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1. 发明专利

JP4634643B2 How to expose the shaded image of the plant to a photosensitive material 有权
公开(公告)号：JP4634643B2
公开(公告)日：2011-02-23
申请号：JP2001144525
申请日：2001-05-15
申请人：竹前祥江
发明人：俊治竹前
IPC分类号： G03B15/00 , G03B15/02 , G03B15/06 , G03B15/07 , G03B27/02

2. 发明专利

JP2005077920A Image recorder 审中-公开
标题翻译：图像记录器
公开(公告)号：JP2005077920A
公开(公告)日：2005-03-24
申请号：JP2003310177
申请日：2003-09-02
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： OTA YASUYOSHI
IPC分类号： B41J2/44 , B41J2/45 , B41J2/455 , G03B27/02 , G03D13/00
摘要： PROBLEM TO BE SOLVED: To provide an image recorder of a dry system in which processing time is shortened by improving the efficiency of an exposure process and whose size is made small. SOLUTION: An exposure processing part 49 for forming an image on a sheet-like recording material 33 exposes the recording material 3 by surface exposure using a surface luminous body disposed along the surface of the recording material 3. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供通过提高曝光处理的效率并且尺寸变小的干燥系统的图像记录器，其中处理时间缩短。解决方案：用于在片状记录材料33上形成图像的曝光处理部分49通过使用沿着记录材料3的表面设置的表面发光体的表面曝光来曝光记录材料3.版权所有：（C）2005，JPO＆NCIPI

3. 发明专利

JP2004272084A Exposure device for three-dimensional table generation, and three-dimensional table generation method 审中-公开
公开(公告)号：JP2004272084A
公开(公告)日：2004-09-30
申请号：JP2003065249
申请日：2003-03-11
申请人： Fuji Photo Film Co Ltd , 富士写真フイルム株式会社
发明人： MACHIDA MAKOTO
IPC分类号： G03B27/02 , G03B27/32 , G03B27/72 , H04N1/23
摘要： PROBLEM TO BE SOLVED: To improve the precision of a 3DLUT for color signal conversion.
SOLUTION: The exposure device, which generates a three-dimensional table for color signal conversion of a photosensitive material, is provided with: a black-and-white pattern display device for displaying a black-and-white density pattern for varying exposure quantities of respective colors for constituting the three-dimensional table; and an illumination light source irradiating the black-and-white pattern display device with light having the least color mixture in a spectral characteristic of the photosensitive material.
COPYRIGHT: (C)2004,JPO&NCIPI

4. 发明专利

JP2003140269A IMAGE TRANSFER UNIT 审中-公开
公开(公告)号：JP2003140269A
公开(公告)日：2003-05-14
申请号：JP2001340757
申请日：2001-11-06
申请人： FUJI PHOTO FILM CO LTD
发明人： CHINO NAOYOSHI
IPC分类号： B41J2/445 , G02F1/13 , G02F1/13357 , G03B27/02 , G03B27/16
摘要： PROBLEM TO BE SOLVED: To provide an image transfer unit which can be made small-sized and lightweight more than a conventional unit and can obtain a high-definition image of high sharpness by using a liquid crystal display having a high-definition screen of a high pixel density as an image transfer unit which transfers an image by exposing a photosensitive recording medium to projection light carrying the image. SOLUTION: The image transfer unit is equipped with a transmission type liquid crystal display 3 which displays image according to supplied image data, a back light unit 11 which projects the projection light on the liquid crystal display 3 from one side of the liquid crystal display 3, a porous plate 2 which is provided between the back light unit 11 and liquid crystal display 3 and collimates the irradiation light from the back light unit 1 into nearly parallel light, and piezoelectric actuators 7 and 8 which move the porous plate 2 relatively to the liquid crystal display 3 while the image displayed on the liquid crystal display is transferred to a photosensitive film 4.

5. 发明专利

JP3378076B2 Exposure apparatus and the exposure method 失效
公开(公告)号：JP3378076B2
公开(公告)日：2003-02-17
申请号：JP4405094
申请日：1994-03-15
申请人：松下電器産業株式会社
发明人：隆史井上 , 好道石井 , 寛之長野
IPC分类号： G03B27/02 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70575 , G03F7/7035 , G03F7/70358 , G03F7/70691

6. 发明专利

JP3309867B2 失效
公开(公告)号：JP3309867B2
公开(公告)日：2002-07-29
申请号：JP58293
申请日：1993-01-06
IPC分类号： G02B3/00 , G02B5/08 , G02B5/26 , G02B5/28 , G03B27/02 , G03B27/16 , G03B27/54 , G03B27/72 , G03F7/20 , H01L21/027

7. 发明专利

JP3064117B2 失效
公开(公告)号：JP3064117B2
公开(公告)日：2000-07-12
申请号：JP26851592
申请日：1992-10-07
IPC分类号： B41M5/28 , B41M5/26 , B41M5/30 , G03B27/02 , G03B27/10

8. 发明专利

JPH11320569A APPARATUS FOR MANUFACTURE OF ROLLER 失效
公开(公告)号：JPH11320569A
公开(公告)日：1999-11-24
申请号：JP13243198
申请日：1998-05-14
申请人： KANEGAFUCHI CHEMICAL IND
发明人： OGOSHI HIROSHI , KOBAYASHI KENJI
IPC分类号： G03G15/02 , B29C33/12 , B29C45/14 , B29C45/37 , B29K101/10 , B29K105/22 , B29L31/00 , B29L31/32 , F16C13/00 , G03B27/02 , G03B27/46 , G03G15/08 , G03G15/16
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing a roller for obtaining a roller of an extremely small core oscillation even if secondary processing such as polishing, cutting or the like is not executed. SOLUTION: The apparatus for manufacturing a roller having a cylindrical mold 1, mandrel holding members 2, 3 disposed at both end openings of the mold 1 and a means for clamping them comprises the mold 1 having a space formed to be radially enlarged at an inner diameter toward an opening end in a predetermined range of both the ends with oblique inner peripheral surfaces 1a, 1b formed in a predetermined range of the mold 1, the mandrel holding members 2, 3 for closing the opening ends of the mold 1 while holding ends of the mandrel disposed at both ends of the mold 1 and having ridge-shaped engaging elements 6, 7 having oblique outer peripheral surfaces 6a, 7a and complementarily engaging with the enlarged space of the mold 1 having shaft end holding holes 3a, 2a for receiving and holding the shaft end of the mandrel A at a radial center, and a means for clamping the members 3, 2 at both ends of the mold 1.

9. 发明专利

JPH11133588A EXPOSURE MASK AND EXPOSURE DEVICE 失效
公开(公告)号：JPH11133588A
公开(公告)日：1999-05-21
申请号：JP31108897
申请日：1997-10-28
申请人： DAINIPPON PRINTING CO LTD
发明人： ONOZAWA KIYOSHI , NARIZUMI AKIRA
IPC分类号： G03B27/02 , G03F1/42 , H01L21/027 , G03F1/08
摘要： PROBLEM TO BE SOLVED: To avoid the remaining of a resist on a metal thin plate due to the exposure of positioning marks without causing troubles for positioning of an exposure mask and a metal thin plate. SOLUTION: In the exposure mask 1, an optical layer 6 which transmits visible rays but absorbs UV rays is formed in the positioning mark part 5. The optical layer 6 is a polyimide film and the layer 6 is adhered to the non- pattern face of the exposure mask 1 with a transparent adhesive layer. Further, in the exposure device, a metal thin plate with a photoresist film formed is exposed to UV rays to form a pattern except for the positioning marks by using the exposure mask 1.

10. 发明专利

JP2875108B2 失效
公开(公告)号：JP2875108B2
公开(公告)日：1999-03-24
申请号：JP19228392
申请日：1992-07-20
申请人： FUJI SHASHIN FUIRUMU KK
发明人： YOSHIDA TAKASHI , YAMAMOTO TAKASHI
IPC分类号： G03B27/02 , G03B27/46 , G03B27/52

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