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    • 5. 发明专利
    • Production of styrene
    • 苯乙烯的生产
    • JPS6172727A
    • 1986-04-14
    • JP19449284
    • 1984-09-17
    • Nippon Sheet Glass Co Ltd
    • AOKI YUICHITASHIRO MASASHITAKAHASHI TAKESHIGETAKIGAWA AKIOMAEDA KOICHITAGO IKUOYOSHIDA MOTOAKI
    • C07C1/24B01J29/00B01J29/06C07B61/00C07C1/00C07C15/46C07C67/00
    • Y02P20/52
    • PURPOSE: To improve the selectivity and yield of the objective compound in the production of styrene useful as a raw material of plastics by the dehydration of phenylethyl alcohol, by carrying out the reaction in the presence of a zeolite catalyst.
      CONSTITUTION: The objective compound of formula III is produced by dehydrating the phenylethyl alcohol of formula I or formula II in the presence of a zeolite catalyst preferably at 100W300°C, especially at 150W250°C under normal pressure. The selectivity and yield can be remarkably improved compared with conventional process using potassium hydroxide or titania as the catalyst. The objective compound can be produced in a yield comparable to or higher than that of the ethylbenzene dehydrogenation process, without necessitating high temperature required in the dehydrogenation process. Accordingly, the process is extremely advantageous from the viewpoint of energy cost.
      COPYRIGHT: (C)1986,JPO&Japio
    • 目的:通过在沸石催化剂存在下进行反应,提高目标化合物在苯乙醇脱水中作为塑料原料生产苯乙烯的选择性和产率。 结构式:式III的目标化合物是通过在沸石催化剂存在下,优选在100-300℃,特别是在150-250℃,常压下使式I或式II的苯基乙醇脱水来制备的。 与使用氢氧化钾或二氧化钛作为催化剂的常规方法相比,选择性和产率可以显着提高。 可以以与乙苯脱氢方法相当或更高的产率生产目标化合物,而不需要脱氢过程中所需的高温。 因此,从能量成本的观点来看,该方法是非常有利的。
    • 6. 发明专利
    • PREPARATION OF PLASTIC OPTICAL CIRCUIT
    • JPS60202406A
    • 1985-10-12
    • JP5860384
    • 1984-03-27
    • NIPPON SHEET GLASS CO LTD
    • AOKI YUUICHITAKIGAWA AKIOMAEDA KOUICHITAGO IKUOYOSHIDA MOTOAKI
    • G02B6/13G02B6/138G03C5/00G03F7/26
    • PURPOSE:To obtain a novel plastic optical circuit capable of eliminating problem of adhesion between a mask and a gelled substrate and a problem of precision of a mask pattern by executing masking using a resist. CONSTITUTION:A substrate 1 comprising a transparent gel is prepd. by polymerizing partly a monomer Ma which forms a network polymer Pa having a refractive index Na, and a resist layer 20 is formed on the surface of the polymer Pa, which is then prebaked and adhered firmly to the transparent gel substrate 1. Then, a photomask 3 is placed on a resist layer 20 and irradiated with ultraviolet rays 6 from a mercury lamp. The part exposed to the ultraviolet rays is removed after development to form a resist mask 2 having an opening 2A with a specified pattern. Then, another monomer Mb which forms a polymer Pb having a different refractive index Nb to the refractive index Na of the network polymer Pa, for example larger refractive index than Na is diffused and polymerized on the surface of the transparent gel substrate. When the resist mask 2 is removed by polishing after completion of polymerization, a flat optical circuit having specified photoconductive path 5 such as current branching. combining circuit, wave-separating.combining circuit, etc. having the same pattern as a flat pattern of the original photomask 3, is obtd.