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1. 发明专利

JPS60101540A PROJECTION OPTICAL DEVICE 失效
公开(公告)号：JPS60101540A
公开(公告)日：1985-06-05
申请号：JP20886783
申请日：1983-11-07
申请人： NIPPON KOGAKU KK
发明人： SUWA KIYOUICHI
IPC分类号： G03B27/34 , G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To detect accurately the focusing of a projection mask pattern image on a projected body such as a wafer by detecting the focusing on the projected body on the basis of an image signal corresponding to the image formation state of an overlap image between a light image of a mask pattern and a reflected light image projected reversely from the projected body. CONSTITUTION:The mask R with a light-absorbent and light-shielding mark M is lighted up and the reflected light image of the mark M projected reversely from a wafer W and the light image of the mark M formed by illumination light form an overlap image on the photodetection surface of a TV camera 12. In this case, calibration is so performed that the output of a projector 13 and a photodetector 4 which detect in-focus image formation corresponding to the image signal from a camera 12, etc., is 0; when the mask pattern projection image on the wafer is in focus, that is detected accurately with the output of the photodetector 14 which varies according to the upward/downward movement of a stage 11.

2. 发明专利

JPS58150924A OPTICAL SYSTEM MAINTAINING DOUBLE CONJUGATION 失效
公开(公告)号：JPS58150924A
公开(公告)日：1983-09-07
申请号：JP3436682
申请日：1982-03-04
申请人： NIPPON KOGAKU KK
发明人： UEHARA MAKOTO , ANZAI AKIRA , SUWA KIYOUICHI
IPC分类号： G02B13/22 , G02B19/00 , G02B21/08 , G02B27/00 , G03F7/20
摘要： PURPOSE:To maintain conjugate relation even when the distance between an object and an image varies and to maintain the conjugate relation of an iris as well, by providing an afocal system between two positive lenses and moving the afocal system associatively with the movement of one positive lens. CONSTITUTION:An afocal system L20 consisting of a negative lens group L21 and a positive lens group L22 is arranged between the 1st positive lens group L11 and the 2nd positive lens group L12 in such a way that the afocal system L20 is movable associatively with the movement of the 1st positive lens group L11. When the object Q moves forth by DELTAdt, the 1st lens group L11 is moved forth by DELTAdt and the afocal system L20 is also moved forth by DELTAd3, thereby forming an object image Q' on the rear-side focal point of the 2nd lens group L12. For this purpose, the 2nd lens group L12 is fixed to maintain the conjugate relation between the both even when the distance between the object and image varies, and the conjugate relation of the iris, etc., is also held constant.

3. 发明专利

JPS60238836A METHOD FOR DETECTING PATTERN AND PROJECTING OPTICAL DEVICE USING SAID METHOD 失效
公开(公告)号：JPS60238836A
公开(公告)日：1985-11-27
申请号：JP9405184
申请日：1984-05-11
申请人： NIPPON KOGAKU KK
发明人： SUWA KIYOUICHI
IPC分类号： H01L21/30 , G03F7/20 , G03F9/00 , H01L21/027
摘要： PURPOSE:To enable detection of an exposed pattern without development by irradiating energy rays to the saturating extent to a reticle which is masked and is formed with the pattern to form a latent image to a photosensitive layer and detecting the latent image from the difference in the optical characteristics between the exposed part and the unexposed part. CONSTITUTION:A desired circuit pattern is formed on the reticle R by shielding the light to a region 1 by a light shielding material made of chromium, etc.; in addition, rectangular light shielding parts 2, 3 formed of chromium, etc. on both sides of the region 1 are provided to said reticle on the x axis running the center RC of the region 1 and slits 2a, 3a extending in a Y direction are provided to the center thereof. A wafer (not shown) is disposed through a lens of a reduction magnification not shown to the reticle R and the pattern on the reticle R is irradiated by the energy dose at which the wafer is nearly saturated to form the latent image. The latent image part is detected by detecting the difference in the optical characteristics between the part of the latent image irradiated with the energy and the unirradiated part. The pattern is thus detected without a developing operation. The above-mentioned method and device are suitable for an IC and LSI.

4. 发明专利

JPS59149317A Alignment optical system of projection type exposure device 失效
标题翻译：投影型曝光装置对准光学系统
公开(公告)号：JPS59149317A
公开(公告)日：1984-08-27
申请号：JP2420283
申请日：1983-02-16
申请人： Nippon Kogaku Kk
发明人： UEHARA MAKOTO , ANZAI AKIRA , SUWA KIYOUICHI
IPC分类号： H01L21/30 , G02B13/22 , G02B19/00 , G02B21/08 , G02B27/18 , G03F9/00 , H01L21/027
CPC分类号： G03F9/70
摘要： PURPOSE:To align a reticle and a wafer with a high precision even if the reticle size is changed, by providing a rectangular aperture in a light source means and making the lengthwise direction of the rectangular aperture coincident with the direction in which the reticle-side focus of a reticle-side positive lens group can be moved on the reticle. CONSTITUTION:A rectangular aperture 70a formed with a slit-shaped rectangular diaphragm 70 provided in a light source part is so arranged that its lengthwise direction corresponds to the direction of movement of the focus position of the first positive lens group L10, namely, the radial direction of a reticle R; and when an object lens barrel 10 and a focus barrel 20 in an alignment system are moved in accordance with the change of the reticle size, a rectangular aperture image 70a' of the light source part is moved in the lengthwise direction to an entrance pupil IE on the entrance pupil plane of a projection object lens L50, and an entrance pupil image IE' of the projection object lens L50 is moved in the lengthwise direction of the rectangular aperture 70a on the rectangular aperture 70a on the aperture plane of the light source part. Therefore, the state where an alignment mark Wm on a wafer W is illuminated through the projection object lens L50 is hardly changed.
摘要翻译：目的：即使标线尺寸改变，也可以高精度地对准标线片和晶片，通过在光源装置中设置矩形孔并使矩形孔的长度方向与标线片侧的方向一致标线片侧正透镜组的焦点可以在光罩上移动。构成：设置在光源部中的形成有狭缝状矩形膜片70的矩形孔70a的长度方向与第一正透镜组L10的聚焦位置的移动方向对应，即径向标线片R的方向; 并且当对准系统中的物镜镜筒10和聚焦镜筒20根据标线尺寸的变化而移动时，光源部分的矩形孔径图像70a'沿长度方向移动到入射光瞳IE 在投影物镜L50的入射光瞳面上，投影物镜L50的入射光瞳图像IE'沿着光源部的孔径面上的矩形孔70a的矩形孔70a的长度方向移动。因此，通过投影物镜L50照射晶片W上的对准标记Wm的状态几乎不变化。

5. 发明专利

JPS5854648A POSITIONING DEVICE 失效
公开(公告)号：JPS5854648A
公开(公告)日：1983-03-31
申请号：JP15320781
申请日：1981-09-28
申请人： NIPPON KOGAKU KK
发明人： SUWA KIYOUICHI , KURAMOCHI KAZUO , NAKAZAWA KIWAO
IPC分类号： H01L21/68 , G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To exactly perform positioning by a method wherein template is done by memorizing the information of a pattern obtained from a predetermined region on an objective substance and positioning is done by the degree of agreement between the template and the pattern information from the objective substance. CONSTITUTION:The first information concerning the pattern in the first region on an objective substance 6 is previously extracted by the first means 1. In performing positioning, the second information concerning a pattern from the second region including the first region on the objective substance 6 is extracted. The degree of agreement between the first information and the second information is calculated by an operational means 12 and the position of the first region in the second region is detected by a detection means 10 based on the calculation result. The position of the objective substance 6 is reproduced in accordance with the detected position.

6. 发明专利

JPS57117238A Exposing and baking device for manufacturing integrated circuit with illuminometer 失效
标题翻译：用照明灯制造集成电路的放电和烘烤装置
公开(公告)号：JPS57117238A
公开(公告)日：1982-07-21
申请号：JP415381
申请日：1981-01-14
申请人： Nippon Kogaku Kk
发明人： MATSUURA TOSHIO , SUWA KIYOUICHI , SHIMIZU TOSHIYUKI , TANIMOTO SHIYOUICHI
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70058 , H01L21/30
摘要： PURPOSE: To measure the distribution of light intensity easily at the point of arbitrary time without overhauling or stopping the device by burying the illuminometer into a movable stage.
CONSTITUTION: The illuminometer 7 is buried into the sample stage 5, and positioned so that the upper surface of the illuminometer 7 and the upper surface of a wafer 6 agree approximately. A hole 7a with approximately 0.5mmϕ as shown in the figure is bored to the illuminometer 7, and light passing the hole 7a is changed into electrical signals by a photoelectric converting element 12 and the intensity is obtained. To measure the light intensity, the sample stage 5 is moved, the illuminometer 7 is brought under an exposing region, and the intensity is measured.
COPYRIGHT: (C)1982,JPO&Japio
摘要翻译：目的：为了在任意时间点轻松测量光线强度分布，无需通过将照度计埋入可移动平台进行大修或停止设备。构成：照度计7被埋入样品台5中，并且被定位成使得照度计7的上表面和晶片6的上表面大致一致。如图所示，具有大约0.5mm.phi的孔7a钻到照度计7，并且通过孔7a的光通过光电转换元件12变成电信号，并且获得强度。为了测量光强度，使样品台5移动，将照度计7置于曝光区域，并测量强度。

7. 发明专利

JPS60239022A MASK FOR EXPOSURE AND EXPOSING DEVICE USING SAID MASK 失效
公开(公告)号：JPS60239022A
公开(公告)日：1985-11-27
申请号：JP9405284
申请日：1984-05-11
申请人： NIPPON KOGAKU KK
发明人： SUWA KIYOUICHI
IPC分类号： H01L21/30 , G03F1/00 , G03F1/38 , G03F1/42 , G03F7/20 , G03F9/00 , H01L21/027
摘要： PURPOSE:To enable to curtail exposure processing time by a method wherein shield regions of size the same or more with width of mark regions are provided between the pattern region of a mask for exposure and the mark regions on both the sides of the pattern region. CONSTITUTION:A pattern region Pa drawn with the desired circuit pattern is formed to a reticle R. Marks M1, M2 are formed respectively at the positions separated by the equal distance to right and left in the (x) direction from the center RC of the region Pa. The marks M1, M2 are formed respectively inside of mark regions Pm1, Pm2. Non-exposing regions Pc1, Pc2 having width in the (x) direction the same or more with width in the (x) direction of the regions Pm1, Pm2 are formed between the respective regions Pm1, Pm2 and the region Pa. Accordingly, when a chip and the original picture pattern of a mask to be superposed are to be positioned, openings for positioning provided to the mask are separated from the original picture pattern, and shielding of the original picture pattern according to an optical system is not generated. Accordingly, the process can be shifted to exposing motion at once.

8. 发明专利

JPS60130742A POSITIONING DEVICE 失效
公开(公告)号：JPS60130742A
公开(公告)日：1985-07-12
申请号：JP23910083
申请日：1983-12-19
申请人： NIPPON KOGAKU KK
发明人： TANIMOTO SHIYOUICHI , MATSUURA TOSHIO , MURAKAMI SHIGEO , UEHARA MAKOTO , SUWA KIYOUICHI
IPC分类号： G03B27/53 , B65G1/00 , G03F9/00 , H01L21/027 , H01L21/30
摘要： PURPOSE:To attain high-speed, high-precision positioning by detecting unidirectional position deviation of the whole position deviation of a photosensitive substrate through an optical projection system, and also detecting the position in the direction perpendicular to said direction and rotary deviation through an off-axis type optical system. CONSTITUTION:Information from a CPU100 is outputted to a peripheral circuit through an IF101. Further, pieces of information from the peripheral circuit and a device are also read in a CPU100 through the IF101. A stage 7 is moved in two-dimensions by an X-directional driving means 102 and a Y-directional driving means 103. The position of the stage 7 is detected by laser interferometers 10 and 104 as coordinate values. Signals XP and YP of every unit movement of the stage 7 are counted up or down by digital counters in the IF101 and their values are read in the CPU100 to detect two-dimensional coordinate values of the stage 7. Consequently, the positioning is attained faster and with higher precision than by a through-the-lens system, and step alignment is possible by the through-the-lens system right before exposure, so errors due to expansion of a wafer is reduced.

9. 发明专利

JPS6095435A MASK FOR EXPOSURE 失效
公开(公告)号：JPS6095435A
公开(公告)日：1985-05-28
申请号：JP20210483
申请日：1983-10-28
申请人： NIPPON KOGAKU KK
发明人： SUWA KIYOUICHI
IPC分类号： G03F1/00 , G03F1/38 , G03F7/20 , H01L21/027
摘要： PURPOSE:To measure characteristics in the middle of manufacture and to improve the yield by providing marks for detecting the optical characteristics of a projection lens at the circumference of a circuit pattern drawing area. CONSTITUTION:Main scales MX1 and MX2 and subscales SX1 and SX2 for measuring X-axial magnification are provided on both sides of alignment marks 6a and 6b outside of left and right light shield frames 3 in a figure. Namely, the main scales MX1 and MX2 are provided at the outside of the left light shield frame 3 and the subscales SX1 and SX2 are provided at the outside of the right light shield frame 3 so that the main scale MX1 and subscale SX1, and the main scale MX2 and subscale SX2 face each other. Further, main scales MY1 and MY2 for measuring Y-axial magnification and subscales SY1 and SY2 are provided at the outside of upper and lower light shield frames 3; the main scales MY1 and MY2 are arranged at the outside of the upper frame and the subscales SY1 and SY2 are arranged at the outside of the lower frame so that the main scale MY1 and subscale SY1, and main scale MY2 and subscale SY2 face each other.

10. 发明专利

JPS58208749A PROJECTION TYPE EXPOSING DEVICE 失效
公开(公告)号：JPS58208749A
公开(公告)日：1983-12-05
申请号：JP9072982
申请日：1982-05-28
申请人： NIPPON KOGAKU KK
发明人： UEHARA MAKOTO , SUWA KIYOUICHI , MATSUURA TOSHIO
IPC分类号： H01L21/30 , G03F9/00 , H01L21/027
摘要： PURPOSE:To attain quick and precise exposure, by arranging a dichroic mirror transmitting exposed light having main wavelength and reflecting arraignment light between a reticle and a projection objective lens. CONSTITUTION:With respect to the projection objective lens, the dichroic mirror M having the size enough to cover an exposed light passing area is arranged between the reticle R and the projection objective lens L0 in parallel with the reticle R. Alignment light flux is reflected by the dichroic mirror and taken out from the exposed light passing area. When an wafer W is located on a position for exposure, the alignment can be performed by detecting the most end part of the exposure are of the wafer W or a key mark Wa formed on the slight inside, so that it is unnecessary to move the wafer W after completing the alignment and rapid and precise exposure is performed.

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