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1. 发明专利

JP2001131096A METHOD FOR DEHALOGENATING HYDROCARBON CONTAINING CARBON-CARBON DOUBLE BOND AND METHOD FOR REGENERATING ALUMINA USED THEREFOR 失效
公开(公告)号：JP2001131096A
公开(公告)日：2001-05-15
申请号：JP30872399
申请日：1999-10-29
申请人： NIPPON PETROCHEMICALS CO LTD
发明人： OHASHI KOICHI , KUROKI TERUHISA
IPC分类号： B01D15/00 , A62D3/00 , C07B35/06 , C07C7/12 , C07C11/09 , C07C11/12
摘要： PROBLEM TO BE SOLVED: To provide a method for suppressing isomerization of double bond occurring as a side reaction in removing a halogen by bringing an organic compound containing a very small amount of a halogen compound and a nonconjugated carbon-carbon double bond into contact with alumina. SOLUTION: This method for removing a very small amount of a halogen is characterized in that an organic basic substance in a sufficient amount to suppress isomerization of organic compound, especially a hydrocarbon carbon- carbon double bond is present in a reaction system. This method for regenerating alumina used for the method is provided.

2. 发明专利

JP2001106724A PRODUCTION OF HIGHLY REACTIVE BUTENE OLIGOMER 失效
公开(公告)号：JP2001106724A
公开(公告)日：2001-04-17
申请号：JP28836699
申请日：1999-10-08
申请人： NIPPON PETROCHEMICALS CO LTD
发明人： TAKASHIMA TSUTOMU , FUJIMURA KOJI , TOKUMOTO YUICHI , OHASHI KOICHI
IPC分类号： C08F4/06 , C08F8/26 , C08F10/10
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a highly reactive butene oligomer by using butadiene raffinate which is industrially and inexpensively available as a raw material and boron trifluoride-based complex catalyst without reducing the content of terminal vinylidene groups and without essentially leaving fluorine. SOLUTION: This method for producing a highly reactive polybutene is to convert terminal fluorine groups into terminal vinylidene groups by bringing an oligomer containing >=80 mole% of a regular repeating structural unit and, as one terminal group, >=60 mole% of molecule having terminal vinylidene group and 0.005-15 mole% of molecule having a terminal fluorinated group into contact with an inorganic material to remove hydrogen fluoride.

3. 发明专利

JP2000239319A PRODUCTION OF BUTENE POLYMER 失效
公开(公告)号：JP2000239319A
公开(公告)日：2000-09-05
申请号：JP4440999
申请日：1999-02-23
申请人： NIPPON PETROCHEMICALS CO LTD
发明人： OHASHI KOICHI , TAKASHIMA TSUTOMU , KUROKI TERUHISA , TOKUMOTO YUICHI
IPC分类号： C08F6/06 , C08F10/08
摘要： PROBLEM TO BE SOLVED: To produce a butene polymer having a low fluorine content and a high terminal vinylidene content by subjecting a specific raw material to a liquid phase polymerization by using boron trifluoride as a catalyst under a specific condition to provide the butene polymer having the high terminal vinylidene content, and treating the obtained butene polymer with a specified inorganic treating agent. SOLUTION: A supplied 4C raw material comprising =1 ppm residual fluorine and having >=60%; terminal vinylidene content, and the obtained butene polymer is treated with an alumina-containing inorganic material to reduce the residual fluorine concentration and to keep the terminal vinylidene content to >=60% of that before the treatment, and to provide the objective polymer.

4. 发明专利

JPH05119483A FORMING METHOD OF RESIST PATTERN 失效
公开(公告)号：JPH05119483A
公开(公告)日：1993-05-18
申请号：JP15765891
申请日：1991-05-31
申请人： NIPPON PETROCHEMICALS CO LTD
发明人： ITO NAOTO , IKEDA NOBUO , OHASHI KOICHI , YAMAGUCHI TATSUO
IPC分类号： G03F7/32
摘要： PURPOSE:To provide a forming method of fine resist patterns with low quantity of exposure light by using a specified electrodeposition photoresist and taking a proper time for development. CONSTITUTION:A resist pattern is formed by a photographic method using an anion-type photosetting electrodeposition coating material. This coating material essentially consists of a specified water-soluble or water-dispersible resin having 80-400mg-KOH/g acidity. The resist is developed with an aq. soln. of sodium bicarbonate of 0.5-5% concn. and then washed with deionized water having

5. 发明专利

JP2002220411A METHOD FOR CONTROLLING DEGRADATION REACTION IN TREATMENT OF BUTENE POLYMER 失效
公开(公告)号：JP2002220411A
公开(公告)日：2002-08-09
申请号：JP2001019418
申请日：2001-01-29
申请人： NIPPON PETROCHEMICALS CO LTD
发明人： OHASHI KOICHI , KUROKI TERUHISA
IPC分类号： B01D15/00 , C08F6/02 , C08F6/08 , C10L1/16 , C10M143/06 , C10N30/12 , C10N40/25
摘要： PROBLEM TO BE SOLVED: To provide a method for removing a residual halogen compound without changing the physical properties resulting from the degradation reaction in a contact process with a solid treatment for reducing a residual halogen concentration from a butene polymer containing a trace of halogen compound as an impurity. SOLUTION: The degradation reaction of the butene polymer can be controlled by having an organic base material in a reaction system when the trace of halogen compound is removed by contacting the polymer with the solid treatment.

6. 发明专利

JP2000080127A PRODUCTION OF BUTENE POLYMER 失效
公开(公告)号：JP2000080127A
公开(公告)日：2000-03-21
申请号：JP26723998
申请日：1998-09-04
申请人： NIPPON PETROCHEMICALS CO LTD
发明人： TOKUMOTO YUICHI , OHASHI KOICHI , OKADA TOSHIO , TAKASHIMA TSUTOMU
IPC分类号： C08F4/44 , C08F6/00 , C08F210/10
摘要： PROBLEM TO BE SOLVED: To obtain a butene polymer which contains at least a specified amt. of polymer molecules having terminal vinylidene structures and has at most a specified org. fluorine content by subjecting a 4C fraction to liq.-phase polymn. at a specified temp. for a specified dwell time in the presence of a specified amt. of a boron trifluoride complex catalyst and reducing the content of a trimer or lower component to a specified value or lower by distillation. SOLUTION: A complex catalyst comprising boron trifluoride, an ether, and an alcohol and/or water in an amt. of 0.05-500 mmol in terms of boron trifluoride per mol of olefin components contained in a 4C fraction comprising butene-1, butene-2, isobutene, and butane compds. is added to a polymn. zone to conduct the liq.-phase polymn. at -100 to +50±C for a dwell time of 5 min to 4 hr, and the content of a trimer or lower component is reduced to 0.2 wt.% or lower. Thus is obtd. a butene polymer which contains at least 80 mol% polymer molecules having terminal vinylidene structures and has a residual org. fluorine content of 30 ppm or lower in terms of fluorine atoms.

7. 发明专利

JP2003211443A METHOD FOR MANUFACTURING BLISTER-RESISTANT LIQUID CRYSTAL POLYESTER COMPOSITION 审中-公开
公开(公告)号：JP2003211443A
公开(公告)日：2003-07-29
申请号：JP2002017502
申请日：2002-01-25
申请人： NIPPON PETROCHEMICALS CO LTD
发明人： MUROUCHI SATOSHI , OHASHI KOICHI , TAKAHASHI ATSUSHI , INOUE TOSHIO
IPC分类号： B29B11/10 , C08G63/78
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a blister-resistant liquid crystal polyester composition, capable of obtaining a molded article not generating a surface blister under a high temperature environment in solder welding or the like at surface mounting. SOLUTION: In a method for manufacturing the liquid crystal polyester composition with a load bending temperature of 230°C or higher by melting and kneading 90-40 wt.% of a liquid crystal polyester with a melting point of 320°C or higher, which is obtained by the polycondensation of a monomer group containing 80 mol % or more of p-hydroxybenzoic acid, terephthalic acid and 4,4'-hydroxydiphenyl (including derivatives of them), and 10-60 wt.% of an inorganic filler using a kneader having an opening for removing a volatile component from the material to be kneaded and a pair of two-start screws, a kneader of which the screw meshing ratio is 1.60 or more is used to manufacture the liquid crystal polyester composition excellent in blister resistance. COPYRIGHT: (C)2003,JPO

8. 发明专利

JP2000063436A PREPARATION OF BUTENE POLYMER 失效
公开(公告)号：JP2000063436A
公开(公告)日：2000-02-29
申请号：JP25461498
申请日：1998-08-25
申请人： NIPPON PETROCHEMICALS CO LTD
发明人： OHASHI KOICHI , TOKUMOTO YUICHI , TAKASHIMA TSUTOMU
IPC分类号： C08F4/12 , C08F6/10 , C08F210/08
摘要： PROBLEM TO BE SOLVED: To obtain a butene polymer having high reactivity and reducing an amount of residual organic fluorine by using a catalyst of a boron trifluoride etherate complex containing ether as a complex agent followed by removing compounds below a trimer of polymers obtained from polymerization of olefin components of 4C-distillate through distillation. SOLUTION: A butene polymer contains not less than 80 mol.% of a polymer molecule having a vinylidene terminal structure and a small content of a residual organic fluorine distilled. A liquid phase polymerization is conducted at -100-+50 deg.C of a polymerization temperature in a range of 5 min to 4 hr of residence time by adding a complex catalyst composed of boron trifluoride and alcohol and/or ether in a ratio of 0.1 mmol as boron trifluoride to 1 mol of olefin components in 4C-distillate materials composed of butene-1, butene-2, isobutene and butanes, into the polymerizing zone. By distilling components below trimer in the polymer, the concentration is reduced up to not more than 0.2 wt.%. This polymer obtained is useful as an additive for a fuel oil.

9. 发明专利

JPH11100493A RESIN COMPOSITION FOR SEALING ELECTRIC AND ELECTRONIC ELEMENTS 失效
公开(公告)号：JPH11100493A
公开(公告)日：1999-04-13
申请号：JP28125597
申请日：1997-09-29
申请人： NIPPON PETROCHEMICALS CO LTD
发明人： OHASHI KOICHI , MORI SATOSHI
IPC分类号： C08L63/08 , C08G59/34 , H01L23/29 , H01L23/31
摘要： PROBLEM TO BE SOLVED: To obtain a sealing resin, especially a sealing resin suitable for liquid sealing remarkably improving reliability of semiconductors through enhancing its moisture resistance and effectively protecting the semiconductors from infiltration of, e.g. water from the outside. SOLUTION: This resin composition for sealing electric and electronic elements comprises (A) an epoxidized liquid polybutadiene having an epoxy equivalent of 100 to 3,000 and a viscosity of 5 to 2,500 poise at 25 deg.C, obtained by epoxidizing a liquid polybutadiene having a vinyl group content of

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