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1. 发明专利

JPS62218564A METHOD FOR CONTROLLING POSITION OF EDGE HEATER 失效
公开(公告)号：JPS62218564A
公开(公告)日：1987-09-25
申请号：JP5942986
申请日：1986-03-19
申请人： NISSHIN STEEL CO LTD , MITSUBISHI HEAVY IND LTD
发明人： HANADA TOSHIAKI , AIKO TAKUYA , TSUKIJI NORIO , OHASHI KYOSUKE , NISHIDA TAKAO , FURUKAWA HEIZABURO , SEKIGUCHI YASUAKI , TAUCHI KUNIAKI , MENDA SHIGEMI
IPC分类号： G01B21/00 , C23C2/02 , C23C2/14 , C23C14/54 , C23C14/56 , C25D21/12
摘要： PURPOSE:To form a plating layer having a uniform thickness on the surface of a steel strip by detecting the meandering of the steel strip with a scanning type radiation thermometer and adequately controlling the positions of edge heaters for the steel strip by the output thereof so that the temp. distribution in the transverse direction of the steel strip is made uniform in the stage of subjecting the steel strip to continuous vacuum deposition plating of zinc, etc. CONSTITUTION:The steel strip 30 subjected to cleaning up of the surface in a reduction furnace is passed through a gas jet chamber 12, a gaseous N2 pressurizing chamber 13 and the edge heaters 14 of a vacuum deposition plating line 10 and through a vacuum sealing roll chamber 15 by which a vapor deposited Zn plating layer is formed on the surface in a vacuum deposition chamber 20. The position of the transverse end of the meandering steel strip 30 is detected by the scanning type radiation thermometer 40 provided in the outlet of a gas jet chamber 12 and the output thereof is fed to a control part 41. The positions of the edge heaters 14, 14 at both ends in the transverse direction of the steel strip 30 are adequately moved in the transverse direction of the steel strip by the output thereof with driving parts 16, 16, by which both ends in the transverse direction of the steel strip are heated to the same temp. and the steel strip is heated to a uniform temp. The thickness of the Zn plating layer by the vapor deposition is thereby made uniform.

2. 发明专利

JPS61270371A VACUUM DEPOSITION DEVICE 失效
公开(公告)号：JPS61270371A
公开(公告)日：1986-11-29
申请号：JP11019985
申请日：1985-05-24
申请人： MITSUBISHI HEAVY IND LTD , NISSHIN STEEL CO LTD
发明人： SHIMOZATO YOSHIO , YANAGI KENICHI , KATO MITSUO , FURUKAWA HEIZABURO , TSUKIJI NORIO , AIKO TAKUYA , ITO TAKEHIKO
IPC分类号： C23C14/56
摘要： PURPOSE:To make uniform the film thickness distribution in the transverse direction by providing a control plate which can change optionally the vapor deposition area by moving along the progressing direction of an object for vapor deposition to a channel outlet connecting an evaporation vessel and the object for vapor deposition. CONSTITUTION:The vapor 10 emitted from the surface of the molten metal in the evaporation chamber 3 in a vapor deposition chamber 2 flows out through a shutter 7 to a channel 6 and deposits on a thin metallic sheet 5 which is the object for vapor deposition and is wound on a roll 9 in the outlet part of the channel. The control plate P for the vapor deposition rate which can change optionally the vapor deposition rate to the sheet 5 by changing the outlet area of the channel 6 is provided between the outlet of the channel 6 and the sheet 5. The plate P can be advanced into and retreated from the channel 6 by the engagement of a pinion S and a rack R when a shaft 11 is rotated. The pressure in the channel is maintained under the pressure adequate for the pressure in the vacuum vessel if the position of the plate P is selected. The film thickness is thus uniformly distributed in the transverse direction of the thin sheet.

3. 发明专利

JPS6173880A Method and device for plating by vacuum deposition 失效
标题翻译：通过真空沉积法沉积的方法和装置
公开(公告)号：JPS6173880A
公开(公告)日：1986-04-16
申请号：JP19257484
申请日：1984-09-17
申请人： Mitsubishi Heavy Ind Ltd , Nisshin Steel Co Ltd
发明人： FURUKAWA HEIZABURO , WAKE KANJI , SHIMOZATO YOSHIO , YANAGI KENICHI , KATO MITSUO , WADA TETSUYOSHI , TSUKIJI NORIO , AIKO TAKUYA , KIKKO TOSHIHARU , NAKANISHI KOJI
IPC分类号： C21D9/56 , C23C14/56
CPC分类号： C21D9/561 , C21D9/565 , C23C14/562
摘要： PURPOSE:To obtain a plated product having good film strength by providing nitrogen replacing chambers between an annealing furnace and vacuum sealing devices and controlling the pressure and hydrogen concn. in the nitrogen replacing chambers. CONSTITUTION:The inlet side nitrogen replacing chamber 3 is provided between the inlet side vacuum sealing device 5 in front of a vacuum deposition chamber 7 of a plating device by vacuum deposition and the annealing furnace 2. The outlet side nitrogen replacing chamber 8 is provided between the outlet side vacuum sealing device 5 behind the chamber 7 and the atm. A circulating and refining device 12 for gaseous N2 which circulates the gaseous N2 from the devices 5 toward the chambers 9 and removes the water, oil and oxygen in the gaseous N2 is provided between both vacuum sealing devices and the chambers 9 under the atmospheric pressure of both vacuum sealing devices. The pressure P1 in the furnace 2 is controlled to the atmospheric pressure or above, the pressure P2 of the chamber 3 to the atmospheric pressure or above and the pressure P3 of the chamber 8 to the atmospheric pressure or above to satisfy the equation. The hydrogen concn. in the chamber 3 is con trolled to
摘要翻译：目的：通过在退火炉和真空密封装置之间提供氮气置换室并控制压力和氢气浓度，以获得具有良好膜强度的镀层产品。在氮气置换室中。构成：入口侧氮气置换室3通过真空蒸镀在电镀装置的真空蒸镀室7前方的入口侧真空密封装置5与退火炉2之间设置。出口侧氮气置换室8设置在出口侧真空密封装置5在室7后面。用于气态N 2的循环和精炼装置12，其将气态N 2从装置5循环到室9，并且除去气态N 2中的水，油和氧，在两个真空密封装置和室9之间在大气压力两个真空密封装置。将炉2中的压力P1控制在大气压以上，将室3的压力P2设定为大气压以上，将室8的压力P3设定为大气压以上，以满足上述等式。氢气在室3中被控制到<= 20％。

4. 发明专利

JPS60197876A VACUUM DEPOSITION DEVICE 失效
公开(公告)号：JPS60197876A
公开(公告)日：1985-10-07
申请号：JP5114184
申请日：1984-03-19
申请人： MITSUBISHI HEAVY IND LTD , NISSHIN STEEL CO LTD
发明人： FURUKAWA HEIZABUROU , WAKE KANJI , SHIMOZATO YOSHIO , YANAGI KENICHI , KATOU MITSUO , WADA TETSUYOSHI , TSUKIJI NORIO , AIKOU TAKUYA , KITSUTAKA TOSHIHARU , NAKANISHI KOUJI
IPC分类号： C23C14/56
摘要： PURPOSE:To improve the yield of the metal to be deposited by evaporation and the working efficiency of an installation with a device for plating continuously a metal by vacuum deposition onto a steel hoop by suppressing the reevaporation of the metal subjected to the vacuum deposition. CONSTITUTION:A steel hoop 1 is conducted via a vacuum sealing device 31, etc. to a vacuum vessel 2 in which a low pressure is maintained. The evaporating metal, for example, Zn vapor 5, from an evaporation vessel 4 is plated by vapor deposition on said hoop in the stage when the hoop is guided by a roll 3. The hoop is again conducted via a high pressure sealing device 6, etc. to the high pressure side. The vapor 5 everges off the roll 3. Inner ducts 12 heated by heaters are provided to the arc-shaped covers 10, 11 provided in the inlet of the roll 3 and are connected to the sealing bar 13 of the device 6. The Zn 8 evaporating again from the hoop 1 is thus suspended in the ducts 12 without vapor deposition. The reevaporation is eliminated when the partial pressure of the Zn vapor attains the satd. vapor pressure P1 at the reevaporation temp. of the solid Zn in the hoop 1. The reevaporation is kept suppressed even if a large amt. of the plated hoop 1 passes through the inside of the ducts 12 after the attainment of the pressure P1 and therefore the yield of Zn is improved and the working efficiency of the installation is improved as well.

5. 发明专利

JPS60100663A METHOD FOR SUPPLYING ZINC TO VACUUM DEPOSITION DEVICE FOR ZINC 失效
公开(公告)号：JPS60100663A
公开(公告)日：1985-06-04
申请号：JP20601783
申请日：1983-11-04
申请人： MITSUBISHI HEAVY IND LTD , NISSHIN STEEL CO LTD
发明人： SHIMOZATO YOSHIO , ITANO SHIGEO , TSUKIJI NORIO , AIKOU TAKUYA
IPC分类号： C23C14/14 , C23C14/24
摘要： PURPOSE:To prevent a suction pipe for molten Zn and an evaporating pan from being eroded by Zn in the stage of supplying molten Zn to a vacuum deposition chamber for Zn by filling preliminarily the molten Pb into said suction pipe and the Zn evaporating pan above said pipe and supplying the molten Zn through the inside thereof to the evaporation chamber. CONSTITUTION:Molten Zn 4 is sucked up and supplied through a suction pipe 7 from a Zn melting furnace 5 into an evaporating pan 8 in the stage of depositing by evaporation the molten Zn in the pan 8 onto the surface of a steel strip 1 which is continuously supported by the revolution of the support roll 3 in a vacuum evaporation chamber 2. The molten Pb 11 in the melting furnace 5 is preliminarily filled into the pan 8 and pipe 7 in this stage. A partition wall 5-1 to separate the molten Pb 11 and the molten Zn 4 is provided to enclose the pipe 7 and an inflow port 7-1 is provided on the Zn side (a) thereof. The molten Zn 4 is supplied to (a) from which the molten Zn is admitted through the port 7-1 into the molten Pb 11, is passed therethrough and is supplied to the pan 8 from the pipe 7 by the difference of specific gravities. Since the molten Zn does not contact with the pipe 7 and the pan 8, the pipe and pan are prevented from being eroded by the molten Zn.

6. 发明专利

JPS63192858A CONTINUOUS VACUUM DEPOSITION APPARATUS 失效
公开(公告)号：JPS63192858A
公开(公告)日：1988-08-10
申请号：JP2358487
申请日：1987-02-05
申请人： MITSUBISHI HEAVY IND LTD , NISSHIN STEEL CO LTD
发明人： YANAGI KENICHI , FURUKAWA HEIZABURO , TAGUCHI TOSHIO , HIRAI ETSURO , AIKO TAKUYA , TSUKIJI NORIO
IPC分类号： C23C14/14 , C23C14/56
摘要： PURPOSE:To make the thickness distribution of a film uniform and to improve the quality of a plated product by horizontally fitting a porous plate as a flow regulating plate to a shutter so as to make a flow of metal vapor uniform. CONSTITUTION:One or more porous plates as a flow regulating plate 20 are horizontally fitted to a shutter 10 for leading metal vapor 6 to the surface of a substrate 1 such as band steel on which the vapor 6 is deposited. The pitch of the pores in the plate 20 may be irregular. A flow of the metal vapor 6 in a duct 8 is made uniform by the plate 20 and the thickness distribution of a vacuum-deposited film is made uniform. By this apparatus, the yield of the vacuum-deposited metal can be increased.

7. 发明专利

JPS61119671A Detection of quantity of metallic vapor to be stuck for vacuum evaporation device 失效
标题翻译：检测真空蒸发器的金属蒸汽量
公开(公告)号：JPS61119671A
公开(公告)日：1986-06-06
申请号：JP24043184
申请日：1984-11-16
申请人： Mitsubishi Heavy Ind Ltd , Nisshin Steel Co Ltd
发明人： TAUCHI KUNIAKI , YANAGI KENICHI , KATO MITSUO , FURUKAWA HEIZABURO , SEKIGUCHI YASUAKI , TSUKIJI NORIO , AIKO TAKUYA , KIKKO TOSHIHARU , NAKANISHI KOJI
IPC分类号： C23C14/54 , C23C14/56
CPC分类号： C23C14/54
摘要： PURPOSE:To detect exactly the vapor deposition quantity of a metal without using a costly detector for the vapor deposition quantity of the metal in the stage of evaporating metallic vapor to the surface of a traveling strip by detecting the strip temp. at the inlet and outlet of a vapor deposition device and calculating and determining the vapor deposition quantity of the metal by a calculator. CONSTITUTION:The vapor of the molten metal 1 in a bath vessel 2 is admitted through a vapor flow port 19 into a duct 6 and the evaporating metal is deposited on the surface of the strip 7 passing continuously in proximity to the aperture thereof. The inlet temp. and outlet temp. of the strip 7 are respectively measured by thermometers 41, 42. The measured values are inputted to the calculator 43 and the metal quantity Qd deposited by evaporation on the strip 7 is calculated and determined by equation. In equation (1), rs is the specific gravity of the strip, (d) is the thickness thereof, Cs is the specific heat, Tsin, Tsout are respectively the inlet and outlet temps. of the strip and H is the latent heat of vapor deposition.
摘要翻译：目的：通过检测带材温度，在金属蒸气蒸发到移动带表面的阶段，无需使用昂贵的检测器来精确检测金属的气相沉积量。在气相沉积装置的入口和出口处，并通过计算器计算和确定金属的气相沉积量。构成：熔池2中的熔融金属1的蒸汽通过蒸气流入口19进入管道6中，并且蒸发金属沉积在条带7的表面上，其连续通过其孔径。入口温度和出口温度条带7分别由温度计41,42测量。测量值被输入到计算器43，通过蒸发沉积在条带7上的金属量Qd被计算并由等式确定。在式（1）中，rs是条带的比重，（d）是其厚度，Cs是比热，Tsin，Tsout分别是入口和出口温度。的条带，H是蒸气沉积的潜热。

8. 发明专利

JPS6173875A Vacuum depositing apparatus provided with plate for regulating width of path 失效
标题翻译：真空沉积装置，用于调节路径宽度
公开(公告)号：JPS6173875A
公开(公告)日：1986-04-16
申请号：JP19257584
申请日：1984-09-17
申请人： Mitsubishi Heavy Ind Ltd , Nisshin Steel Co Ltd
发明人： SHIMOZATO YOSHIO , YANAGI KENICHI , KATO MITSUO , WADA TETSUYOSHI , FURUKAWA HEIZABURO , WAKE KANJI , MORITA ARIHIKO , TSUKIJI NORIO , AIKO TAKUYA , KIKKO TOSHIHARU , NAKANISHI KOJI
IPC分类号： C23C14/04 , C23C14/24 , C23C14/56 , C23C22/24
CPC分类号： C23C14/042 , C23C14/24 , C23C14/562
摘要： PURPOSE: To give a uniform distribution of extent of deposition in the lateral direction of an object of vacuum deposition by placing a regulating plate for arbitrarily changing the width of a vapor path between a bath and the object.
CONSTITUTION: In a vacuum depositing apparatus, vapor from a bath 4 flows into a channel 6 while a shutter 7 placed at the outlet of the bath 4 is open. A regulating plate 9 is placed in the channel 6 and moved arbitrarily in the lateral direction of the channel 6 with a driving shaft 11 connected to an external driving device. Thus, the width of the channel is arbitrarily changed in accordance with the extent of evaporation and the width of an object.
COPYRIGHT: (C)1986,JPO&Japio
摘要翻译：目的：通过放置用于任意改变浴和物体之间的蒸气路径的宽度的调节板来给出真空沉积物体的横向方向上的沉积程度的均匀分布。构成：在真空沉积设备中，来自浴槽4的蒸汽流入通道6，而位于浴槽4的出口处的快门7打开。调节板9放置在通道6中，并且在与外部驱动装置连接的驱动轴11上沿通道6的横向方向任意移动。因此，通道的宽度根据蒸发的程度和物体的宽度而任意改变。

9. 发明专利

JPS60258467A METHOD FOR CONTROLLING DISTRIBUTION OF EXTENT OF DEPOSITION IN VACUUM DEPOSITING APPARATUS 失效
公开(公告)号：JPS60258467A
公开(公告)日：1985-12-20
申请号：JP11319584
申请日：1984-06-04
申请人： MITSUBISHI HEAVY IND LTD , NISSHIN STEEL CO LTD
发明人： SHIMOZATO YOSHIO , WADA TETSUYOSHI , YANAGI KENICHI , KATOU MITSUO , FURUKAWA HEIZABUROU , WAKE KANJI , MORITA ARIHIKO , TSUKIJI NORIO , AIKOU TAKUYA , KITSUTAKA TOSHIHARU , NAKANISHI KOUJI
IPC分类号： C23C14/54 , C23C14/24 , C23C14/56
摘要： PURPOSE:To obtain a vacuum deposited film having a very uniform distribution of thickness on a strip while preventing the film from being made thin at positions close to both edges of the strip in the lateral direction by changing the internal pressure of the depositing chamber of a continuous vacuum depositing apparatus according to the rate of deposition and the width of the strip. CONSTITUTION:An evaporating chamber 1 is constructed as shown by the figure. Evaporation begins at the surface of a molten metal 3 in a tank 4 as usual, and the top of the tank 4 is covered with an evaporating vessel 2 as usual. The internal pressure of the chamber 1 is set according to the rate of evaporation by regulating a valve 11 in an exhaust duct 10. The distribution of thickness of a vacuum deposited film on a strip 5 in the lateral direction is measured with a measuring instrument 13, and the valve 11 is regulated according to the signal to control the internal pressure of the chamber 1. A uniform distribution of thickness of a vacuum deposited film can be attained by keeping the difference between the internal pressure of the chamber 1 and that of the vessel 2 at a fixed value.

10. 发明专利

JPS6021378A VACUUM DEPOSITION APPARATUS 失效
公开(公告)号：JPS6021378A
公开(公告)日：1985-02-02
申请号：JP12888583
申请日：1983-07-15
申请人： NISSHIN STEEL CO LTD , MITSUBISHI HEAVY IND LTD
发明人： ITOU TAKEHIKO , TSUKIJI NORIO , AIKOU TAKUYA , KITSUTAKA TOSHIHARU , FURUKAWA HEIZABUROU , KATOU MITSUO , WADA TETSUYOSHI
IPC分类号： C23C14/54 , C23C14/24 , C23C14/56
摘要： PURPOSE:To change rapidly the deposited amt. without a transition state by providing a collecting and sucking means of vapor between an evaporation tank and a material to be vapor-deposited, and enabling the collection of excess steam generated during a transition period of opening and closing a shutter for controlling the amt. of vapor. CONSTITUTION:An evaporation tank 3 of a vapor depositing material 5 and a vapor passage 6 leading to a vapor depositing surface therefrom are provided in a vacuum vessel 2 through which a belt-shaped metallic material 1 to be vapor- deposited is capable of passing. A shutter 7 is provided to a connecting position between the passage 6 and the evaporation tank 3, and the opening degree of an evaporation port 8 is regulated. A duct 11 is provided and communicated with the space leading to the surface of said material 1 from the evaporation tank 3, and a vapor collecting means 13 and a vapor sucking means 15 are provided to the end of the duct. In this way, the excess steam generated during the transition period of opening and closing the shutter is collected. The deposited amt. of the vapor depositing material can be changed rapidly without a transition state by said apparatus.

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