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    • 7. 发明专利
    • Coating liquid for p-type diffusion layer
    • 用于P型扩散层的涂层液
    • JP2013153052A
    • 2013-08-08
    • JP2012013013
    • 2012-01-25
    • Naoetsu Electronics Co Ltd直江津電子工業株式会社Japan Vam & Poval Co Ltd日本酢ビ・ポバール株式会社
    • ISOTANI KATSUYUKIWATANABE SHIROYASUKOBAYASHI TAKASHIMATSUOKA TOSHIFUMI
    • H01L21/225
    • PROBLEM TO BE SOLVED: To provide a coating liquid for boron and aluminum diffusion which: allows the density of a boron compound to be controlled to a desired one while using a propyleneglycol-based solvent as a solvent of a coating liquid for impurity diffusion; contains an aluminum compound used as a second impurity; enables boron and aluminum to be uniformly diffused into a semiconductor silicon substrate; causes neither variation in the surface specific resistance of the semiconductor silicon substrate after the diffusion, nor impurity crystalline precipitation; and allows the boron and aluminum to be diffused at desired densities.SOLUTION: The coating liquid for diffusion for forming a P-type diffusion layer in a semiconductor silicon substrate comprises: (a)a boron compound and (b)an aluminum compound which are used as materials for forming a P-type diffusion layer in a silicon substrate; a solvent including (c)a propyleneglycol derivative and (d)water; and a coating film forming agent consisting of (e)a polyvinyl alcohol-based resin having a saponification degree of 96 mol% or less. The content of sodium in (e) the polyvinyl alcohol-based resin is 0.2 mass% or less to the mass of the polyvinyl alcohol-based resin. The coating liquid for diffusion is arranged for the purpose of diffusing boron and aluminum into a semiconductor silicon substrate.
    • 要解决的问题:提供一种用于硼和铝扩散的涂布液,其可以使用丙二醇基溶剂作为用于杂质扩散的涂布液的溶剂,将硼化合物的密度控制为所需的浓度; 含有用作第二杂质的铝化合物; 使硼和铝均匀地扩散到半导体硅衬底中; 扩散后不会导致半导体硅衬底的表面电阻率的变化,也不会造成杂质结晶析出; 并且允许硼和铝以所需的密度扩散。溶液:用于在半导体硅衬底中形成P型扩散层的用于扩散的涂布液包括:(a)硼化合物和(b)铝化合物,其为 用作在硅衬底中形成P型扩散层的材料; 溶剂,包括(c)丙二醇衍生物和(d)水; 和(e)皂化度为96摩尔%以下的聚乙烯醇类树脂组成的涂膜成膜剂。 (e)聚乙烯醇系树脂中的钠的含量相对于聚乙烯醇类树脂的质量为0.2质量%以下。 用于扩散的涂布液用于将硼和铝扩散到半导体硅衬底中。
    • 9. 发明专利
    • Coating liquid for boron diffusion
    • 涂料液用于硼的扩散
    • JP2012227287A
    • 2012-11-15
    • JP2011092443
    • 2011-04-18
    • Japan Vam & Poval Co Ltd日本酢ビ・ポバール株式会社
    • MATSUOKA TOSHIFUMI
    • H01L21/225
    • PROBLEM TO BE SOLVED: To provide a coating liquid for boron diffusion capable of diffusing boron at high concentration even using a propylene glycol-based solvent having inferior solubility in a boron compound.SOLUTION: A coating liquid for boron diffusion contains (a) a boron compound, (b) an alcoholic hydroxyl group-containing polymer compound, (c) a propylene glycol derivative, (d) ethylene glycol and (e) water, and is characterized in that the content of the above (a) boron compound is 5 mass% or more and 20 mass% or less in the case of boron oxide (BO).
    • 要解决的问题:即使使用在硼化合物中溶解性差的丙二醇类溶剂,也可以提供能够高浓度硼扩散的硼扩散用涂布液。 解决方案:硼扩散用涂布液含有(a)硼化合物,(b)含醇羟基的高分子化合物,(c)丙二醇衍生物,(d)乙二醇和(e)水, 其特征在于,在氧化硼的情况下,上述(a)硼化合物的含量为5质量%以上至20质量%以下(B 2 SB POS =“POST”> 3 )。 版权所有(C)2013,JPO&INPIT