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JP2013246258A Focus position correction method, exposure method, device manufacturing method and exposure device 审中-公开
标题翻译：聚焦位置校正方法，曝光方法，装置制造方法和曝光装置
公开(公告)号：JP2013246258A
公开(公告)日：2013-12-09
申请号：JP2012118957
申请日：2012-05-24
申请人： Nikon Corp , 株式会社ニコン
发明人： OMORI SEIICHI , NOJIMA TAKUMI , ABIKO KAZUYA
IPC分类号： G03F7/207 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a focus position correction method in which, when the correction amount of a focus position adjustment mechanism possessed by a projection system of an exposure device is obtained, and also to provide an exposure method, a device manufacturing method and the exposure device.SOLUTION: This focus position correction method includes: a substrate positional information detection step for obtaining first positional information on a position of the surface of a predetermined substrate held on a substrate holding surface of a substrate stage of an exposure device (step S101); and a correction amount calculation step for removing second positional information of a predetermined plane obtained on the basis of the first positional information from the first positional information and obtaining the correction amount of a focus position adjustment mechanism of a projection system possessed by the exposure device (S102).
摘要翻译：要解决的问题：提供一种聚焦位置校正方法，其中当获得由曝光装置的投影系统所具有的对焦位置调节机构的校正量时，并且还提供曝光方法，装置制造方法和曝光装置。解决方案：该聚焦位置校正方法包括：基板位置信息检测步骤，用于获得保持在曝光装置的基板台的基板保持表面上的预定基板的表面的位置的第一位置信息（步骤 S101）; 以及校正量计算步骤，用于从第一位置信息中去除基于第一位置信息获得的预定平面的第二位置信息，并获得曝光装置所具有的投影系统的焦点位置调整机构的校正量（ S102）。

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