAKI , FUJIKI TAKESHI , SAKAMOTO HIRONORI , KOBORI KANA , TANAKA MASASHI , HIGASHIYAMA MASARU , YAMADA MITSUAKI , SUDA YASUHIRO
IPC分类号： C08L101/02 , C08K3/04 , C08L101/00 , C09D133/00 , C09D163/00 , C09D169/00 , C09D175/04
摘要： PROBLEM TO BE SOLVED: To provide a fluorene-based composition which is excellent in dispersibility of an additive and can exhibit the function of the additive with a small amount of compounding thereof, and to provide a molded product of the fluorene-based composition. SOLUTION: The fluorene-based composition comprising: a compound or a derivative thereof represented by formula (I) and the additive is prepared, and the molded body is formed by using the composition. In the formula, X 1 and X 2 are identical to each other or different from each other and are hydroxy group or -O(AO) p H group (therein, A represents 2-3C alkylene group and p denotes an integer of 1 or more). COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：待解决的问题：提供一种添加剂的分散性优异的芴类组合物，并且可以通过少量配混发挥添加剂的功能，并提供芴基的成型品组成。解决方案：制备包含由式（I）表示的化合物或其衍生物和添加剂的芴基组合物，并且通过使用该组合物形成成型体。在该式中，X 1 和X 2 彼此相同或彼此不同，为羟基或-O（AO） p

4. 发明专利

JP2009235358A Polysilane resin composition 有权
标题翻译：多晶树脂组合物
公开(公告)号：JP2009235358A
公开(公告)日：2009-10-15
申请号：JP2008086892
申请日：2008-03-28
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： FUJIKI TAKESHI , OSAWA SHINGO , YAMADA MASAHIRO
IPC分类号： C08L83/16 , C08K5/1515 , C08K5/54 , G02F1/1337
摘要： PROBLEM TO BE SOLVED: To provide a resin composition high in water repellency, heat resistance, and transparency.
SOLUTION: The resin composition includes a polysilane and a hydrophobic alkyl compound. The polysilane may contain at least one selected from polymonoaryl silane units, polydiaryl silane units, and polyalkyl aryl silane units. Further, the polysilane may contain at least one selected from mono 6-20C arylsilane units, and 1-6C alkyl 6-20C aryl saline units. The hydrophobic alkyl compound may contain a 6-24C alkyl group and at least one selected from a polymeric unsaturated group, a hydrolytically condensable group, a hydroxyl group, an alkoxy group, a mercapto group, an alkylthio group, a halogen atom, a carboxyl group, an alkoxycarbonyl group, a carbonyl halide group, an epoxy group and an isocyanate group.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供具有高斥水性，耐热性和透明性的树脂组合物。解决方案：树脂组合物包括聚硅烷和疏水性烷基化合物。聚硅烷可以含有选自多元芳基硅烷单元，聚二芳基硅烷单元和聚烷基芳基硅烷单元中的至少一种。此外，聚硅烷可以含有选自单6-20C芳基硅烷单元和1-6C烷基6-20C芳基盐单元中的至少一种。疏水性烷基化合物可以含有6-24C烷基和选自聚合不饱和基团，水解缩合基团，羟基，烷氧基，巯基，烷硫基，卤原子，羧基中的至少一种烷氧基羰基，羰基卤基，环氧基和异氰酸酯基。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2008266433A Polysilane and its manufacturing method 有权
标题翻译：多晶硅及其制造方法
公开(公告)号：JP2008266433A
公开(公告)日：2008-11-06
申请号：JP2007110128
申请日：2007-04-19
申请人： Osaka Gas Co Ltd , 大阪瓦斯株式会社
发明人： OSAWA SHINGO , SAKAMOTO HIRONORI , FUJIKI TAKESHI
IPC分类号： C08G77/60 , C08L63/00 , C08L83/16
摘要： PROBLEM TO BE SOLVED: To provide a polysilane which excels in curability, can independently cure even in the absence of a curing agent, and is useful as a curing agent for thermosetting resins such as an epoxy resin. SOLUTION: The polysilane is constituted of a structural unit represented by formula (1a) (wherein R 1a is an aryl group which may have a substituent) and a structural unit represented by formula (1b) [wherein R 1b is an alkyl group which may have a substituent, and when R 1a in the above formula (1a) is a phenyl group, R 1b in the formula (1b) may be a methyl group]. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供固化性优异的聚硅烷，即使在不存在固化剂的情况下也可以独立地固化，并且可用作热固性树脂如环氧树脂的固化剂。解决方案：聚硅烷由式（1a）表示的结构单元（其中R 1a 是可具有取代基的芳基）和由式（1b）表示的结构单元构成， [其中R“SP”是可以具有取代基的烷基，并且当上述式（1a）中的R“1”是苯基时，R“ 式（1b）中的/ SP>可以是甲基]。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2008111138A Fluorene-containing resin 审中-公开
标题翻译：含氟树脂
公开(公告)号：JP2008111138A
公开(公告)日：2008-05-15
申请号：JP2008020932
申请日：2008-01-31
申请人： Nagase Chemtex Corp , Osaka Gas Co Ltd , ナガセケムテックス株式会社 , 大阪瓦斯株式会社
发明人： FUJIKI TAKESHI , SAKAMOTO HIRONORI , MORITA TAKAYUKI , HOSOMI TETSUYA , TAMAKOSHI HIDEAKI
IPC分类号： C08G59/04 , C08G59/30
摘要： PROBLEM TO BE SOLVED: To provide a thermosetting or photo-curable resin capable of forming a cured material having a high refractive index, excellent heat resistance and electric characteristics, and also being excellent in patterning property. SOLUTION: The specific epoxy resin having a fluorene skeleton, an epoxy acrylate resin and an alkali-soluble irradiation polymerizable unsaturated resin containing fluorene are provided. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供能够形成折射率高，耐热性和电特性优异的固化物的热固性或光固化树脂，并且图案化性能优异。提供具有芴骨架的特定环氧树脂，环氧丙烯酸酯树脂和含有芴的碱溶性照射可聚合不饱和树脂。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2006241224A Alkali-soluble resin 有权
标题翻译： ALKALI-SOLUBLE树脂
公开(公告)号：JP2006241224A
公开(公告)日：2006-09-14
申请号：JP2005055792
申请日：2005-03-01
申请人： Nagase Chemtex Corp , Osaka Gas Co Ltd , ナガセケムテックス株式会社 , 大阪瓦斯株式会社
发明人： MURASE HIROAKI , FUJIKI TAKESHI , SAKAMOTO HIRONORI , MORITA TAKAYUKI , KITANO KEI , HOSOMI TETSUYA
IPC分类号： C08G63/133 , G03F7/023 , G03F7/027
摘要： PROBLEM TO BE SOLVED: To provide an alkali-soluble resin composition constituting the main component of a radiation-sensitive resin composition capable of forming a resist film which is excellent in sensitivity, residual film ratio, developability, resolution, adhesion to various kinds of substrates, transparency in the visible light region, thermal discoloration and chemical resistance, particularly has a very high heat resistance and easily forms desired patterns under a variety of curing conditions. SOLUTION: The alkali-soluble resin is obtained by reacting an epoxy ester compound, a polyhydric alcohol and a polybasic carboxylic acid or its anhydride. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供构成敏感性，残留膜比，显影性，分辨率，各种粘合性的抗敏剂膜的能够形成抗蚀剂膜的辐射敏感性树脂组合物的主要成分的碱溶性树脂组合物基板种类，可见光区域的透明性，耐热变色性和耐化学性，特别是具有很高的耐热性，在各种固化条件下容易形成所需的图案。解决方案：碱溶性树脂通过使环氧酯化合物，多元醇和多元羧酸或其酸酐反应而获得。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2006119383A Infrared absorbing filter and infrared absorbing panel 有权
标题翻译：红外吸收滤光片和红外吸收面板
公开(公告)号：JP2006119383A
公开(公告)日：2006-05-11
申请号：JP2004307486
申请日：2004-10-21
申请人： Osaka Gas Co Ltd , Teijin Chem Ltd , 大阪瓦斯株式会社 , 帝人化成株式会社
发明人： YAMADA MASAHIRO , FUJIKI TAKESHI , KAWASAKI SHINICHI , YAMADA MITSUAKI , YANAGIDA TAKATSUNE , ANDO MASATOSHI , IMANAKA YOSHIHIKO
IPC分类号： G02B5/22 , C08G64/06 , C09B47/08 , C09B47/30 , C09B53/00 , C09B57/10 , C09K3/00
CPC分类号： C09B53/02 , C08G64/0208 , C08G64/04 , C08G64/1608 , C08J5/18 , C08J2369/00 , C08K5/0041 , C09B47/08 , C09B47/30 , G02B5/208 , C08L69/00
摘要： PROBLEM TO BE SOLVED: To obtain a near-infrared absorbing filter in which a near-infrared absorbing dye can be uniformly contained or dispersed at a high concentration, and which has high performance and excellent durability and can be used for a plasma display, a CCD camera, etc. SOLUTION: The near-infrared absorbing filter consists of a polycarbonate resin having a fluorene skeleton represented by formula (1) and a dye having near-infrared absorbing power. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：解决的问题：为了获得能够以高浓度均匀地包含或分散近红外线吸收染料并且具有高性能和优异的耐久性并可用于等离子体的近红外吸收滤光器显示器，CCD照相机等。解决方案：近红外吸收滤光器由具有由式（1）表示的芴骨架的聚碳酸酯树脂和具有近红外吸收能力的染料组成。版权所有（C）2006，JPO＆NCIPI

9. 发明专利

JP2005314712A Composition for forming metal particulate and metal particulate 审中-公开
标题翻译：用于形成金属颗粒和金属颗粒的组合物
公开(公告)号：JP2005314712A
公开(公告)日：2005-11-10
申请号：JP2004130750
申请日：2004-04-27
申请人： Osaka City , Osaka Gas Co Ltd , 大阪市 , 大阪瓦斯株式会社
发明人： FUJIKI TAKESHI , KAWASAKI SHINICHI , MURASE HIROAKI , SAKAMOTO HIRONORI , TANAKA MASASHI , MATSUKAWA KOYO , MATSUURA YUKITO
IPC分类号： B01J19/12 , B22F1/00 , B22F9/24 , C08K3/10 , C08L83/16 , C09D5/24 , C09D7/12 , C09D183/14 , C09D183/16
摘要： PROBLEM TO BE SOLVED: To provide a composition with which metal particulate (particularly, metal nanoparticle) can be easily and efficiently formed at high reducibility. SOLUTION: The composition is composed of: a polysilane compound; and a metal compound (e.g., a noble metal compound) capable of forming the metal particulate by reduction. The polysilane compound may be a copolymer of polysilane and a vinyl monomer comprising a unit having affinity for the metal compound and/or metal particulate. The ratio of the metal compound may be, e.g., about 1 to 40 pts.wt. to 100 pts.wt. of the polysilane compound. By allowing active energy rays to act on the composition, the polysilane compound is decomposed, thus the metal particulate (particularly, nanoparticle) can be formed. The method can be applied to various methods, and, e.g., it is also possible that the composition is applied to a substrate, so as to be exposed to form metal particulate, and further, development is performed, thus a metal particulate-containing pattern is formed. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供可以以高还原性容易且有效地形成金属颗粒（特别是金属纳米颗粒）的组合物。该组合物由聚硅烷化合物组成; 以及能够通过还原形成金属颗粒的金属化合物（例如，贵金属化合物）。聚硅烷化合物可以是聚硅烷和乙烯基单体的共聚物，其包含对金属化合物和/或金属颗粒具有亲和性的单元。金属化合物的比例可以是例如约1至40重量份。到100磅的聚硅烷化合物。通过允许活性能量射线作用于组合物，聚硅烷化合物被分解，因此可以形成金属颗粒（特别是纳米颗粒）。该方法可以应用于各种方法，例如，也可以将组合物施加到基材上，以暴露于形成金属颗粒，进一步进行显影，从而形成含金属颗粒的图案形成了。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2005314692A Photo-polymerizable resin composition and its cured product 有权
标题翻译：光聚合树脂组合物及其固化产品
公开(公告)号：JP2005314692A
公开(公告)日：2005-11-10
申请号：JP2005104051
申请日：2005-03-31
申请人： Osaka City , Osaka Gas Co Ltd , 大阪市 , 大阪瓦斯株式会社
发明人： MURASE HIROAKI , KAWASAKI SHINICHI , FUJIKI TAKESHI , YAMADA MITSUAKI , MATSUKAWA KOYO , MATSUURA YUKITO , MOTOKAWA TAKUYA
IPC分类号： C08G59/24
摘要： PROBLEM TO BE SOLVED: To provide a photo-polymerizable resin composition which has high adhesiveness to substrates and can produce cured products having excellent mechanical characteristics (hardness, heat resistance, and the like) and excellent optical characteristics such as high transparency and a high refractive index. SOLUTION: This photo-polymerizable resin composition comprises a fluorene skeleton-having epoxy resin [for example, a 9,9-bis(monohydroxyphenyl)fluorene diglycidyl ether, a 9,9-bis(monohydroxyphenyl)fluorene 2-4C alkylene oxide diglycidyl ether, or the like], an alkoxysilane and a photo acid generator. The alkoxysilane may be an aryltrialkoxysilane, an epoxy group-having trialkoxysilane, a tetraalkoxysilane, an alkoxysilane condensation product, or the like. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种对基材具有高粘合性并且可以生产具有优异的机械特性（硬度，耐热性等）的固化产物和优异的光学特性（如高透明度和高透光性）的光聚合性树脂组合物，高折射率。解决方案：该可光聚合树脂组合物包含具有芴骨架的环氧树脂[例如9,9-双（一羟基苯基）芴二缩水甘油醚，9,9-双（一羟基苯基）芴2-4C亚烷基氧化二缩水甘油醚等]，烷氧基硅烷和光酸发生剂。烷氧基硅烷可以是芳基三烷氧基硅烷，具有三烷氧基硅烷的环氧基，四烷氧基硅烷，烷氧基硅烷缩合产物等。版权所有（C）2006，JPO＆NCIPI

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