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    • 3. 发明专利
    • METHOD AND APPARATUS FOR PRODUCING SILICON SINGLE CRYSTAL
    • JPH03164494A
    • 1991-07-16
    • JP22374890
    • 1990-08-23
    • NIPPON KOKAN KK
    • KANETO TAKESHIKAMIO HIROSHIARAKI KENJISHIMA YOSHINOBU
    • C30B15/02C30B29/06H01L21/208
    • PURPOSE:To lower the oxygen concn. level in a longitudinal direction by gently moving a silicon melt in one direction by an much as the quantity necessary for maintaining the silicon melt levels of a raw material supplying section and a single crystal growing section at the same level. CONSTITUTION:A quartz crucible 1 partitioned by a cylindrical partition member 11 having a pipe 12 is set in a graphite crucible 2 supported vertically movably and rotatably on a pedestal 3 and a radiation heat suppressing member 14 constituted by forming metallic sheets 31 into a multilayered structure via spacers 32 is supported to a hot zone heat insulating material 7 enclosing this crucible 2 so as to cover the silicon melt 4. Granular silicon raw materials are supplied from the raw material supplying device 13 and are melted. The melt is gently admitted to the single crystal growing section via the pipe 12 by as much as the quantity necessary for maintaining the silicon melt levels of the raw material supplying section and the single crystal growing section at the same level and the silicon single crystal 5 is pulled up while the quantity of the heat radiation from the melt 4 is arbitrarily controlled by the suppressing material 14.
    • 6. 发明专利
    • CRUCIBLE FOR PULLING UP SILICON SINGLE CRYSTAL
    • JPH02172888A
    • 1990-07-04
    • JP32868988
    • 1988-12-26
    • NIPPON KOKAN KK
    • SHIMA YOSHINOBU
    • C30B15/10C30B29/06
    • PURPOSE:To eliminate the disturbance of single crystal growth by bubbles from the bottom of the crucible made of air bubble-contg. silica glass to be used in a CZ method by installing a bluebells silica glass plate which does not generate the bubbles near the m. p. of silicon to the bottom of the inside surface of the crucible. CONSTITUTION:The crucible 1 for pulling up the silicon single crystal by the Czochralski method is produced by a method for melting the powder silica in the rotating crucible, etc. The bubbleless silica glass plate 2 which has the diameter smaller than the bore of the crucible 1 and does not generate the bubbles at about the m. p. of the silicon is then installed by welding, etc., to the bottom of the inside surface of this crucible 1 in which the bubbles are unavoidably intruded. The hindrance of the growth of the single crystal by the infiltration of the bubbles generated from the silica glass to the solid-liquid boundary of the single crystal under pulling up is obviated in this way even if the crucible 1 is used over a long period of time.
    • 7. 发明专利
    • PRODUCTION OF SILICON SINGLE CRYSTAL AND APPARATUS
    • JPH0259494A
    • 1990-02-28
    • JP20844688
    • 1988-08-24
    • NIPPON KOKAN KK
    • SHIMA YOSHINOBUKAMIO HIROSHIARAKI KENJI
    • C30B15/02C30B29/06H01L21/208
    • PURPOSE:To obtain silicon single crystal wherein both doping material concn. in the pulling-up direction and oxygen concn. are nearly constant by heating a ringlike heating element provided so as to cover the melting part of a raw material and a partition member, and holding melt and the partition member at the specified temp. CONSTITUTION:When a silicon raw material is charged, a heating element 17 which is heated with electric resistance and made of graphite is moved to the upper part of a crucible 1 or the crucible 1 is vertically moved and thereby charging is made easy. At a point of time when the silicon raw material has been melted, this heating element 17 is moved downward or the crucible 1 is moved upward. Both the surface of melt in a raw material melting part B and the upper part of a partition member 11 are held at high temp. by controlling a heater 6 surrounding a crucible 2 made of graphite and the heating element 17. Thereby the silicon raw material 16 can be surely melted in the melting part B. Further generation of coagulation from the partition member 11 is inhibited in a single crystal pulling-up part A and thereby this pulling-up part can be held at the melt temp. free from trouble for growth of silicon single crystal 5.
    • 9. 发明专利
    • PRODUCTION DEVICE OF SILICON SINGLE CRYSTAL
    • JPH02133389A
    • 1990-05-22
    • JP28401788
    • 1988-11-11
    • NIPPON KOKAN KK
    • SHIMA YOSHINOBUKAMIO HIROSHI
    • C30B15/22C30B15/02C30B15/10C30B15/12C30B15/14C30B29/06H01L21/208
    • PURPOSE:To prevent the molten raw material from generating solidification in the vicinity of partition member when the inside or the crucible receiving molten silicon raw material is divided with the partition member having small openings and the raw material is continuously supplied in the outside and a single crystal is pulled up from the inside by constituting the partition member of foamed silica glass. CONSTITUTION:The partition member 11 which or a part of which consists of foamed silica glass is provided in the crucible 2 receiving molten silicon raw material 4 so as to enclose the silicon single crystal 6 to be pulled up, and the small openings 13 are provided in the partition member 11 so that the molten silicon raw material 4 is allowed to move quietly. The silicon single crystal 5 is pulled up from the inside of the partition member while silicon raw material 18 is continuously supplied to the outside of the partition member 11 from a supplying unit 14. Thus, as the partition member 11 consists of foamed silica glass, the heat radiation from the molten liquid 4 near the partition member 11 is restrained, and the molten liquid 4 is prevented from generating solidification.
    • 10. 发明专利
    • PRODUCTION DEVICE OF SILICON SINGLE CRYSTAL
    • JPH02133388A
    • 1990-05-22
    • JP28401688
    • 1988-11-11
    • NIPPON KOKAN KK
    • SHIMA YOSHINOBU
    • C30B15/22C30B29/06H01L21/208
    • PURPOSE:To prevent the molten raw material from generating solidification in the contact part of partition member when the inside of the crucible receiving molten silicon raw material is divided with the partition member having small openings and a single crystal is pulled up from the inside by constituting the partition member of foamed silica glass. CONSTITUTION:The partition member 11 consisting of foamed silica glass is provided in the crucible 2 receiving molten silicon raw material 4 so as to enclose the silicon single crystal 5 to be pulled up, and the small openings 13 are provided in the partition member 11 so that the molten silicon raw material 4 is allowed to move quietly. The silicon single crystal 5 is pulled up from the inside of the partition member 11 by Czochralski method. Thus, as the partition member 11 consists of foamed silica glass, the heat radiation from the molten liquid 4 near the partition member 11 is restrained, and the molten liquid 4 is prevented from generating solidification in the contact part of the partition member 11.