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    • 2. 发明专利
    • HEATER FOR STRIP END PART BETWEEN ROLLING MILL
    • JPS6349318A
    • 1988-03-02
    • JP19121886
    • 1986-08-15
    • NIPPON STEEL CORPMITSUBISHI ELECTRIC CORP
    • KAWAMURA KUNIOMATSUI KENICHIWAKASUGI NOBUYUKIGOTO AKIRAOHASHI SEIICHI
    • C21D1/42B21B45/00
    • PURPOSE:To heat both end parts of a strip with a little electric power and to improve the strip quality by installing a couple of laterally movable suspended frames from an overbridge type gantry on the pass line between hot finishing rolling mills and installing a couple of induction heaters being vertically movable on the inside face of the frames facing each other. CONSTITUTION:Carriers 2a movable in the width direction on an overbridge type gantry 1a on the pass line between hot finishing rolling mills. Intermediate movable frames 5a and 5b, which are vertically moved by cylinders 12a, 12b and a distance between the frames 5a, 5b is adjusted by a gap setting cylinder, are installed on the inside face of a couple of vertical frames 2b facing each other. The frames 2b are suspended from the carriers 2a. The frames 5a, 5b are provided with heating faces 6c, 6d vertically moved by copying cylinders 9a, 9b. The heating faces 6c, 6d to which a steel strip 22 exists hold a proper gap against the strip 22 by actions of the above cylinders 9a, 9b. End parts of the strip 22 are heated with a temp. rise of the heating faces 6c, 6d by induction heating inductors 15a, 15b. Therefore, the rolling quality of the rolled strip 22 whose both end parts are easily cooled is made to be uniform and good.
    • 4. 发明专利
    • INDUCTION HEATING DEVICE
    • JPH01189887A
    • 1989-07-31
    • JP1495588
    • 1988-01-25
    • MITSUBISHI ELECTRIC CORP
    • OHASHI SEIICHI
    • H05B6/10
    • PURPOSE:To prevent the occurrence of the oxidized scale of an object to be heated by providing an exhaust nozzle bursting the air outward and an exhaust nozzle bursting the inert gas inward around the inlet and outlet of a heating coil and making the inside the inert gas atmosphere. CONSTITUTION:Before an object to be heated 3 is conveyed into a beating coil 2, an air quantity adjusting valve 60 is operated, the compressed air is guided into air injection rings 11 on both ends of the heating coil 2 and burst through exhaust nozzles of the rings 11, the inside of the coil 2 is isolated from the outside by these air curtains, the inert gas is guided into a gas circulating pipeline 5, the inside of the heating coil 2 is made the inert gas atmosphere with a circulating fan 53. The occurrence of the oxidized scale of an object to be heated such as a forging billet is prevented, the extension of the metal life and the reduction of the occurrence ratio of defective articles are realized.
    • 6. 发明专利
    • INDUCTION HEATER
    • JPS6481190A
    • 1989-03-27
    • JP23725787
    • 1987-09-24
    • MITSUBISHI ELECTRIC CORP
    • OHASHI SEIICHI
    • H05B6/10
    • PURPOSE:To prevent oxidation of an article to be heated by supplying inert gas in a heating coil, and providing a gas sealing injection ring and an air involving preventing ring. CONSTITUTION:An article 1 to be heated is fed on a transfer conveyor 2, and pressure-fed to a heating coil 4. In the coil 4, an inert gas from a gas supply nozzle 9 is supplied, and the gas is jetted in the coil 4 from jetting rings 13, 14. In addition, compression air which is the same in quality with the inert gas fed from jetting rings 11, 17 to the jetting ring 13, 15 is jetted toward the outside of the coil 4, whereby instruction of air into the coil 4 is prevented. At this time, a regulation valve 10 is regulated to minimize the flow out of the inert gas. It is thus possible to heat the article 1 in a state where its oxidation is restrained in the atmosphere of inert gas and then to allow the transportation to a post-process.
    • 9. 发明专利
    • APPARATUS FOR PRODUCTION OF SEMICONDUCTOR
    • JPH06145969A
    • 1994-05-27
    • JP30364692
    • 1992-11-13
    • MITSUBISHI ELECTRIC CORP
    • OHASHI SEIICHI
    • C23C14/32
    • PURPOSE:To prevent the thin films formed on a shutter and shielding plates by forming the shutter and shielding plates of materials which have the same coefft. of linear expansion as the coefft. of expansion of a material to be deposited by evaporation or the coefft. of thermal expansion approximate thereto and are specified in vapor pressure. CONSTITUTION:The vapor of Ti 12 is ejected from the nozzle of a crucible 11 and is made into cluster ions 12a, 12b which head together with the gaseous N2 ejected from a gas nozzle 18 toward a substrate 1. These ions deposit by evaporation on the shielding plates 44 and the shutter 41 and form the thin films of Ti and TiN. The materials of the shielding plates 44 and the shutter 41 are formed of the materials having the coefft. of linear expansion as the coefft. of linear expansion of the thin films deposited by evaporation or the coefft. of linear expansion approximate thereto to prevent the peeling of the formed in films by the effect of heat. The vapor pressure of the materials of the shielding plates 44 and the shutter 41 is set as low as Torr at 200 deg.C to substantially prevent the evaporation in a vacuum. As a result, the intrusion of the peeled thin films as contaminations into the TiN films formed by vapor deposition on the substrate 1 is lessened.
    • 10. 发明专利
    • ORGANIC THIN FILM FORMING DEVICE
    • JPH05125525A
    • 1993-05-21
    • JP28855791
    • 1991-11-05
    • MITSUBISHI ELECTRIC CORP
    • OHASHI SEIICHI
    • C23C14/12C23C14/32
    • PURPOSE:To shorten the time for heating and cooling a crucible and to improve the capacity to produce org. thin-film substrates by holding heating wires enclosing the crucible with a cylindrical part in contact with the crucible and disposing a water cooling jacket so as to enclose this cylindrical part. CONSTITUTION:The inside of a vacuum chamber 1 is evacuated to a prescribed vacuum degree and the crucible 3 is heated to evaporate a material 5 to be deposited by evaporation. The vapor is injected from a nozzle 4 to form clusters 8. The clusters 8 are partly ionized by the electron beam released from an ionizing filament 10 to form the ionized clusters 14. These clusters are accelerated together with the clusters 8 by a grounding electrode 15b to form the thin film on the surface of the substrate 16. The heating wires 30 are disposed to enclose the crucible 3. The heating wires 30 are held by the cylindrical part 31 disposed to come into contact with the crucible 3 and the water cooling jacket 32 is disposed to enclose this cylindrical part 31 in contact therewith. As a result, the time for heating up the crucible 3 and the time for cooling the crucible 3 at the end of the operation are shortened.