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1. 发明专利

JP2013240042A System and method for automatically tuning power and frequency of rf generator in bimodal mode 有权
标题翻译：射频发生器在双模式下自动调谐功率和频率的系统与方法
公开(公告)号：JP2013240042A
公开(公告)日：2013-11-28
申请号：JP2013060644
申请日：2013-03-22
申请人： Mks Instruments Inc , エムケーエスインストルメンツインコーポレーテッドMks Instruments,Incorporated
发明人： FISK II LARRY J , RUGHOONUNDON AMISH
IPC分类号： H04B1/04 , H03F3/20 , H03F3/68 , H05H1/46
CPC分类号： H03B5/1237 , H01J37/32082 , H01J37/32174 , H03F3/20 , H03K3/55
摘要： PROBLEM TO BE SOLVED: To provide a radio frequency generator in which a plurality of RF power signals generated by a plurality of RF generators are accurately controlled to effectively execute plasma etching.SOLUTION: A radio frequency generator includes: power control modules 74 and 76 generating power signals indicating power levels for a plurality of target states of power amplifiers 42 and 44; frequency control modules 78 and 80 generating frequency signals indicating frequencies for the plurality of target states of the power amplifiers 42 and 44; and pulse generating modules 70 and 72 supplying an output signal to the power amplifiers 42 and 44, recalling at least one of the latest power level and the latest frequency for one of the plurality of target states of the power amplifiers 42 and 44, and on the basis of the power signals, the frequency signals and at least one of the latest power level and the latest frequency of the power amplifiers 42 and 44, adjusting a current power level and a current frequency of the output signal.
摘要翻译：要解决的问题：提供一种射频发生器，其中由多个RF发生器产生的多个RF功率信号被精确地控制以有效地执行等离子体蚀刻。解决方案：射频发生器包括：功率控制模块74和76，产生指示功率放大器42和44的多个目标状态的功率电平的功率信号; 频率控制模块78和80产生指示功率放大器42和44的多个目标状态的频率的频率信号; 以及向功率放大器42和44提供输出信号的脉冲发生模块70和72，回收功率放大器42和44的多个目标状态中的一个的最新功率电平和最新频率中的至少一个，并且接通功率信号的基础，频率信号和功率放大器42和44的最新功率电平和最新频率中的至少一个，调整当前功率电平和输出信号的当前频率。

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