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1. 发明专利

JP2013153052A Coating liquid for p-type diffusion layer 有权
标题翻译：用于P型扩散层的涂层液
公开(公告)号：JP2013153052A
公开(公告)日：2013-08-08
申请号：JP2012013013
申请日：2012-01-25
申请人： Naoetsu Electronics Co Ltd , 直江津電子工業株式会社 , Japan Vam & Poval Co Ltd , 日本酢ビ・ポバール株式会社
发明人： ISOTANI KATSUYUKI , WATANABE SHIROYASU , KOBAYASHI TAKASHI , MATSUOKA TOSHIFUMI
IPC分类号： H01L21/225
摘要： PROBLEM TO BE SOLVED: To provide a coating liquid for boron and aluminum diffusion which: allows the density of a boron compound to be controlled to a desired one while using a propyleneglycol-based solvent as a solvent of a coating liquid for impurity diffusion; contains an aluminum compound used as a second impurity; enables boron and aluminum to be uniformly diffused into a semiconductor silicon substrate; causes neither variation in the surface specific resistance of the semiconductor silicon substrate after the diffusion, nor impurity crystalline precipitation; and allows the boron and aluminum to be diffused at desired densities.SOLUTION: The coating liquid for diffusion for forming a P-type diffusion layer in a semiconductor silicon substrate comprises: (a)a boron compound and (b)an aluminum compound which are used as materials for forming a P-type diffusion layer in a silicon substrate; a solvent including (c)a propyleneglycol derivative and (d)water; and a coating film forming agent consisting of (e)a polyvinyl alcohol-based resin having a saponification degree of 96 mol% or less. The content of sodium in (e) the polyvinyl alcohol-based resin is 0.2 mass% or less to the mass of the polyvinyl alcohol-based resin. The coating liquid for diffusion is arranged for the purpose of diffusing boron and aluminum into a semiconductor silicon substrate.
摘要翻译：要解决的问题：提供一种用于硼和铝扩散的涂布液，其可以使用丙二醇基溶剂作为用于杂质扩散的涂布液的溶剂，将硼化合物的密度控制为所需的浓度; 含有用作第二杂质的铝化合物; 使硼和铝均匀地扩散到半导体硅衬底中; 扩散后不会导致半导体硅衬底的表面电阻率的变化，也不会造成杂质结晶析出; 并且允许硼和铝以所需的密度扩散。溶液：用于在半导体硅衬底中形成P型扩散层的用于扩散的涂布液包括：（a）硼化合物和（b）铝化合物，其为用作在硅衬底中形成P型扩散层的材料; 溶剂，包括（c）丙二醇衍生物和（d）水; 和（e）皂化度为96摩尔％以下的聚乙烯醇类树脂组成的涂膜成膜剂。（e）聚乙烯醇系树脂中的钠的含量相对于聚乙烯醇类树脂的质量为0.2质量％以下。用于扩散的涂布液用于将硼和铝扩散到半导体硅衬底中。

2. 发明专利

JP2014011379A P-type diffusion layer coating liquid 有权
标题翻译： P型扩散层涂层液
公开(公告)号：JP2014011379A
公开(公告)日：2014-01-20
申请号：JP2012148323
申请日：2012-07-02
申请人： Naoetsu Electronics Co Ltd , 直江津電子工業株式会社 , Japan Vam & Poval Co Ltd , 日本酢ビ・ポバール株式会社
发明人： NISHIMAKI KOICHI , ISOTANI KATSUYUKI , MATSUOKA TOSHIFUMI
IPC分类号： H01L21/225
摘要： PROBLEM TO BE SOLVED: To provide a boron diffusion coating liquid for forming a P-type diffusion layer on a semiconductor silicon substrate capable of adjusting a boron compound to a desired concentration by using a propylene glycol derivative as a solvent, uniformly dispersing boron in the semiconductor silicon substrate, and diffusing the boron to a desired concentration without any variation on the surface resistance value of the semiconductor silicon substrate after the diffusion and without any impurity crystal deposition.SOLUTION: Provided is a diffusion coating liquid for forming a P-type diffusion layer in a semiconductor silicon substrate. The diffusion coating liquid for diffusing boron in the semiconductor silicon substrate is characterized in that (a) a bron compound as a substance for forming the P-type diffusion layer in the silicon substrate, (b) a propylene glycol derivative as a solvent, and (c) water are contained, (d) a polyvinyl alcohol resin having a saponification degree set less than 96 mol% is contained as a film forming agent, and the addition amount of the (d) polyvinyl alcohol resin is within the range of 1.5 to 3.0 mass times larger than the mass of the (a) boron compound.
摘要翻译：要解决的问题：为了提供一种用于在能够通过使用丙二醇衍生物作为溶剂将硼化合物调节至所需浓度的半导体硅衬底上形成P型扩散层的硼扩散涂布液，将硼均匀分散在半导体硅衬底，并且将硼扩散到期望的浓度，而在扩散之后并且没有任何杂质晶体沉积，半导体硅衬底的表面电阻值没有任何变化。解决方案：提供一种用于形成P型扩散的扩散涂覆液在半导体硅衬底中。用于在半导体硅衬底中扩散硼的扩散涂布液的特征在于（a）作为在硅衬底中形成P型扩散层的物质的支化合物，（b）作为溶剂的丙二醇衍生物，以及（c）含有水，（d）作为成膜剂含有皂化度小于96摩尔％的聚乙烯醇树脂，（d）聚乙烯醇树脂的添加量在1.5以下比（a）硼化合物的质量大3.0质量倍。

3. 发明专利

JP2013012532A Coating liquid for diffusing phosphorous 有权
标题翻译：涂料液用于扩散磷
公开(公告)号：JP2013012532A
公开(公告)日：2013-01-17
申请号：JP2011143119
申请日：2011-06-28
申请人： Japan Vam & Poval Co Ltd , 日本酢ビ・ポバール株式会社
发明人： MATSUOKA TOSHIFUMI
IPC分类号： H01L21/225
CPC分类号： H01L21/2225
摘要： PROBLEM TO BE SOLVED: To provide a coating liquid for diffusing phosphorous, which can diffuse phosphorous without causing variations between a resistance value at the center part and a resistance value at the periphery of a semiconductor device in which phosphorous has been diffused, and can be stored at room temperature.SOLUTION: The coating liquid for diffusing phosphorous contains: (a) a phosphorous compound; (b) a polyvinyl ester resin having an average degree of polymerization of 150 to 4000; (c) alkoxysilane; and (d) an organic solvent having a boiling point of 70°C or higher.
摘要翻译：要解决的问题：为了提供可以扩散磷的磷扩散用涂布液，而不引起中心部分的电阻值与磷扩散的半导体器件的周边的电阻值的变化，并可在室温下储存。解决方案：用于扩散磷的涂布液包含：（a）磷化合物; （b）平均聚合度为150〜4000的聚乙烯酯树脂; （c）烷氧基硅烷; 和（d）沸点为70℃以上的有机溶剂。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2010062334A Coating liquid for diffusing phosphor 审中-公开
标题翻译：涂料液用于扩散磷化氢
公开(公告)号：JP2010062334A
公开(公告)日：2010-03-18
申请号：JP2008226509
申请日：2008-09-03
申请人： Japan Vam & Poval Co Ltd , 日本酢ビ・ポバール株式会社
发明人： MATSUOKA TOSHIFUMI , OHARADA AKINOBU
IPC分类号： H01L21/225
CPC分类号： H01L21/2225
摘要： PROBLEM TO BE SOLVED: To provide a relatively inexpensive coating liquid for phosphorous diffusion that prevents variations in the resistance value of a semiconductor device in which phosphorous has been diffused, can diffuse phosphorous with high concentration, and can further avoid the contamination of the semiconductor device by sodium. SOLUTION: The coating liquid for diffusing phosphorous contains: (a) a phosphorous compound, (b) a polyvinyl alcohol based resin having a sodium content of ≤10 ppm, and (c) water. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供防止磷扩散的半导体器件的电阻值的变化的磷扩散的相对便宜的涂布液，可以扩散高浓度的磷，并且可以进一步避免污染钠的半导体器件。解决方案：用于扩散磷的涂布液包含：（a）磷化合物，（b）钠含量≤10ppm的聚乙烯醇类树脂和（c）水。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2007007587A Dredge soil pellet 审中-公开
标题翻译：干粉土豆片
公开(公告)号：JP2007007587A
公开(公告)日：2007-01-18
申请号：JP2005193233
申请日：2005-07-01
申请人： Japan Science & Technology Agency , Japan Vam & Poval Co Ltd , Katayama Chem Works Co Ltd , 日本酢ビ・ポバール株式会社 , 株式会社片山化学工業研究所 , 独立行政法人科学技術振興機構
发明人： IMAI DAIZO , AHMED HAMOOD AHMED DABWAN , EKUSA KIYOYUKI , MATSUOKA TOSHIFUMI , KATO TADAYA
IPC分类号： C02F11/00 , C02F11/14
摘要： PROBLEM TO BE SOLVED: To provide an effective dredge soil pellet which is useful as a house of a microbe or the like, can become a carrier useful in promoting the activity of the microbe, is obtained without adopting a drying step and a firing step and is friendly to the environment.
SOLUTION: The porous dredge soil pellet is obtained by using a solid obtained by dehydrating a flock formed by mixing/reacting a paper sludge ash-based coagulating/solidifying agent with the dredge soil pumped up by dredge work, mixing polyvinyl alcohol of 0.1-10 pts.wt. in the obtained solid of 100 pts.wt. to obtain a mixture and pelletizing the obtained mixture.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供可用作微生物等的房屋的有效的疏浚土壤颗粒，可以成为可用于促进微生物活性的载体，而不采用干燥步骤和开火步骤，对环境友好。解决方案：通过使用将通过将淤泥灰基凝固固化剂与通过疏浚工作抽出的疏浚土混合/反应而形成的绒毛脱水得到的多孔疏浚土颗粒，混合聚乙烯醇 0.1-10重量得到的固体为100重量份得到混合物并造粒得到的混合物。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2004285144A Aqueous emulsion 审中-公开
公开(公告)号：JP2004285144A
公开(公告)日：2004-10-14
申请号：JP2003077359
申请日：2003-03-20
申请人： Japan Vam & Poval Co Ltd , 日本酢ビ・ポバール株式会社
发明人： OHARADA AKINOBU , MATSUOKA TOSHIFUMI
IPC分类号： C08L67/04 , C08F8/12 , C08F218/08 , C08F220/26 , C08F290/04 , C08K5/10 , C08K5/41 , C08L29/04 , C08L101/16 , C09D5/02 , C09D129/04 , C09D167/04 , C09J129/04 , C09J167/04
摘要： PROBLEM TO BE SOLVED: To provide an aqueous emulsion which can easily be produced without using an organic solvent and without a special installation and a troublesome operation, is inexpensive, has excellent storage stability, and further has good adhesiveness, coating film formability, coatability and the like.
SOLUTION: This aqueous emulsion is characterized by being obtained by dispersing in water a composition obtained by melt-kneading polylactic acid and a polyvinyl alcohol-based resin in a polylactic acid / polyvinyl alcohol-based resin mass ratio of 99/1 to 30/70.
COPYRIGHT: (C)2005,JPO&NCIPI

7. 发明专利

JP2010062223A Coating liquid for boron diffusion 有权
标题翻译：涂料液用于硼的扩散
公开(公告)号：JP2010062223A
公开(公告)日：2010-03-18
申请号：JP2008223973
申请日：2008-09-01
申请人： Japan Vam & Poval Co Ltd , 日本酢ビ・ポバール株式会社
发明人： MATSUOKA TOSHIFUMI , OHARADA AKINOBU
IPC分类号： H01L21/225
摘要： PROBLEM TO BE SOLVED: To provide a relatively inexpensive coating liquid for boron diffusion that prevents variations in the resistance value of a semiconductor device in which boron has been diffused, can diffuse boron with high concentration, and can further avoid the contamination of the semiconductor device by sodium.
SOLUTION: The coating liquid for boron diffusion contains: (a) a boron compound; (b) a polyvinyl alcohol based resin having a sodium content of ≤10 ppm; and (c) water.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种相对便宜的硼扩散涂层液，其防止硼扩散的半导体器件的电阻值的变化，可以以高浓度扩散硼，并且可以进一步避免污染钠的半导体器件。解决方案：用于硼扩散的涂布液包含：（a）硼化合物; （b）钠含量≤10ppm的聚乙烯醇系树脂; 和（c）水。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2008133345A Method for polymerizing aliphatic vinyl ester and method for producing polyvinyl alcohol-based resin 有权
标题翻译：用于聚合乙烯醇的方法和用于生产聚乙烯醇基树脂的方法
公开(公告)号：JP2008133345A
公开(公告)日：2008-06-12
申请号：JP2006319691
申请日：2006-11-28
申请人： Japan Vam & Poval Co Ltd , 日本酢ビ・ポバール株式会社
发明人： MATSUOKA TOSHIFUMI
IPC分类号： C08F18/08 , C08F16/06
摘要： PROBLEM TO BE SOLVED: To provide a new method for polymerizing an aliphatic vinyl ester and to provide a new method for producing polyvinyl alcohol in order to enable efficient and industrial production of the polyvinyl alcohol having a high degree of polymerization.
SOLUTION: The method for polymerizing the aliphatic vinyl ester is provided. The method for polymerizing the aliphatic vinyl ester comprises decompressing the internal pressure of a polymerizer and carrying out solution polymerization at a lower temperature than the boiling temperature of a polymerization reaction liquid under atmospheric pressure while boiling the polymerization reaction liquid under the vacuum.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种聚合脂族乙烯基酯的新方法，并提供一种生产聚乙烯醇的新方法，以便有效和工业化生产具有高聚合度的聚乙烯醇。解决方案：提供聚合脂族乙烯基酯的方法。聚合脂肪族乙烯基酯的方法包括在聚合反应液中在真空下沸腾聚合反应液体的同时，在大气压下，在比聚合反应液的沸点低的温度下进行聚合反应器的内压减压，进行溶液聚合。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2004177581A Polyvinylalcohol-based photosensitive resin 有权
公开(公告)号：JP2004177581A
公开(公告)日：2004-06-24
申请号：JP2002342386
申请日：2002-11-26
申请人： Japan Vam & Poval Co Ltd , Raizu Chemical Research:Kk , 日本酢ビ・ポバール株式会社 , 有限会社ライズケミカルリサーチ
发明人： NOBORIO KAZUHIKO , MATSUOKA TOSHIFUMI
IPC分类号： G03F7/04 , G03F7/033 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an etching-durable photosensitive resin composition which can be exposed for patterning with a small quantity of exposure light, which prevents misalignment of the pattern, which has excellent stripping property without leaving an unnecessary resin, and which can prevents a metal plate from rust.
SOLUTION: The etching-durable photosensitive resin to be used for the photoetching process of a metal plate comprises: (A) a polyvinyl alcohol resin having 65 to 98 mol% saponification degree and 4 to 46 (mPa s) viscosity of a 4 mass% aqueous solution at 20°C; (B) a carboxyl group-containing water-soluble polymer having

10. 发明专利

JP2012227287A Coating liquid for boron diffusion 有权
标题翻译：涂料液用于硼的扩散
公开(公告)号：JP2012227287A
公开(公告)日：2012-11-15
申请号：JP2011092443
申请日：2011-04-18
申请人： Japan Vam & Poval Co Ltd , 日本酢ビ・ポバール株式会社
发明人： MATSUOKA TOSHIFUMI
IPC分类号： H01L21/225
摘要： PROBLEM TO BE SOLVED: To provide a coating liquid for boron diffusion capable of diffusing boron at high concentration even using a propylene glycol-based solvent having inferior solubility in a boron compound.SOLUTION: A coating liquid for boron diffusion contains (a) a boron compound, (b) an alcoholic hydroxyl group-containing polymer compound, (c) a propylene glycol derivative, (d) ethylene glycol and (e) water, and is characterized in that the content of the above (a) boron compound is 5 mass% or more and 20 mass% or less in the case of boron oxide (BO).
摘要翻译：要解决的问题：即使使用在硼化合物中溶解性差的丙二醇类溶剂，也可以提供能够高浓度硼扩散的硼扩散用涂布液。解决方案：硼扩散用涂布液含有（a）硼化合物，（b）含醇羟基的高分子化合物，（c）丙二醇衍生物，（d）乙二醇和（e）水，其特征在于，在氧化硼的情况下，上述（a）硼化合物的含量为5质量％以上至20质量％以下（B 2 SB POS =“POST”> 3 ）。版权所有（C）2013，JPO＆INPIT

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