专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2013167608A Inspection device and inspection method 有权
标题翻译：检查装置和检查方法
公开(公告)号：JP2013167608A
公开(公告)日：2013-08-29
申请号：JP2012032506
申请日：2012-02-17
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： INOUE TAKAFUMI , MATSUMOTO EIJI , KIKUIRI NOBUTAKA , ISOMURA IKUNAO
IPC分类号： G01N21/956 , G03F1/84
CPC分类号： G06T7/0004 , G06T7/001 , G06T2207/20021 , G06T2207/30148
摘要： PROBLEM TO BE SOLVED: To provide an inspection device and an inspection method capable of reducing position errors generated during an inspection process.SOLUTION: The inspection region of a mask 101 is virtually divided by stripes 20a to 20i, and the pattern of position error correction means 10 is also virtually divided by the stripes 20a to 20i. For both of the mask 101 and the position error correction means 10, a stage 102 is moved so as to continuously scan all the stripes and obtain optical images thereof. The fluctuation values of the position coordinates of the patterns formed in the position error correction means 10 are obtained from the optical images of the position error correction means 10. The fluctuation values of the position coordinates of respective patterns in the inspection region of the mask 101 are obtained based on the fluctuation value to correct the position coordinates. Then, a map is created from the fluctuation values of the position coordinates of the respective patterns in the inspection region of the mask 101.
摘要翻译：要解决的问题：提供能够减少在检查过程中产生的位置误差的检查装置和检查方法。解决方案：掩模101的检查区域实际上被条纹20a至20i划分，并且位置误差校正的图案装置10也实际上被条纹20a至20i划分。对于掩模101和位置误差校正装置10两者，移动载物台102，以连续地扫描所有的条纹并获得其光学图像。由位置误差校正装置10的光学图像获得形成在位置误差校正装置10中的图案的位置坐标的波动值。掩模101的检查区域中各图案的位置坐标的波动值基于波动值获得以校正位置坐标。然后，根据掩模101的检查区域中的各图案的位置坐标的波动值创建地图。

2. 发明专利

JP2013040873A Pattern inspection device and pattern inspection method 有权
标题翻译：模式检验装置和模式检验方法
公开(公告)号：JP2013040873A
公开(公告)日：2013-02-28
申请号：JP2011178877
申请日：2011-08-18
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： MATSUMOTO EIJI , KIKUIRI NOBUTAKA , TSUCHIYA HIDEO
IPC分类号： G01B11/24 , G01N21/956 , G03F1/84
CPC分类号： G06K9/00 , G01B11/02 , G01B2210/56 , G01N21/95 , G01N21/95607 , G01N2021/95615 , G03F1/84 , G03F7/70616 , G03F7/707 , H01L22/00 , H01L2924/0002 , H04N7/18 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide an inspection device capable of inspecting the homogeneity of position precision of a pattern itself formed on a mask.SOLUTION: An inspection device 100 includes: a map generation circuit 131 which generates a first displacement amount map in an entire inspection object region by using first displacement amounts between dimensions of graphics in respective optical images acquired by imaging discrete regions and those in corresponding reference images; a map generation circuit 132 which generates a second displacement amount map in the entire inspection object region by using second displacement amounts between dimensions of graphics in respective optical images acquired by imaging the entire inspection object region and those in corresponding reference images; and a determination circuit 156 which determines whether or not a value exceeding an allowable value is included in respective values defined in a third displacement amount map obtained by correcting the second displacement amount map with a first difference map between the first displacement amount map and the second displacement amount map.
摘要翻译：要解决的问题：提供一种能够检查形成在掩模上的图案本身的位置精度的均匀性的检查装置。检查装置100包括：地图生成电路131，其通过使用通过成像离散区域拍摄的各个光学图像中的图形的尺寸之间的第一位移量来生成整个检查对象区域中的第一位移量图，相应的参考图像; 地图生成电路132，其通过使用通过对整个检查对象区域成像而获得的各个光学图像中的图形的尺寸和相应的参考图像中的图像的尺寸之间的第二位移量来生成整个检查对象区域中的第二位移量图; 以及确定电路156，其确定超过容许值的值是否包括在通过用第一位移量图和第二位置量图之间的第一差分图校正第二位移量图而获得的第三位移量图中定义的相应值中位移量图。版权所有（C）2013，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式