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1. 发明专利

JP2003200034A HYDROTHERMAL REACTION APPARATUS AND ITS OPERATING METHOD 审中-公开
公开(公告)号：JP2003200034A
公开(公告)日：2003-07-15
申请号：JP2002004609
申请日：2002-01-11
申请人： ORGANO KK
发明人： NAKAMORI OSAMU , SUZUKI AKIRA , KAWASAKI SHINICHIROU , IWAMORI TOMOYUKI , FUJII TOMONORI , ANJO TOKUYUKI
IPC分类号： A62D3/20 , A62D3/34 , A62D3/38 , A62D101/22 , A62D101/28 , B01J3/00 , B01J3/02 , C07B35/06 , C07B37/08 , C07C25/18 , A62D3/00
摘要： PROBLEM TO BE SOLVED: To provide a hydrothermal reaction apparatus constituted so that the harmful liquid to be treated does not remain undecomposed when the operation of the hydrothermal reaction apparatus is stopped. SOLUTION: The apparatus is a supercritical water oxidation apparatus 60 which is provided with a flushing air supplying pipe 62 for supplying flushing air to a pipe 14 of the liquid to be treated and a three-fluid nozzle 42 at the inlet of a reactor in addition to the constitution of the conventional supercritical water oxidation apparatus. The pipe 62 is branched from an air supplying pipe 18 and joined with the pipe 14 just after a stop valve 15 on the upstream side of the junction of a cleaning liquid supplying pipe 40. The pipe 40 is branched from an auxiliary fuel supplying pipe 22 and connected to the pipe 14 on the downstream side of the valve 15. When the reactor is kept at a prescribed temperature, PCB in the pipe 14 is displaced with IPA and then PCB is displaced/flushed with air so that a very small amount of the remaining PCB stuck to the pipe 14 and the PCB contained in the IPA stuck to the pipe 14 can be sent into the reactor completely. COPYRIGHT: (C)2003,JPO

2. 发明专利

JP2003164751A HYDROTHERMAL OXIDATION REACTOR 审中-公开
公开(公告)号：JP2003164751A
公开(公告)日：2003-06-10
申请号：JP2001366434
申请日：2001-11-30
申请人： ORGANO KK
发明人： FUJII TOMONORI , SUZUKI AKIRA , IWAMORI TOMOYUKI , ANJO TOKUYUKI , NAKAMORI OSAMU
IPC分类号： A62D3/00 , B01D61/08 , B01D61/44 , B01D61/46 , B01D61/58 , B01J3/00 , C02F1/44 , C02F1/469 , C07B35/06 , C07B37/06 , C07C25/18
摘要： PROBLEM TO BE SOLVED: To provide a hydrothermal oxidation reactor equipped with a means for efficiently separating ions in fluid to be treated. SOLUTION: A supercritical water oxidation apparatus 40 has the same structure as conventional supercritical water oxidation apparatus, except that the apparatus 40 has an electrodialyzer 42 on the downstream side of a liquid level control valve 27 in a liquid outflow pipe 24 going out of a gas-liquid separator 20. The electrodialyzer 42 separates the ions in the fluid to be treated by an electrodialysis method to make deionized water flow out of a deionized water pipe 44 and to make ion-concentrated water flow out of a salt- concentrated water pipe 46. COPYRIGHT: (C)2003,JPO

3. 发明专利

JP2003117378A HYDROTHERMAL ORGANIC SUBSTANCE SEPARATING DEVICE AND HYDROTHERMAL ORGANIC SUBSTANCE SEPARATING METHOD 审中-公开
公开(公告)号：JP2003117378A
公开(公告)日：2003-04-22
申请号：JP2001320522
申请日：2001-10-18
申请人： ORGANO KK
发明人： FUJII TOMONORI , SUZUKI AKIRA , FUTATSUGI TAKASHI
IPC分类号： G02F1/1333 , B01J3/00 , B01J3/02 , B01J3/03 , B09B3/00
摘要： PROBLEM TO BE SOLVED: To provide an industrial device which hydrothermally separates an organic object substance from a body to be treated by a hydrothermal reaction. SOLUTION: This hydrothermal organic substance separating device 30 which separates liquid crystal from a liquid crystal panel by a hydrothermal reaction is provided with a reactor 32, a hot water circulating system 34 which circulates hot water to the reactor, an outflow pipe 38 which has a pressure regulation valve 36 and is connected with the reactor, a condenser 40 which is disposed on the outflow pipe 38 on the upstream of the pressure regulation valve and a gas-liquid separator 42. The reactor is formed as a closed vessel 32a having a freely openable and closable cover part 44, houses liquid crystal panels P in reacting cages 46 which are communicated with each other inside and outside a cage wall and the reacting cages are stored in the vessel. An electric furnace 48 is disposed outside the reactor. The hot water circulating system 34 is provided with a hot water extracting pipe 52 which is connected with the bottom part of the reactor via an opening/closing valve 50, a hot water circulating pump 54 and a hot water supplying pipe 58 which is connected from the discharge side of the hot water circulating pump to the cover part via an opening/closing valve 56.

4. 发明专利

JP2002233746A SUPERCRITICAL WATER REACTION DEVICE 失效
公开(公告)号：JP2002233746A
公开(公告)日：2002-08-20
申请号：JP2001033778
申请日：2001-02-09
申请人： ORGANO KK
发明人： ANJO TOKUYUKI , SUZUKI AKIRA , IWAMORI TOMOYUKI , KAWASAKI SHINICHIROU , FUJII TOMONORI
IPC分类号： A62D3/00 , A62D3/20 , A62D3/33 , A62D3/34 , A62D3/36 , A62D3/38 , A62D101/22 , A62D101/28 , B01F3/04 , B01J3/00 , B01J3/02 , C02F1/74
摘要： PROBLEM TO BE SOLVED: To provide a supercritical water reaction device capable of keeping the concentration of an organic chlorine compound in a gas to be released into the atmosphere at a level below a specified value, when a liquid to be treated containing the organic chlorine compound is treated by a supercritical water reaction process. SOLUTION: This supercritical water reaction device 40 is of the same structure as the conventional devices excepting the construction of a gaseous component outflow system 42 connected to a gas/liquid separator 20. The gaseous component outflow system 42 is composed of gas/liquid contact vessels 44A and 44B and gas storage vessels 46A and 46B for storing a gas component which is obtained through a gas/liquid contact, and the system 42 is equipped with two gas/liquid contact lines A and B which are alternately operated independently of each other and a single adsorption vessel 48 installed downstream in the gas/liquid contact line. The gas/liquid contact vessels 44A and 44B store water in the lower parts and are each equipped with an introduction nozzle 56 which introduces the gaseous component separated by the gas/liquid separator 20 into water stored in the gas/liquid contact vessels 44A and 44B, in the lower part. The gaseous component outflow system 42 is equipped with an analysis meter 60 in order to ensure that the concentration of the PCB content of the gaseous component stored in the gas storage vessels 46A and 46B is below a reference valve.

5. 发明专利

JP2002136860A SUPERCRITICAL WATER REACTION APPARATUS 失效
公开(公告)号：JP2002136860A
公开(公告)日：2002-05-14
申请号：JP2000338792
申请日：2000-11-07
申请人： ORGANO KK
发明人： FUJII TOMONORI , ANJO TOKUYUKI , KAWASAKI SHINICHIROU , SUZUKI AKIRA
IPC分类号： A62D3/00 , A62D3/176 , A62D3/20 , A62D3/30 , A62D3/34 , A62D3/36 , A62D3/38 , A62D101/22 , A62D101/28 , B01J3/00 , B01J19/12 , C07B35/06 , C07B37/06 , C07B61/00
摘要： PROBLEM TO BE SOLVED: To provide a supercritical water reaction apparatus provided with a structure to control the concentration of an organic chlorine compound in a treating liquid to equal to or below the emission standard value regardless of the operation form of the supper critical water reaction apparatus at the time of treating the organic chlorine compound by a supercritical water reaction. SOLUTION: The supercritical water reaction apparatus 40 is provided with a reactor 12 and a cooler 16, a pressure control valve 18 and a gas-liquid separator 18, which are provided successively in a treating liquid pipe 14 for allowing the treating liquid to flow out from the reactor. In the apparatus, a liquid to be treated, which contains the organic chlorine compound, is introduced into the reactor housing the supercritical water, treated with supercritical water reaction to oxidize and decompose the organic chlorine compound and next, the treated liquid flowing out from the reactor is cooled in the cooler, the flow rate of the treated liquid is adjusted by the pressure control valve to control the pressure of the reactor and the treated liquid is gas-liquid separated in the gas-liquid separator. An ultraviolet irradiation device is provided in a liquid to be treated pipe in the down stream of the reactor in the apparatus as a secondary oxidation reactor accelerating the oxidation decomposition of the organic chlorine compound and is regularly operated.

6. 发明专利

JP2003175392A METHOD AND SYSTEM FOR HYDROTHERMAL OXIDATION 审中-公开
公开(公告)号：JP2003175392A
公开(公告)日：2003-06-24
申请号：JP2002240409
申请日：2002-08-21
申请人： ORGANO KK
发明人： FUJII TOMONORI , SUZUGAKI HIROSHI , SUZUKI AKIRA , OE TARO
IPC分类号： B01D61/44 , B01J3/00 , C02F1/44 , C02F1/469 , C02F1/74 , C02F11/08 , C07B35/06
摘要： PROBLEM TO BE SOLVED: To provide a method for hydrothermal oxidation for treating liquid containing a highly concentrated ions or salts. SOLUTION: In the method of hydrothermal oxidation, a to-be-treated liquid is filtered, and solid and suspended matters are removed in a step S1. The treated liquid is heated to a predetermined temperature, e.g. 40°C in order to improve efficiency of electrodialytic treatment in a step S2, and the liquid is subjected to the electrodialysis treatment to reduce as far as possible inorganic ions in the liquid containing organic substances in a step S3. In a step S4, dilute solution of the liquid is subjected to a supercritical-water oxidation treatment of one kind of hydrothermal oxidation treatment. COPYRIGHT: (C)2003,JPO

7. 发明专利

JP2002095953A REACTION DEVICE FOR SUPERCRITICAL WATER 失效
公开(公告)号：JP2002095953A
公开(公告)日：2002-04-02
申请号：JP2000286401
申请日：2000-09-21
申请人： ORGANO KK
发明人： FUJII TOMONORI , IWAMORI TOMOYUKI , KURAMOCHI TARO , SUZUKI AKIRA
IPC分类号： A62D3/20 , A62D3/38 , A62D101/22 , A62D101/28 , B01J3/00 , B01J3/02 , C02F1/74 , C07B35/06 , C07B37/06 , C07C25/18
摘要： PROBLEM TO BE SOLVED: To provide a reaction device for supercritical water, in which in the case of treating a hydrophobic organic substance such as PCB, a reaction of supercritical water is continued at a stable reaction temperature. SOLUTION: The reaction device 10 for supercritical water is a device, in which PCB is fed into a reactor together with water and subjected to oxidative reaction with supercritical water, is equipped with a reactor 12, a system for supplying PCB, water for producing supercritical water and a surfactant, an emulsification device 14 for emulsifying both PCB and water by the surfactant, a feed system for feeding air and an outflow system after the reactor 12. In this device, a neutralization quenching part 48, in which an alkali aqueous solution is poured to the treated liquid and the same is neutralized and quenched, is provided just after the outlet of the reactor 12 and a particle diameter detection device 52 for detecting the average particle diameter of the micell of an emulsion is provided just after the outlet of the emulsification device. In the case of PCB treatment, the surfactant is added so that the average particle diameter of the micell of the emulsion becomes

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