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    • 4. 发明专利
    • LIGHT CHOPPER
    • JPS55116227A
    • 1980-09-06
    • JP2477879
    • 1979-03-02
    • NIPPON ELECTRIC CONIPPON TELEGRAPH & TELEPHONE
    • AOYAMA TSUTOMUKOBAYASHI IKUTAROUMINOWA JIYUNICHIROU
    • G01J1/04G01J1/02G01J1/36G01J3/08
    • PURPOSE:To obtain a light chopper useful in characteristic measurement for optical communication system, photo-devices and others by an arrangement wherein the lens is disposed in such a way that incident light is focused on the light chopping means arranged between two lenses. CONSTITUTION:Light introduced from a connector 15 connecting with optical fibers is image-transformed by a lens 11 so as to be focused on a shutter 14 opened or closed at the natural frequency of a tuning fork vibrator 13. The interrupted light enters into a lens 16 and then focuses so as to enter into optical fibers connecting with a connector 16. In this arrangement, when resonant frequency of the tuning fork vibrator is set at 280Hz, vibration of 400mum is produced with the application of 20Vpp, and the rod lenses are disposed to make the image transformation of 1:1 therebetween, the diameter of the focused light becomes 60mum upon connecting to optical fibers with the core diameter of 60mum. Rising and falling times of thus arranged light chopper become about 50mus and thus light pulse very near to a square wave is obtained. By so doing, it becomes possible to provide the light chopper useful in characteristic measurement for optical communication system, photo- device and others.
    • 7. 发明专利
    • CONTROLLING METHOD OF THICKNESS OF OPTICAL THIN FILM
    • JPS58140605A
    • 1983-08-20
    • JP553282
    • 1982-01-18
    • KOSHIN KOUGAKU KKNIPPON TELEGRAPH & TELEPHONE
    • TAKAHASHI HARUOMINOWA JIYUNICHIROUMIYAMOTO NOBUHIDE
    • G01B11/06
    • PURPOSE:To obtain prescribed film thickness with high accuracy in controlling of the optical film thickness of vapor deposited thin films by passing monochromatic light through the thin films during vapor deposition of the thin films and measuring the inverse proportional value of transmittance. CONSTITUTION:An evaporating source material 3 placed on the inner side of an opening/closing device 2 is heated in a vacuum vessel 1. Monochromatic light is projected from a light projector 6 to the substrate 5 to be deposited in a circular cover 4 and the light passed through the substrate 5 is fed to a measuring mechanism 7. The incident light in the mechanism 7 is passed through a photodetecting part 8 and is intensified with an amplifier 9. The ratio between the amplitude which is the inverse number of the transmittance of the monochromatic incident light and the constant amplitude determined by the refractive index of the evaporating source material is determined with constant power sources 10, 10' and calculators 11, 11', then the outputs which are equal to the square of the sine of optical phase angles and change periodically with an increase in optical film thickness are drawn by a recorder 12. The vapor deposition is suspended by the device 2 upon attaining of the required optical film thickness, whereby the thin films are formed to the prescribed film thickness with high accuracy.